Patents by Inventor Kazuishi Tanno
Kazuishi Tanno has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 11333973Abstract: A resist composition including a base component which exhibits changed solubility in a developing solution under action of acid and an acid-generator component (B) which generates acid upon exposure, the base component including a polymeric compound containing a structural unit having an acid decomposable group, the amount of the structural unit having an acid decomposable group, based on the combined total of all structural units contained in the base component being 51 mol % to 59 mol %, and the structural unit having an acid decomposable group includes a structural unit represented by general formula (a1-1) shown below (in which R represents a hydrogen atom, an alkyl group or a halogenated alkyl group; Z represents a single bond or an alkyl group; and Cp is a group represented by general formula (Cp-1) shown below).Type: GrantFiled: March 12, 2019Date of Patent: May 17, 2022Assignee: Tokyo Ohka Kogyo Co., Ltd.Inventors: Kazuishi Tanno, Tsuyoshi Nakamura, Eun Sol Jo
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Patent number: 11150554Abstract: A resist composition including a base component (A) which exhibits changed solubility in a developing solution under action of acid and an acid-generator component (B) which generates acid upon exposure, the acid-generator component (B) including at least one acid generator (B1) represented by general formula (b1) shown below, at least one acid generator (B2) represented by general formula (b2) shown below, and at least one acid generator (B3) represented by general formula (b3) shown below (wherein IV to R3 each independently represents a cyclic group which may have a substituent, a chain alkyl group, or a chain alkenyl group; Y1 represents a single bond or a divalent linking group containing an oxygen atom; M1+ to M3+ represents a monovalent organic cation; n represents an integer of 1 to 4; m represents an integer of 0 to 4; provided that, when m is 0, the carbon atom adjacent to the sulfur atom within R2 has no fluorine atom bonded thereto).Type: GrantFiled: October 13, 2016Date of Patent: October 19, 2021Assignee: Tokyo Ohka Kogyo Co., Ltd.Inventors: Tsuyoshi Nakamura, Kazuishi Tanno, JunYeob Lee
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Patent number: 11036132Abstract: A resist composition which generates an acid upon exposure and whose solubility in a developing solution is changed due to an action of the acid, the resist composition including a base material component whose solubility in a developing solution is changed due to the action of an acid; and a compound represented by Formula (d1) in which Rb1 and Rb2 each independently represents —COO?, —COOH, or a hydroxyl group, where at least one of Rb1 and Rb2 represents —COO?, Rb3, Rb4, and Rb5 each independently represents a hydroxyl group or a halogen atom, Rb6 to Rb8 each independently represents an alkyl group, nb3 represents an integer of 0 to 4, nb4 and nb5 each independently represents an integer of 0 to 2, nb6 to nb8 each independently represents an integer of 0 to 5, m represents 1 or 2, and q represents an integer of 0 to 3.Type: GrantFiled: December 19, 2018Date of Patent: June 15, 2021Assignee: Tokyo Ohka Kogyo Co., Ltd.Inventors: Takashi Nagamine, Kazuishi Tanno, Tsuyoshi Nakamura, Masafumi Fujisaki
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Patent number: 11036131Abstract: A resist composition containing a compound (B1) represented by Formula (b1) in which Rb1 represents a monovalent hydrocarbon group which has a steroid skeleton and 17 to 50 carbon atoms, Yb1 and Yb2 each independently represent a divalent linking group having a hetero atom, Vb1 represents a divalent linking group containing a cyclic aliphatic hydrocarbon group, Vb2 represents an alkylene group, a fluorinated alkylene group, or a single bond, Rf1 represents a hydrogen atom, a fluorine atom, or a fluorinated alkyl group having 1 to 5 carbon atoms, m represents an integer of 1 or greater, and Mm+ represents an m-valent organic cationType: GrantFiled: December 19, 2018Date of Patent: June 15, 2021Assignee: Tokyo Ohka Kogyo Co., Ltd.Inventors: Takashi Nagamine, Tsuyoshi Nakamura, Kazuishi Tanno
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Patent number: 10534264Abstract: A resist composition which generates an acid through exposure and whose solubility in a developer changes by the action of an acid. The resist composition contains a polymer compound having at least two kinds of specific constituent units. A resist pattern forming method, including forming a resist film on a support using the resist composition, subjecting the resist film to exposure, and forming a resist pattern through patterning by developing the resist film having undergone exposure by using a developer.Type: GrantFiled: January 24, 2018Date of Patent: January 14, 2020Assignee: TOKYO OHKA KOGYO CO., LTD.Inventors: Tsuyoshi Nakamura, Kazuishi Tanno, JunYeob Lee
