Patents by Inventor Kazuhito Fukasawa

Kazuhito Fukasawa has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20240047586
    Abstract: An electrode structure of a solar cell includes an electric conductor on a substrate side of a chalcogen solar cell, and a wiring element to be electrically connected with the electric conductor. The wiring element is stacked on and bonded with the electric conductor. The wiring element and the electric conductor each contain a group VI element. In a stacked direction of the electric conductor and the wiring element, a peak of a concentration distribution of the group VI element is shifted from an interface between the electric conductor and the wiring element.
    Type: Application
    Filed: December 21, 2021
    Publication date: February 8, 2024
    Applicant: IDEMITSU KOSAN CO.,LTD.
    Inventors: Yoshihide MIYAGAWA, Kazuhito FUKASAWA, Mikio HAMANO, Kyohei HORIGUCHI, Koji YAMAGUCHI
  • Publication number: 20240038910
    Abstract: An electrode structure of a solar cell includes an electric conductor on a substrate side of a chalcogen solar cell, and a wiring element to be electrically connected with the electric conductor. The wiring element is stacked on and bonded with the electric conductor. The melting point of the wiring element is equal to or higher than 230° C., and the electric conductor in the region corresponding to the wiring element includes a part of the metal element of the wiring element.
    Type: Application
    Filed: December 21, 2021
    Publication date: February 1, 2024
    Applicant: IDEMITSU KOSAN CO.,LTD.
    Inventors: Yoshihide MIYAGAWA, Kazuhito FUKASAWA, Mikio HAMANO, Kyohei HORIGUCHI, Koji YAMAGUCHI
  • Patent number: 8545688
    Abstract: Dense carbon nitride films are electrochemically formed on a conductive substrate by placing the substrate acting as cathode in a molten salt electrolyte bath and applying DC current across the substrate and a counter electrode acting as anode also placed in the molten salt electrolyte bath. Carbonate ion and nitrate ion are concurrently reduced to deposit carbon nitride films on the substrate.
    Type: Grant
    Filed: May 28, 2010
    Date of Patent: October 1, 2013
    Assignees: Toyota Boshoku Kabushiki Kaisha, IMSEP Co., Ltd., SEC Carbon Limited, The Doshisha
    Inventors: Tokujiro Nishikiori, Hiroaki Amahashi, Kouji Kuroda, Yasuhiko Ito, Kazuhito Fukasawa, Naohiro Yasuda
  • Publication number: 20110290656
    Abstract: Dense carbon nitride films are electrochemically formed on a conductive substrate by placing the substrate acting as cathode in a molten salt electrolyte bath and applying DC current across the substrate and a counter electrode acting as anode also placed in the molten salt electrolyte bath. Carbonate ion and nitrate ion are concurrently reduced to deposit carbon nitride films on the substrate.
    Type: Application
    Filed: May 28, 2010
    Publication date: December 1, 2011
    Applicants: TOYOTA BOSHOKU KABUSHIKI KAISHA, THE DOSHISHA, SEC CARBON, LIMITED, I'MSEP CO., LTD.
    Inventors: Tokujiro NISHIKIORI, Hiroaki AMAHASHI, Kouji KURODA, Yasuhiko ITO, Kazuhito FUKASAWA, Naohiro YASUDA
  • Patent number: 7642368
    Abstract: A method for producing a triarylsulfonium salt having a structure that only one of the three arobatic rings of the three aromatic rings on the cationic portion is different from the other two aromatic groups, and which is useful, for example, as an acid-generating agent for a resist or a photo cationic polymerization initiator, by reacting a diaryl sulfoxide and an aryl Grignard reagent RMgX??[2] in the presence of an activator with high affinity for oxygen of 3 to 7.5 equivalents relative to the above diaryl sulfoxide, and then reacting the resultant reaction mixture with a strong acid HA1??[3].
