Patents by Inventor Kazuhiro Ishizuka

Kazuhiro Ishizuka has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Method for manufacturing conductive element substrate, conductive element substrate, method for manufacturing liquid crystal display, liquid crystal display and electronic information equipment
    Patent number: 7550183
    Abstract: A method for manufacturing a liquid crystal display which employs an active matrix substrate including a plurality of pixels arranged in matrix on a substrate and reflecting electrodes formed in the pixels, respectively. The method comprises (a) a laminated conductive film formation step of sequentially forming a conductive metal film and an amorphous transparent conductive film on a substrate to form a laminated conductive film and (b) a reflecting electrode formation step of patterning the laminated conductive film into a reflecting electrode, wherein the step (b) includes a first etching step of etching the conductive metal film and the amorphous transparent conductive film simultaneously and a second etching step of etching the amorphous transparent conductive film only.
    Type: Grant
    Filed: February 18, 2005
    Date of Patent: June 23, 2009
    Assignee: Sharp Kabushiki Kaisha
    Inventors: Kazuhiro Ishizuka, Takashi Fujikawa, Takehiko Sakai
  • Method of making LCD with asperities in insulation layer under reflective electrode
    Patent number: 7106400
    Abstract: An object of the invention is to provide a method of manufacturing a liquid crystal display apparatus of high display quality by which a reflecting plate having excellent reflection characteristics can easily be manufactured with excellent reproducibility. A negative or positive photosensitive resin is applied to a substrate, asperities are formed in a first region of the applied photosensitive resin film by exposing the first region with various integrals of exposure amount so that the photosensitive resin in the first region is left in different film thicknesses and a concave is formed in a second region of the applied photosensitive resin film so that the photosensitive resin in the second region is left in a thickness smaller than those of the first region by exposing the second region with an integral of exposure amount different from those for the first region.
    Type: Grant
    Filed: September 27, 1999
    Date of Patent: September 12, 2006
    Assignee: Sharp Kabushiki Kaisha
    Inventors: Kazuhiko Tsuda, Kazuhiro Ishizuka, Hiroyuki Ohgami
  • Method for manufacturing conductive element substrate, conductive element substrate, method for manufacturing liquid crystal display, liquid crystal display and electronic information equipment
    Publication number: 20050186359
    Abstract: A method for manufacturing a liquid crystal display which employs an active matrix substrate including a plurality of pixels arranged in matrix on a substrate and reflecting electrodes formed in the pixels, respectively. The method comprises (a) a laminated conductive film formation step of sequentially forming a conductive metal film and an amorphous transparent conductive film on a substrate to form a laminated conductive film and (b) a reflecting electrode formation step of patterning the laminated conductive film into a reflecting electrode, wherein the step (b) includes a first etching step of etching the conductive metal film and the amorphous transparent conductive film simultaneously and a second etching step of etching the amorphous transparent conductive film only.
    Type: Application
    Filed: February 18, 2005
    Publication date: August 25, 2005
    Applicant: Sharp Kabushiki Kaisha
    Inventors: Kazuhiro Ishizuka, Takashi Fujikawa, Takehiko Sakai