Patents by Inventor Kazuhisa Machida
Kazuhisa Machida has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 6476913Abstract: Inspection method, apparatus, and system for a circuit pattern, in which when various conditions which are necessary in case of inspecting a fine circuit pattern by using an image formed by irradiating white light, a laser beam, or a charged particle beam are set, its operating efficiency can be improved. An inspection target region of an inspection-subject substrate is displayed, and a designated map picture plane and an image of an optical microscope or an electron beam microscope of a designated region are displayed in parallel, thereby enabling a defect distribution and a defect image to be simultaneously seen. Item names of inspecting conditions and a picture plane to display, input, or instruct the contents of the inspecting conditions are integrated, those contents are overlapped to the picture plane and layer-displayed, and all of the item names are displayed in parallel in a tab format in the upper portion of the picture plane of the contents.Type: GrantFiled: November 29, 1999Date of Patent: November 5, 2002Assignee: Hitachi, Ltd.Inventors: Kazuhisa Machida, Mari Nozoe, Hiroshi Morioka, Yasutsugu Usami, Takashi Hiroi, Maki Ito
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Patent number: 6473518Abstract: The magnetic field data display device make it possible to display on the same screen: a process function display area showing process function items; an analysis data display area showing at least one of measured magnetic field data and its processed magnetic field data; and an operating region display area showing operating items corresponding to the measured magnetic fields and the processed magnetic fields, analysis data display area displays data of at least one of the channels showing the plurality of measurement positions of the test sample, the operating region display area displays a channel display area in which the channels are displayed and whether or not a data of each of said channels is displayed in the analysis data display area.Type: GrantFiled: October 1, 1998Date of Patent: October 29, 2002Assignee: Hitachi, Ltd.Inventors: Kazuhisa Machida, Takafumi Kawasaki, Hiroyuki Suzuki, Keiji Tsukada
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Publication number: 20020113967Abstract: Inspection method, apparatus, and system for a circuit pattern, in which when various conditions which are necessary in case of inspecting a fine circuit pattern by using an image formed by irradiating white light, a laser beam, or a charged particle beam are set, its operating efficiency can be improved. An inspection target region of an inspection-subject substrate is displayed, and a designated map picture plane and an image of an optical microscope or an electron beam microscope of a designated region are displayed in parallel, thereby enabling a defect distribution and a defect image to be simultaneously seen. Item names of inspecting conditions and a picture plane to display, input, or instruct the contents of the inspecting conditions are integrated, those contents are overlapped to the picture plane and layer-displayed, and all of the item names are displayed in parallel in a tab format in the upper portion of the picture plane of the contents.Type: ApplicationFiled: April 5, 2002Publication date: August 22, 2002Inventors: Yasuhiko Nara, Kazuhisa Machida, Mari Nozoe, Hiroshi Morioka, Yasutsugu Usami, Takashi Hiroi, Kohichi Hayakawa, Maki Ito
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Publication number: 20020109088Abstract: Inspection method, apparatus, and system for a circuit pattern, in which when various conditions which are necessary in case of inspecting a fine circuit pattern by using an image formed by irradiating white light, a laser beam, or a charged particle beam are set, its operating efficiency can be improved. An inspection target region of an inspection-subject substrate is displayed, and a designated map picture plane and an image of an optical microscope or an electron beam microscope of a designated region are displayed in parallel, thereby enabling a defect distribution and a defect image to be simultaneously seen. Item names of inspecting conditions and a picture plane to display, input, or instruct the contents of the inspecting conditions are integrated, those contents are overlapped to the picture plane and layer-displayed, and all of the item names are displayed in parallel in a tab format in the upper portion of the picture plane of the contents.Type: ApplicationFiled: April 5, 2002Publication date: August 15, 2002Inventors: Yasuhiko Nara, Kazuhisa Machida, Mari Nozoe, Hiroshi Morioka, Yasutsugu Usami, Takashi Hiroi, Kohichi Hayakawa, Maki Ito
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Publication number: 20020105648Abstract: Inspection method, apparatus, and system for a circuit pattern, in which when various conditions which are necessary in case of inspecting a fine circuit pattern by using an image formed by irradiating white light, a laser beam, or a charged particle beam are set, its operating efficiency can be improved. An inspection target region of an inspection-subject substrate is displayed, and a designated map picture plane and an image of an optical microscope or an electron beam microscope of a designated region are displayed in parallel, thereby enabling a defect distribution and a defect image to be simultaneously seen. Item names of inspecting conditions and a picture plane to display, input, or instruct the contents of the inspecting conditions are integrated, those contents are overlapped to the picture plane and layer-displayed, and all of the item names are displayed in parallel in a tab format in the upper portion of the picture plane of the contents.Type: ApplicationFiled: April 4, 2002Publication date: August 8, 2002Applicant: Hitachi, Ltd.Inventors: Yasuhiko Nara, Kazuhisa Machida, Mari Nozoe, Hiroshi Morioka, Yasutsugu Usami, Takashi Hiroi, Kohichi Hayakawa, Maki Ito
