Patents by Inventor Kazuhiro Jindai
Kazuhiro Jindai has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 8231204Abstract: The present invention provides liquid ejection head enables a reduction in the distance between a print medium and an ejection port formation face of the liquid ejection head on which an ejection port is formed, improving the landing accuracy of droplets ejected from the liquid ejection head. A print head according to the present invention includes an element substrate and a supporting member. A supporting portion is located in the space between the element substrate and the supporting member. Connection wiring is formed on the supporting portion. The connection wiring is provided which connects wiring inside of the supporting member provided in the supporting member to the heat generating element.Type: GrantFiled: May 7, 2008Date of Patent: July 31, 2012Assignee: Canon Kabushiki KaishaInventors: Kazuhiro Jindai, Yuji Tsuruoka, Takashi Mori, Nobuhito Yamaguchi, Masao Furukawa, Seiichi Kamiya
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Patent number: 8003939Abstract: A foreign matter detecting apparatus includes a detecting device for detecting foreign matter by measuring smoothness of a surface of an object undergoing measurement, a marking device for providing a dent on the surface of the object with a predetermined horizontal distance from the foreign matter detected by the detecting device, and a mass spectrum measuring device for irradiating and scanning a small area with a primary ion beam, as a part of the object, including the foreign matter and the dent, so as to measure a mass spectrum of secondary ions emitted from the foreign matter located at a position within a predetermined horizontal distance from the dent.Type: GrantFiled: October 27, 2009Date of Patent: August 23, 2011Assignee: Canon Kabushiki KaishaInventors: Kazuhiro Jindai, Hideto Yokoi
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Publication number: 20100038531Abstract: A foreign matter detecting apparatus includes a detecting device for detecting foreign matter by measuring smoothness of a surface of an object undergoing measurement, a marking device for providing a dent on the surface of the object with a predetermined horizontal distance from the foreign matter detected by the detecting device, and a mass spectrum measuring device for irradiating and scanning a small area with a primary ion beam, as a part of the object, including the foreign matter and the dent, so as to measure a mass spectrum of secondary ions emitted from the foreign matter located at a position within a predetermined horizontal distance from the dent.Type: ApplicationFiled: October 27, 2009Publication date: February 18, 2010Applicant: CANON KABUSHIKI KAISHAInventors: Kazuhiro Jindai, Hideto Yokoi
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Patent number: 7635840Abstract: A surface analysis apparatus includes a unit configured to bombard a sample surface with at least two types of ions having different sizes; a measurement device for measuring, with a time-of-flight secondary ion mass spectrometer, a mass spectrum of ions emitted from the sample surface; and an information processor outputting a difference between two mass spectra measured by bombardment of different types of ions.Type: GrantFiled: June 26, 2007Date of Patent: December 22, 2009Assignee: Canon Kabushiki KaishaInventors: Kazuhiro Jindai, Hideto Yokoi
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Patent number: 7629577Abstract: A foreign matter or abnormal unsmoothness inspection apparatus is constituted by a detecting member for detecting a foreign matter or abnormal unsmoothness by measuring smoothness of a surface of a substrate-like measuring object, a marking device for providing an dent on the surface of the measuring object with a predetermined horizontal distance from the foreign matter or abnormal unsmoothness, and a mass spectrum measuring device for measuring a mass spectrum of secondary ion emitted from a position with a predetermined distance from the dent by detecting the dent through impact and scanning of the surface of the measuring object with a primary ion beam.Type: GrantFiled: February 25, 2008Date of Patent: December 8, 2009Assignee: Canon Kabushiki KaishaInventors: Kazuhiro Jindai, Hideto Yokoi
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Publication number: 20090009559Abstract: The present invention provides liquid ejection head enables a reduction in the distance between a print medium and an ejection port formation face of the liquid ejection head on which an ejection port is formed, improving the landing accuracy of droplets ejected from the liquid ejection head. A print head according to the present invention includes an element substrate and a supporting member. A supporting portion is located in the space between the element substrate and the supporting member. Connection wiring is formed on the supporting portion. The connection wiring is provided which connects wiring inside of the supporting member provided in the supporting member to the heat generating element.Type: ApplicationFiled: May 7, 2008Publication date: January 8, 2009Applicant: CANON KABUSHIKI KAISHAInventors: Kazuhiro Jindai, Yuji Tsuruoka, Takashi Mori, Nobuhito Yamaguchi, Masao Furukawa, Seiichi Kamiya
