Patents by Inventor Katsuhisa Yuda
Katsuhisa Yuda has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 7981216Abstract: A vacuum processing apparatus, including a reactor and a partitioning plate having a plurality of through-holes through which radicals are allowed to pass and separating the reactor into a plasma generating space and a substrate process space, the process, such as a film deposition process, being carried out on a substrate placed in the substrate process space by delivering a gas into the plasma generating space for generating a plasma, producing radicals with the plasma thus generated, and delivering the radicals through the plurality of through-holes on the partitioning plate into the substrate process space. The partitioning plate includes a partitioning body having a plurality of through-holes and a control plate disposed on the plasma generating space side of the partitioning body and having radical passage holes in the positions corresponding to the plurality of through-holes on the partitioning plate.Type: GrantFiled: March 16, 2005Date of Patent: July 19, 2011Assignees: Canon Anelva Corporation, NEC CorporationInventors: Keiji Ishibashi, Masahiko Tanaka, Akira Kumagai, Manabu Ikemoto, Katsuhisa Yuda
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Publication number: 20100170442Abstract: In a plasma CVD apparatus, a plate formed with a plurality of perforated holes is arranged to separate a plasma generation region and a processing region. The aperture ratio of the perforated holes to the plate is not greater than five percent. Plasma including radicals and excited species is generated from an oxygen (O2) gas in the plasma generation region, then the radicals and excited species flow into the processing region through the perforated holes. A monosilane (SiH4) gas is also supplied into the processing region, but the backward flow of the monosilane gas into the plasma generation region is suppressed by the plate. In the processing region, the radicals and the excited species and the monosilane gas result in a gas phase reaction that yields the silicon dioxide film formed on the substrate or the wafer with high quality.Type: ApplicationFiled: March 17, 2010Publication date: July 8, 2010Inventors: Katsuhisa YUDA, Hiroshi NOGAMI
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Patent number: 7709063Abstract: In a plasma CVD apparatus, a plate formed with a plurality of perforated holes is arranged to separate a plasma generation region and a processing region. The aperture ratio of the perforated holes to the plate is not greater than five percent. Plasma including radicals and excited species is generated from an oxygen (O2) gas in the plasma generation region, then the radicals and excited species flow into the processing region through the perforated holes. A monosilane (SiH4) gas is also supplied into the processing region, but the backward flow of the monosilane gas into the plasma generation region is suppressed by the plate. In the processing region, the radicals and the excited species and the monosilane gas result in a gas phase reaction that yields the silicon dioxide film formed on the substrate or the wafer with high quality.Type: GrantFiled: January 5, 2007Date of Patent: May 4, 2010Assignees: NEC Corporation, Canon Anelva CorporationInventors: Katsuhisa Yuda, Hiroshi Nogami
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Patent number: 7585708Abstract: A thin-film transistor is formed on a transparent substrate and has a gate electrode film layer and a source and drain regions, and further has an alignment mark made of one and the same constituent material as a constituent material of at least one of the gate electrode film layer and source and drain regions and formed at one and the same position as the gate electrode film layer or source and drain region.Type: GrantFiled: August 30, 2006Date of Patent: September 8, 2009Assignee: NEC CorporationInventors: Yoshinobu Satou, Katsuhisa Yuda, Hiroshi Tanabe
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Publication number: 20090202721Abstract: A method for thin film formation that can form, at a low temperature, a good thin film having a good interfacial property between a silicon substrate and a silicon oxide film and having a low interfacial trap density is provided.Type: ApplicationFiled: March 14, 2006Publication date: August 13, 2009Inventors: Hiroshi Nogami, Katsuhisa Yuda, Hiroshi Tanabe
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Publication number: 20080305275Abstract: An insulating film deposition chamber 40 has a plasma generator 14 having a plasma generation chamber 21 separated from the film deposition chamber 13 in which the substrate is arranged. A material gas is directly supplied to the film deposition chamber, and radicals are introduced into the film deposition chamber from the plasma generator, and a thin film is deposited on the substrate. Further, a cleaning gas feeder is added to the plasma generator. A cleaning gas is introduced through the cleaning gas feeder to produce plasma at the plasma generator to generate radicals, and the radicals are introduced into the film deposition chamber and irradiate the substrate to clean it.Type: ApplicationFiled: July 8, 2008Publication date: December 11, 2008Applicant: CANON ANELVA CORPORATIONInventors: Kazuo Ichikawa, Hiroshi Tanabe, Katsuhisa Yuda
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Patent number: 7392759Abstract: In a plasma CVD apparatus, a plate formed with a plurality of perforated holes is arranged to separate a plasma generation region and a processing region. The aperture ratio of the perforated holes to the plate is not greater than five percent. Plasma including radicals and excited species is generated from an oxygen (O2) gas in the plasma generation region, then the radicals and excited species flow into the processing region through the perforated holes. A monosilane (SiH4) gas is also supplied into the processing region, but the backward flow of the monosilane gas into the plasma generation region is suppressed by the plate. In the processing region, the radicals and the excited species and the monosilane gas result in a gas phase reaction that yields the silicon dioxide film formed on the substrate or the wafer with high quality.Type: GrantFiled: October 29, 2004Date of Patent: July 1, 2008Assignees: NEC Corporation, Canon Anelva CorporationInventors: Katsuhisa Yuda, Hiroshi Nogami
