Abstract: A direct exposure apparatus having a light source for projecting light onto an exposure target or, more specifically, an exposure target substrate, comprises: measuring means for measuring the illuminance distribution of light on an area corresponding to the exposure surface of the exposure target substrate; and control means for controlling, based on the measurement result supplied from the measuring means, the light source so that the intended illuminance distribution can be obtained.

Abstract: An exposure apparatus, in which exposure data necessary for direct exposure is sequentially supplied to an exposure engine having a plurality of exposure devices and, based on the thus supplied exposure data, the exposure engine forms an exposure pattern on an exposure target substrate moving relative to the exposure engine, comprising: data supplying means for supplying the same exposure data to each of a plurality of exposure device groups formed by dividing the plurality of exposure devices in the exposure engine into groups; and optics via which lights respectively produced from the exposure device groups based on the exposure data supplied from the data supplying means are projected so as to be superimposed one on top of another on the same area on the exposure target substrate.

Abstract: A license management system for software which drives a single computer or a plurality of computers includes: an application program for requesting a decision of the number of license which it needs to drive itself and for receiving issuance of the license; a number of license decision unit for determining the necessary number of licenses in accordance with the request from the application program; and a license management unit for issuing the number of licenses which was determined by the number of license decision unit. Further, the number of license decision unit has means for determining the number of licenses based on the following multi-nominal function, LK=f (x1, x2, . . . , xn), where, LK is the number of licenses, and x1 to xn are parameters which are needed to determine the number of licenses. According to the present invention, it is possible to provide a license management system enabling issuance of a license in which the sales strategy of a software maker was considered.

Abstract: A drawing apparatus, for forming a desired drawing pattern by drawing the pattern directly on a drawing target surface using a drawing engine equipped with a plurality of drawing devices arranged along a direction of relative movement of the drawing target surface, the drawing engine being designed so that the design spacing of the thus arranged drawing devices is equal to a product of a unit pixel spacing in drawing data and an integer, comprises: correcting means for generating corrected drawing data by correcting the drawing data based on the difference between the design spacing and the actual spacing of the drawing devices; and supplying means for supplying the drawing engine with the corrected drawing data just necessary for direct drawing to a drawing block that the drawing engine can draw at a time on the drawing target surface, each time the drawing target substrate moves in relative fashion by a distance corresponding to an actual pixel spacing that is obtained by dividing the actual spacing of the

Abstract: A drawing apparatus in which drawing data, which is required to perform a drawing operation on drawing blocks on a surface that can be drawn at one time by drawing heads moving relatively to said drawn surface, is sequentially generated based on design data and temporarily stored in a memory and, then, sequentially supplied to drawing engines comprises computing means for computing drawing start instruction data to start the relative movement and the drawing operation of the drawing heads after a delay from the start of production of the drawing data so that at least the drawing data is stored in the memory.

Abstract: A direct exposure system comprises: a data mask that is a data object including drawing data; and a control mask that is a data object including at least one logical layer in which information about exposure conditions applied according to regions on a substrate is specified, and performs a direct exposure process using integrated data generated by combining the data mask with the control mask.

Abstract: An exposing apparatus for irradiating desired spots on a substrate to be exposed relatively moving with respect to two or more light sources arranged along the direction of the relative movement to form a desired exposure pattern using the light sources comprises a control means for controlling the turning-on of only specific light sources out of the two or more light sources at a specific timing.

Abstract: A pattern drawing apparatus for forming patterns, that have a mirror image relationship to each other with respect to a substrate, on both sides of the substrate forms the patterns on both sides of the substrate by drawing the patterns directly on both sides of the substrate in accordance with prescribed data by using a direct drawing means such as a maskless exposure means or an inkjet patterning means.

Abstract: An apparatus 1 for fabricating a component-embedded board according to the present invention comprises: a detecting unit 11 for detecting, before the board 21 is covered with an insulating layer 23, the actual position of an electronic component 22 formed on the surface of the board 21; a holding unit 12 for calculating a displacement between the design position of the electronic component 22 and the actual position of the electronic component 22 on the surface of the board 21, and for holding the displacement as displacement data; and a correcting unit 13 for correcting, based on the displacement data, design data to be used for processing the board 21 after the board 21 is covered with the insulating layer 23.

Abstract: A wiring forming system comprises: maskless exposure unit which directly exposes an unexposed board by using exposure data generated based on design data relating to an wiring board; post-development inspect unit which tests the board after development, by using the exposure data and the image data of the board exposed and developed by the maskless exposure unit; etching unit which etches the developed board; and post-etching inspect unit which tests an etching pattern formed on the etched board, by using etching inspect data generated based on the design data and the image data of the board etched by the etching unit.

Abstract: An optical exposure method and a device are used for forming patterns on a printed board wiring or semiconductor board. A single exposing region of a surface to be exposed is irradiated with a plurality of optical beams having different irradiating areas and different scanning speeds, such as, a peripheral area is irradiated with an optical beam having a smaller irradiating area and an inner area is irradiated with an optical beam having a larger irradiating area.

Abstract: The present invention provides a method of data processing for calculating and storing in a memory to deform a data structure of layout designing data in which cells having geometry information and also having reference information to refer to geometry information of another cell are hierarchically combined with each other.

Abstract: A semiconductor device drive circuit is provided for turning on and off a semiconductor device that comprises a main static induction transistor and a sense static induction transistor. The drive circuit comprisees a first current source having one terminal connected to a power supply and its other terminal connected to said main static induction transistor, a second current source having one terminal connected to the power supply and its other terminal connected to said sense static induction transistor, a third current source having terminal connected to the power supply and its other terminal connected to the first current source, and a fourth current source having one terminal connected to the power supply and its other terminal connected to the second current source.