Abstract: A process for producing a purified aqueous hydrogen peroxide solution comprises contacting an aqueous hydrogen peroxide solution containing metal ion impurities firstly with a H+ type cation exchange resin, secondly with a carbonate iron (CO32?) type or bicarbonate ion (HCO3?) type anion exchange resin, and thirdly with a H+ type cation exchange resin. Further, a process for producing a purified aqueous hydrogen peroxide solution comprises contacting an aqueous hydrogen peroxide solution containing metal ion impurities firstly with a H+ type cation exchange resin, secondly with a fluoride ion (F?) type anion exchange resin, thirdly with a carbonate ion (CO32?) type or bicarbonate ion (HCO3?) type anion exchange resin, and fourthly with a H+ type cation exchange resin.

Abstract: A process for producing a highly purified aqueous hydrogen peroxide solution by removing silicon oxide impurities from an aqueous hydrogen peroxide solution containing silicon oxide impurities by adding a flocculating agent and filtering out impurities of solid content contained in the aqueous hydrogen peroxide solution with a precision filter, thereafter bringing the aqueous hydrogen peroxide solution into contact with an anion exchange resin in a fluoride ion form by at least one fluoride compound which contains 0.05% by weight or less of SiF6 and is selected from the group consisting of sodium fluoride, potassium fluoride and ammonium fluoride.

Abstract: A process for producing a purified aqueous hydrogen peroxide solution comprises contacting an aqueous hydrogen peroxide solution containing metal ion impurities firstly with a H+ type cation exchange resin, secondly with a carbonate iron (CO32−) type or bicarbonate ion (HCO3−) type anion exchange resin, and thirdly with a H+ type cation exchange resin. Further, a process for producing a purified aqueous hydrogen peroxide solution comprises contacting an aqueous hydrogen peroxide solution containing metal ion impurities firstly with a H+ type cation exchange resin, secondly with a fluoride ion (F−) type anion exchange resin, thirdly with a carbonate ion (CO32−) type or bicarbonate ion (HCO3−) type anion exchange resin, and fourthly with a H+ type cation exchange resin.

Abstract: The present invention provides a process for producing a highly purified aqueous hydrogen peroxide solution from which silicon oxide impurities are removed to a minimum by purifying an aqueous hydrogen peroxide solution containing silicon oxide impurities.