Patents by Inventor Kazunari Kaga

Kazunari Kaga has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20230382741
    Abstract: A method for removing an oxygen molecule from a carbon-monoxide-containing gas which includes removing water from a platinum catalyst by heat treating the platinum catalyst in a heat treatment vessel until the concentration of water contained in inert gas discharged from the heat treatment vessel after being supplied to the heat treatment vessel and used in the heat treatment is less than 1000 vol ppm; and bringing the carbon-monoxide-containing gas into contact with the platinum catalyst to remove an oxygen molecule from the carbon-monoxide-containing gas. Also disclosed is a step of removing carbon dioxide from gas after removing an oxygen molecule using a carbon dioxide adsorbent, as well as a pressure swing adsorption step of recovering carbon monoxide from gas after removing carbon dioxide by a pressure swing adsorption method, to obtain purified carbon monoxide having a purity of 99.95 vol % or more.
    Type: Application
    Filed: October 6, 2021
    Publication date: November 30, 2023
    Applicant: Resonac Corporation
    Inventors: Daichi KAWAUCHI, Jun DOU, Kazunari KAGA
  • Patent number: 8003832
    Abstract: The process for recovering pentafluoroethane of the invention includes bringing a mixed gas containing pentafluoroethane and a non-condensable gas into contact with a chlorinated solvent, and allowing the chlorinated solvent to absorb pentafluoroethane contained in the mixed gas. The process for the production of pentafluoroethane of the invention uses the recovering process.
    Type: Grant
    Filed: July 27, 2006
    Date of Patent: August 23, 2011
    Assignee: Showa Denko K.K.
    Inventors: Kazunari Kaga, Hiromoto Ohno
  • Publication number: 20100286456
    Abstract: The process for recovering pentafluoroethane of the invention includes bringing a mixed gas containing pentafluoroethane and a non-condensable gas into contact with a chlorinated solvent, and allowing the chlorinated solvent to absorb pentafluoroethane contained in the mixed gas. The process for the production of pentafluoroethane of the invention uses the recovering process.
    Type: Application
    Filed: July 27, 2006
    Publication date: November 11, 2010
    Applicant: SHOWA DENKO K.K.
    Inventor: Kazunari KAGA
  • Patent number: 7179653
    Abstract: The present invention provided a method for measuring a halogen gas and/or a hydrofluorocarbon for the purpose of controlling the concentration of the halogen gas and/or the hydrofluorocarbon, in a plant producing a halogen compound or a perfluorocarbon, at a predetermined concentration level quickly, easily, and precisely for the control. The present invention provides also a measurement apparatus for the above measurement which has a compact structure, and in which the parts are exchangeable quickly and readily. The present invention provides further a process for producing a halogen compound or a perfluorocarbon employing the measurement method and the measurement apparatus. In particular, the present invention intends to provide a method for measuring safely and quickly a hydrofluorocarbon concentration in a mixed gas stream in a process of producing a perfluorocarbon by direct fluorination reaction of a hydrofluorocarbon and F2.
    Type: Grant
    Filed: April 2, 2001
    Date of Patent: February 20, 2007
    Assignee: Showa Denko K.K.
    Inventors: Hiromoto Ohno, Toshio Ohi, Kazunari Kaga, Ryuichi Tachi, Itsuaki Matsuda
  • Patent number: 7074974
    Abstract: A process comprising fluorinating tetrachloroethylene to obtain a crude pentafluoroethane containing impurities and bringing the crude pentafluoroethane containing impurities into contact with oxygen and/or an oxygen-containing compound in the presence of a catalyst. There can be obtained high-purity pentafluoroethane which can be used as a low-temperature refrigerant or an etching gas or as a starting material for the production of high-purity hexafluoroethane.
    Type: Grant
    Filed: July 27, 2004
    Date of Patent: July 11, 2006
    Assignee: Showa Denko K.K.
    Inventors: Kazunari Kaga, Hiromoto Ohno, Toshio Ohi
  • Publication number: 20050065385
    Abstract: A process comprising fluorinating tetrachloroethylene to obtain a crude pentafluoroethane containing impurities and bringing the crude pentafluoroethane containing impurities into contact with oxygen and/or an oxygen-containing compound in the presence of a catalyst. There can be obtained high-purity pentafluoroethane which can be used as a low-temperature refrigerant or an etching gas or as a starting material for the production of high-purity hexafluoroethane.
    Type: Application
    Filed: July 27, 2004
    Publication date: March 24, 2005
    Inventors: Kazunari Kaga, Hiromoto Ohno, Toshio Ohi
  • Publication number: 20040242943
    Abstract: A high-purity pentafluoroethane is produced through a process comprising (1) a step of fluorinating tetrachloroethylene to obtain a crude pentafluoroethane containing impurities and (2) a step of bringing the crude pentafluoroethane containing impurities into contact with oxygen and/or an oxygen-containing compound in the presence of a catalyst.
    Type: Application
    Filed: November 10, 2003
    Publication date: December 2, 2004
    Inventors: Kazunari Kaga, Hiromoto Ohno, Toshio Ohi
  • Publication number: 20020183568
    Abstract: The present invention intends to provide a process for producing CF3CF3 with good profitability using CF3CHF2 containing a compound having chlorine atom within the molecule, and use thereof.
    Type: Application
    Filed: January 14, 2002
    Publication date: December 5, 2002
    Inventors: Hiromoto Ohno, Kazunari Kaga, Toshio Ohi
  • Patent number: 6489523
    Abstract: The present invention intends to provide a process for producing CF3CF3 with good profitability using CF3CHF2 containing a compound having chlorine atom within the molecule, and use thereof. In the process of the present invention, a gas mixture containing CF3CHF2 and a compound having chlorine atom within the molecule is reacted with hydrogen fluoride in the presence of a fluorination catalyst, thereby converting CClF2CF3 as a main impurity into CF3CF3, and CF3CHF2 containing CF3CF3 is reacted with fluorine gas in the gaseous phase in the presence of a diluting gas.
    Type: Grant
    Filed: January 14, 2002
    Date of Patent: December 3, 2002
    Assignee: Showa Denko K.K.
    Inventors: Hiromoto Ohno, Kazunari Kaga, Toshio Ohi
  • Publication number: 20020051132
    Abstract: The present invention provided a method for measuring a halogen gas and/or a hydrofluorocarbon for the purpose of controlling the concentration of the halogen gas and/or the hydrofluorocarbon, in a plant producing a halogen compound or a perfluorocarbon, at a predetermined concentration level quickly, easily, and precisely for the control. The present invention provides also a measurement apparatus for the above measurement which has a compact structure, and in which the parts are exchangeable quickly and readily. The present invention provides further a process for producing a halogen compound or a perfluorocarbon employing the measurement method and the measurement apparatus.
    Type: Application
    Filed: April 2, 2001
    Publication date: May 2, 2002
    Inventors: Hiromoto Ohno, Toshio Ohi, Kazunari Kaga, Ryuichi Tachi, Itsuaki Matsuda