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Publication number: 20080210854Abstract: A foreign matter or abnormal unsmoothness inspection apparatus is constituted by a detecting member for detecting a foreign matter or abnormal unsmoothness by measuring smoothness of a surface of a substrate-like measuring object, a marking device for providing an dent on the surface of the measuring object with a predetermined horizontal distance from the foreign matter or abnormal unsmoothness, and a mass spectrum measuring device for measuring a mass spectrum of secondary ion emitted from a position with a predetermined distance from the dent by detecting the dent through impact and scanning of the surface of the measuring object with a primary ion beam.Type: ApplicationFiled: February 25, 2008Publication date: September 4, 2008Applicant: CANON KABUSHIKI KAISHAInventors: Kazuhiro Jindai, Hideto Yokoi
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Patent number: 7357690Abstract: An alignment unit and an alignment method for aligning needle-like structures. The alignment unit includes a substrate having a surface and grooves defined in the surface. The grooves are sized and arranged such that when the needle-like structures are received therein, the needle-like structures are aligned.Type: GrantFiled: November 17, 2004Date of Patent: April 15, 2008Assignee: Canon Kabushiki KaishaInventors: Yuji Tsuruoka, Kazuo Iwata, Kazuhiro Jindai, Hidehito Takayama, Eiichi Motai, Takashi Mori
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Publication number: 20080001081Abstract: A surface analysis apparatus includes a unit configured to bombard a sample surface with at least two types of ions having different sizes; a measurement device for measuring, with a time-of-flight secondary ion mass spectrometer, a mass spectrum of ions emitted from the sample surface; and an information processor outputting a difference between two mass spectra measured by bombardment of different types of ions.Type: ApplicationFiled: June 26, 2007Publication date: January 3, 2008Applicant: CANON KABUSHIKI KAISHAInventors: Kazuhiro Jindai, Hideto Yokoi
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Patent number: 7189427Abstract: This invention provides an electron source manufacturing apparatus which can be easily downsized and operated. The electron source manufacturing apparatus includes a support member for supporting a substrate (10) having a conductor (11), a vessel (12) which has a gas inlet port (15) and a gas exhaust port (16) and covers a partial region of the surface of the substrate (10); a gas inlet unit (24) connected to the gas inlet port (15) to introduce gas into the vessel, an exhaust unit (26) connected to the gas exhaust port to evacuate the interior of the vessel, and a voltage application unit (32) for applying a voltage to the conductor.Type: GrantFiled: February 10, 2004Date of Patent: March 13, 2007Assignee: Canon Kabushiki KaishaInventors: Toshihiko Takeda, Masaru Kamio, Masataka Yamashita, Yasue Sato, Hitoshi Oda, Keisuke Yamamoto, Miki Tamura, Hideshi Kawasaki, Kazuhiro Jindai
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Publication number: 20050189859Abstract: An alignment unit and an alignment method for aligning needle-like structures. The alignment unit includes a substrate having a surface and grooves defined in the surface. The grooves are sized and arranged such that when the needle-like structures are received therein, the needle-like structures are aligned.Type: ApplicationFiled: November 17, 2004Publication date: September 1, 2005Applicant: Canon Kabushiki KaishaInventors: Yuji Tsuruoka, Kazuo Iwata, Kazuhiro Jindai, Hidehito Takayama, Eiichi Motai, Takashi Mori
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Patent number: 6851995Abstract: It relates to a method of manufacturing an electron source. In an activation process, a set value of an activation gas partial pressure is switched at multi-stages and an application of a compensation voltage is not conducted for a predetermined period after switching of the set value. Alternatively, the activation is repeated plural times while a row wiring or a column wiring is switched, and the application of the compensation voltage is not conducted for the predetermined period after switching of the row wiring or the column wiring. Thus, activation processing can be uniformly performed for all electron emitting devices.Type: GrantFiled: September 26, 2002Date of Patent: February 8, 2005Assignee: Canon Kabushiki KaishaInventors: Tsuyoshi Takegami, Hisaaki Kawade, Takahiro Oguchi, Kazuhiro Jindai
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Patent number: 6824437Abstract: A method of manufacturing an electron-emitting device has a step of forming a pair of conductors on a substrate, the conductors being spaced from each other, and an activation process of depositing carbon or carbon compound on at least one side of the pair of conductors in an atmosphere of carbon compound gas. The activation process includes a plurality of processes of two or more stages including a first process and a second process. The first process is executed in an atmosphere of the carbon compound gas having a partial pressure higher than a partial pressure of the gas in the second process, with the second process being the last activation process.Type: GrantFiled: December 17, 2002Date of Patent: November 30, 2004Assignee: Canon Kabushiki KaishaInventors: Kazuhiro Jindai, Toshikazu Ohnishi
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Patent number: 6780073Abstract: A method of manufacturing an electron-emitting device includes a process for forming a pair of electric conductors spaced from each other on a substrate, and an activation process for forming a film of carbon or a carbon compound on at least one of the pair of electric conductors. The activation process is sequentially performed within plural containers having different atmospheres.Type: GrantFiled: April 2, 2002Date of Patent: August 24, 2004Assignee: Canon Kabushiki KaishaInventors: Miki Tamura, Toshikazu Ohnishi, Kazuhiro Jindai
