Patents by Inventor Kazuki Yoshiura

Kazuki Yoshiura has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20240116075
    Abstract: A selective film deposition method includes exposing a substrate having a structure on which a first surface region containing a metal element and a second surface region containing a nonmetal inorganic material are both exposed, to a solution containing an organic substance represented by formula (1) shown below and a solvent to deposit a film of the organic substance on the first surface region selectively over the second surface region: R1(X)m (1) wherein R1 is a C4-C100 hydrocarbon group optionally containing a heteroatom or a halogen atom, and m hydrogen atoms of the hydrocarbon group are replaced with X; X is —PO3(R2)2, —O—PO3(R2)2, —CO2R2, —SR2, or —SSR1; each R2 is a hydrogen atom or a C1-C6 alkyl group; and m is a positive integer, and m/r is 0.01 to 0.25 where r is the number of carbons of the hydrocarbon group.
    Type: Application
    Filed: January 28, 2022
    Publication date: April 11, 2024
    Applicant: CENTRAL GLASS COMPANY, LIMITED
    Inventors: Takuya OKADA, Junki YAMAMOTO, Takahisa TANIGUCHI, Kazuki YOSHIURA, Katsuya KONDO, Soichi KUMON, Tatsuo MIYAZAKI
  • Publication number: 20230374669
    Abstract: The present disclosure provides a wet etching method including pretreating a metal-containing film on a substrate with a surface modification liquid and etching the metal-containing film with an etching liquid, wherein the etching liquid is a solution containing: a ?-diketone with a trifluoromethyl group bonded to a carbonyl group; and an organic solvent, wherein the metal-containing film contains a metal element capable of forming a complex with the ?-diketone, wherein the surface modification liquid contains an acidic substance against the metal element, and wherein the wet etching method is carried out through: a first step of bringing the surface modification liquid into contact with the metal-containing film, thereby forming an oxide layer of the metal element at a surface of the metal-containing film; and a second step of bringing the etching liquid into contact with the metal-containing film on which the oxide layer has been formed.
    Type: Application
    Filed: October 11, 2021
    Publication date: November 23, 2023
    Inventors: Kazuki YOSHIURA, Takuya OKADA, Kenta WATANABE, Soichi KUMON, Yosuke NAKAMURA, Takahisa TANIGUCHI
  • Patent number: 6674541
    Abstract: A method for transmitting facsimile data between facsimile apparatuses each connected to a relay apparatus, and relay apparatuses being connected each other through an internet protocol network, includes steps of: performing an address conversion from a telephone number of a facsimile apparatus of the reception side to an IP address corresponding to the telephone number; transmitting a request for TCP connection to a relay apparatus corresponding to a destination of the IP address when receiving an identifying signal which indicates transmission of the facsimile data from the facsimile apparatus of the sending side; and transmitting the facsimile data to the relay apparatus corresponding to the destination of the IP address based on the TCP connection.
    Type: Grant
    Filed: December 27, 1999
    Date of Patent: January 6, 2004
    Assignee: Fujitsu Limited
    Inventors: Hideki Kamiyama, Kazuki Yoshiura, Katsuo Gomi, Hiroaki Hamano, Ryoichi Doi