Patents by Inventor Kazuhiro Jindai

Kazuhiro Jindai has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 8231204
    Abstract: The present invention provides liquid ejection head enables a reduction in the distance between a print medium and an ejection port formation face of the liquid ejection head on which an ejection port is formed, improving the landing accuracy of droplets ejected from the liquid ejection head. A print head according to the present invention includes an element substrate and a supporting member. A supporting portion is located in the space between the element substrate and the supporting member. Connection wiring is formed on the supporting portion. The connection wiring is provided which connects wiring inside of the supporting member provided in the supporting member to the heat generating element.
    Type: Grant
    Filed: May 7, 2008
    Date of Patent: July 31, 2012
    Assignee: Canon Kabushiki Kaisha
    Inventors: Kazuhiro Jindai, Yuji Tsuruoka, Takashi Mori, Nobuhito Yamaguchi, Masao Furukawa, Seiichi Kamiya
  • Patent number: 8003939
    Abstract: A foreign matter detecting apparatus includes a detecting device for detecting foreign matter by measuring smoothness of a surface of an object undergoing measurement, a marking device for providing a dent on the surface of the object with a predetermined horizontal distance from the foreign matter detected by the detecting device, and a mass spectrum measuring device for irradiating and scanning a small area with a primary ion beam, as a part of the object, including the foreign matter and the dent, so as to measure a mass spectrum of secondary ions emitted from the foreign matter located at a position within a predetermined horizontal distance from the dent.
    Type: Grant
    Filed: October 27, 2009
    Date of Patent: August 23, 2011
    Assignee: Canon Kabushiki Kaisha
    Inventors: Kazuhiro Jindai, Hideto Yokoi
  • Publication number: 20100038531
    Abstract: A foreign matter detecting apparatus includes a detecting device for detecting foreign matter by measuring smoothness of a surface of an object undergoing measurement, a marking device for providing a dent on the surface of the object with a predetermined horizontal distance from the foreign matter detected by the detecting device, and a mass spectrum measuring device for irradiating and scanning a small area with a primary ion beam, as a part of the object, including the foreign matter and the dent, so as to measure a mass spectrum of secondary ions emitted from the foreign matter located at a position within a predetermined horizontal distance from the dent.
    Type: Application
    Filed: October 27, 2009
    Publication date: February 18, 2010
    Applicant: CANON KABUSHIKI KAISHA
    Inventors: Kazuhiro Jindai, Hideto Yokoi
  • Patent number: 7635840
    Abstract: A surface analysis apparatus includes a unit configured to bombard a sample surface with at least two types of ions having different sizes; a measurement device for measuring, with a time-of-flight secondary ion mass spectrometer, a mass spectrum of ions emitted from the sample surface; and an information processor outputting a difference between two mass spectra measured by bombardment of different types of ions.
    Type: Grant
    Filed: June 26, 2007
    Date of Patent: December 22, 2009
    Assignee: Canon Kabushiki Kaisha
    Inventors: Kazuhiro Jindai, Hideto Yokoi
  • Patent number: 7629577
    Abstract: A foreign matter or abnormal unsmoothness inspection apparatus is constituted by a detecting member for detecting a foreign matter or abnormal unsmoothness by measuring smoothness of a surface of a substrate-like measuring object, a marking device for providing an dent on the surface of the measuring object with a predetermined horizontal distance from the foreign matter or abnormal unsmoothness, and a mass spectrum measuring device for measuring a mass spectrum of secondary ion emitted from a position with a predetermined distance from the dent by detecting the dent through impact and scanning of the surface of the measuring object with a primary ion beam.
    Type: Grant
    Filed: February 25, 2008
    Date of Patent: December 8, 2009
    Assignee: Canon Kabushiki Kaisha
    Inventors: Kazuhiro Jindai, Hideto Yokoi
  • Publication number: 20090009559
    Abstract: The present invention provides liquid ejection head enables a reduction in the distance between a print medium and an ejection port formation face of the liquid ejection head on which an ejection port is formed, improving the landing accuracy of droplets ejected from the liquid ejection head. A print head according to the present invention includes an element substrate and a supporting member. A supporting portion is located in the space between the element substrate and the supporting member. Connection wiring is formed on the supporting portion. The connection wiring is provided which connects wiring inside of the supporting member provided in the supporting member to the heat generating element.
    Type: Application
    Filed: May 7, 2008
    Publication date: January 8, 2009
    Applicant: CANON KABUSHIKI KAISHA
    Inventors: Kazuhiro Jindai, Yuji Tsuruoka, Takashi Mori, Nobuhito Yamaguchi, Masao Furukawa, Seiichi Kamiya
  • Publication number: 20080210854
    Abstract: A foreign matter or abnormal unsmoothness inspection apparatus is constituted by a detecting member for detecting a foreign matter or abnormal unsmoothness by measuring smoothness of a surface of a substrate-like measuring object, a marking device for providing an dent on the surface of the measuring object with a predetermined horizontal distance from the foreign matter or abnormal unsmoothness, and a mass spectrum measuring device for measuring a mass spectrum of secondary ion emitted from a position with a predetermined distance from the dent by detecting the dent through impact and scanning of the surface of the measuring object with a primary ion beam.