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Patent number: 10534263Abstract: A resist composition which generates acid upon exposure and exhibits changed solubility in a developing solution by the action of acid, which includes a polymeric compound having at least two specific structural units.Type: GrantFiled: December 20, 2017Date of Patent: January 14, 2020Assignee: TOKYO OHKA KOGYO CO., LTD.Inventors: Tsuyoshi Nakamura, Kazuishi Tanno, JunYeob Lee
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Publication number: 20190285984Abstract: A resist composition including a base component which exhibits changed solubility in a developing solution under action of acid and an acid-generator component (B) which generates acid upon exposure, the base component including a polymeric compound containing a structural unit having an acid decomposable group, the amount of the structural unit having an acid decomposable group, based on the combined total of all structural units contained in the base component being 51 mol % to 59 mol %, and the structural unit having an acid decomposable group includes a structural unit represented by general formula (a1-1) shown below (in which R represents a hydrogen atom, an alkyl group or a halogenated alkyl group; Z represents a single bond or an alkyl group; and Cp is a group represented by general formula (Cp-1) shown below).Type: ApplicationFiled: March 12, 2019Publication date: September 19, 2019Inventors: Kazuishi TANNO, Tsuyoshi NAKAMURA, Eun Sol JO
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Publication number: 20190204739Abstract: A resist composition containing a compound (B1) represented by Formula (b1) in which Rb1 represents a monovalent hydrocarbon group which has a steroid skeleton and 17 to 50 carbon atoms, Yb1 and Yb2 each independently represent a divalent linking group having a hetero atom, Vb1 represents a divalent linking group containing a cyclic aliphatic hydrocarbon group, Vb2 represents an alkylene group, a fluorinated alkylene group, or a single bond, Rf1 represents a hydrogen atom, a fluorine atom, or a fluorinated alkyl group having 1 to 5 carbon atoms, m represents an integer of 1 or greater, and Mm+ represents an m-valent organic cationType: ApplicationFiled: December 19, 2018Publication date: July 4, 2019Inventors: Takashi NAGAMINE, Tsuyoshi NAKAMURA, Kazuishi TANNO
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Publication number: 20190204735Abstract: A resist composition which generates an acid upon exposure and whose solubility in a developing solution is changed due to an action of the acid, the resist composition including a base material component whose solubility in a developing solution is changed due to the action of an acid; and a compound represented by Formula (d1) in which Rb1 and Rb2 each independently represents —COO?, —COOH, or a hydroxyl group, where at least one of Rb1 and Rb2 represents —COO?, Rb3, Rb4, and Rb5 each independently represents a hydroxyl group or a halogen atom, Rb6 to Rb8 each independently represents an alkyl group, nb3 represents an integer of 0 to 4, nb4 and nb5 each independently represents an integer of 0 to 2, nb6 to nb8 each independently represents an integer of 0 to 5, m represents 1 or 2, and q represents an integer of 0 to 3.Type: ApplicationFiled: December 19, 2018Publication date: July 4, 2019Inventors: Takashi NAGAMINE, Kazuishi TANNO, Tsuyoshi NAKAMURA, Masafumi FUJISAKI
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Publication number: 20190064663Abstract: A resist composition including a base component which exhibits changed solubility in a developing solution under action of acid and an acid-generator component which generates acid upon exposure, the base component containing a polymer having a structural unit represented by formula (1), and the acid-generator component having an anion represented by formula (2) (in formula (1), Rx represents a hydrogen atom, an alkyl group having 1 to 5 carbon atoms or a halogenated alkyl group having 1 to 5 carbon atoms; Z represents a single bond or an alkyl group having 1 to 5 carbon atoms; Cp is a group represented by formula (Cp-1); in formula (Cp-1), R2 represents a tertiary alkyl group; in formula (2), Ry represents a cyclic hydrocarbon group of 3 to 20 carbon atoms which may have a hetero atom; A represents —O(C?O)— or —(C?)O—; L represents a single bond or a divalent hydrocarbon group containing a hetero atom; each X independently represents H or F; and n represents an integer of 0 to 10).Type: ApplicationFiled: March 23, 2017Publication date: February 28, 2019Inventors: Tsuyoshi NAKAMURA, Kazuishi TANNO, JunYeob LEE
