Abstract: When a public line is used for a remote copy function of storage in a disaster recovery (DR) system, the online performance is degraded due to the increase and decrease of the line utilization rate. Therefore, it is desired to change the remote copy function depending on the line utilization rate. Also, there is the possibility of data loss if disaster occurs during the copy between storage devices. Therefore, it is desired to perform the processing to detect the data status immediately before the occurrence of the disaster. By switching the synchronous transmission and the asynchronous transmission in accordance with the increase and decrease of the response time of the remote copy function between storage devices, the online performance of the primary site can be maintained without being influenced by the line utilization rate, and the data loss can be detected based on the used remote copy function.

Abstract: A detector system, filter therefor, and method of making same is disclosed. The filter includes an interference element having a reflection band disposed primarily in the near infrared, and having a high transmission over most of the visible region. The filter also includes an absorptive element that absorbs light non-uniformly over the visible region. The filter when combined with a semiconductor photodiode or other suitable detector yields a detector system whose spectral responsivity closely matches the visual response of the human eye.

Abstract: A detector system, filter therefor, and method of making same is disclosed. The filter includes an interference element having a reflection band disposed primarily in the near infrared, and having a high transmission over most of the visible region. The filter also includes an absorptive element that absorbs light non-uniformly over the visible region. The filter when combined with a semiconductor photodiode or other suitable detector yields a detector system whose spectral responsivity closely matches the visual response of the human eye.

Abstract: An optical display, and method for forming an optical display, having improved antireflection properties and durability is formed by applying a transferable antireflection material to an optical substrate through the use of an in-mold or heat press technique or alternatively by an ultraviolet exposure technique. The transferable antireflection material is formed prior to application to the substrate and has at least a low refractive index layer and a high refractive index layer coupled to a release film. The low index reflection layer is preferably a silicon-modified fluoropolymer material having good durability, low refractivity, and appropriate adhesion to the release layer and subsequently applied high index refraction layer. The optical display is then coupled to a housing of an article for use.

Abstract: A silicone-modified fluoropolymer is formed by first dissolving a fluoropolymer in an organic solvent, the fluoropolymer having at least one monomer of vinylidene fluoride coupled to a hexafluoropropylene monomer unit, and subsequently reacting the mixture with an amino silane coupling agent to form an aminosilane-modified fluoropolymer. The aminosilane fluoropolymer is subsequently heated and partially condensed with an oligomer of a silane compound including alkoxy silane. The resultant composition is suitable for use as a low refractive index layer in an antireflection coating on an optical substrate.

Abstract: An optical display, and method for forming an optical display, having improved antireflection properties and durability is formed by applying a transferable antireflection material to an optical substrate through the use of an in-mold or heat press technique or alternatively by an ultraviolet exposure technique. The transferable antireflection material is formed prior to application to the substrate and has at least a low refractive index layer and a high refractive index layer coupled to a release film. The low index reflection layer is preferably a silicone-modified fluoropolymer material having good durability, low refractivity, and appropriate adhesion to the release layer and subsequently applied high index refraction layer. The optical display is then coupled to a housing of an article for use.

Abstract: Provided are a preparation process of a copolymer for semiconductor lithography, suited for a film forming composition used for the formation of minute patterns necessary for semiconductor fabrication, which comprises carrying out radical polymerization of at least two monomers having an ethylenic double bond in the presence of a polymerization initiator in a polymerization solvent, while causing to exist, in the solution containing the monomers, a polymerization inhibitive component; and a copolymer for semiconductor lithography prepared by the above-described process, and contains no high polymer, has excellent storage stability and generates remarkably less defects in resist pattern when used for semiconductor lithography.

Abstract: A method for prevention of increase in particles in copolymer for semiconductor resist, which comprises passing, through a filter containing a resin having an amino group and/or an amide bond, a copolymer solution for semiconductor resist which contains a copolymer for semiconductor resist having a polar group-containing recurring unit and an alicyclic structure-containing recurring unit and which contains no ionic additive. With the method, there can be obtained a copolymer for semiconductor resist, which can be suitably used in a resist film used for formation of a fine pattern in semiconductor production and which is very low in formation of particles during storage and accordingly generates substantially no defect after development.

Abstract: Solving problems in the prior art, provided are a resist polymer which is small in lot-to-lot, reactor-to-reactor and scale-to-scale variations, and contains no high polymer, is excellent in solubility and storage stability, and is suitable for fine pattern formation, and a method for production thereof. The present invention provides the resist polymer at least having a repeating unit having a structure which is decomposed by an acid to become soluble in an alkali developer and a repeating unit having a polar group to enhance adhesion to a substrate, characterized in that a peak area of a high molecular weight component (high polymer) with molecular weight of 100,000 or more is 0.1% or less based on an entire peak area in a molecular weight distribution determined by gel permeation chromatography (GPC).

Abstract: A detector system, filter therefor, and method of making same is disclosed. The filter includes an interference element having a reflection band disposed primarily in the near infrared, and having a high transmission over most of the visible region. The filter also includes an absorptive element that absorbs light non-uniformly over the visible region. The filter when combined with a semiconductor photodiode or other suitable detector yields a detector system whose spectral responsivity closely matches the visual response of the human eye.