    Type: Application
    Filed: February 25, 2008
    Publication date: September 4, 2008
    Applicant: CANON KABUSHIKI KAISHA
    Inventors: Kazuhiro Jindai, Hideto Yokoi
  • Patent number: 7357690
    Abstract: An alignment unit and an alignment method for aligning needle-like structures. The alignment unit includes a substrate having a surface and grooves defined in the surface. The grooves are sized and arranged such that when the needle-like structures are received therein, the needle-like structures are aligned.
    Type: Grant
    Filed: November 17, 2004
    Date of Patent: April 15, 2008
    Assignee: Canon Kabushiki Kaisha
    Inventors: Yuji Tsuruoka, Kazuo Iwata, Kazuhiro Jindai, Hidehito Takayama, Eiichi Motai, Takashi Mori
  • Publication number: 20080001081
    Abstract: A surface analysis apparatus includes a unit configured to bombard a sample surface with at least two types of ions having different sizes; a measurement device for measuring, with a time-of-flight secondary ion mass spectrometer, a mass spectrum of ions emitted from the sample surface; and an information processor outputting a difference between two mass spectra measured by bombardment of different types of ions.
    Type: Application
    Filed: June 26, 2007
    Publication date: January 3, 2008
    Applicant: CANON KABUSHIKI KAISHA
    Inventors: Kazuhiro Jindai, Hideto Yokoi
  • Patent number: 7189427
    Abstract: This invention provides an electron source manufacturing apparatus which can be easily downsized and operated. The electron source manufacturing apparatus includes a support member for supporting a substrate (10) having a conductor (11), a vessel (12) which has a gas inlet port (15) and a gas exhaust port (16) and covers a partial region of the surface of the substrate (10); a gas inlet unit (24) connected to the gas inlet port (15) to introduce gas into the vessel, an exhaust unit (26) connected to the gas exhaust port to evacuate the interior of the vessel, and a voltage application unit (32) for applying a voltage to the conductor.
    Type: Grant
    Filed: February 10, 2004
    Date of Patent: March 13, 2007
    Assignee: Canon Kabushiki Kaisha
    Inventors: Toshihiko Takeda, Masaru Kamio, Masataka Yamashita, Yasue Sato, Hitoshi Oda, Keisuke Yamamoto, Miki Tamura, Hideshi Kawasaki, Kazuhiro Jindai
  • Publication number: 20050189859
    Abstract: An alignment unit and an alignment method for aligning needle-like structures. The alignment unit includes a substrate having a surface and grooves defined in the surface. The grooves are sized and arranged such that when the needle-like structures are received therein, the needle-like structures are aligned.
    Type: Application
    Filed: November 17, 2004
    Publication date: September 1, 2005
    Applicant: Canon Kabushiki Kaisha
    Inventors: Yuji Tsuruoka, Kazuo Iwata, Kazuhiro Jindai, Hidehito Takayama, Eiichi Motai, Takashi Mori
  • Patent number: 6851995
    Abstract: It relates to a method of manufacturing an electron source. In an activation process, a set value of an activation gas partial pressure is switched at multi-stages and an application of a compensation voltage is not conducted for a predetermined period after switching of the set value. Alternatively, the activation is repeated plural times while a row wiring or a column wiring is switched, and the application of the compensation voltage is not conducted for the predetermined period after switching of the row wiring or the column wiring. Thus, activation processing can be uniformly performed for all electron emitting devices.
    Type: Grant
    Filed: September 26, 2002
    Date of Patent: February 8, 2005
    Assignee: Canon Kabushiki Kaisha
    Inventors: Tsuyoshi Takegami, Hisaaki Kawade, Takahiro Oguchi, Kazuhiro Jindai
  • Patent number: 6824437
    Abstract: A method of manufacturing an electron-emitting device has a step of forming a pair of conductors on a substrate, the conductors being spaced from each other, and an activation process of depositing carbon or carbon compound on at least one side of the pair of conductors in an atmosphere of carbon compound gas. The activation process includes a plurality of processes of two or more stages including a first process and a second process. The first process is executed in an atmosphere of the carbon compound gas having a partial pressure higher than a partial pressure of the gas in the second process, with the second process being the last activation process.
    Type: Grant
    Filed: December 17, 2002
    Date of Patent: November 30, 2004
    Assignee: Canon Kabushiki Kaisha
    Inventors: Kazuhiro Jindai, Toshikazu Ohnishi
  • Patent number: 6780073
    Abstract: A method of manufacturing an electron-emitting device includes a process for forming a pair of electric conductors spaced from each other on a substrate, and an activation process for forming a film of carbon or a carbon compound on at least one of the pair of electric conductors. The activation process is sequentially performed within plural containers having different atmospheres.
