Abstract: An object is to provide a semiconductor material and coating having high solubility in solvents and having advantageous filling property, high heat resistance, and/or high etching resistance. Another object is to provide a method for manufacturing a semiconductor using the semiconductor material. Still another object is to provide a novel compound. Provided are: a semiconductor material consisting of a specific aromatic hydrocarbon ring derivative; methods for manufacturing a coating and a semiconductor using the semiconductor material; and a compound consisting of a specific aromatic hydrocarbon ring derivative.

Abstract: An object is to provide a semiconductor material and coating having high solubility in solvents and having advantageous filling property, high heat resistance, and/or high etching resistance. Another object is to provide a method for manufacturing a semiconductor using the semiconductor material. Still another object is to provide a novel compound. Provided are: a semiconductor material consisting of a specific aromatic hydrocarbon ring derivative; methods for manufacturing a coating and a semiconductor using the semiconductor material; and a compound consisting of a specific aromatic hydrocarbon ring derivative.

Abstract: A method and a system for inexpensively producing a corresponding target ketone and/or alcohol by decomposing hydroperoxide rapidly and with high selectivity using an aqueous alkaline solution and by recovering and recycling alkali. The method includes neutralizing at least a part of a carboxylic acid in the oxidation reaction solution by contacting the oxidation reaction solution with a first alkaline solution including a carbonate of an alkali metal, and separating the reaction mixture into a first oil phase and a first water phase; decomposing the hydroperoxide and the ester compound in the first oil phase by contacting the first oil phase with a second alkaline solution having a higher pH value than the first alkaline solution, and separating the reaction mixture into a second oil phase and a second water phase; and recovering the carbonate of an alkali metal from the first water phase and recycling the carbonate of an alkali metal to the first alkaline solution.

Abstract: The present invention relates to a polymer, composition, the forming of a sacrificial layer and a method for producing a semiconductor device comprising a step during which a pattern is made using a photoresist by the photolithography method.

Abstract: A method and a system for inexpensively producing a corresponding target ketone and/or alcohol by decomposing hydroperoxide rapidly and with high selectivity using an aqueous alkaline solution and by recovering and recycling alkali. The method includes neutralizing at least a part of a carboxylic acid in the oxidation reaction solution by contacting the oxidation reaction solution with a first alkaline solution including a carbonate of an alkali metal, and separating the reaction mixture into a first oil phase and a first water phase; decomposing the hydroperoxide and the ester compound in the first oil phase by contacting the first oil phase with a second alkaline solution having a higher pH value than the first alkaline solution, and separating the reaction mixture into a second oil phase and a second water phase; and recovering the carbonate of an alkali metal from the first water phase and recycling the carbonate of an alkali metal to the first alkaline solution.

Abstract: This invention provides producing having an objective ketone and/or alcohol by decomposing of a hydrocarbon compound rapidly and selectively having a same number of carbon atoms as a hydrocarbon compound by decomposing a hydroperoxide in a reaction solution obtained from oxidizing the hydrocarbon compound using molecular oxygen of this invention involves, a hydroperoxide decomposition step for decomposing the hydroperoxide into the ketone and/or alcohol by contacting the reaction solution with an aqueous solution containing a carbonate of an alkaline earth metal or a carbonate of an alkali metal and a transition metal compound, a separation step for separating into an oil phase comprising the ketone and/or alcohol, and a water phase comprising the carbonate of an alkaline earth metal or carbonate of an alkali metal and the transition metal compound, a recovery step for recovering the carbonate of an alkali metal or carbonate of an alkaline earth metal and the transition metal compound by combusting the water

Abstract: This invention provides producing having an objective ketone and/or alcohol by decomposing of a hydrocarbon compound rapidly and selectively having a same number of carbon atoms as a hydrocarbon compound by decomposing a hydroperoxide in a reaction solution obtained from oxidizing the hydrocarbon compound using molecular oxygen of this invention involves, a hydroperoxide decomposition step for decomposing the hydroperoxide into the ketone and/or alcohol by contacting the reaction solution with an aqueous solution containing a carbonate of an alkaline earth metal or a carbonate of an alkali metal and a transition metal compound, a separation step for separating into an oil phase comprising the ketone and/or alcohol, and a water phase comprising the carbonate of an alkaline earth metal or carbonate of an alkali metal and the transition metal compound, a recovery step for recovering the carbonate of an alkali metal or carbonate of an alkaline earth metal and the transition metal compound by combusting the water

Abstract: This invention relates to a process for producing an oxime comprising reacting a ketone and hydroxylamine in the presence of a carboxylic acid and/or its salt in a system consisting of an aqueous phase and a hydrophobic solvent phase.

Abstract: The present invention relates to a two novel processes, “Dual Coating Process and Single Coating Process,” for forming an array of via's by employing a graphoepitaxy approach, where an array of pillars the surface of the pillars has been modified by the formation of a hydrophobic poly(vinyl aryl) brush at the surface of the pillars. The present invention also relates to a composition comprising a poly(vinyl aryl) hydrophopic polymer brush precursor terminated at one chain end with a reactive functional group, a diblock copolymer comprising an etch resistant hydrophobic block and a highly etchable hydrophilic block, a thermal acid generator and a solvent.

