Patents by Inventor Katsunori Hirai

Katsunori Hirai has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 11037815
    Abstract: A dechuck control method of dechucking a processed object electrostatically attracted to an electrostatic chuck is provided. The method includes a step of dechucking the processed object by lifting the processed object with a supporting mechanism. The dechucking step is performed while applying a given voltage to an electrode of the electrostatic chuck.
    Type: Grant
    Filed: August 29, 2018
    Date of Patent: June 15, 2021
    Assignee: Tokyo Electron Limited
    Inventors: Yasuharu Sasaki, Katsunori Hirai, Junichi Sasaki
  • Patent number: 10832930
    Abstract: Disclosed is an electrostatic attraction method including: a first step in which a gas is introduced into a chamber in which the processing target object is to be processed before a processing target object is placed on a stage within the chamber, and plasma is generated by applying a high frequency power; a second step in which a DC voltage having a polarity opposite to a polarity of a DC voltage to be applied when attracting the processing target object, to an electrostatic chuck provided on the stage after the first step; a third step where extinguishing of the plasma by stopping application of the high frequency power is performed after the second step; and a fourth step where application of the DC voltage is stopped after the third step.
    Type: Grant
    Filed: June 15, 2018
    Date of Patent: November 10, 2020
    Assignee: TOKYO ELECTRON LIMITED
    Inventors: Katsunori Hirai, Yasuharu Sasaki
  • Patent number: 10669446
    Abstract: An aqueous coating composition containing an acrylic-modified polyester resin (A) and a reactive-group-containing resin (B), the acrylic-modified polyester resin (A) comprising as a monomer component constituting the acrylic part, a polyoxyalkylene group-containing unsaturated monomer having a weight average molecular weight of 400 or more, and the proportion of compounds having 6 or more carbon atoms of the total amount of the polyester-constituting components being 50 mass % or more.
    Type: Grant
    Filed: March 6, 2017
    Date of Patent: June 2, 2020
    Assignee: KANSAI PAINT CO., LTD.
    Inventors: Yosuke Hasegawa, Hiroshi Kitagawa, Katsunori Hirai
  • Publication number: 20190074209
    Abstract: A dechuck control method of dechucking a processed object electrostatically attracted to an electrostatic chuck is provided. The method includes a step of dechucking the processed object by lifting the processed object with a supporting mechanism. The dechucking step is performed while applying a given voltage to an electrode of the electrostatic chuck.
    Type: Application
    Filed: August 29, 2018
    Publication date: March 7, 2019
    Inventors: Yasuharu SASAKI, Katsunori HIRAI, Junichi SASAKI
  • Publication number: 20190071586
    Abstract: An aqueous coating composition containing an acrylic-modified polyester resin (A) and a reactive-group-containing resin (B), the acrylic-modified polyester resin (A) comprising as a monomer component constituting the acrylic part, a polyoxyalkylene group-containing unsaturated monomer having a weight average molecular weight of 400 or more, and the proportion of compounds having 6 or more carbon atoms of the total amount of the polyester-constituting components being 50 mass % or more.
    Type: Application
    Filed: March 6, 2017
    Publication date: March 7, 2019
    Applicant: KANSAI PAINT CO., LTD.
    Inventors: Yosuke HASEGAWA, Hiroshi KITAGAWA, Katsunori HIRAI
  • Publication number: 20180366360
    Abstract: Disclosed is an electrostatic attraction method including: a first step in which a gas is introduced into a chamber in which the processing target object is to be processed before a processing target object is placed on a stage within the chamber, and plasma is generated by applying a high frequency power; a second step in which a DC voltage having a polarity opposite to a polarity of a DC voltage to be applied when attracting the processing target object, to an electrostatic chuck provided on the stage after the first step; a third step where extinguishing of the plasma by stopping application of the high frequency power is performed after the second step; and a fourth step where application of the DC voltage is stopped after the third step.
    Type: Application
    Filed: June 15, 2018
    Publication date: December 20, 2018
    Applicant: TOKYO ELECTRON LIMITED
    Inventors: Katsunori HIRAI, Yasuharu SASAKI
  • Patent number: 9475957
    Abstract: The first objective of the present invention is to provide an aqueous paint composition that can form a paint film with excellent smoothness, image clarity, adhesion and water resistance. This aqueous paint is characterized in comprising (A) an aqueous dispersion of an acrylic modified polyester resin, (B) a block polyisocyanate compound having a nonionic hydrophilic group, and (C) an aqueous dispersion of acrylic polymer fine particles.
