Patents by Inventor Katsushige Hayashi

Katsushige Hayashi has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 8790766
    Abstract: The present invention can provide a polymer film having an Ra (arithmetic average roughness) of 0.5 ?m to 2.5 ?m, an Ry (maximum height) of 3 ?m to 11 ?m, an Rz (ten-point average height) of 3 ?m to 8 ?m, and a light transmittance of 85% or higher. A preferable embodiment of the present invention can provide, at the same time, an optical diffusion function, an improved luminance, a transmittance and the like which are of a sufficient level not realized conventionally. In a still preferable embodiment, Sm (average concave-concave/convex-convex interval) of 90 ?m to 160 ?m and the average inter-local peak interval (S) is 5 ?m to 15 ?m.
    Type: Grant
    Filed: December 21, 2007
    Date of Patent: July 29, 2014
    Assignees: MGC Filsheet Co., Ltd., Mitsubishi Gas Chemical Company Inc.
    Inventors: Kenji Kato, Katsushige Hayashi, Jun Yokoyama, Mitsuo Miura, Tsutomu Nara
  • Patent number: 8451540
    Abstract: Disclosed is a film suitable for improvement of luminance, contrast and view angle of a liquid crystal display. Specifically disclosed is a retardation film having a thickness of 30-500 ?m, a light transmittance of not less than 85%, and an Nz factor of not less than 10.
    Type: Grant
    Filed: September 11, 2007
    Date of Patent: May 28, 2013
    Assignees: MGC Filsheet Co., Ltd., Mitsubishi Gas Chemical Company, Inc.
    Inventors: Kenji Kato, Katsushige Hayashi, Noriyuki Kato, Haruaki Eto, Syoichi Nito
  • Publication number: 20100136287
    Abstract: The present invention can provide a polymer film having an Ra (arithmetic average roughness) of 0.5 ?m to 2.5 ?m, an Ry (maximum height) of 3 ?m to 11 ?m, an Rz (ten-point average height) of 3 ?m to 8 ?m, and a light transmittance of 85% or higher. A preferable embodiment of the present invention can provide, at the same time, an optical diffusion function, an improved luminance, a transmittance and the like which are of a sufficient level not realized conventionally. In a still preferable embodiment, Sm (average concave-concave/convex-convex interval) of 90 ?m to 160 ?m and the average inter-local peak interval (S) is 5 ?m to 15 ?m.
    Type: Application
    Filed: December 21, 2007
    Publication date: June 3, 2010
    Inventors: Kenji Kato, Katsushige Hayashi, Jun Yokoyama
  • Patent number: 6888774
    Abstract: A semiconductor memory device is of a bank switching type having a plurality of memory array banks provided in a memory chip which can be switched from one to another for storage operation. The semiconductor memory device includes: a plurality of memory arrays in the memory array banks; an input/output circuit for transmitting information data between the memory arrays and the outside; a data bus for connecting between the memory arrays and the input/output circuit; and N-channel transistors provided across the data bus. The data bus consists of a plurality of adjacent lines. Each of N-channel transistors is connected at their drain to the corresponding lines of the data bus while at their source to the ground. When a multi-bit test is commenced for writing and reading data on the memory arrays, the N-channel transistors are turned on to connect the lines of the data bus to the ground.
    Type: Grant
    Filed: August 21, 2002
    Date of Patent: May 3, 2005
    Assignees: Renesas Technology Corp., Mitsubishi Electric Engineering Company Limited
    Inventors: Takanobu Suzuki, Tamaki Tsuruda, Katsushige Hayashi
  • Publication number: 20030105199
    Abstract: A polyoxymethylene resin composition consisting essentially of 100 parts by weight of a polyoxymethylene copolymer containing an oxymethylene unit as a main recurring unit and 1 to 30 mol, per 100 mol of the oxymethylene unit, of an oxyalkylene unit having at least 2 carbon atoms as a unit from a comonomer and 1 to 50 parts by weight of a polyalkylene glycol, and a molded article formed of the resin composition. The polyoxymethylene resin composition has high tenacity and high flexibility, is excellent in folding durability and is excellent in compatibility and dispersibility, and it gives a molded article having excellent folding durability and an excellent surface condition.
    Type: Application
    Filed: November 12, 2002
    Publication date: June 5, 2003
    Applicant: Mitsubishi Gas Chemical Company, Inc.
    Inventors: Masanori Furukawa, Daigo Nakaya, Katsushige Hayashi, Hiroshi Mimura, Daisuke Sunaga
  • Publication number: 20030058730
    Abstract: A semiconductor memory device is of a bank switching type having a plurality of memory array banks provided in a memory chip which can be switched from one to another for storage operation. The semiconductor memory device includes: a plurality of memory arrays in the memory array banks; an input/output circuit for transmitting information data between the memory arrays and the outside; a data bus for connecting between the memory arrays and the input/output circuit; and N-channel transistors provided across the data bus. The data bus consists of a plurality of adjacent lines. Each of N-channel transistors is connected at their drain to the corresponding lines of the data bus while at their source to the ground. When a multi-bit test is commenced for writing and reading data on the memory arrays, the N-channel transistors are turned on to connect the lines of the data bus to the ground.
