Patents by Inventor Kazuo Nakamae
Kazuo Nakamae has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
-
Patent number: 11371139Abstract: A method of manufacturing a diamond by a vapor phase synthesis method includes: preparing a substrate including a diamond seed crystal; forming a light absorbing layer lower in optical transparency than the substrate by performing ion implantation into the substrate, the light absorbing layer being formed at a predetermined depth from a main surface of the substrate; growing a diamond layer on the main surface of the substrate by the vapor phase synthesis method; and separating the diamond layer from the substrate by applying light from a main surface of at least one of the diamond layer and the substrate to allow the light absorbing layer to absorb the light and cause the light absorbing layer to be broken up.Type: GrantFiled: January 29, 2020Date of Patent: June 28, 2022Assignee: Sumitomo Electric Industries, Ltd.Inventors: Yoshiki Nishibayashi, Natsuo Tatsumi, Hitoshi Sumiya, Kazuo Nakamae
-
Publication number: 20200181800Abstract: A method of manufacturing a diamond by a vapor phase synthesis method includes: preparing a substrate including a diamond seed crystal; forming a light absorbing layer lower in optical transparency than the substrate by performing ion implantation into the substrate, the light absorbing layer being formed at a predetermined depth from a main surface of the substrate; growing a diamond layer on the main surface of the substrate by the vapor phase synthesis method; and separating the diamond layer from the substrate by applying light from a main surface of at least one of the diamond layer and the substrate to allow the light absorbing layer to absorb the light and cause the light absorbing layer to be broken up.Type: ApplicationFiled: January 29, 2020Publication date: June 11, 2020Applicant: Sumitomo Electric Industries, Ltd.Inventors: Yoshiki Nishibayashi, Natsuo Tatsumi, Hitoshi Sumiya, Kazuo Nakamae
-
Patent number: 10584428Abstract: A method of manufacturing a diamond by a vapor phase synthesis method includes: preparing a substrate including a diamond seed crystal; forming a light absorbing layer lower in optical transparency than the substrate by performing ion implantation into the substrate, the light absorbing layer being formed at a predetermined depth from a main surface of the substrate; growing a diamond layer on the main surface of the substrate by the vapor phase synthesis method; and separating the diamond layer from the substrate by applying light from a main surface of at least one of the diamond layer and the substrate to allow the light absorbing layer to absorb the light and cause the light absorbing layer to be broken up.Type: GrantFiled: August 7, 2015Date of Patent: March 10, 2020Assignee: Sumitomo Electric Industries, Ltd.Inventors: Yoshiki Nishibayashi, Natsuo Tatsumi, Hitoshi Sumiya, Kazuo Nakamae
-
Patent number: 10304739Abstract: A method for manufacturing a semiconductor substrate according to the present invention includes preparing a seed substrate containing a semiconductor material, forming an ion implanted layer at a certain depth from a front surface of a main surface of the seed substrate by implanting ions into the seed substrate, growing a semiconductor layer on the main surface of the seed substrate with a vapor-phase synthesis method, and separating a semiconductor substrate including the semiconductor layer and a part of the seed substrate by irradiating the front surface of the main surface of at least any of the semiconductor layer and the seed substrate with light.Type: GrantFiled: January 15, 2016Date of Patent: May 28, 2019Assignee: SUMITOMO ELECTRIC INDUSTRIES, LTD.Inventors: Yoshiki Nishibayashi, Kazuo Nakamae
-
Patent number: 9978490Abstract: A low-loss compact and a method for producing the compact are provided. A method for producing a compact by using coated soft magnetic powder that includes coated soft magnetic particles constituted by soft magnetic particles and insulating coatings coating outer peripheries of the soft magnetic particles includes a raw material preparation step and an irradiation step. In the raw material preparation step, a raw compact is prepared by press-forming coated soft magnetic powder. In the irradiation step, part of a surface of the raw compact is irradiated with a laser. Irradiating a part of a surface of a raw compact with laser increases the number of disrupted portions of conductive portions where constituent materials of the soft magnetic particles at the surface of the raw compact have become conductive to each other, and the loss of the compact can be decreased.Type: GrantFiled: June 10, 2015Date of Patent: May 22, 2018Assignees: Sumitomo Electric Industries, Ltd., Sumitomo Electric Sintered Alloy, Ltd.Inventors: Kazushi Kusawake, Masato Uozumi, Atsushi Sato, Koji Yamaguchi, Mamoru Ono, Hiroyuki Murase, Kazuo Nakamae
-
Publication number: 20170372965Abstract: A method for manufacturing a semiconductor substrate according to the present invention includes preparing a seed substrate containing a semiconductor material, forming an ion implanted layer at a certain depth from a front surface of a main surface of the seed substrate by implanting ions into the seed substrate, growing a semiconductor layer on the main surface of the seed substrate with a vapor-phase synthesis method, and separating a semiconductor substrate including the semiconductor layer and a part of the seed substrate by irradiating the front surface of the main surface of at least any of the semiconductor layer and the seed substrate with light.Type: ApplicationFiled: January 15, 2016Publication date: December 28, 2017Applicant: SUMITOMO ELECTRIC INDUSTRIES, LTD.Inventors: Yoshiki NISHIBAYASHI, Kazuo NAKAMAE