    Type: Grant
    Filed: October 4, 2004
    Date of Patent: January 5, 2010
    Assignee: Wako Pure Chemical Industries, Ltd.
    Inventors: Motoshige Sumino, Kazuhito Fukasawa, Shigeaki Imazeki, Tetsuya Watanabe
  • Publication number: 20070083060
    Abstract: [Subject] To provide a method for effectively producing a triarylsulfonium salt having a structure that only one aromatic ring of three aromatic rings on the cation portion thereof is different from the other two aromatic rings (hereinafter, abbreviated as a triarylsulfonium salt relating to the present invention) in a high yield without forming any byproduct.
    Type: Application
    Filed: October 4, 2004
    Publication date: April 12, 2007
    Inventors: Motoshige Sumino, Kazuhito Fukasawa, Shigeaki Imazeki, Tetsuya Watanabe
  • Patent number: 6924323
    Abstract: A compound shown by the general formula [1] (wherein R1, R2 and R3 are each independently an aromatic hydrocarbon residual group, Yn? is an anion derived from a carboxylic acid having 3 or more carbon atoms with substituted fluorine atoms, and n is 1 or 2, provided that R1, R2 and R3 each is not a phenyl group having substituents at an ortho and/or a meta position), and a composition consisting of the compound and a diazodisulfone compound are disclosed. Use of the compound or the compound as an acid generator for resists produces the effects of improving the profiles of ultra-fine patterns or diminishing sidewall irregularities in ultra-fine patterns. The compound is also useful as a cationic photopolymerization initiator.
    Type: Grant
    Filed: June 27, 2001
    Date of Patent: August 2, 2005
    Assignee: Wako Pure Chemical Industries, Ltd.
    Inventors: Masami Ishihara, Motoshige Sumino, Kazuhito Fukasawa, Naoki Katano, Shigeaki Imazeki
  • Patent number: 6723483
    Abstract: A triphenyl sulfonium salt compound shown by the general formula [1] or [3]. (wherein R1 and R2 are each independently a hydrogen atom or a lower alkyl group, provided that at least one of R1 and R2 are a lower alkyl group, R3s are each independently an alkyl group, n is an integer of 0 to 3, i is an integer of 1 to 3, j is an integer of 0 to 2, provided that i+j=3, Y− is an anion derived from a sulfonic acid shown by the general formula [2] R4—SO3H  [2] [wherein R4 is an alkyl group or an aryl group which may have as a substituent an alkyl group]). (wherein X is a phenyl group which has a substituent at an ortho- and/or a meta-position, m is an integer of 1 to 3, q is an integer of 0 to 2, provided that m+q=3, p is 1 or 2 and Zp− is an anion derived from a carboxylic acid).
    Type: Grant
    Filed: December 7, 2000
    Date of Patent: April 20, 2004
    Assignee: Wako Pure Chemical Industries, Ltd.
    Inventors: Keiji Oono, Kazuhito Fukasawa, Kazunori Sakamoto, Fumiyoshi Urano, Motoshige Sumino, Shigeaki Imazeki
  • Publication number: 20040033434
    Abstract: A compound shown by the general formula [1] 1
    Type: Application
    Filed: January 14, 2003
    Publication date: February 19, 2004
    Inventors: Masami Ishihara, Motoshige Sumino, Kazuhito Fukasawa, Naoki Katano, Shigeaki Imazeki
  • Patent number: 5856521
    Abstract: A monomer of the formula: ##STR1## wherein R5, R6 and R7 are independently hydrogen, alkyl, cyano, alkyloxycarbonyl or carbamoyl; Z is a spacer or a direct link; and R is hydroxyalkyl having a protected terminal hydroxy, can produce a polymer useful for producting a resist composition.
    Type: Grant
    Filed: April 28, 1998
    Date of Patent: January 5, 1999
    Assignee: Wako Pure Chemical Industries, Ltd.
    Inventors: Motoshige Sumino, Kazuhito Fukasawa