Patents by Inventor Kazunari Shinya
Kazunari Shinya has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 8342907Abstract: A polishing state monitoring apparatus measures characteristic values of a surface, being polished, of a workpiece to determine the timing of a polishing end point. The polishing state monitoring apparatus includes a light-emitting unit for applying light from a light source to a surface of a workpiece being polished, a light-receiving unit for receiving reflected light from the surface of the workpiece, a spectroscope unit for dividing the reflected light received by the light-receiving unit into a plurality of light rays having respective wavelengths, and light-receiving elements for accumulating the detected light rays as electrical information.Type: GrantFiled: November 30, 2009Date of Patent: January 1, 2013Assignees: Ebara Corporation, Shimadzu CorporationInventors: Yoichi Kobayashi, Shunsuke Nakai, Hitoshi Tsuji, Yasuo Tsukuda, Junki Ishimoto, Kazunari Shinya
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Publication number: 20100075576Abstract: A polishing state monitoring apparatus measures characteristic values of a surface, being polished, of a workpiece to determine the timing of a polishing end point. The polishing state monitoring apparatus includes a light-emitting unit for applying light from a light source to a surface of a workpiece being polished, a light-receiving unit for receiving reflected light from the surface of the workpiece, a spectroscope unit for dividing the reflected light received by the light-receiving unit into a plurality of light rays having respective wavelengths, and light-receiving elements for accumulating the detected light rays as electrical information.Type: ApplicationFiled: November 30, 2009Publication date: March 25, 2010Inventors: Yoichi KOBAYASHI, Shunsuke NAKAI, Hitoshi TSUJI, Yasuo TSUKUDA, Junki ISHIMOTO, Kazunari SHINYA
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Patent number: 7645181Abstract: A polishing state monitoring apparatus measures characteristic values of a surface, being polished, of a workpiece to determine the timing of a polishing end point. The polishing state monitoring apparatus includes a light-emitting unit for applying light from a light source to a surface of a workpiece being polished, a light-receiving unit for receiving reflected light from the surface of the workpiece, a spectroscope unit for dividing the reflected light received by the light-receiving unit into a plurality of light rays having respective wavelengths, and light-receiving elements for accumulating the detected light rays as electrical information.Type: GrantFiled: August 27, 2008Date of Patent: January 12, 2010Assignees: Ebara Corporation, Shimadzu CorporationInventors: Yoichi Kobayashi, Shunsuke Nakai, Hitoshi Tsuji, Yasuo Tsukuda, Junki Ishimoto, Kazunari Shinya
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Publication number: 20090011680Abstract: A polishing state monitoring apparatus measures characteristic values of a surface, being polished, of a workpiece to determine the timing of a polishing end point. The polishing state monitoring apparatus includes a light-emitting unit for applying light from a light source to a surface of a workpiece being polished, a light-receiving unit for receiving reflected light from the surface of the workpiece, a spectroscope unit for dividing the reflected light received by the light-receiving unit into a plurality of light rays having respective wavelengths, and light-receiving elements for accumulating the detected light rays as electrical information.Type: ApplicationFiled: August 27, 2008Publication date: January 8, 2009Inventors: Yoichi Kobayashi, Shunsuke Nakai, Hitoshi Tsuji, Yasuo Tsukuda, Junki Ishimoto, Kazunari Shinya
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Patent number: 7438627Abstract: A polishing state monitoring apparatus measures characteristic values of a surface, being polished, of a workpiece to determine the timing of a polishing end point. The polishing state monitoring apparatus includes a light-emitting unit for applying light from a light source to a surface of a workpiece being polished, a light-receiving unit for receiving reflected light from the surface of the workpiece, a spectroscope unit for dividing the reflected light received by the light-receiving unit into a plurality of light rays having respective wavelengths, and light-receiving elements for accumulating the detected light rays as electrical information.Type: GrantFiled: June 27, 2007Date of Patent: October 21, 2008Assignees: Ebara Corporation, Shimadzu CorporationInventors: Yoichi Kobayashi, Shunsuke Nakai, Hitoshi Tsuji, Yasuo Tsukuda, Junki Ishimoto, Kazunari Shinya
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Publication number: 20070254557Abstract: A polishing state monitoring apparatus measures characteristic values of a surface, being polished, of a workpiece to determine the timing of a polishing end point. The polishing state monitoring apparatus includes a light-emitting unit for applying light from a light source to a surface of a workpiece being polished, a light-receiving unit for receiving reflected light from the surface of the workpiece, a spectroscope unit for dividing the reflected light received by the light-receiving unit into a plurality of light rays having respective wavelengths, and light-receiving elements for accumulating the detected light rays as electrical information.Type: ApplicationFiled: June 27, 2007Publication date: November 1, 2007Inventors: Yoichi Kobayashi, Shunsuke Nakai, Hitoshi Tsuji, Yasuo Tsukuda, Junki Ishimoto, Kazunari Shinya
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Patent number: 7252575Abstract: A polishing state monitoring apparatus measures characteristic values of a surface, being polished, of a workpiece to determine the timing of a polishing end point. The polishing state monitoring apparatus includes a light-emitting unit for applying light from a light source to a surface of a workpiece being polished, a light-receiving unit for receiving reflected light from the surface of the workpiece, a spectroscope unit for dividing the reflected light received by the light-receiving unit into a plurality of light rays having respective wavelengths, and light-receiving elements for accumulating the detected light rays as electrical information.Type: GrantFiled: October 15, 2003Date of Patent: August 7, 2007Assignees: EBARA Corporation, Shimadzu CorporationInventors: Yoichi Kobayashi, Shunsuke Nakai, Hitoshi Tsuji, Yasuo Tsukuda, Junki Ishimoto, Kazunari Shinya