-
Publication number: 20170233889Abstract: A method of manufacturing a diamond by a vapor phase synthesis method includes: preparing a substrate including a diamond seed crystal; forming a light absorbing layer lower in optical transparency than the substrate by performing ion implantation into the substrate, the light absorbing layer being formed at a predetermined depth from a main surface of the substrate; growing a diamond layer on the main surface of the substrate by the vapor phase synthesis method; and separating the diamond layer from the substrate by applying light from a main surface of at least one of the diamond layer and the substrate to allow the light absorbing layer to absorb the light and cause the light absorbing layer to be broken up.Type: ApplicationFiled: August 7, 2015Publication date: August 17, 2017Inventors: Yoshiki Nishibayashi, Natsuo Tatsumi, Hitoshi Sumiya, Kazuo Nakamae
-
Patent number: 9707629Abstract: A cutting tool includes a portion made of a high hardness material. The portion includes a rake face, a flank face, and a cutting edge. The rake face is divided into a region A along the cutting edge and a region B excluding the region A of the rake face, a surface roughness of the region A is smaller than a surface roughness of the region B, and the region B is deepened with respect to a position of the region A.Type: GrantFiled: May 31, 2013Date of Patent: July 18, 2017Assignees: SUMITOMO ELECTRIC HARDMETAL CORP., SUMITOMO ELECTRIC INDUSTRIES, LTD.Inventors: Kazuya Yano, Yoshinori Tanigawa, Yoshikazu Yamashita, Hiroyuki Shimada, Kazuo Nakamae
-
Patent number: 9415466Abstract: Provided is a technology for manufacturing cutting tools that is capable of providing cutting tools that have a cut surface whose surface is uniformly smooth and that have a stable performance.Type: GrantFiled: September 16, 2011Date of Patent: August 16, 2016Assignees: SUMITOMO ELECTRIC INDUSTRIES, LTD., SUMITOMO ELECTRIC HARDMETAL CORP.Inventors: Kazuo Nakamae, Hiroyuki Murase, Katsuko Yamamoto, Mamoru Ono, Katsuyuki Tanaka, Toshimitsu Sakata, Teruhiro Enami, Yutaka Kobayashi
-
Publication number: 20150279532Abstract: A low-loss compact and a method for producing the compact are provided. A method for producing a compact by using coated soft magnetic powder that includes coated soft magnetic particles constituted by soft magnetic particles and insulating coatings coating outer peripheries of the soft magnetic particles includes a raw material preparation step and an irradiation step. In the raw material preparation step, a raw compact is prepared by press-forming coated soft magnetic powder. In the irradiation step, part of a surface of the raw compact is irradiated with a laser. Irradiating a part of a surface of a raw compact with laser increases the number of disrupted portions of conductive portions where constituent materials of the soft magnetic particles at the surface of the raw compact have become conductive to each other, and the loss of the compact can be decreased.Type: ApplicationFiled: June 10, 2015Publication date: October 1, 2015Inventors: Kazushi Kusawake, Masato Uozumi, Atsushi Sato, Koji Yamaguchi, Mamoru Ono, Hiroyuki Murase, Kazuo Nakamae
-
Publication number: 20150125226Abstract: A cutting tool includes a portion made of a high hardness material. The portion includes a rake face, a flank face, and a cutting edge. The rake face is divided into a region A along the cutting edge and a region B excluding the region A of the rake face, a surface roughness of the region A is smaller than a surface roughness of the region B, and the region B is deepened with respect to a position of the region A.Type: ApplicationFiled: May 31, 2013Publication date: May 7, 2015Inventors: Kazuya Yano, Yoshinori Tanigawa, Yoshikazu Yamashita, Hiroyuki Shimada, Kazuo Nakamae
-
Publication number: 20140054275Abstract: Provided is a technology for manufacturing cutting tools that is capable of providing cutting tools that have a cut surface whose surface is uniformly smooth and that have a stable performance.Type: ApplicationFiled: September 16, 2011Publication date: February 27, 2014Applicants: SUMITOMO ELECTRIC HARDMETAL CORP, SUMITOMO ELECTRIC INDUSTRIES, LTD.Inventors: Kazuo Nakamae, Hiroyuki Murase, Katsuko Yamamoto, Mamoru Ono, Katsuyuki Tanaka, Toshimitsu Sakata, Teruhiro Enami, Yutaka Kobayashi
-
Patent number: 8628715Abstract: The present invention relates to a laser processing method and the like which use no wavelength conversion technique by nonlinear optical crystals when selectively removing an insulating layer of a printed board, while employing only one wavelength throughout the entire removal processing. A laser processing apparatus (1), preferably used in the laser processing method, has a MOPA structure and comprises a seed light source (100), a YbDF (110), a bandpass filter (120), a YbDF (130), a bandpass filter (140), a YbDF (150), a YbDF (160), and so forth.Type: GrantFiled: October 23, 2009Date of Patent: January 14, 2014Assignee: Sumitomo Electric Industries, Ltd.Inventors: Motoki Kakui, Kazuo Nakamae, Shinobu Tamaoki
-