    Type: Grant
    Filed: April 2, 2002
    Date of Patent: August 24, 2004
    Assignee: Canon Kabushiki Kaisha
    Inventors: Miki Tamura, Toshikazu Ohnishi, Kazuhiro Jindai
  • Publication number: 20040154545
    Abstract: This invention provides an electron source manufacturing apparatus which can be easily downsized and operated. The electron source manufacturing apparatus includes a support member for supporting a substrate (10) having a conductor (11), a vessel (12) which has a gas inlet port (15) and a gas exhaust port (16) and covers a partial region of the surface of the substrate (10); a gas inlet unit (24) connected to the gas inlet port (15) to introduce gas into the vessel, an exhaust unit (26) connected to the gas exhaust port to evacuate the interior of the vessel, and a voltage application unit (32) for applying a voltage to the conductor.
    Type: Application
    Filed: February 10, 2004
    Publication date: August 12, 2004
    Applicant: CANON KABUSHIKI KAISHA
    Inventors: Toshihiko Takeda, Masaru Kamio, Masataka Yamashita, Yasue Sato, Hitoshi Oda, Keisuke Yamamoto, Miki Tamura, Hideshi Kawasaki, Kazuhiro Jindai
  • Patent number: 6755709
    Abstract: In a method of fabricating an electron-emitting device, an activation step is performed in shorter time. The method forms a deposit of carbon or carbon compound on a precursory structure which becomes an electron-emitting region in an electron-emitting device made on a substrate and comprises a first step for depositing carbon or carbon compound in a gas atmosphere which includes a carbon compound of a first molecular weight, and subsequently a second step for depositing carbon or carbon compound in a gas atmosphere which includes a carbon compound of a second molecular weight smaller than the first molecular weight.
    Type: Grant
    Filed: May 23, 2002
    Date of Patent: June 29, 2004
    Assignee: Canon Kabushiki Kaisha
    Inventors: Kazuhiro Jindai, Mineto Yagyu
  • Patent number: 6726520
    Abstract: This invention provides an electron source manufacturing apparatus which can be easily downsized and operated. The electron source manufacturing apparatus includes a support member for supporting a substrate (10) having a conductor (11), a vessel (12) which has a gas inlet port (15) and a gas exhaust port (16) and covers a partial region of the surface of the substrate (10); a gas inlet unit (24) connected to the gas inlet port (15) to introduce gas into the vessel, an exhaust unit (26) connected to the gas exhaust port to evacuate the interior of the vessel, and a voltage application unit (32) for applying a voltage to the conductor.
    Type: Grant
    Filed: February 21, 2001
    Date of Patent: April 27, 2004
    Assignee: Canon Kabushiki Kaisha
    Inventors: Toshihiko Takeda, Masaru Kamio, Masataka Yamashita, Yasue Sato, Hitoshi Oda, Keisuke Yamamoto, Miki Tamura, Hideshi Kawasaki, Kazuhiro Jindai
  • Patent number: 6582268
    Abstract: A method of manufacturing an electron-emitting device has a step of forming a pair of conductors on a substrate, the conductors being spaced from each other, and an activation process of depositing carbon or carbon compound on at least one side of the pair of conductors in an atmosphere of carbon compound gas. The activation process includes a plurality of processes of two or more stages including a first process and a second process. The first process is executed in an atmosphere of the carbon compound gas having a partial pressure higher than a partial pressure of the gas in the second process, with the second process being the last activation process.
    Type: Grant
    Filed: February 24, 2000
    Date of Patent: June 24, 2003
    Assignee: Canon Kabushiki Kaisha
    Inventors: Kazuhiro Jindai, Toshikazu Ohnishi
  • Publication number: 20030104751
    Abstract: A method of manufacturing an electron-emitting device has a step of forming a pair of conductors on a substrate, the conductors being spaced from each other, and an activation process of depositing carbon or carbon compound on at least one side of the pair of conductors in an atmosphere of carbon compound gas The activation process includes a plurality of processes of two or more stages including a first process and a second process. The first process is executed in an atmosphere of the carbon compound gas having a partial pressure higher than a partial process of the second process used as a last activation process.
    Type: Application
    Filed: December 17, 2002
    Publication date: June 5, 2003
    Applicant: CANON KABUSHIKI KAISHA
    Inventors: Kazuhiro Jindai, Toshikazu Ohnishi
  • Publication number: 20030064653
    Abstract: It relates to a method of manufacturing an electron source. In an activation process, a set value of an activation gas partial pressure is switched at multi-stages and an application of a compensation voltage is not conducted for a predetermined period after switching of the set value. Alternatively, the activation is repeated plural times while a row wiring or a column wiring is switched, and the application of the compensation voltage is not conducted for the predetermined period after switching of the row wiring or the column wiring. Thus, activation processing can be uniformly performed for all electron emitting devices.
    Type: Application
    Filed: September 26, 2002
    Publication date: April 3, 2003
    Inventors: Tsuyoshi Takegami, Hisaaki Kawade, Takahiro Oguchi, Kazuhiro Jindai