    Type: Application
    Filed: August 21, 2002
    Publication date: March 27, 2003
    Applicant: Mitsubishi Denki Kabushiki Kaisha
    Inventors: Takanobu Suzuki, Tamaki Tsuruda, Katsushige Hayashi
  • Patent number: 6255436
    Abstract: An aromatic polycarbonate of the present invention is produced by reacting an aromatic dihydroxy compound with a compound capable of introducing a carbonate bond, and has a viscosity-average molecular weight of 12,000 to 40,000 and a content of a cyclic oligomer represented by the formula (1) of not more than 1,000 ppm, in which the percentage of the content of said cyclic oligomer represented by the formula (1) based on the total contents of the cyclic oligomer represented by the formula (1), an oligomer represented by the formula (2) and an oligomer represented by the formula (3) satisfies the following relational formula [I]: 0 < ( 1 ) ( 1 ) + ( 2 )
    Type: Grant
    Filed: November 22, 1999
    Date of Patent: July 3, 2001
    Assignees: Mitsubishi Chemical Corporation, Mitsubishi Gas Chemical Company, Inc.
    Inventors: Masatoshi Kimura, Michio Kawai, Hiroshi Takeguchi, Hiroshi Nakano, Masayuki Nakajima, Katsushige Hayashi
  • Patent number: 6187896
    Abstract: An aromatic polycarbonate composition which has excellent thermal stability and maintains high transparency and a satisfactory hue even at high temperatures. The aromatic polycarbonate composition comprises: a polycarbonate obtained by reacting at least one aromatic dihydroxy compound with a compound capable of incorporating a carbonate bond; and a phosphorus compound represented by the following formula (1): wherein the eight R′s may be the same or different and each represents a hydrogen atom or an optionally substituted, aliphatic or aromatic, univalent group having 1 to 18 carbon atoms.
    Type: Grant
    Filed: December 21, 1999
    Date of Patent: February 13, 2001
    Assignees: Mitsubishi Gas Chemical Company, Inc., Mitsubishi Chemical Corporation
    Inventors: Masayuki Nakajima, Katsushige Hayashi, Michio Kawai, Junji Takano
  • Patent number: 5777064
    Abstract: A method of producing a polycarbonate excellent in the hue, the thermal stability, and the electrolysis stability by supplying a polycarbonate obtained by a transesterification method to an extruder having vent(s), melting the polycarbonate, and adding an acidic compound to the molten polycarbonate followed by kneading to continuously devolatilize low molecular weight compounds remaining in the polycarbonate. Better result is obtained by adding water to the kneaded mixture of the polycarbonate and the acidic compound before devolatilizing the low molecular weight compounds.
    Type: Grant
    Filed: March 14, 1996
    Date of Patent: July 7, 1998
    Assignee: Mitsubishi Gas Chemical Company, Inc.
    Inventors: Katsushige Hayashi, Tsutomu Kawakami, Yuji Takeda, Katuhiro Iura
  • Patent number: 5457174
    Abstract: A process for preparing a polycarbonate which comprises performing a transesterification and a polycondensation reaction with a diarylcarbonate and dihydroxyaryl compound, in a reaction apparatus composed of stainless steel comprising at least 12% by weight of Ni, and at least 22% by weight of Cr, and having Fe as the remaining main component. A polycarbonate which has a good color, is stable to hydrolysis and resistant to heat-yellowing is the resulting product.
    Type: Grant
    Filed: July 21, 1994
    Date of Patent: October 10, 1995
    Assignee: Mitsubishi Gas Chemical Company, Inc.
    Inventors: Katsushige Hayashi, Mitsuhiko Masumoto, Masayuki Nakajima, Takuya Hasaki, Masahiko Ishikawa, Atsushi Hirashima
  • Patent number: 5380907
    Abstract: A process for producing an aromatic carbonate which comprises:reacting(a) an aromatic hydroxy compound with(b) carbon monoxide in the presence of(c) an oxidation agent,(d) a catalyst comprising a palladium compound or impregnated palladium catalyst,(e) a co-catalyst comprising a manganese compound, a cobalt compound or a copper compound, and(f) at least one nitrile compoundat a temperature of 20.degree. to 300.degree. C.
    Type: Grant
    Filed: June 1, 1993
    Date of Patent: January 10, 1995
    Assignee: Mitsubishi Gas Chemical Company, Inc.
