Abstract: A wavefront measuring device and method obtain wavefront information of an optical system. The method including: irradiating the optical system with a light beam; allowing the light beam passed via the optical system to come into a diffraction grating having periodicity in a first direction; and obtaining the wavefront information based on an interference fringe formed by light beams generated from the diffraction grating. The diffraction grating including: first portions which allow light to pass therethrough; and second portions which shield light, each of the second portions being provided between two of the first portions. A ratio between a width of one of the first portions in the first direction and a width of one of the second portions in the first direction is changed in the first direction, the one of the first portions and the one of the second portions being adjacent to each other.

Abstract: A wavefront measuring device and method obtain wavefront information of an optical system. The method including: irradiating the optical system with a light beam; allowing the light beam passed via the optical system to come into a diffraction grating having periodicity in a first direction; and obtaining the wavefront information based on an interference fringe formed by light beams generated from the diffraction grating. The diffraction grating including: first portions which allow light to pass therethrough; and second portions which shield light, each of the second portions being provided between two of the first portions. A ratio between a width of one of the first portions in the first direction and a width of one of the second portions in the first direction is changed in the first direction, the one of the first portions and the one of the second portions being adjacent to each other.

Abstract: There is provided a wavefront measuring method for obtaining wavefront information of an optical system. The method including: irradiating the optical system with a light beam; allowing the light beam passed via the optical system to come into a diffraction grating having periodicity in a first direction; and obtaining the wavefront information based on an interference fringe formed by light beams generated from the diffraction grating. The diffraction grating including: first portions which allow light to pass therethrough; and second portions which shield light, each of the second portions being provided between two of the first portions. A ratio between a width of one of the first portions in the first direction and a width of one of the second portions in the first direction is changed in the first direction, the one of the first portions and the one of the second portions being adjacent to each other.

Abstract: There is provided a wavefront measuring method for obtaining wavefront information of an optical system. The method including: irradiating the optical system with a light beam; allowing the light beam passed via the optical system to come into a diffraction grating having periodicity in a first direction; and obtaining the wavefront information based on an interference fringe formed by light beams generated from the diffraction grating. The diffraction grating including: first portions which allow light to pass therethrough; and second portions which shield light, each of the second portions being provided between two of the first portions. A ratio between a width of one of the first portions in the first direction and a width of one of the second portions in the first direction is changed in the first direction, the one of the first portions and the one of the second portions being adjacent to each other.

Abstract: There is provided a template inspection apparatus which inspects a replica template, manufactured by an imprinting method from a master template having a depression/protrusion pattern, the template inspection apparatus including: an inspection light source part which radiates inspection light of plane waves; a stage configured to dispose the master template and the replica template so as to be in close proximity with each other and be irradiated by the inspection light; and a detection part which detects light of a component transmitting through the master template and the replica template and different from the plane waves. Accordingly, a template can be inspected in a short time.

Abstract: There is provided a template inspection apparatus which inspects a replica template, manufactured by an imprinting method from a master template having a depression/protrusion pattern, the template inspection apparatus including: an inspection light source part which radiates inspection light of plane waves; a stage configured to dispose the master template and the replica template so as to be in close proximity with each other and be irradiated by the inspection light; and a detection part which detects light of a component transmitting through the master template and the replica template and different from the plane waves. Accordingly, a template can be inspected in a short time.

Abstract: A wavefront aberration measuring device includes a mask which arranges a group of minute apertures for generating a group of point light sources at an object point as a measurement objective of an inspection-objective optical system, an illumination system which illuminates the mask with an illumination light, a diffraction grating which shears, into a plurality of light fluxes, a light flux exiting from the group of minute apertures and passing via the inspection-objective optical system, and a detecting portion which detects an interference fringe formed mutually by the plurality of sheared light fluxes, wherein a center spacing distance L between adjacent minute apertures which are adjacent in a shear direction in the group of minute apertures is defined to minimize the coherence degree.

Abstract: The invention relates to a point diffraction interferometer which measures a profile irregularity on a surface to be measured by, irradiating light irradiated from a light source to a pinhole mirror via a collective optical system, irradiating a part of the light diffracted from a pinhole provided in the pinhole mirror to the surface to be measured as a luminous flux for measurement, making the luminous flux for measurement reflected by the surface to be measured interfere with a reference luminous flux which is an other part of light diffracted from the pinhole, and detecting the state of an interference fringe caused by the interference. In the invention, a diameter range of the pinhole is: &lgr;/2≦&phgr;PH≦&lgr;/NA (wherein &lgr; is a wavelength of light irradiated from the light source, NA is a numerical aperture of the collective optical system, and &phgr; PH is a diameter of the pinhole).