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Patent number: 6421122Abstract: Inspection method, apparatus, and system for a circuit pattern, in which when various conditions which are necessary in case of inspecting a fine circuit pattern by using an image formed by irradiating white light, a laser beam, or a charged particle beam are set, its operating efficiency can be improved. An inspection target region of an inspection-subject substrate is displayed, and a designated map picture plane and an image of an optical microscope or an electron beam microscope of a designated region are displayed in parallel, thereby enabling a defect distribution and a defect image to be simultaneously seen. Item names of inspecting conditions and a picture plane to display, input, or instruct the contents of the inspecting conditions are integrated, those contents are overlapped to the picture plane and layer-displayed, and all of the item names are displayed in parallel in a tab format in the upper portion of the picture plane of the contents.Type: GrantFiled: April 11, 2001Date of Patent: July 16, 2002Assignee: Hitachi, Ltd.Inventors: Yasuhiko Nara, Kazuhisa Machida, Mari Nozoe, Hiroshi Morioka, Yasutsugu Usami, Takashi Hiroi, Kohichi Hayakawa, Maki Ito
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Patent number: 6388747Abstract: Inspection method, apparatus, and system for a circuit pattern, in which when various conditions which are necessary in case of inspecting a fine circuit pattern by using an image formed by irradiating white light, a laser beam, or a charged particle beam are set, its operating efficiency can be improved. An inspection target region of an inspection-subject substrate is displayed, and a designated map picture plane and an image of an optical microscope or an electron beam microscope of a designated region are displayed in parallel, thereby enabling a defect distribution and a defect image to be simultaneously seen. Item names of inspecting conditions and a picture plane to display, input, or instruct the contents of the inspecting conditions are integrated, those contents are overlapped to the picture plane and layer-displayed, and all of the item names are displayed in parallel in a tab format in the upper portion of the picture plane of the contents.Type: GrantFiled: April 11, 2001Date of Patent: May 14, 2002Assignee: Hitachi, Ltd.Inventors: Yasuhiko Nara, Kazuhisa Machida, Mari Nozoe, Hiroshi Morioka, Yasutsugu Usami, Takashi Hiroi
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Publication number: 20020045813Abstract: A method for processing biomagnetic fields generated by biocurrents resulting from activities of human brain or myocardia and its mapping apparatus are provided, which features biomagnetic measurement and its analysis, magnetic field mapping and its imaging and their waveform generation by a simple operation. Biomagnetic fields emitted from the patient are measured at a plurality of measurement positions, and a contour map of magnetic field obtained as a result of processing of these measured biomagnetic fields is imaged in the magnetic contour map display apparatus, which display apparatus comprises: the process function display area indicating process function items including measurement; and the analysis data display area which displays the waveform together with a designated measurement time, the waveform being generated during measurement at least based on the measured biomagnetic fields and during the designated measurement period of time.Type: ApplicationFiled: October 30, 2001Publication date: April 18, 2002Applicant: Hitachi, Ltd.Inventors: Hiroyuki Suzuki, Keiji Tsukada, Kazuhisa Machida, Takafumi Kawasaki
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Publication number: 20020031444Abstract: An operation guidance method of clinical system which enables a doctor or nurse unskilled in testing to operate the clinical system without operation error by providing operation guidance. In the system, an initial screen shows numerals 1 to 5 indicating the order of procedure of sample test and character information indicating the contents of works (1 confirmation of sample, 2 confirmation of request, 3 feeding samples, 4 confirmation of result and 5 finish) as contents displayed in an operation menu. When an operator selects a “start” button, display images showing as guidance on the respective works are sequentially displayed. Further, a display image as guidance on arbitrary one of the works may be displayed by selection of one of the works in the operation menu.Type: ApplicationFiled: August 24, 2001Publication date: March 14, 2002Inventors: Eitaro Ito, Kazuhisa Machida, Susumu Kai, Yoshimitsu Takagi, Yasuhiro Higuchi
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Publication number: 20020001404Abstract: The present invention relates to an inspection device and inspection method of a specimen, particularly to the inspection device and inspection method of defects of semiconductor wafers, and the object is to cope with the increase of inspection images and provide an inspection device and inspection method which is capable of classification by sub class, meeting the user needs, in addition to the automatic classification by an inspection device.Type: ApplicationFiled: June 25, 2001Publication date: January 3, 2002Inventors: Akira Yoshikawa, Kazuhisa Machida, Hitoshi Komuro, Takehiro Hirai, Katsuhiro Kitahashi