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Publication number: 20040154545Abstract: This invention provides an electron source manufacturing apparatus which can be easily downsized and operated. The electron source manufacturing apparatus includes a support member for supporting a substrate (10) having a conductor (11), a vessel (12) which has a gas inlet port (15) and a gas exhaust port (16) and covers a partial region of the surface of the substrate (10); a gas inlet unit (24) connected to the gas inlet port (15) to introduce gas into the vessel, an exhaust unit (26) connected to the gas exhaust port to evacuate the interior of the vessel, and a voltage application unit (32) for applying a voltage to the conductor.Type: ApplicationFiled: February 10, 2004Publication date: August 12, 2004Applicant: CANON KABUSHIKI KAISHAInventors: Toshihiko Takeda, Masaru Kamio, Masataka Yamashita, Yasue Sato, Hitoshi Oda, Keisuke Yamamoto, Miki Tamura, Hideshi Kawasaki, Kazuhiro Jindai
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Patent number: 6755709Abstract: In a method of fabricating an electron-emitting device, an activation step is performed in shorter time. The method forms a deposit of carbon or carbon compound on a precursory structure which becomes an electron-emitting region in an electron-emitting device made on a substrate and comprises a first step for depositing carbon or carbon compound in a gas atmosphere which includes a carbon compound of a first molecular weight, and subsequently a second step for depositing carbon or carbon compound in a gas atmosphere which includes a carbon compound of a second molecular weight smaller than the first molecular weight.Type: GrantFiled: May 23, 2002Date of Patent: June 29, 2004Assignee: Canon Kabushiki KaishaInventors: Kazuhiro Jindai, Mineto Yagyu
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Patent number: 6726520Abstract: This invention provides an electron source manufacturing apparatus which can be easily downsized and operated. The electron source manufacturing apparatus includes a support member for supporting a substrate (10) having a conductor (11), a vessel (12) which has a gas inlet port (15) and a gas exhaust port (16) and covers a partial region of the surface of the substrate (10); a gas inlet unit (24) connected to the gas inlet port (15) to introduce gas into the vessel, an exhaust unit (26) connected to the gas exhaust port to evacuate the interior of the vessel, and a voltage application unit (32) for applying a voltage to the conductor.Type: GrantFiled: February 21, 2001Date of Patent: April 27, 2004Assignee: Canon Kabushiki KaishaInventors: Toshihiko Takeda, Masaru Kamio, Masataka Yamashita, Yasue Sato, Hitoshi Oda, Keisuke Yamamoto, Miki Tamura, Hideshi Kawasaki, Kazuhiro Jindai
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Patent number: 6582268Abstract: A method of manufacturing an electron-emitting device has a step of forming a pair of conductors on a substrate, the conductors being spaced from each other, and an activation process of depositing carbon or carbon compound on at least one side of the pair of conductors in an atmosphere of carbon compound gas. The activation process includes a plurality of processes of two or more stages including a first process and a second process. The first process is executed in an atmosphere of the carbon compound gas having a partial pressure higher than a partial pressure of the gas in the second process, with the second process being the last activation process.Type: GrantFiled: February 24, 2000Date of Patent: June 24, 2003Assignee: Canon Kabushiki KaishaInventors: Kazuhiro Jindai, Toshikazu Ohnishi
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Publication number: 20030104751Abstract: A method of manufacturing an electron-emitting device has a step of forming a pair of conductors on a substrate, the conductors being spaced from each other, and an activation process of depositing carbon or carbon compound on at least one side of the pair of conductors in an atmosphere of carbon compound gas The activation process includes a plurality of processes of two or more stages including a first process and a second process. The first process is executed in an atmosphere of the carbon compound gas having a partial pressure higher than a partial process of the second process used as a last activation process.Type: ApplicationFiled: December 17, 2002Publication date: June 5, 2003Applicant: CANON KABUSHIKI KAISHAInventors: Kazuhiro Jindai, Toshikazu Ohnishi
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Publication number: 20030064653Abstract: It relates to a method of manufacturing an electron source. In an activation process, a set value of an activation gas partial pressure is switched at multi-stages and an application of a compensation voltage is not conducted for a predetermined period after switching of the set value. Alternatively, the activation is repeated plural times while a row wiring or a column wiring is switched, and the application of the compensation voltage is not conducted for the predetermined period after switching of the row wiring or the column wiring. Thus, activation processing can be uniformly performed for all electron emitting devices.Type: ApplicationFiled: September 26, 2002Publication date: April 3, 2003Inventors: Tsuyoshi Takegami, Hisaaki Kawade, Takahiro Oguchi, Kazuhiro Jindai