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Publication number: 20080044589Abstract: An insulating film deposition chamber 40 has a plasma generator 14 having a plasma generation chamber 21 separated from the film deposition chamber 13 in which the substrate is arranged. A material gas is directly supplied to the film deposition chamber, and radicals are introduced into the film deposition chamber from the plasma generator, and a thin film is deposited on the substrate. Further, a cleaning gas feeder is added to the plasma generator. A cleaning gas is introduced through the cleaning gas feeder to produce plasma at the plasma generator to generate radicals, and the radicals are introduced into the film deposition chamber and irradiate the substrate to clean it.Type: ApplicationFiled: October 11, 2007Publication date: February 21, 2008Applicants: ANELVA CORPORATION, NEC CORPORATIONInventors: Kazuo Ichikawa, Hiroshi Tanabe, Katsuhisa Yuda
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Publication number: 20070110918Abstract: In a plasma CVD apparatus, a plate formed with a plurality of perforated holes is arranged to separate a plasma generation region and a processing region. The aperture ratio of the perforated holes to the plate is not greater than five percent. Plasma including radicals and excited species is generated from an oxygen (O2) gas in the plasma generation region, then the radicals and excited species flow into the processing region through the perforated holes. A monosilane (SiH4) gas is also supplied into the processing region, but the backward flow of the monosilane gas into the plasma generation region is suppressed by the plate. In the processing region, the radicals and the excited species and the monosilane gas result in a gas phase reaction that yields the silicon dioxide film formed on the substrate or the wafer with high quality.Type: ApplicationFiled: January 5, 2007Publication date: May 17, 2007Inventors: Katsuhisa Yuda, Hiroshi Nogami
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Publication number: 20070045624Abstract: A thin-film transistor is formed on a transparent substrate and has a gate electrode film layer and a source and drain regions, and further has an alignment mark made of one and the same constituent material as a constituent material of at least one of the gate electrode film layer and source and drain regions and formed at one and the same position as the gate electrode film layer or source and drain region.Type: ApplicationFiled: August 30, 2006Publication date: March 1, 2007Inventors: Yoshinobu Satou, Katsuhisa Yuda, Hiroshi Tanabe
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Patent number: 7119363Abstract: A thin-film transistor is formed on a transparent substrate and has a gate electrode film layer and a source and drain regions, and further has an alignment mark made of one and the same constituent material as a constituent material of at least one of the gate electrode film layer and source and drain regions and formed at one and the same position as the gate electrode film layer or source and drain region.Type: GrantFiled: August 5, 2004Date of Patent: October 10, 2006Assignee: NEC CorporationInventors: Yoshinobu Satou, Katsuhisa Yuda, Hiroshi Tanabe
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Patent number: 7067436Abstract: In a method of forming a silicon oxide film, the silicon oxide film is formed on a substrate by the use of a plasma CVD method. A plasma-generating region is separated from a deposition region which includes excitation oxygen molecules and excitation oxygen atoms. Plasma of first gas containing oxygen atoms is formed in the plasma-generating region while second gas containing silicon atoms is supplied into the deposition region. First quantity of the excitation oxygen molecules and second quantity of the excitation oxygen atoms are controlled intentionally.Type: GrantFiled: April 27, 2004Date of Patent: June 27, 2006Assignees: NEC Corp., ANELVA Corp.Inventors: Katsuhisa Yuda, Ge Xu
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Publication number: 20050217576Abstract: A vacuum processing apparatus, including a reactor and a partitioning plate having a plurality of through-holes through which radicals are allowed to pass and separating the reactor into a plasma generating space and a substrate process space, the process, such as a film deposition process, being carried out on a substrate placed in the substrate process space by delivering a gas into the plasma generating space for generating a plasma, producing radicals with the plasma thus generated, and delivering the radicals through the plurality of through-holes on the partitioning plate into the substrate process space. The partitioning plate includes a partitioning body having a plurality of through-holes and a control plate disposed on the plasma generating space side of the partitioning body and having radical passage holes in the positions corresponding to the plurality of through-holes on the partitioning plate.Type: ApplicationFiled: March 16, 2005Publication date: October 6, 2005Applicants: ANELVA CORPORATION, NEC CORPORATIONInventors: Keiji Ishibashi, Masahiko Tanaka, Akira Kumagai, Manabu Ikemoto, Katsuhisa Yuda
