Abstract: Disclosed is a vapor source assembly comprising a means for supporting at least one material to be vaporized, a plurality of electron-beam guns for producing electron beams, and a deflecting means for producing a magnetic field to deflect each electron beam through an arcuate path from its electron-beam gun to the material to be vaporized. The deflecting means includes a plurality of pairs of pole pieces positioned such that a north pole piece and a south pole piece, are on opposite sides of each electron-beam gun, and a plurality of magnetic means including magnets for interconnecting the south pole piece of each successive electron-beam gun with the north pole piece of the next successive electron-beam gun so as to form a single magnetic circuit. In preferred embodiments, the electron-beam guns are positioned below the maximum level of material in a cluster of crucibles, and two long pole pieces extend on opposite sides of the crucibles, but no pole piece extends between adjacent crucibles.

Abstract: An electron-beam apparatus for evaporating material is disclosed. The apparatus comprises a rotatable hearth on which the evaporant material can be placed and an electron-beam source which can be energized to evaporate the material. The apparatus is compact and durable because the electron beam source occupies a protected location which is closer to the rotational axis than is the hearth.

Abstract: A method and apparatus for coating a substrate with a layer of polymerized material by simultaneous glow discharge polymerization and sputtering is disclosed. A substrate and two electrodes are placed in a chamber which can be evacuated. An appropriate pressure of a gas which can form a polymer is introduced into the chamber. A glow discharge is established in the gas. Molecules of starting gas and reactive species created in the glow discharge deposit on the electrodes and on the substrate. Material deposited on at least one of the electrodes is sputtered onto the substrate by applying an electric potential, preferably an AC potential, across the electrodes. The glow discharge is preferably confined to a region adjacent to the sputtered electrode. This confinement may be accomplished by the use of a planar magnetron sputtering cathode. The method and apparatus disclosed allow the rapid deposition of high quality polymeric coatings at low gas pressures.