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Publication number: 20180299778Abstract: A resist composition including a base component (A) which exhibits changed solubility in a developing solution under action of acid and an acid-generator component (B) which generates acid upon exposure, the acid-generator component (B) including at least one acid generator (B1) represented by general formula (b1) shown below, at least one acid generator (B2) represented by general formula (b2) shown below, and at least one acid generator (B3) represented by general formula (b3) shown below (wherein IV to R3 each independently represents a cyclic group which may have a substituent, a chain alkyl group, or a chain alkenyl group; Y1 represents a single bond or a divalent linking group containing an oxygen atom; M1+ to M3+ represents a monovalent organic cation; n represents an integer of 1 to 4; m represents an integer of 0 to 4; provided that, when m is 0, the carbon atom adjacent to the sulfur atom within R2 has no fluorine atom bonded thereto).Type: ApplicationFiled: October 13, 2016Publication date: October 18, 2018Applicant: TOKYO OHKA KOGYO CO., LTD.Inventors: Tsuyoshi NAKAMURA, Kazuishi TANNO, JunYeob LEE
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Publication number: 20180224742Abstract: A resist composition which generates an acid through exposure and whose solubility in a developer changes by the action of an acid. The resist composition contains a polymer compound having at least two kinds of specific constituent units. A resist pattern forming method, including forming a resist film on a support using the resist composition, subjecting the resist film to exposure, and forming a resist pattern through patterning by developing the resist film having undergone exposure by using a developer.Type: ApplicationFiled: January 24, 2018Publication date: August 9, 2018Inventors: Tsuyoshi NAKAMURA, Kazuishi TANNO, JunYeob LEE
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Publication number: 20180180997Abstract: A resist composition which generates acid upon exposure and exhibits changed solubility in a developing solution by the action of acid, which includes a polymeric compound having at least two specific structural units.Type: ApplicationFiled: December 20, 2017Publication date: June 28, 2018Inventors: Tsuyoshi NAKAMURA, Kazuishi TANNO, JunYeob LEE
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Patent number: 9529266Abstract: Using a resist composition which exhibits decreased solubility in an organic solvent upon exposure, patterning is conducted by a negative-tone development using a developing solution containing an organic solvent to form a first resist pattern on the substrate, wherein the first resist pattern is composed of a plurality of exposed portions. Then, a pattern reversing composition containing an organic solvent which does not dissolve the first resist pattern is applied to the substrate on which the first resist pattern has been formed, to form a pattern reversing film. Next, the first resist pattern is removed and patterning of the pattern reversing film is conducted by an alkali developing to form a reversed pattern in which the image of the first resist pattern is reversed.Type: GrantFiled: December 22, 2014Date of Patent: December 27, 2016Assignee: TOKYO OHKA KOGYO CO., LTD.Inventors: Tomohiro Oikawa, Kazuishi Tanno
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Patent number: 9274424Abstract: A resist composition which generates an acid upon exposure and exhibits changed solubility in a developing solution by the action of the acid contains a high-molecular weight compound (A1) having a constituent unit (a0) represented by a general formula (a0-1) and a constituent unit (a1-1) including a monocyclic group-containing acid decomposable group whose polarity increases by the action of an acid. In the formula (a0-1), R represents a hydrogen atom, an alkyl group having 1 to 5 carbon atoms, or a halogenated alkyl group having 1 to 5 carbon atoms; Ya01 represents a single bond or a divalent linking group; X01 represents a sulfur atom or an oxygen atom; and Ra01 represents an optionally substituted cyclic group, chain alkyl group, or chain alkenyl group.Type: GrantFiled: March 19, 2014Date of Patent: March 1, 2016Assignee: TOKYO OHKA KOGYO CO., LTD.Inventors: Tsuyoshi Nakamura, Kazuishi Tanno, Naoto Motoike, Junichi Tsuchiya, Yoichi Hori
