Abstract: A wire material for medical use made of stainless steel has a resilience rate of 96% or more after bending the wire material so that the ends of the wire material approach each other to strain the wire by a strain amount of 2%. Strain amount (%)=(R/(L?R))×100. R is a wire diameter of the wire material, and L is a distance between the ends when the wire material is bent so that the ends approach each other. The resilience rate (%)=(1??/180)×100. ? is an angle of intersection between two tangent lines extending from the ends of the wire material after bending.

Abstract: A resist composition containing a silicon-containing resin, an acid generator component which generates an acid upon exposure, and a photodecomposable base which controls diffusion of the acid generated from the acid generator component upon exposure, in which the silicon content proportion in the silicon-containing resin is in a range of 20% to 25% with respect to a total amount of all atoms constituting the silicon-containing resin.

Abstract: Provided is an aluminum alloy clad sheet that resolves the contradiction between a high strength level and ductility in a single sheet of the existing 7000-series aluminum alloy or the like, and has high strength, good formability (high ductility), and a good BH property through short-time artificial age hardening. An aluminum alloy clad sheet subjected to diffusion heat treatment includes a plurality of aluminum alloy layers being laminated. In the clad sheet, aluminum alloy layers having specific compositions are adjacently laminated such that the contents of Mg or Zn are different from each other, and a microstructure after the diffusion heat treatment has fine grain size and an interdiffusion region of Mg and Zn. In addition, the clad sheet has a specific DSC characteristic. Consequently, high strength and good formability (high ductility) are exhibited, and a BH property through short-time artificial age hardening is improved.

Abstract: An aluminum-alloy-clad plate which includes a plurality of superposed aluminum alloy layers and which has undergone a diffusion heat treatment. Aluminum alloy layers having specific compositions are superposed so that any adjoining two of these differ in the content of Mg or Zn, and are subjected to a diffusion heat treatment to give a structure which has fine crystal grain diameters and Mg/Zn mutual diffusion regions and which has specific DSC properties. Thus, both higher strength and high formability are imparted.

Abstract: A method of forming a resist pattern including forming a resist film on a support using a resist composition; subjecting the resist film to exposure; and forming a resist pattern by developing the resist film having undergone the exposure, in which the developing is performed using a developer which contains a basic compound represented by the following formula (1) and tetrabutylammonium hydroxide, and in which the concentration of tetrabutylammonium hydroxide is equal to or greater than 2.5% by mass and less than 2.8% by mass: in which R1 to R4 each independently represent a linear or branched alkyl group, and the total number of carbon atoms contained in each of the alkyl groups represented by R1 to R4 is 4 to 15.

Abstract: A 7xxx-series aluminum alloy sheet produced by a common procedure is allowed to include a surface part having a texture with grown Cube orientation, and a central part having a texture with grown S orientation. Namely, the surface part and the thickness-central part in the sheet are allowed to have different textures that are optimal respectively for shock absorption and for strength. This allows the aluminum alloy sheet to have better shock absorption upon automobile collision without lowering its strength, where the shock absorption is evaluated by a VDA bend test as illustrated in FIG. 1.

Abstract: An aluminum-alloy-clad plate which includes a plurality of superposed aluminum alloy layers and which has undergone a diffusion heat treatment. Aluminum alloy layers having specific compositions are superposed so that any adjoining two of these differ in the content of Mg or Zn, and are subjected to a diffusion heat treatment to give a structure which has fine crystal grain diameters and Mg/Zn mutual diffusion regions and which has specific DSC properties. Thus, both higher strength and high formability are imparted.

Abstract: An aluminum-alloy-clad plate in which a plurality of aluminum alloy layers are layered and diffusion heat treatment is performed thereon, wherein aluminum alloy layers having a specific composition are layered so as to each have a different content Mg or Zn, the structure of the aluminum alloy clad plate after diffusion heat treatment thereof has a minute crystal grain diameter and a predetermined amount of a specific Mg and Zn inter-diffusion region in which Mg and Zn of layered aluminum alloy layers are diffused with each other, and increased strength and high moldability are obtained at the same time.

Abstract: Disclosed are a structural part obtained from a 6000 series aluminum alloy sheet as a shaping raw material and having an improved crash performance; and a method for producing the sheet. For the sheet, a 6000 series aluminum alloy sheet is used which has a specified composition and is produced in the usual way. Even when this sheet is used, strain is given at a high level thereto by a cold work, thereby heightening the average dislocation density of a surface of the resultant structural part, which has been artificially aged. This density is measured by X-ray diffraction. Thus, the structural part is improved in strength and in crash performance, which is estimated in a VDA bending test, when the automobile collides.

Abstract: Provided is an aluminum alloy clad sheet that resolves the contradiction between a high strength level and ductility in a single sheet of the existing 7000-series aluminum alloy or the like, and has high strength, good formability (high ductility), and a good BH property through short-time artificial age hardening. An aluminum alloy clad sheet subjected to diffusion heat treatment includes a plurality of aluminum alloy layers being laminated. In the clad sheet, aluminum alloy layers having specific compositions are adjacently laminated such that the contents of Mg or Zn are different from each other, and a microstructure after the diffusion heat treatment has fine grain size and an interdiffusion region of Mg and Zn. In addition, the clad sheet has a specific DSC characteristic. Consequently, high strength and good formability (high ductility) are exhibited, and a BH property through short-time artificial age hardening is improved.

