Patents by Inventor Kazuei Yamaguchi
Kazuei Yamaguchi has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
-
Patent number: 7857876Abstract: Diamond clusters are used as a polishing material of free abrading particles, each being a combination of artificial diamond particles having primary particle diameters of 20 nm or less and impurities that are attached around these diamond particles. The density of non-diamond carbon contained in the impurities is in the range of 95% or more and 99% or less, and the density of chlorine contained in other than non-diamond carbon in the impurities is 0.5% or more and preferably 3.5% or less. The diameters of these diamond clusters are in the range of 30 nm or more and 500 nm or less, and their average diameter is in the range of 30 nm or more and 200 nm or less. Such polishing material is produced first by an explosion shock method to obtain diamond clusters and then removing the impurities such that density of non-diamond carbon contained in the impurities and density of chlorine contained in other than non-diamond carbon in the impurities become adjusted.Type: GrantFiled: April 8, 2009Date of Patent: December 28, 2010Assignee: Nihon Micro Coating Co., Ltd.Inventors: Noriyuki Kumasaka, Yuji Horie, Mitsuru Saito, Kazuei Yamaguchi
-
Patent number: 7585341Abstract: Diamond clusters are used as a polishing material of free abrading particles, each being a combination of artificial diamond particles having primary particle diameters of 20 nm or less and impurities that are attached around these diamond particles. The density of non-diamond carbon contained in the impurities is in the range of 95% or more and 99% or less, and the density of chlorine contained in other than non-diamond carbon in the impurities is 0.5% or more and preferably 3.5% or less. The diameters of these diamond clusters are in the range of 30 nm or more and 500 nm or less, and their average diameter is in the range of 30 nm or more and 200 nm or less.Type: GrantFiled: May 23, 2007Date of Patent: September 8, 2009Assignee: Nihon Micro Coating Co., Ltd.Inventors: Noriyuki Kumasaka, Yuji Horie, Mitsuru Saito, Kazuei Yamaguchi
-
Publication number: 20090188170Abstract: Diamond clusters are used as a polishing material of free abrading particles, each being a combination of artificial diamond particles having primary particle diameters of 20 nm or less and impurities that are attached around these diamond particles. The density of non-diamond carbon contained in the impurities is in the range of 95% or more and 99% or less, and the density of chlorine contained in other than non-diamond carbon in the impurities is 0.5% or more and preferably 3.5% or less. The diameters of these diamond clusters are in the range of 30 nm or more and 500 nm or less, and their average diameter is in the range of 30 nm or more and 200 nm or less. Such polishing material is produced first by an explosion shock method to obtain diamond clusters and then removing the impurities such that density of non-diamond carbon contained in the impurities and density of chlorine contained in other than non-diamond carbon in the impurities become adjusted.Type: ApplicationFiled: April 8, 2009Publication date: July 30, 2009Applicant: NIHON MICRO COATING CO., LTD.Inventors: Noriyuki Kumasaka, Yuji Horie, Mitsuru Saito, Kazuei Yamaguchi
-
Patent number: 7374473Abstract: Texturing slurry for texturing a substrate for a magnetic hard disk is obtained by dispersing abrading particles of a specified kind in a specified kind of dispersant. The abrading particles include diamond clusters formed with artificial diamond particles with primary particle diameter of 20 nm or less and surrounded by impurities containing chlorine at a certain ratio. The cluster diameter and the average cluster diameter of the diamond clusters are each within a specified range. For texturing a substrate surface, the substrate is rotated, texturing slurry of this invention is supplied to the surface and a texturing tape of a specified kind is pressed against the substrate surface while it is caused to run.Type: GrantFiled: November 27, 2006Date of Patent: May 20, 2008Assignee: NIHON Micro Coating Co., Ltd.Inventors: Noriyuki Kumasaka, Yuji Horie, Mitsuru Saito, Kazuei Yamaguchi
-
Publication number: 20080076327Abstract: Polishing slurry is caused to be present between a surface of a soft magnetic layer and a polishing tool such as a polishing pad and the surface of the soft magnetic layer and the polishing tool are moved relative to each other. The polishing slurry contains silica particles as abrading particles, compounds containing carboxylic acid and amino polycarboxylic acid and an oxidizing agent as a polishing accelerator, organic and/or inorganic compound of phosphoric acid, nitride and/or nitrite as an anti-corrosion agent and a pH conditioner such that the slurry has pH value between 4 and 11.Type: ApplicationFiled: August 17, 2007Publication date: March 27, 2008Inventors: Kazuei Yamaguchi, Yasuyuki Yokota, Sanaki Horimoto
-