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Patent number: 6336043Abstract: A method for processing biomagnetic fields generated by biocurrents resulting from activities of human brain or myocardia and its mapping apparatus are provided, which features biomagnetic measurement and its analysis, magnetic field mapping and its imaging and their waveform generation by a simple operation. Biomagnetic fields emitted from the patient are measured at a plurality of measurement positions, and a contour map of magnetic field obtained as a result of processing of these measured biomagnetic fields is imaged in the magnetic contour map display apparatus, which display apparatus includes: the process function display area indicating process function items including measurement; and the analysis data display area which displays the waveform together with a designated measurement time, the waveform being generated during measurement at least based on the measured biomagnetic fields and during the designated measurement period of time.Type: GrantFiled: October 1, 1998Date of Patent: January 1, 2002Assignee: Hitachi, Ltd.Inventors: Hiroyuki Suzuki, Keiji Tsukada, Kazuhisa Machida, Takafumi Kawasaki
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Publication number: 20010021019Abstract: Inspection method, apparatus, and system for a circuit pattern, in which when various conditions which are necessary in case of inspecting a fine circuit pattern by using an image formed by irradiating white light, a laser beam, or a charged particle beam are set, its operating efficiency can be improved. An inspection target region of an inspection-subject substrate is displayed, and a designated map picture plane and an image of an optical microscope or an electron beam microscope of a designated region are displayed in parallel, thereby enabling a defect distribution and a defect image to be simultaneously seen. Item names of inspecting conditions and a picture plane to display, input, or instruct the contents of the inspecting conditions are integrated, those contents are overlapped to the picture plane and layer-displayed, and all of the item names are displayed in parallel in a tab format in the upper portion of the picture plane of the contents.Type: ApplicationFiled: April 11, 2001Publication date: September 13, 2001Inventors: Yasuhiko Nara, Kazuhisa Machida, Mari Nozoe, Hiroshi Morioka, Yasutsugu Usami, Takashi Hiroi
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Publication number: 20010019411Abstract: Inspection method, apparatus, and system for a circuit pattern, in which when various conditions which are necessary in case of inspecting a fine circuit pattern by using an image formed by irradiating white light, a laser beam, or a charged particle beam are set, its operating efficiency can be improved. An inspection target region of an inspection-subject substrate is displayed, and a designated map picture plane and an image of an optical microscope or an electron beam microscope of a designated region are displayed in parallel, thereby enabling a defect distribution and a defect image to be simultaneously seen. Item names of inspecting conditions and a picture plane to display, input, or instruct the contents of the inspecting conditions are integrated, those contents are overlapped to the picture plane and layer-displayed, and all of the item names are displayed in parallel in a tab format in the upper portion of the picture plane of the contents.Type: ApplicationFiled: April 11, 2001Publication date: September 6, 2001Inventors: Yasuhiko Nara, Kazuhisa Machida, Mari Nozoe, Hiroshi Morioka, Yasutsugu Usami, Takashi Hiroi, Kohichi Hayakawa, Maki Ito
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Publication number: 20010015805Abstract: Inspection method, apparatus, and system for a circuit pattern, in which when various conditions which are necessary in case of inspecting a fine circuit pattern by using an image formed by irradiating white light, a laser beam, or a charged particle beam are set, its operating efficiency can be improved. An inspection target region of an inspection-subject substrate is displayed, and a designated map picture plane and an image of an optical microscope or an electron beam microscope of a designated region are displayed in parallel, thereby enabling a defect distribution and a defect image to be simultaneously seen. Item names of inspecting conditions and a picture plane to display, input, or instruct the contents of the inspecting conditions are integrated, those contents are overlapped to the picture plane and layer-displayed, and all of the item names are displayed in parallel in a tab format in the upper portion of the picture plane of the contents.Type: ApplicationFiled: April 11, 2001Publication date: August 23, 2001Inventors: Yasuhiko Nara, Kazuhisa Machida, Mari Nozoe, Hiroshi Morioka, Yasutsugu Usami, Takashi Hiroi
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Publication number: 20010011706Abstract: Inspection method, apparatus, and system for a circuit pattern, in which when various conditions which are necessary in case of inspecting a fine circuit pattern by using an image formed by irradiating white light, a laser beam, or a charged particle beam are set, its operating efficiency can be improved. An inspection target region of an inspection-subject substrate is displayed, and a designated map picture plane and an image of an optical microscope or an electron beam microscope of a designated region are displayed in parallel, thereby enabling a defect distribution and a defect image to be simultaneously seen. Item names of inspecting conditions and a picture plane to display, input, or instruct the contents of the inspecting conditions are integrated, those contents are overlapped to the picture plane and layer-displayed, and all of the item names are displayed in parallel in a tab format in the upper portion of the picture plane of the contents.Type: ApplicationFiled: April 11, 2001Publication date: August 9, 2001Inventors: Yasuhiko Nara, Kazuhisa Machida, Mari Nozoe, Hiroshi Morioka, Yasutsugu Usami, Takashi Hiroi, Kohichi Hayakawa, Maki Ito
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Patent number: D441761Type: GrantFiled: August 12, 1999Date of Patent: May 8, 2001Assignee: Hitachi, Ltd.Inventors: Kazuhisa Machida, Kiyotaka Izawa, Takafumi Kawasaki