Abstract: Provided are an aluminum alloy clad plate for structural members, and an aluminum alloy clad structural member which have both of a high strength and formability (ductility) and further such a BH response that the plate and the member can gain a required high strength even through a high-temperature and short-period artificial aging. The clad plate is an aluminum alloy clad plate having laminated aluminum alloy layers as illustrated in FIGS. 4 and 5. The clad plate also has mutual diffusion regions in which Mg and Zn are mutually diffused between the laminated aluminum alloy layers as a phase after subjected to diffusion heat treatment, and has an inertial radius Rg and a scattering intensity I0 as shown in FIGS. 1 and 2. The factors Rg and I0 are measured by a small angle X-ray scattering technique.

Abstract: A method of forming a resist pattern including forming a resist film on a support using a resist composition; subjecting the resist film to exposure; and forming a resist pattern by developing the resist film having undergone the exposure, in which the developing is performed using a developer which contains a basic compound represented by the following formula (1) and tetrabutylammonium hydroxide, and in which the concentration of tetrabutylammonium hydroxide is equal to or greater than 2.5% by mass and less than 2.8% by mass: in which R1 to R4 each independently represent a linear or branched alkyl group, and the total number of carbon atoms contained in each of the alkyl groups represented by R1 to R4 is 4 to 15.

Abstract: A method of forming a resist pattern of high aspect ratio excelling in etching resistance by the use of nanoimprint lithography. The method of forming a resist pattern by nanoimprint lithography comprises the steps of disposing organic layer (4) on support (1); providing resist layer (2) on the organic layer (4) with the use of chemical amplification type negative resist composition containing silsesquioxane resin (A); pressing light transmission allowing mold (3) with partial light shielding portion (5) against the resist layer (2) and thereafter carrying out exposure from the upside of the mold (3); and detaching the mold (3).

Abstract: A photosensitive resin composition which has a quenching function and satisfactory long-term stability and which, in particular, can be prevented from suffering sensitivity abnormality caused by change with time during storage (change from given sensitivity); and a method of forming a pattern from the composition. The resist composition contains a base resin comprising, as the main component, a silicon-containing polymer which is a siloxane or silsesquioxane polymer or the like, the composition containing, as a quencher, a specific sulfonium compound in place of a nitrogenous compound.

Abstract: A positive resist composition including a resin component (A) containing an acid dissociable dissolution inhibiting group whose alkali solubility increases under action of acid and an acid generator component (B) that generates acid on exposure, wherein the resin component (A) is a copolymer comprising a first structural unit (a1) derived from a hydroxystyrene and a second structural unit (a2) derived from a (meth)acrylate ester containing an alcoholic hydroxyl group, in which 10 mol % or more and 25 mol % or less of a combined total of hydroxyl groups within the structural units (a1) and alcoholic hydroxyl groups within the structural units (a2) are protected with the acid dissociable dissolution inhibiting groups, and a weight average molecular weight of the copolymer prior to protection with the acid dissociable dissolution inhibiting groups is 2,000 or more and 8,500 or less.

Abstract: A method for forming a photoresist pattern involves the steps of: depositing a photoresist film on a substrate, the photoresist film containing an acid-generating agent capable of generating an acid upon exposure to light; overlaying an antireflective film over the photoresist film, the antireflective film containing a fluorine-based acidic compound; selectively exposing the photoresist; and developing the photoresist. The novel method is characterized in that the acid-generating agent and the fluorine-based acidic compound are selected so that the acid that the acid-generating agent generates in the photoresist film upon exposure to light has a higher acidity than the fluorine-based acidic compound in the antireflective film.

Abstract: A photosensitive resin composition which has a quenching function and satisfactory long-term stability and which, in particular, can be prevented from suffering sensitivity abnormality caused by change with time during storage (change from given sensitivity); and a method of forming a pattern from the composition. The resist composition contains a base resin comprising, as the main component, a silicon-containing polymer which is a siloxane or silsesquioxane polymer or the like, the composition containing, as a quencher, a specific sulfonium compound in place of a nitrogenous compound.

Abstract: A method of forming a resist pattern of high aspect ratio excelling in etching resistance by the use of nanoimprint lithography. The method of forming a resist pattern by nanoimprint lithography comprises the steps of disposing organic layer (4) on support (1); providing resist layer (2) on the organic layer (4) with the use of chemical amplification type negative resist composition containing silsesquioxane resin (A); pressing light transmission allowing mold (3) with partial light shielding portion (5) against the resist layer (2) and thereafter carrying out exposure from the upside of the mold (3); and detaching the mold (3).

Abstract: A method for forming a photoresist pattern involves the steps of: depositing a photoresist film on a substrate, the photoresist film containing an acid-generating agent capable of generating an acid upon exposure to light; overlaying an antireflective film over the photoresist film, the antireflective film containing a fluorine-based acidic compound; selectively exposing the photoresist; and developing the photoresist. The novel method is characterized in that the acid-generating agent and the fluorine-based acidic compound are selected so that the acid that the acid-generating agent generates in the photoresist film upon exposure to light has a higher acidity than the fluorine-based acidic compound in the antireflective film.

Abstract: A composition for forming an antireflection coating, characterized in that it comprises an organic solvent and, dissolved therein, (A) a ladder silicone copolymer containing (a1) 10 to 90 mole % of a (hydroxyphenylalkyl)silsesquioxane unit, (a2) 0 to 50 mole % of a (alkoxyphenylalkyl)silsesquioxane unit and (a3) 10 to 90 mole % of an alkyl or phenylsilsesquioxane unit, (B) an acid generator generating an acid upon exposure to heat or light, and (C) a crosslinking agent, and is capable of forming an antireflection coating exhibiting an optional parameter (k value) for an ArF laser of the range of 0.002 to 0.95. The composition is soluble in an organic solvent, can be applied by a conventional spin coating method with ease, has good storage stability, and can exhibit an adjusted preventive capability for reflection through the introduction of a chromophoric group absorbing a radiation ray thereto.