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Publication number: 20060166606Abstract: A polishing state monitoring apparatus measures characteristic values of a surface, being polished, of a workpiece to determine the timing of a polishing end point. The polishing state monitoring apparatus includes a light-emitting unit for applying light from a light source to a surface of a workpiece being polished, a light-receiving unit for receiving reflected light from the surface of the workpiece, a spectroscope unit for dividing the reflected light received by the light-receiving unit into a plurality of light rays having respective wavelengths, and light-receiving elements for accumulating the detected light rays as electrical information.Type: ApplicationFiled: October 15, 2003Publication date: July 27, 2006Inventors: Yoichi Kobayashi, Shunsuke Nakai, Hitoshi Tsuji, Yasuo Tsukuda, Junki Ishimoto, Kazunari Shinya
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Patent number: 7012699Abstract: The present invention provides a method of measuring the thickness of a thin film or thin layer by a spectroscopic measurement, which is applicable to the measurement of a multiple layered film whose layers have different refractive indices. According to the method, an interference light from the film is measured to create a measured spectrum. The waveform of the measured spectrum can be approximately represented by a linear sum of base spectrums. Accordingly, various constructed spectrums are created using base spectrums each having a cycle interval as a parameter. Then, the constructed spectrum that minimizes the square error against the measured spectrum is identified. The least square error is calculated for each of predetermined cycle intervals. A graph is drawn to represent the relation between the least square error and the cycle interval. The correspondence between the layers and the plural minimum points of the least square error appearing on the graph is determined.Type: GrantFiled: August 20, 2003Date of Patent: March 14, 2006Assignee: Shimadzu CorporationInventors: Kazunari Shinya, Takashi Nishimura
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Patent number: 7002693Abstract: A monochromatic light is cast on a thin layer, and the intensity of the reflected light which is an interference light of the lights reflected by the front surface and back surface of the layer. A spectrum (a measured spectrum) is obtained from the measured intensity by scanning the wavenumber of the monochromatic light. On the other hand, a constructed spectrum is created based on an assumed thickness using a predetermined function. Then an error between the measured spectrum and the constructed spectrum is calculated. The value of the error is plotted against the assumed thickness, and the point at which the error is minimum is detected. The assumed thickness at the error-minimum point is determined as the thickness of the layer.Type: GrantFiled: May 19, 2003Date of Patent: February 21, 2006Assignee: Shimadzu CorporationInventor: Kazunari Shinya
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Publication number: 20040105101Abstract: The present invention provides a method of measuring the thickness of a thin film or thin layer by a spectroscopic measurement, which is applicable to the measurement of a multiple layered film whose layers have different refractive indices. According to the method, an interference light from the film is measured to create a measured spectrum. The waveform of the measured spectrum can be approximately represented by a linear sum of base spectrums. Accordingly, various constructed spectrums are created using base spectrums each having a cycle interval as a parameter. Then, the constructed spectrum that minimizes the square error against the measured spectrum is identified. The least square error is calculated for each of predetermined cycle intervals. A graph is drawn to represent the relation between the least square error and the cycle interval. The correspondence between the layers and the plural minimum points of the least square error appearing on the graph is determined.Type: ApplicationFiled: August 20, 2003Publication date: June 3, 2004Applicant: Shimadzu CorporationInventors: Kazunari Shinya, Takashi Nishimura
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Publication number: 20030218758Abstract: A monochromatic light is cast on a thin layer, and the intensity of the reflected light which is an interference light of the lights reflected by the front surface and back surface of the layer. A spectrum (a measured spectrum) is obtained from the measured intensity by scanning the wavenumber of the monochromatic light. On the other hand, a constructed spectrum is created based on an assumed thickness using a predetermined function. Then an error between the measured spectrum and the constructed spectrum is calculated. The value of the error is plotted against the assumed thickness, and the point at which the error is minimum is detected. The assumed thickness at the error-minimum point is determined as the thickness of the layer.Type: ApplicationFiled: May 19, 2003Publication date: November 27, 2003Applicant: SHIMADZU CORPORATIONInventor: Kazunari Shinya
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Patent number: 5442574Abstract: A method and apparatus for determining a base line of a measurement curve wherein after preparing a template having an arc upward convex, a CPU of the data processing system moves, without rotating, the template with the arc of the template always contacting the measurement curve and determines the base line as the envelope of the arc of the template. During moving of the template, the system may move the template horizontally under the measurement curve; calculate, at every horizontal point at a given horizontal position of the template, the vertical distance between the arc of the template and the arc of the measurement curve; detect the minimum of the vertical distance at the given horizontal position of the template; and move the template vertically at the given horizontal position by the minimum vertical distance.Type: GrantFiled: March 8, 1993Date of Patent: August 15, 1995Assignee: Shimadzu CorporationInventor: Kazunari Shinya