Patents by Inventor Kazuki Uwada
Kazuki Uwada has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 11618807Abstract: A film is provided with void spaces having a porous structure with less cracks and a high proportion of void space as well as having strength. The film with void spaces includes one kind or two or more kinds of structural units that form a structure with minute void spaces, wherein the structural units are chemically bonded through catalysis. For example, the abrasion resistance measured with BEMCOT® is in the range from 60% to 100%, and the folding endurance measured by the MIT test is 100 times or more. The film with void spaces can be produced by forming the precursor of the silicone porous body using sol containing pulverized products of a gelled silicon compound and then chemically bonding the pulverized products contained in the precursor of the silicone porous body. The chemical bond among the pulverized products is preferably a chemical crosslinking bond among the pulverized products.Type: GrantFiled: December 25, 2015Date of Patent: April 4, 2023Assignee: NITTO DENKO CORPORATIONInventors: Daisuke Hattori, Hiromoto Haruta, Kozo Nakamura, Kazuki Uwada, Hiroyuki Takemoto, Nao Murakami
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Patent number: 10815355Abstract: The present invention provides, for example, a silicone porous body having a porous structure with less cracks and a high proportion of void space as well as having a strength. The silicone porous body of the present invention includes silicon compound microporous particles, wherein the silicon compound microporous particles are chemically bonded by catalysis. For example, the abrasion resistance measured with BEMCOT® is in the range from 60% to 100%, and the folding endurance measured by the MIT test is 100 times or more. The silicone porous body can be produced, for example, by forming the precursor of the silicone porous body using sol containing pulverized products of a gelled silicon compound and then chemically bonding the pulverized products contained in the precursor of the silicone porous body. The chemical bond among the pulverized products is preferably a chemical crosslinking bond among the pulverized products, for example.Type: GrantFiled: July 3, 2019Date of Patent: October 27, 2020Assignee: NITTO DENKO CORPORATIONInventors: Hiromoto Haruta, Kozo Nakamura, Kazuki Uwada, Hiroyuki Takemoto, Nao Murakami, Daisuke Hattori
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Patent number: 10634836Abstract: There is provided a circularly polarizing plate for an organic EL display apparatus that is excellent in productivity, is prevented from warping, and can achieve an excellent tint. An elongated circularly polarizing plate for an organic EL display apparatus according to an embodiment of the present invention includes in the following order: an elongated polarizer having an absorption axis in a longitudinal direction thereof; an elongated first retardation layer functioning as a ?/2 plate; and an elongated second retardation layer functioning as a ?/4 plate. An angle formed between the absorption axis of the elongated polarizer and a slow axis of the elongated first retardation layer is front 15° to 30°; and the absorption axis of the elongated polarizer and a slow axis of the elongated second retardation layer are substantially perpendicular to each other.Type: GrantFiled: April 28, 2015Date of Patent: April 28, 2020Assignee: NITTO DENKO CORPORATIONInventors: Kentarou Takeda, Hironori Yaginuma, Kazuki Uwada, Tadashi Kojima, Nao Murakami
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Patent number: 10472483Abstract: The present invention provides, for example, a silicone porous body having a porous structure with less cracks and a high proportion of void space as well as having a strength. The silicone porous body of the present invention includes silicon compound microporous particles, wherein the silicon compound microporous particles are chemically bonded by catalysis. For example, the abrasion resistance measured with BEMCOT® is in the range from 60% to 100%, and the folding endurance measured by the MIT test is 100 times or more. The silicone porous body can be produced, for example, by forming the precursor of the silicone porous body using sol containing pulverized products of a gelled silicon compound and then chemically bonding the pulverized products contained in the precursor of the silicone porous body. The chemical bond among the pulverized products is preferably a chemical crosslinking bond among the pulverized products, for example.Type: GrantFiled: December 25, 2015Date of Patent: November 12, 2019Assignee: NITTO DENKO CORPORATIONInventors: Hiromoto Haruta, Kozo Nakamura, Kazuki Uwada, Hiroyuki Takemoto, Nao Murakami, Daisuke Hattori
