Abstract: Provided are a charged particle beam generation apparatus, a charged particle beam irradiation apparatus, a particle beam therapy system, and a charged particle beam generation apparatus operating method capable of implementing injection of a charged particle beam into a circular accelerator at an arbitrary timing by setting a normal operation period of a linear accelerator to be larger than a shortest period and securing a stability of the beam. In timing control of controlling injecting, accelerating, emitting, and decelerating processes of a synchrotron (200), after an end of the emitting process, a linear accelerator (111) is allowed to stop repetition of an operation based on an after-end-of-emitting-process timing signal to be in a stand-by state and is allowed to be start the repetition of the operation in a constant period based on a master signal.

Abstract: Provided are a charged particle beam generation apparatus, a charged particle beam irradiation apparatus, a particle beam therapy system, and a charged particle beam generation apparatus operating method capable of implementing injection of a charged particle beam into a circular accelerator at an arbitrary timing by setting a normal operation period of a linear accelerator to be larger than a shortest period and securing a stability of the beam. In timing control of controlling injecting, accelerating, emitting, and decelerating processes of a synchrotron 200, after an end of the emitting process, a linear accelerator 111 is allowed to stop repetition of an operation based on an after-end-of-emitting-process timing signal to be in a stand-by state and is allowed to be start the repetition of the operation in a constant period based on a master signal.

Abstract: This apparatus for manufacturing semiconductor substrates has support disks and holding units holding semiconductor substrates on the support disks. The holding unit has a stopper which is formed of a conductive material and holds the brim of the semiconductor substrate, a stopper holder which supports the stopper at the outer circumferential portion thereof, a retaining member which retains the stopper to the support disk, and a heating unit which heats the stopper.

Abstract: This apparatus for manufacturing semiconductor substrates has support disks and holding units holding semiconductor substrates on the support disks. The holding unit has a stopper which is formed of a conductive material and holds the brim of the semiconductor substrate, a stopper holder which supports the stopper at the outer circumferential portion thereof, a retaining member which retains the stopper to the support disk, and a heating unit which heats the stopper.