    Inventors: Masamichi Mizukami, Katsushige Hayashi, Katsuhiro Iura, Takao Kawaki
  • Patent number: 5310944
    Abstract: A process for producing a carboxylated compound, which comprises reacting a carbonyl compound with hydrogen peroxide in the presence of an organo-arsenic acid of the formula (1), ##STR1## wherein: R.sup.1 is a C.sub.1 -C.sub.12 alkyl group which may be substituted or an aryl group which may be substituted,R.sup.2 is a hydroxyl group or the same group as that which defines R.sup.1,or alternatively, R.sup.1 and R.sup.2 may bond to each other to form a five-membered or six-membered ring together with As atoms to which these groups are bonded, andthe substituent(s) substituted on the above groups is/are selected from hydroxyl, carboxyl, carbonyl, sulfonyl, sulfonium, an amino group, an ammonium group, an alkyl group, an alkoxyl group and a halogen atom,while a water concentration in a reaction system is maintained at not more than 2% by weight, thereby to form a corresponding carboxylated compound.
    Type: Grant
    Filed: January 17, 1992
    Date of Patent: May 10, 1994
    Assignee: Mitsubishi Gas Chemical Company, Inc.
    Inventors: Takao Kawaki, Yuh Miyauchi, Toshio Watanabe, Katsushige Hayashi, Satoshi Ueno, Hiroshi Ogawa, Fumiya Zaima
  • Patent number: 5051309
    Abstract: An anti-dazzling polycarbonate polarizing plate is formed with a polarizing thin layer composed of a polymeric film having a dichroic substance adsorbed on and oriented in the polymeric film, and a polycarbonate sheet having a retardation value of at least 2000 nm bonded to one or both surfaces of the polarizing thin layer.
    Type: Grant
    Filed: April 20, 1990
    Date of Patent: September 24, 1991
    Assignee: Mitsubishi Gas Chemical Co., Inc.
    Inventors: Takao Kawaki, Ryozo Kawai, Katsushige Hayashi, Masaki Nagata
  • Patent number: 4861854
    Abstract: A photosensitive polyimide precursor composed of the structural units (A) represented by the following general formula (I) and the structural units (B) represented by the following general formula (II), in which the ratio of the molar quantity of the structural units (A) to the sum of the molar quantity of the structural units (A) and that of the structural units (B) is 0.01 or greater, and having a viscosity of 100 cP or above as measured at 25.degree. C. in the state of a 10% by weight solution in N-methylpyrrolidone: ##STR1## wherein R.sub.1 represents a tetravalent aromatic hydrocarbon residue; R.sub.2 represents a divalent aromatic hydrocarbon residue; X, identical or different represents a halogen or an alkyl group; and m represents 0 or an integer from 1 to 4. The photosensitivity of the present photosensitive polyimide precursor is about 20 to 100 times that of conventional products. After heat dehydration cyclization, it shows a heat resistance of 400.degree. C. or above.
    Type: Grant
    Filed: June 1, 1988
    Date of Patent: August 29, 1989
    Assignee: Mitsubishi Gas Chemical Company, Inc.
    Inventors: Akitoshi Sugio, Takao Kawaki, Makoto Kobayashi, Katsushige Hayashi, Masahito Watanabe
  • Patent number: 4670535
    Abstract: The photosensitive polyimide precursor of the invention has a recurring unit represented by the following general formula [I]: ##STR1## (R.sub.1 represents a tetravalent aromatic hydrocarbon residue; R.sub.2 and R.sub.3 each represent a divalent aromatic or aliphatic hydrocarbon residue; and R.sub.4 represents a divalent aromatic hydrocarbon residue represented by ##STR2## wherein R.sub.5, R.sub.6, R.sub.7, R.sub.8, R.sub.9, R.sub.10, R.sub.11 and R.sub.12, identical or different, each represent hydrogen atom, a halogen group or an alkyl group). The photosensitive polyimide precursor of the invention has a viscosity of 50 centipoises or above as measured at 23.degree. C. in the state of a 10% (by weight) solution in N,N-dimethylacetamide. Its photosensitivity is as high as about 20-100 times that of prior products. After heat cyclization, it exhibits a heat resistance of 400.degree. C. or above.
    Type: Grant
    Filed: June 17, 1986
    Date of Patent: June 2, 1987
    Assignee: Mitsubishi Gas Chemical Company, Inc.
    Inventors: Akitoshi Sugio, Takao Kawaki, Katsushige Hayashi
  • Patent number: 4473705
    Abstract: A process for producing an oxalate diester is provided. The oxalate diester is produced by reacting an aliphatic alcohol, carbon monoxide and molecular oxygen at an elevated temperature and under pressure in the presence of a catalyst comprising (1) metallic palladium or a palladium compound, (2) a heteropoly-acid and (3) at least one nitrogen compound selected from the group consisting of nitric acid, nitrogen oxides and esters of nitrous acid.
    Type: Grant
    Filed: December 21, 1982
    Date of Patent: September 25, 1984
    Assignee: Mitsubishi Gas Chemical Company, Inc.
    Inventors: Hiroshi Miyamori, Tadashi Simomura, Mituo Miura, Katsushige Hayashi