Publication number: 20070231245Abstract: Diamond clusters are used as a polishing material of free abrading particles, each being a combination of artificial diamond particles having primary particle diameters of 20 nm or less and impurities that are attached around these diamond particles. The density of non-diamond carbon contained in the impurities is in the range of 95% or more and 99% or less, and the density of chlorine contained in other than non-diamond carbon in the impurities is 0.5% or more and preferably 3.5% or less. The diameters of these diamond clusters are in the range of 30 nm or more and 500 nm or less, and their average diameter is in the range of 30 nm or more and 200 nm or less. Such polishing material is produced first by an explosion shock method to obtain diamond clusters and then removing the impurities such that density of non-diamond carbon contained in the impurities and density of chlorine contained in other than non-diamond carbon in the impurities become adjusted.Type: ApplicationFiled: May 23, 2007Publication date: October 4, 2007Inventors: Noriyuki Kumasaka, Yuji Horie, Mitsuru Saito, Kazuei Yamaguchi
-
Patent number: 7267601Abstract: A polishing cloth to be produced has a surface layer stacked over a base material. The surface layer is made of a foamed layer and a non-foamed layer, the foamed layer including air bubble cells and the non-foamed layer having an externally exposed surface where linear cuts are formed. These linear cuts reach the air bubble cells such that the air bubble cells communicate with the exterior through the linear cuts. These linear cuts are controlled to be 10 ?m or less in length. Such a polishing cloth is produced by applying a foamable coating material such as a foamable resin over a surface of the base material, foaming the foamable coating material to form the surface layer, and forming the linear cuts through the non-foamed layer.Type: GrantFiled: August 8, 2006Date of Patent: September 11, 2007Assignee: NIHON Micro Coating Co., Ltd.Inventors: Yuji Horie, Hiromitsu Okuyama, Kazuei Yamaguchi
-
Publication number: 20070123153Abstract: Texturing slurry for texturing a substrate for a magnetic hard disk is obtained by dispersing abrading particles of a specified kind in a specified kind of dispersant. The abrading particles include diamond clusters formed with artificial diamond particles with primary particle diameter of 20 nm or less and surrounded by impurities containing chlorine at a certain ratio. The cluster diameter and the average cluster diameter of the diamond clusters are each within a specified range. For texturing a substrate surface, the substrate is rotated, texturing slurry of this invention is supplied to the surface and a texturing tape of a specified kind is pressed against the substrate surface while it is caused to run.Type: ApplicationFiled: November 27, 2006Publication date: May 31, 2007Inventors: Noriyuki Kumasaka, Yuji Horie, Mitsuru Saito, Kazuei Yamaguchi
-
Publication number: 20060270328Abstract: A polishing cloth to be produced has a surface layer stacked over a base material. The surface layer is made of a foamed layer and a non-foamed layer, the foamed layer including air bubble cells and the non-foamed layer having an externally exposed surface where linear cuts are formed. These linear cuts reach the air bubble cells such that the air bubble cells communicate with the exterior through the linear cuts. These linear cuts are controlled to be 10 ?m or less in length. Such a polishing cloth is produced by applying a foamable coating material such as a foamable resin over a surface of the base material, foaming the foamable coating material to form the surface layer, and forming the linear cuts through the non-foamed layer.Type: ApplicationFiled: August 8, 2006Publication date: November 30, 2006Inventors: Yuji Horie, Hiromitsu Okuyama, Kazuei Yamaguchi
-
Patent number: 7134952Abstract: A polishing cloth has a surface layer stacked over a base material. The surface layer is made of a foamed layer and a non-foamed layer, the foamed layer including air bubble cells and the non-foamed layer having an externally exposed surface where linear cuts are formed. These linear cuts reach the air bubble cells such that the air bubble cells communicate with the exterior through the linear cuts. These linear cuts are controlled to be 10 ?m or less in length.Type: GrantFiled: September 19, 2003Date of Patent: November 14, 2006Assignee: NIHON Microcoating Co., Ltd.Inventors: Yuji Horie, Hiromitsu Okuyama, Kazuei Yamaguchi
-
Publication number: 20040121714Abstract: A polishing cloth has a surface layer stacked over a base material. The surface layer is made of a foamed layer and a non-foamed layer, the foamed layer including air bubble cells and the non-foamed layer having an externally exposed surface where linear cuts are formed. These linear cuts reach the air bubble cells such that the air bubble cells communicate with the exterior through the linear cuts. These linear cuts are controlled to be 10 &mgr;m or less in length. Such a polishing cloth is produced by applying a foamable coating material such as a foamable resin over a surface of the base material, foaming the foamable coating material to form the surface layer, and forming the linear cuts through the non-foamed layer.Type: ApplicationFiled: September 19, 2003Publication date: June 24, 2004Applicant: Nihon Microcoating Co., Ltd.Inventors: Yuji Horie, Hiromitsu Okuyama, Kazuei Yamaguchi
-
Publication number: 20040038024Abstract: An adhesive tape of the double-side type for attaching a polishing pad to a polisher and for backing a polishing pad and a polishing tape has a base sheet with both its front and back surfaces coated with an adhesive agent and a peeling sheet of a resin material is adhesively attached onto at least one of the surfaces of the base sheet. The peeling sheet may be made of polyethylene terephthalate or polypropylene and is treated such that it can be peeled easily.Type: ApplicationFiled: August 21, 2003Publication date: February 26, 2004Applicant: NIHON MICROCOATING CO, LTD.Inventors: Kazuei Yamaguchi, Hiromitsu Okuyama