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Publication number: 20050087140Abstract: In a plasma CVD apparatus, a plate formed with a plurality of perforated holes is arranged to separate a plasma generation region and a processing region. The aperture ratio of the perforated holes to the plate is not greater than five percent. Plasma including radicals and excited species is generated from an oxygen (O2) gas in the plasma generation region, then the radicals and excited species flow into the processing region through the perforated holes. A monosilane (SiH4) gas is also supplied into the processing region, but the backward flow of the monosilane gas into the plasma generation region is suppressed by the plate. In the processing region, the radicals and the excited species and the monosilane gas result in a gas phase reaction that yields the silicon dioxide film formed on the substrate or the wafer with high quality.Type: ApplicationFiled: October 29, 2004Publication date: April 28, 2005Inventors: Katsuhisa Yuda, Hiroshi Nogami
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Patent number: 6851384Abstract: In a plasma CVD apparatus, a plate formed with a plurality of perforated holes is arranged to separate a plasma generation region and a processing region. The aperture ratio of the perforated holes to the plate is not greater than five percent. Plasma including radicals and excited species is generated from an oxygen (O2) gas in the plasma generation region, then the radicals and excited species flow into the processing region through the perforated holes. A monosilane (SiH4) gas is also supplied into the processing region, but the backward flow of the monosilane gas into the plasma generation region is suppressed by the plate. In the processing region, the radicals and the excited species and the monosilane gas result in a gas phase reaction that yields the silicon dioxide film formed on the substrate or the wafer with high quality.Type: GrantFiled: March 28, 2001Date of Patent: February 8, 2005Assignees: NEC Corporation, Anelva CorporationInventors: Katsuhisa Yuda, Hiroshi Nogami
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Publication number: 20050012098Abstract: A thin-film transistor is formed on a transparent substrate and has a gate electrode film layer and a source and drain regions, and further has an alignment mark made of one and the same constituent material as a constituent material of at least one of the gate electrode film layer and source and drain regions and formed at one and the same position as the gate electrode film layer or source and drain region.Type: ApplicationFiled: August 5, 2004Publication date: January 20, 2005Inventors: Yoshinobu Satou, Katsuhisa Yuda, Hiroshi Tanabe
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Patent number: 6830786Abstract: A silicon oxide film has a ratio of A1 to A2 which is not higher than 0.21, where A1 is a first peak integrated intensity of a first peak belonging to Si—OH and appearing in the vicinity of a wave-number of 970 cm−1, and A2 is a second peak integrated intensity of a second peak belonging to O—Si—O and appearing in the vicinity of a wave-number 820 cm−1, and each of the first and second peak integrated intensities is defined as a product of peak width at half height and a peak height of a Raman spectrum obtained by a Raman scattering spectroscopic analysis of the silicon oxide film. The silicon oxide film is deposited under a condition that a ratio of a first flow rate Fo of oxygen gas to a second flow rate Fsi of a silicon source gas is not lower than 20.Type: GrantFiled: July 18, 2002Date of Patent: December 14, 2004Assignee: NEC CorporationInventors: Katsuhisa Yuda, Hiroshi Tanabe
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Patent number: 6822263Abstract: A thin-film transistor is formed on a transparent substrate and has a gate electrode film layer and a source and drain regions, and further has an alignment mark made of one and the same constituent material as a constituent material of at least one of the gate electrode film layer and source and drain regions and formed at one and the same position as the gate electrode film layer or source and drain region.Type: GrantFiled: June 9, 2003Date of Patent: November 23, 2004Assignee: NEC CorporationInventors: Yoshinobu Satou, Katsuhisa Yuda, Hiroshi Tanabe
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Publication number: 20040198071Abstract: In a method of forming a silicon oxide film, the silicon oxide film is formed on a substrate by the use of a plasma CVD method. A plasma-generating region is separated from a deposition region which includes excitation oxygen molecules and excitation oxygen atoms. Plasma of first gas containing oxygen atoms is formed in the plasma-generating region while second gas containing silicon atoms is supplied into the deposition region. First quantity of the excitation oxygen molecules and second quantity of the excitation oxygen atoms are controlled intentionally.Type: ApplicationFiled: April 27, 2004Publication date: October 7, 2004Inventors: Katsuhisa Yuda, Ge Xu
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Patent number: 6779483Abstract: A plasma CVD apparatus includes first and second electrodes, neutral gas introduction pipes, and a plasma confining electrode interposed between the first and second electrodes to separate a plasma generation region and a substrate processing region. The plasma confining electrode has a hollow structure defined by an upper electrode plate, and a lower electrode plate, and has gas diffusing plates provided in the hollow structure, and has radical passage holes provided to supply radicals from the plasma generation region into the substrate processing region while isolating from a neutral gas. The plasma confining electrode is connected to the neutral gas introduction pipes, and a plurality of neutral gas passage holes are provided for each of the lower electrode plate and the gas diffusing plates to supply the neutral gas into the substrate processing region.Type: GrantFiled: August 26, 2003Date of Patent: August 24, 2004Assignees: NEC Corporation, Anelva CorporationInventors: Katsuhisa Yuda, Manabu Ikemoto