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Publication number: 20190330438Abstract: The present invention provides, for example, a silicone porous body having a porous structure with less cracks and a high proportion of void space as well as having a strength. The silicone porous body of the present invention includes silicon compound microporous particles, wherein the silicon compound microporous particles are chemically bonded by catalysis. For example, the abrasion resistance measured with BEMCOT® is in the range from 60% to 100%, and the folding endurance measured by the MIT test is 100 times or more. The silicone porous body can be produced, for example, by forming the precursor of the silicone porous body using sol containing pulverized products of a gelled silicon compound and then chemically bonding the pulverized products contained in the precursor of the silicone porous body. The chemical bond among the pulverized products is preferably a chemical crosslinking bond among the pulverized products, for example.Type: ApplicationFiled: July 3, 2019Publication date: October 31, 2019Applicant: NITTO DENKO CORPORATIONInventors: Hiromoto Haruta, Kozo Nakamura, Kazuki Uwada, Hiroyuki Takemoto, Nao Murakami, Daisuke Hattori
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Patent number: 10435531Abstract: The present invention provides, for example, a silicone porous body having a porous structure with less cracks and a high proportion of void space as well as having a strength. The silicone porous body of the present invention includes silicon compound microporous particles, wherein the silicon compound microporous particles are chemically bonded by catalysis. For example, the abrasion resistance measured with BEMCOT® is in the range from 60% to 100%, and the folding endurance measured by the MIT test is 100 times or more. The silicone porous body can be produced, for example, by forming the precursor of the silicone porous body using sol containing pulverized products of a gelled silicon compound and then chemically bonding the pulverized products contained in the precursor of the silicone porous body. The chemical bond among the pulverized products is preferably a chemical crosslinking bond among the pulverized products, for example.Type: GrantFiled: December 25, 2015Date of Patent: October 8, 2019Assignee: NITTO DENKO CORPORATIONInventors: Hiromoto Haruta, Kozo Nakamura, Kazuki Uwada, Hiroyuki Takemoto, Nao Murakami, Daisuke Hattori
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Patent number: 10385179Abstract: The present invention provides, for example, a silicone porous body having a porous structure with less cracks and a high proportion of void space as well as having a strength. The silicone porous body of the present invention includes silicon compound microporous particles, wherein the silicon compound microporous particles are chemically bonded by catalysis. For example, the abrasion resistance measured with BEMCOT® is in the range from 60% to 100%, and the folding endurance measured by the MIT test is 100 times or more. The silicone porous body can be produced, for example, by forming the precursor of the silicone porous body using sol containing pulverized products of a gelled silicon compound and then chemically bonding the pulverized products contained in the precursor of the silicone porous body. The chemical bond among the pulverized products is preferably a chemical crosslinking bond among the pulverized products, for example.Type: GrantFiled: December 25, 2015Date of Patent: August 20, 2019Assignee: NITTO DENKO CORPORATIONInventors: Hiromoto Haruta, Kozo Nakamura, Kazuki Uwada, Hiroyuki Takemoto, Nao Murakami, Daisuke Hattori
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Publication number: 20180002508Abstract: A film is provided with void spaces having a porous structure with less cracks and a high proportion of void space as well as having strength. The film with void spaces includes one kind or two or more kinds of structural units that form a structure with minute void spaces, wherein the structural units are chemically bonded through catalysis. For example, the abrasion resistance measured with BEMCOT® is in the range from 60% to 100%, and the folding endurance measured by the MIT test is 100 times or more. The film with void spaces can be produced by forming the precursor of the silicone porous body using sol containing pulverized products of a gelled silicon compound and then chemically bonding the pulverized products contained in the precursor of the silicone porous body. The chemical bond among the pulverized products is preferably a chemical crosslinking bond among the pulverized products.Type: ApplicationFiled: December 25, 2015Publication date: January 4, 2018Applicant: NITTO DENKO CORPORATIONInventors: Daisuke Hattori, Hiromoto Haruta, Kozo Nakamura, Kazuki Uwada, Hiroyuki Takemoto, Nao Murakami
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Publication number: 20170342232Abstract: The present invention provides, for example, a silicone porous body having a porous structure with less cracks and a high proportion of void space as well as having a strength. The silicone porous body of the present invention includes silicon compound microporous particles, wherein the silicon compound microporous particles are chemically bonded by catalysis. For example, the abrasion resistance measured with BEMCOT® is in the range from 60% to 100%, and the folding endurance measured by the MIT test is 100 times or more. The silicone porous body can be produced, for example, by forming the precursor of the silicone porous body using sol containing pulverized products of a gelled silicon compound and then chemically bonding the pulverized products contained in the precursor of the silicone porous body. The chemical bond among the pulverized products is preferably a chemical crosslinking bond among the pulverized products, for example.Type: ApplicationFiled: December 25, 2015Publication date: November 30, 2017Applicant: Nitto Denko CorporationInventors: Hiromoto Haruta, Kozo Nakamura, Kazuki Uwada, Hiroyuki Takemoto, Nao Murakami, Daisuke Hattori