    Type: Grant
    Filed: April 4, 2013
    Date of Patent: October 25, 2016
    Assignee: KANSAI PAINT CO., LTD.
    Inventors: Minoru Ishikura, Takashi Nakayabu, Yuki Yamada, Katsunori Hirai
  • Patent number: 9082720
    Abstract: A direction change of space formed in an etching target layer can be suppressed while maintaining an etching selectivity for the etching target layer against a mask. A semiconductor device manufacturing method MT includes exciting a first gas by supplying the first gas containing a fluorocarbon gas, a fluorohydrocarbon gas and an oxygen gas into a processing chamber 12 (ST2); and exciting a second gas by supplying the second gas containing an oxygen gas and a rare gas into the processing chamber (ST3), and a cycle including the exciting of the first gas (ST2) and the exciting of the second gas (ST3) is repeated multiple times.
    Type: Grant
    Filed: August 25, 2014
    Date of Patent: July 14, 2015
    Assignee: TOKYO ELECTRON LIMITED
    Inventors: Kazuto Ogawa, Katsunori Hirai
  • Publication number: 20150056817
    Abstract: A direction change of space formed in an etching target layer can be suppressed while maintaining an etching selectivity for the etching target layer against a mask. A semiconductor device manufacturing method MT includes exciting a first gas by supplying the first gas containing a fluorocarbon gas, a fluorohydrocarbon gas and an oxygen gas into a processing chamber 12 (ST2); and exciting a second gas by supplying the second gas containing an oxygen gas and a rare gas into the processing chamber (ST3), and a cycle including the exciting of the first gas (ST2) and the exciting of the second gas (ST3) is repeated multiple times.
    Type: Application
    Filed: August 25, 2014
    Publication date: February 26, 2015
    Inventors: Kazuto Ogawa, Katsunori Hirai
  • Publication number: 20150056376
    Abstract: The first objective of the present invention is to provide an aqueous paint composition that can form a paint film with excellent smoothness, image clarity, adhesion and water resistance. This aqueous paint is characterized in comprising (A) an aqueous dispersion of an acrylic modified polyester resin, (B) a block polyisocyanate compound having a nonionic hydrophilic group, and (C) an aqueous dispersion of acrylic polymer fine particles.
    Type: Application
    Filed: April 4, 2013
    Publication date: February 26, 2015
    Applicant: KANSAI PAINT CO., LTD.
    Inventors: Minoru Ishikura, Takashi Nakayabu, Yuki Yamada, Katsunori Hirai
  • Patent number: 5282411
    Abstract: This heat-insulating piston has a piston head comprising a piston head base portion consisting of a ceramic material, a heat-insulating member jointed to the piston head base portion and consisting of a whisker fired member of the same ceramic material as that of the piston head base portion, and a laminate jointed to the surface of the heat-insulating member that faces the combustion chamber, as well as to the surface that slides and consisting of the same ceramic material as that of the heat-insulating member. The heat-insulating member is stably jointed to the piston head base portion and laminate by utilizing the same ceramic material for the heat-insulating member, piston head base portion and laminate, whereby the strength of the piston head can be improved. Furthermore, the heat-insulating capability of the piston can be improved, while the thermal capacity of the laminate is made small, whereby the suction efficiency can also be improved.
    Type: Grant
    Filed: March 19, 1992
    Date of Patent: February 1, 1994
    Assignee: Isuzu Motors Limited
    Inventors: Katsunori Hirai, Hiroshi Matsuoka
  • Patent number: 5018489
    Abstract: In a heat-insulating piston comprising a ceramic cylindrical member having the lower end surface thereof in contact with the outer peripheral upper end surface of a piston skirt member, a head base member having the peripheral portion thereof in contact with an inner peripheral step portion of the cylindrical member and fixed to the piston skirt member, a heat-insulating member disposed on the head base member and a ceramic thin film member disposed on the heat-insulating member and having the peripheral portion thereof bonded to the cylindrical member, this invention relates to a heat-insulating piston which inserts metallic heat-resistant members between the inner peripheral step portion of the cylindrical member and the peripheral portion of the head base member in order to prevent the occurrence of a gap between the thin film member and the heat-insulating member.
    Type: Grant
    Filed: August 23, 1990
    Date of Patent: May 28, 1991
    Assignee: Isuzu Motors Limited
    Inventor: Katsunori Hirai