Patents by Inventor Kazuhiro Ohkubo

Kazuhiro Ohkubo has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 11920077
    Abstract: No studies have been made regarding what kinds of refrigerants should be used in a refrigeration cycle device for a vehicle. An air conditioner (1) for a vehicle includes a refrigerant circuit (10) and a refrigerant that is sealed in the refrigerant circuit (10). The refrigerant circuit (10) includes a compressor (80), a first heat exchanger (85), which serves as a heat dissipater in a dehumidifying heating mode, an outside-air heat exchanger (82), a cooling control valve (87), and a second heat exchanger (86), which serves as an evaporator in the dehumidifying heating mode. The refrigerant is a refrigerant having a low GWP.
    Type: Grant
    Filed: July 16, 2019
    Date of Patent: March 5, 2024
    Assignee: DAIKIN INDUSTRIES, LTD.
    Inventors: Eiji Kumakura, Kazuhiro Furusho, Masaru Tanaka, Shun Ohkubo, Mitsushi Itano, Yuuki Yotsumoto, Akihito Mizuno, Tomoyuki Gotou, Yasufu Yamada, Tatsumi Tsuchiya, Kenji Gobou, Hitomi Kuroki, Daisuke Karube, Tatsuya Takakuwa, Tetsushi Tsuda
  • Patent number: 11915920
    Abstract: The present invention provides a simpler method for sharpening a tip of an emitter. In addition, the present invention provides an emitter including a nanoneedle made of a single crystal material, an emitter including a nanowire made of a single crystal material such as hafnium carbide (HfC), both of which stably emit electrons with high efficiency, and an electron gun and an electronic device using any one of these emitters. A method for manufacturing the emitter according to an embodiment of the present invention comprises processing a single crystal material in a vacuum using a focused ion beam to form an end of the single crystal material, through which electrons are to be emitted, into a tapered shape, wherein the processing is performed in an environment in which a periphery of the single crystal material fixed to a support is opened.
    Type: Grant
    Filed: October 20, 2020
    Date of Patent: February 27, 2024
    Assignee: NATIONAL INSTITUTE FOR MATERIALS SCIENCE
    Inventors: Jie Tang, Shuai Tang, Ta-Wei Chiu, Tadakatsu Ohkubo, Jun Uzuhashi, Kazuhiro Hono, Luchang Qin
  • Publication number: 20230033913
    Abstract: Provided is a cleaning apparatus and a cleaning method for semiconductor wafers that can hinder a mist of a cleaning solution from being adhered to a surface of a semiconductor wafer during cleaning of the semiconductor wafer. In a cleaning apparatus 1 for a semiconductor wafer, a spin cup 20 has an annular side wall portion 21; an inclined portion 22 that is inclined toward the rotating table 13; and an annular bent portion 23. The height position h21 of the upper end portion 21c of the side wall portion 21 is set at a position lower than the height position h14a of the upper end portion 14a of the wafer retainer portion 14, and the inclination angle ?22 of the inclined portion to a horizontal plane and the width w of the inclined portion satisfy a formula (A): ?22(°)??0.65×w (mm)+72.
    Type: Application
    Filed: August 17, 2020
    Publication date: February 2, 2023
    Applicant: SUMCO CORPORATION
    Inventors: Kaito NODA, Kazuhiro OHKUBO, Yuki NAKAO, Michihiko TOMITA
  • Patent number: 8409349
    Abstract: A film thickness measurement method for measuring a change in film thickness of 0.3 ?m or less in a silicon wafer by FTIR, having an auxiliary film formation step for depositing an auxiliary film for measurement on a surface to be measured for the change in film thickness, an auxiliary film thickness measurement step for measuring the film thickness of the auxiliary film, a measurement step for measuring the film thickness of the auxiliary film after the change in film thickness, and a calculation step for calculating a change in film thickness of a back surface deposit from the result of the measurement step and the result of the auxiliary film thickness measurement step.
    Type: Grant
    Filed: June 9, 2009
    Date of Patent: April 2, 2013
    Assignee: Sumco Corporation
    Inventor: Kazuhiro Ohkubo
  • Publication number: 20090305021
    Abstract: A film thickness measurement method for measuring a change in film thickness of 0.3 ?m or less in a silicon wafer by FTIR, having an auxiliary film formation step for depositing an auxiliary film for measurement on a surface to be measured for the change in film thickness, an auxiliary film thickness measurement step for measuring the film thickness of the auxiliary film, a measurement step for measuring the film thickness of the auxiliary film after the change in film thickness, and a calculation step for calculating a change in film thickness of a back surface deposit from the result of the measurement step and the result of the auxiliary film thickness measurement step.
    Type: Application
    Filed: June 9, 2009
    Publication date: December 10, 2009
    Applicant: SUMCO CORPORATION
    Inventor: Kazuhiro OHKUBO
  • Patent number: 6892037
    Abstract: The image forming apparatus corrects the rotation number of a replenishing screw according to the toner replenishing amount using a correction table stored in advance in the case where a toner is replenished according to the density of the toner in the developing container, and controls the rotation of the replenishing screw according to the corrected rotation number to replenish the toner. Thus, the suitable amount of toner can be timely replenished into the developing container.
    Type: Grant
    Filed: February 21, 2003
    Date of Patent: May 10, 2005
    Assignee: Canon Kabushiki Kaisha
    Inventor: Kazuhiro Ohkubo
  • Publication number: 20030161642
    Abstract: The image forming apparatus corrects the rotation number of a replenishing screw according to the toner replenishing amount using a correction table stored in advance in the case where a toner is replenished according to the density of the toner in the developing container, and controls the rotation of the replenishing screw according to the corrected rotation number to replenish the toner. Thus, the suitable amount of toner can be timely replenished into the developing container.
    Type: Application
    Filed: February 21, 2003
    Publication date: August 28, 2003
    Applicant: Canon Kabushiki Kaisha
    Inventor: Kazuhiro Ohkubo