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Patent number: 9627655Abstract: There is provided a display apparatus that can suppress the occurrence of a crack in a circularly polarizing plate in its manufacturing process without reducing designability and mass productivity. A display apparatus according to an embodiment of the present invention includes: a display element; and a circularly polarizing plate placed on a viewer side of the display element. The circularly polarizing plate includes a polarizer and a retardation film. In-plane retardations of the retardation film satisfy a relationship represented by the below-indicated expression (1); and an angle ?1 formed between a slow axis of the retardation film and a direction in which a wiring crimping portion provided along at least one side of a peripheral edge portion of the display element extends satisfies a relationship represented by the below-indicated expression (2): Re(450)<Re(550)??(1) ?1?70°??(2) where Re(450) and Re(550) represent in-plane retardations measured at 23° C.Type: GrantFiled: July 4, 2013Date of Patent: April 18, 2017Assignee: NITTO DENKO CORPORATIONInventors: Hironori Yaginuma, Kentarou Takeda, Takashi Shimizu, Kazuki Uwada, Nao Murakami
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Publication number: 20170052300Abstract: There is provided a circularly polarizing plate for an organic EL display apparatus that is excellent in productivity, is prevented from warping, and can achieve an excellent tint. An elongated circularly polarizing plate for an organic EL display apparatus according to an embodiment of the present invention includes in the following order: an elongated polarizer having an absorption axis in a longitudinal direction thereof; an elongated first retardation layer functioning as a ?/2 plate; and an elongated second retardation layer functioning as a ?/4 plate. An angle formed between the absorption axis of the elongated polarizer and a slow axis of the elongated first retardation layer is front 15° to 30°; and the absorption axis of the elongated polarizer and a slow axis of the elongated second retardation layer are substantially perpendicular to each other.Type: ApplicationFiled: April 28, 2015Publication date: February 23, 2017Applicant: NITTO DENKO CORPORATIONInventors: Kentarou Takeda, Hironori Yaginuma, Kazuki Uwada, Tadashi Kojima, Nao Murakami
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Patent number: 9459389Abstract: There is provided a polarizing plate that achieves an excellent reflection hue. A polarizing plate according to an embodiment of the present invention is used in an organic EL panel, and includes a polarizer and a retardation film. In-plane retardations of the retardation film satisfy a relationship of Re(450)<Re(550); and an angle ? formed between an absorption axis of the polarizer and a slow axis of the retardation film satisfies a relationship of 38°???44° or of 46°???52°.Type: GrantFiled: June 24, 2013Date of Patent: October 4, 2016Assignee: NITTO DENKO CORPORATIONInventors: Takashi Shimizu, Nao Murakami, Kazuki Uwada, Tadashi Kojima, Hironori Yaginuma
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Patent number: 9453951Abstract: The present invention provides a retardation film web having sufficient reversed wavelength dispersion characteristics and favorable for film lamination according to a roll-to-roll system. A retardation film web of the present invention includes a polycarbonate resin or a polyester carbonate resin, an orientation angle ? which is an angle between a slow axis and a width direction satisfies the following formula (I), and a ratio of an in-plane retardation R450 measured at a wavelength of 450 nm to an in-plane retardation R550 measured at a wavelength of 550 nm satisfies the following formula (II): 38°???52°??(I) R450/R550<1??(II).Type: GrantFiled: March 28, 2013Date of Patent: September 27, 2016Assignees: NITTO DENKO CORPORATION, MITSUBISHI CHEMICAL CORPORATIONInventors: Takashi Shimizu, Kazuki Uwada, Tadashi Kojima, Nao Murakami, Tomohiko Tanaka, Shingo Namiki
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Patent number: 9417369Abstract: The present invention provides a retardation film web having sufficient reversed wavelength dispersion characteristics and favorable for film lamination according to a roll-to-roll system. A retardation film web of the present invention includes a polycarbonate resin or a polyester carbonate resin, an orientation angle ? which is an angle between a slow axis and a width direction satisfies the following formula (I), and a ratio of an in-plane retardation R450 measured at a wavelength of 450 nm to an in-plane retardation R550 measured at a wavelength of 550 nm satisfies the following formula (II): 38°???52°??(I) R450/R550<1??(II).Type: GrantFiled: March 28, 2013Date of Patent: August 16, 2016Assignees: NITTO DENKO CORPORATION, MITSUBISHI CHEMICAL CORPORATIONInventors: Takashi Shimizu, Kazuki Uwada, Tadashi Kojima, Nao Murakami, Tomohiko Tanaka, Shingo Namiki