Abstract: Provided are a preparation process of a copolymer for semiconductor lithography, suited for a film forming composition used for the formation of minute patterns necessary for semiconductor fabrication, which comprises carrying out radical polymerization of at least two monomers having an ethylenic double bond in the presence of a polymerization initiator in a polymerization solvent, while causing to exist, in the solution containing the monomers, a polymerization inhibitive component; and a copolymer for semiconductor lithography prepared by the above-described process, and contains no high polymer, has excellent storage stability and generates remarkably less defects in resist pattern when used for semiconductor lithography.

Abstract: A visible wavelength detector and method of making the same is disclosed. A visible wavelength detector includes a semiconductor structure that converts electromagnetic energy into an electrical signal and an interference element that includes polymeric material and substantially reflects normally incident light over a band of near-infrared wavelengths and that substantially transmits normally incident light over visible wavelengths, disposed on the semiconductor structure.

Abstract: A JOB distribution control method for a plurality of Computer Service Centers connected via a network represented by the Grid is provided. When a JOB request occurs in a first Computer Service Center, a current average JOB request interval of the first Computer Service Center is calculated. The necessary number of servers for achieving a predetermined JOB response time is calculated from a predetermined standard JOB request interval, a predetermined standard JOB execution time of servers, and the calculated current average JOB request interval. Only when the number of the servers in the first Computer Service Center is over the calculated necessary number, the JOB request is transmitted to a remote second Computer Service Center.

Abstract: Solving problems in the prior art, provided are a resist polymer which is small in lot-to-lot, reactor-to-reactor and scale-to-scale variations, and contains no high polymer, is excellent in solubility and storage stability, and is suitable for fine pattern formation, and a method for production thereof. The present invention provides the resist polymer at least having a repeating unit having a structure which is decomposed by an acid to become soluble in an alkali developer and a repeating unit having a polar group to enhance adhesion to a substrate, characterized in that a peak area of a high molecular weight component (high polymer) with molecular weight of 100,000 or more is 0.1% or less based on an entire peak area in a molecular weight distribution determined by gel permeation chromatography (GPC).

Abstract: A detector system, filter therefor, and method of making same is disclosed. The filter includes an interference element having a reflection band disposed primarily in the near infrared, and having a high transmission over most of the visible region. The filter also includes an absorptive element that absorbs light non-uniformly over the visible region. The filter when combined with a semiconductor photodiode or other suitable detector yields a detector system whose spectral responsivity closely matches the visual response of the human eye.

Abstract: An olefinic copolymer having a cyclic structure is prepared by copolymerizing a) ethylene (M1) and b) dicyclopentadiene or tricyclopentadiene (M2), and, optionally c) a cyclic olefin (M3), in the presence of a catalyst which contains a metallocene compound (A) having formula [1]: H2C(R′mCp)(R″nCp)MX2[1], wherein M is zirconium or hafnium, Cp has a cyclopentadienyl skeleton, each of R′ and R″ is a hydrocarbon group having 1 to 10 carbon atoms, each of two X's which may be the same or different from each other, is a halogen, a hydrogen, a hydrocarbon group having 1 to 20 carbon atoms, a halogenated hydrocarbon group, an alkylamino group, an alkoxy group, an aryloxy group of the formula —O—Ar—Yp, a thioalkyl group, or a thioaryl group of the formula —S—Ar—Yp; wherein Ar is an aromatic ring, Y is a halogen, a hydrogen, a hydrocarbon group having 1 to 20 carbon atoms, a halogenated hydrocarbon group, an alkoxy group, an alkylamino

Abstract: A method for producing an olefin type copolymer having a cyclic structure, which comprises copolymerizing ethylene (M1) and dicyclopentadiene or tricyclopentadiene (M2), and, as optionally introduced, a cyclic olefin (M3), wherein, as a catalyst, a catalyst comprising a metallocene compound (A) of the following formula [1]:

Abstract: An improved electronic display that includes components selected to enhance display performance. The improved display includes an active substrate that has a plurality of thin film transistors and a plurality of thermally transferred color filters that include a colorant in a crosslinked binder. The active substrate can also include a black matrix. Other components in the improved display such as a liquid crystal material, spacers, and bottom polarizer, can be selected to enhance display performance characteristics such as brightness, power consumption, response time, weight, and thickness. The invention also provides a method of forming a color filter substrate for displays including the steps of thermally mass transferring a plurality of color filters and crosslinking the plurality of color filters after transfer. Before the crosslinking step, the plurality of color filters can be inspected and removed for reworking of the substrate.

Abstract: A plasticizer-containing layer can be used in a thermal transfer element to facilitate transfer to a receptor for the formation of a variety of articles. In one method, a receptor is brought into contact with a thermal transfer element that includes a transfer unit having at least one layer with a binder composition and a plasticizer. A portion of the transfer unit is thermally transferred to the receptor. This thermal transfer can be accomplished using, for example, a thermal print head or radiative (e.g., light or laser) thermal transfer. After transfer, the binder composition and the plasticizer (in the portion of the transfer unit that is transferred to the receptor) are reactively coupled.

Abstract: An improved electronic display that includes components selected to enhance display performance. The improved display includes an active substrate that has a plurality of thin film transistors and a plurality of thermally transferred color filters that include a colorant in a crosslinked binder. The active substrate can also include a black matrix. Other components in the improved display such as a liquid crystal material, spacers, and bottom polarizer, can be selected to enhance display performance characteristics such as brightness, power consumption, response time, weight, and thickness. The invention also provides a method of forming a color filter substrate for displays including the steps of thermally mass transferring a plurality of color filters and crosslinking the plurality of color filters after transfer. Before the crosslinking step, the plurality of color filters can be inspected and removed for reworking of the substrate.