Abstract: There are provided a composition for forming a superfine pattern and a method employing the same for forming a superfine pattern. The composition enables to simply produce a superfine pattern with high mass productivity. The composition comprises perhydropolysilazane (I), silicon-containing polymer (II) having a hydrocarbon group, and a solvent. The mixture of those polymers contains silicon-hydrogen bonds and silicon-hydrocarbon group bonds in such amounts that the number of the silicon-hydrocarbon group bonds is in a ratio of 1 to 44% based on the total number of the silicon-hydrogen bonds and the silicon-hydrocarbon group bonds. The composition is applied on a resist pattern to form a spacer formed of the composition on the side wall of the ridges in the pattern, and then the spacer or a resin layer disposed around the spacer is used as a mask to form a superfine pattern.

Abstract: The present invention provides novel cyclododecanone-O-azacyclotridecen-2-yloxime and cyclododecanone-O-azacyclotridecen-2-yloxime hydrochloride. The invention also provides a process for producing an amide compound wherein cyclododecanone-O-azacyclotridecen-2-yloxime, hydrogen chloride and/or Lewis acid or cyclododecanone-O-azacyclotridecen-2-yloxime hydrochloride are used as a rearrangement catalyst and/or a reaction starting material in a reaction step.

Abstract: According to the first embodiment of the present invention, an oxide of a hydrocarbon compound can be produced with high yield and high productivity by oxidizing the hydrocarbon compound with molecular oxygen in the co-presence of an N-hydroxy compound, such as methyl ethyl ketone or N-hydroxysuccinimide, and a phosphate ester, such as dibutyl phosphate. According to another embodiment of the present invention, an oxide of a hydrocarbon compound can be produced with high yield by using an oxidation catalyst that comprises an oxime compound, such as methyl ethyl ketone. According to another embodiment of the present invention, an alcohol and/or a ketone can be produced with high yield by oxidizing the hydrocarbon compound at a temperature of 160° C. or less, and by decomposing the resulting hydroperoxide, for example, in a unit having an inner surface formed by a material from which no transition metal ion is generated.

Abstract: This invention relates to a process for producing an oxime comprising reacting a ketone and hydroxylamine in the presence of a carboxylic acid and/or its salt in a system consisting of an aqueous phase and a hydrophobic solvent phase.

Abstract: The present invention provides novel cyclododecanone-O-azacyclotridecen-2-yloxime and cyclododecanone-O-azacyclotridecen-2-yloxime hydrochloride. The invention also provides a process for producing an amide compound wherein cyclododecanone-O-azacyclotridecen-2-yloxime, hydrogen chloride and/or Lewis acid or cyclododecanone-O-azacyclotridecen-2-yloxime hydrochloride are used as a rearrangement catalyst and/or a reaction starting material in a reaction step.

Abstract: There are provided a composition for forming a superfine pattern and a method employing the same for forming a superfine pattern. The composition enables to simply produce a superfine pattern with high mass productivity. The composition comprises perhydropolysilazane (I), silicon-containing polymer (II) having a hydrocarbon group, and a solvent. The mixture of those polymers contains silicon-hydrogen bonds and silicon-hydrocarbon group bonds in such amounts that the number of the silicon-hydrocarbon group bonds is in a ratio of 1 to 44% based on the total number of the silicon-hydrogen bonds and the silicon-hydrocarbon group bonds. The composition is applied on a resist pattern to form a spacer formed of the composition on the side wall of the ridges in the pattern, and then the spacer or a resin layer disposed around the spacer is used as a mask to form a superfine pattern.

Abstract: The present invention relates to a process for forming an reverse tone image on a device comprising; a) forming an optional absorbing organic underlayer on a substrate; b) forming a coating of a photoresist over the underlayer; c) forming a photoresist pattern; d) forming a polysilazane coating over the photoresist pattern from a polysilazane coating composition, where the polysilazane coating is thicker than the photoresist pattern, and further where the polysilazane coating composition comprises a silicon/nitrogen polymer and an organic coating solvent; e) etching the polysilazane coating to remove the polysilazane coating at least up to a level of the top of the photoresist such that the photoresist pattern is revealed; and, f) dry etching to remove the photoresist and the underlayer which is beneath the photoresist, thereby forming an opening beneath where the photoresist pattern was present.

Abstract: The present invention relates to a process for forming an reverse tone image on a device comprising; a) forming an optional absorbing organic underlayer on a substrate; b) forming a coating of a photoresist over the underlayer; c) forming a photoresist pattern; d) forming a polysilazane coating over the photoresist pattern from a polysilazane coating composition, where the polysilazane coating is thicker than the photoresist pattern, and further where the polysilazane coating composition comprises a silicon/nitrogen polymer and an organic coating solvent; e) etching the polysilazane coating to remove the polysilazane coating at least up to a level of the top of the photoresist such that the photoresist pattern is revealed; and, f) dry etching to remove the photoresist and the underlayer which is beneath the photoresist, thereby forming an opening beneath where the photoresist pattern was present.