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Patent number: 9400345Abstract: There is provided a circularly polarizing plate that can prevent light leakage in an organic EL panel and can suppress the warping of the panel to reduce reflection unevenness in a panel surface. A circularly polarizing plate according to an embodiment of the present invention is used in an organic EL panel, and includes a polarizer and a retardation film directly bonded to the polarizer. In-plane retardations of the retardation film satisfy a relationship of Re(450)<Re(550); and a 90° adhesive strength between the polarizer and the retardation film is 1.0 N/20 mm or more.Type: GrantFiled: June 24, 2013Date of Patent: July 26, 2016Assignee: NITTO DENKO CORPORATIONInventors: Toshiyuki Iida, Takashi Shimizu, Nao Murakami, Kazuki Uwada, Tadashi Kojima
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Patent number: 9164213Abstract: Provided is a polarizing plate that has an excellent viewing angle characteristic and suppresses changes in display characteristics. A polarizing plate of the present invention is used in an organic EL panel, and includes a polarizer (10), a first retardation layer (30), and a second retardation layer (40). The first retardation layer (30) shows a refractive index characteristic of nx>ny?nz, satisfies a relationship of Re(450)<Re(550), and has a water absorption rate of 3% or less. The second retardation layer (40) shows a refractive index characteristic of nz>nx?ny. A laminate of the first retardation layer (30) and the second retardation layer (40) has an Re(550) of from 120 nm to 160 nm and an Rth(550) of from 40 nm to 100 nm.Type: GrantFiled: June 18, 2013Date of Patent: October 20, 2015Assignee: NITTO DENKO CORPORATIONInventors: Hironori Yaginuma, Takashi Shimizu, Kazuki Uwada, Nao Murakami, Tadashi Kojima, Kentarou Takeda
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Publication number: 20150277012Abstract: Provided is an optical member that can realize a liquid crystal display apparatus that is excellent in mechanical strength and suppressed in color shift. The optical member includes: a polarizing plate; a reflective polarizer; a low refractive index layer having a selected refractive index; and a prism sheet.Type: ApplicationFiled: March 27, 2015Publication date: October 1, 2015Applicant: NITTO DENKO CORPORATIONInventors: Kozo Nakamura, Kazuki Uwada, Hiromoto Haruta, Takehito Fuchida, Hiroyuki Takemoto, Nao Murakami, Daisuke Hattori
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Publication number: 20150277011Abstract: Provided is an optical member that can realize a liquid crystal display apparatus that is excellent in mechanical strength and provides sufficient brightness. The optical member includes: a polarizing plate; a low refractive index layer having a selected refractive index; and a prism sheet.Type: ApplicationFiled: March 27, 2015Publication date: October 1, 2015Applicant: NITTO DENKO CORPORATIONInventors: Kozo Nakamura, Kazuki Uwada, Hiromoto Haruta, Takehito Fuchida, Hiroyuki Takemoto, Nao Murakami, Daisuke Hattori
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Publication number: 20150249231Abstract: There is provided a display apparatus that can suppress the occurrence of a crack in a circularly polarizing plate in its manufacturing process without reducing designability and mass productivity. A display apparatus according to an embodiment of the present invention includes: a display element; and a circularly polarizing plate placed on a viewer side of the display element. The circularly polarizing plate includes a polarizer and a retardation film. In-plane retardations of the retardation film satisfy a relationship represented by the below-indicated expression (1); and an angle ?1 formed between a slow axis of the retardation film and a direction in which a wiring crimping portion provided along at least one side of a peripheral edge portion of the display element extends satisfies a relationship represented by the below-indicated expression (2): Re(450)<Re(550)??(1) ?1?70°??(2) where Re(450) and Re(550) represent in-plane retardations measured at 23° C.Type: ApplicationFiled: July 4, 2013Publication date: September 3, 2015Applicant: NITTO DENKO CORPORATIONInventors: Hironori Yaginuma, Kentarou Takeda, Takashi Shimizu, Kazuki Uwada, Nao Murakami
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Publication number: 20150168624Abstract: Provided is a polarizing plate that has an excellent viewing angle characteristic and suppresses changes in display characteristics. A polarizing plate of the present invention is used in an organic EL panel, and includes a polarizer (10), a first retardation layer (30), and a second retardation layer (40). The first retardation layer (30) shows a refractive index characteristic of nx>ny?nz, satisfies a relationship of Re(450)<Re(550), and has a water absorption rate of 3% or less. The second retardation layer (40) shows a refractive index characteristic of nz>nx?ny. A laminate of the first retardation layer (30) and the second retardation layer (40) has an Re(550) of from 120 nm to 160 nm and an Rth(550) of from 40 nm to 100 nm.Type: ApplicationFiled: June 18, 2013Publication date: June 18, 2015Applicant: NITTO DENKO CORPORATIONInventors: Hironori Yaginuma, Takashi Shimizu, Kazuki Uwada, Nao Murakami, Tadashi Kojima, Kentarou Takeda