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Patent number: 9235123Abstract: A resist composition includes a high-molecular weight compound having a constituent unit (a0) represented by a general formula (a0-1), an acid generator component (B) which generates an acid upon exposure, and a photodegradable base (D1) which is decomposed upon exposure to lose acid diffusion controlling properties, and a mixing ratio of the component (D1) to the component (B) is 0.5 or more in terms of a molar ratio represented by (D1)/(B). In the formula (a0-1), R represents a hydrogen atom, an alkyl group having 1 to 5 carbon atoms, or a halogenated alkyl group having 1 to 5 carbon atoms; Ya01 represents a single bond or a divalent linking group; X01 represents a sulfur atom or an oxygen atom; and Ra01 represents an optionally substituted cyclic group, an optionally substituted chain alkyl group, or an optionally substituted chain alkenyl group.Type: GrantFiled: March 18, 2014Date of Patent: January 12, 2016Assignee: TOKYO OHKA KOGYO CO., LTD.Inventors: Tsuyoshi Nakamura, Kazuishi Tanno, Naoto Motoike, Yoshitaka Komuro, Tomoyuki Hirano, Masatoshi Arai
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Publication number: 20150185619Abstract: Using a resist composition which exhibits decreased solubility in an organic solvent upon exposure, patterning is conducted by a negative-tone development using a developing solution containing an organic solvent to form a first resist pattern on the substrate, wherein the first resist pattern is composed of a plurality of exposed portions. Then, a pattern reversing composition containing an organic solvent which does not dissolve the first resist pattern is applied to the substrate on which the first resist pattern has been formed, to form a pattern reversing film. Next, the first resist pattern is removed and patterning of the pattern reversing film is conducted by an alkali developing to form a reversed pattern in which the image of the first resist pattern is reversed.Type: ApplicationFiled: December 22, 2014Publication date: July 2, 2015Inventors: Tomohiro Oikawa, Kazuishi Tanno
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Patent number: 9052592Abstract: A resist composition contains a high-molecular weight compound which has a partial structure represented by a general formula (a0-r-1) and has a constituent unit represented by a general formula (a0-1). In the formula (a0-r-1), Y1 represents a divalent linking group; each of R2 and R3 represents a group having 0 to 20 carbon atoms, which is not a fluorine atom, and either R2 or R3 may form a ring with Y1; m represents an integer of 1 or more; and Mm+ represents an m-valent organic cation. In the formula (a0-1), R represents a hydrogen atom, an alkyl group, or a halogenated alkyl group; Ya01 represents a single bond or a divalent linking group; X01 represents a sulfur atom or an oxygen atom; and Ra01 represents an optionally substituted cyclic group, chain alkyl group or chain alkenyl group.Type: GrantFiled: March 18, 2014Date of Patent: June 9, 2015Assignee: Tokyo Ohka Kogyo Co., Ltd.Inventors: Tsuyoshi Nakamura, Kazuishi Tanno, Akiya Kawaue, Takayoshi Mori
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Publication number: 20140287361Abstract: A resist composition includes a high-molecular weight compound having a constituent unit (a0) represented by a general formula (a0-1), an acid generator component (B) which generates an acid upon exposure, and a photodegradable base (D1) which is decomposed upon exposure to lose acid diffusion controlling properties, and a mixing ratio of the component (D1) to the component (B) is 0.5 or more in terms of a molar ratio represented by (D1)/(B). In the formula (a0-1), R represents a hydrogen atom, an alkyl group having 1 to 5 carbon atoms, or a halogenated alkyl group having 1 to 5 carbon atoms; Ya01 represents a single bond or a divalent linking group; X01 represents a sulfur atom or an oxygen atom; and Ra01 represents an optionally substituted cyclic group, an optionally substituted chain alkyl group, or an optionally substituted chain alkenyl group.Type: ApplicationFiled: March 18, 2014Publication date: September 25, 2014Applicant: Tokyo Ohka Kogyo Co., Ltd.Inventors: Tsuyoshi Nakamura, Kazuishi Tanno, Naoto Motoike, Yoshitaka Komuro, Tomoyuki Hirano, Masatoshi Arai
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Publication number: 20140287362Abstract: A resist composition which generates an acid upon exposure and exhibits changed solubility in a developing solution by the action of the acid contains a high-molecular weight compound (A1) having a constituent unit (a0) represented by a general formula (a0-1) and a constituent unit (a1-1) including a monocyclic group-containing acid decomposable group whose polarity increases by the action of an acid. In the formula (a0-1), R represents a hydrogen atom, an alkyl group having 1 to 5 carbon atoms, or a halogenated alkyl group having 1 to 5 carbon atoms; Ya01 represents a single bond or a divalent linking group; X01 represents a sulfur atom or an oxygen atom; and Ra01 represents an optionally substituted cyclic group, chain alkyl group, or chain alkenyl group.Type: ApplicationFiled: March 19, 2014Publication date: September 25, 2014Applicant: Tokyo Ohka Kogyo Co., Ltd.Inventors: Tsuyoshi Nakamura, Kazuishi Tanno, Naoto Motoike, Junichi Tsuchiya, Yoichi Hori