Abstract: The present invention provides a solid-state imaging device comprising: a transparent substrate transmitting light therethrough; a first chip including a solid-state imaging element having a light receiving portion; a first resin providing airtight sealing between the first chip and the transparent substrate; a second chip opposite to the transparent substrate with respect to the first chip; and second resin die bonding the second chip to the first chip, wherein the first resin and the second resin are made of the same material.

Abstract: The present invention provides a solid-state imaging device comprising: a transparent substrate transmitting light therethrough; a first chip including a solid-state imaging element having a light receiving portion; a first resin providing airtight sealing between the first chip and the transparent substrate; a second chip opposite to the transparent substrate with respect to the first chip; and second resin die bonding the second chip to the first chip, wherein the first resin and the second resin are made of the same material.

Abstract: A transparent optical device is provided with a transparent medium having a front side, at least a portion of the front side being adapted for receiving light. A porous layer is formed on substantially all areas of the front side which are adapted for receiving light. The transparent optical device may have a recessed surface area which is recessed below a remainder area of the front side to define a phase shift photomask. The transparent medium may be made of synthesized silica. The porous layer may be formed by reactive ion etching using gaseous plasma of halogenized hydrocarbon. The front side of the transparent medium may have a portion not adapted for receiving light which may have a metal pattern formed thereon. In producing the transparent optical mask, the porous layer may be formed before or after the metal pattern. The transparent optical device may be formed in an etching chamber in which etching depth is monitored by measuring the transmissivity of a preselected portion of the transparent medium.

Abstract: A method for manufacturing a phase shift mask of the invention comprises a process of protecting a side wall of an opening in a light-damping film by means of a resist and then etching the light-damping film to be so thin as a halftone film.

Abstract: An antenna system having a multiple of antenna feeds to drive a microwave ns, composed primarily of a Luneberg lens and a metallic ground plane upon which are mounted three antenna feeds and a shorted stub (or four bent-stub coaxial feeds). The antenna system uses a common aperture to provide antenna performance for the three separate feeds, conserving space that would normally be required for three separate high gain antennas.

Abstract: A programmable microwave modulator for controlling the amplitude of a micave signal versus time. A programmed driver generates a linear analog signal that has a predetermined amplitude pattern and time period. The linear analog signal from the programmable driver passes through a linearized current driver before inputting a PIN attenuator. The linearized current driver takes the antilogarithm of the linear analog signal, thus compensating for the logarithmic nonlinearity of the PIN attenuator. A radio frequency signal from a receiving antenna inputs the PIN attenuator and is attenuated as a function of the amplitude pattern of the linear analog signal. The PIN attenuator outputs the attenuated radio frequency signal.