Publication number: 20130322135Abstract: A low-loss compact and a method for producing the compact are provided. A method for producing a compact by using coated soft magnetic powder that includes coated soft magnetic particles constituted by soft magnetic particles and insulating coatings coating outer peripheries of the soft magnetic particles includes a raw material preparation step and an irradiation step. In the raw material preparation step, a raw compact is prepared by press-forming coated soft magnetic powder. In the irradiation step, part of a surface of the raw compact is irradiated with a laser. Irradiating a part of a surface of a raw compact with laser increases the number of disrupted portions of conductive portions where constituent materials of the soft magnetic particles at the surface of the raw compact have become conductive to each other, and the loss of the compact can be decreased.Type: ApplicationFiled: December 28, 2011Publication date: December 5, 2013Applicants: Sumitomo Electric Sintered Alloy, Ltd., Sumitomo Electric Industries, Ltd.Inventors: Kazushi Kusawake, Masato Uozumi, Atsushi Sato, Koji Yamaguchi, Mamoru Ono, Hiroyuki Murase, Kazuo Nakamae
-
Patent number: 8581949Abstract: The present invention relates to a laser marking method which is capable of changing the grey level of a marking even in the case of a high processing speed. The laser marking method forms a marking pattern on a marking object by irradiating the marking object with pulsed light oscillated from a pulsed light source of a MOPA structure in which a semiconductor laser outputting directly-modulated pulsed light is used as a seed light source. At this time, the pulse duration of the pulsed light is changed in order to change a gray level of the marking pattern to be formed. In this way, a peak power of the pulsed light is changed by changing the pulse duration, so that it is possible to positively change the gray level of the marking pattern without changing the processing speed.Type: GrantFiled: August 6, 2009Date of Patent: November 12, 2013Assignee: Sumitomo Electric Industries, Ltd.Inventors: Yasuomi Kaneuchi, Motoki Kakui, Kazuo Nakamae, Shinobu Tamaoki
-
Patent number: 8455791Abstract: The present invention relates to a laser processing method and the like provided with a structure for enabling realization of both preferable processing of locations not easily reached by laser light and effective inhibition of damage caused to locations easily reached by laser light during laser processing. Radiation optics scan locations irradiated with laser light from a laser light source while radiating laser light onto a plurality of objects arranged on a stage and the periphery thereof from a direction perpendicular to the stage. On the stage reflecting members are respectively arranged adjacent to the plurality of objects. The reflecting members reflect laser light radiated from the radiation optics towards lateral surfaces of the objects. Since laser light reflected by the reflecting members is radiated onto the lateral surfaces of the objects, laser light also reaches the lateral surfaces of the objects not easily reached by laser light without having to increase the intensity of the laser light.Type: GrantFiled: March 4, 2009Date of Patent: June 4, 2013Assignee: Sumitomo Electric Industries, Ltd.Inventors: Shinobu Tamaoki, Motoki Kakui, Kazuo Nakamae
-
Patent number: 8305689Abstract: The present invention relates to a light source apparatus or the like provided with a structure that can block reflected return light also when an emitting end side of an optical isolator is a space. The light source apparatus comprises a light source section, a guide section, and an optical module. The optical module includes a collimator, an optical isolator, and an oblique-beam blocking section. The collimator outputs collimated light with a predetermined beam diameter as a forward propagating beam. The optical isolator is a polarization-independent optical isolator that introduces the collimated light from a first end and outputs this collimated light from a second end.Type: GrantFiled: October 9, 2008Date of Patent: November 6, 2012Assignee: Sumitomo Electric Industries, Ltd.Inventors: Motoki Kakui, Kazuo Nakamae, Shinobu Tamaoki
-
Patent number: 8294123Abstract: The present invention relates to a laser processing method and the like having a structure for making it possible to process an object to be processed in various ways while accurately adjusting the installation state of the object. The method irradiates the object with plural adjustment laser light beams that are set in a specific positional relationship against a converging point of processing laser light beam, and adjusts the state of installation of the object while monitoring irradiation areas of the adjustment laser light beams on the surface of the object. Each irradiation directions of adjustment laser light beams is different from that of the processing laser light beam. By reflecting the irradiation condition of the adjustment laser light beam and monitored information of the irradiation areas in positional adjustment of the object, the installation state of the object can be adjusted in accordance with various kinds of processing.Type: GrantFiled: July 30, 2007Date of Patent: October 23, 2012Assignee: Sumitomo Electric Industries, Ltd.Inventors: Kazuo Nakamae, Motoki Kakui, Shinobu Tamaoki
-
Patent number: 8283592Abstract: The present invention relates to a laser welding method of welding an electrode and a cable core to each other satisfactory by irradiation of a laser beam, even when the core is thin and the area of the electrode is small. The laser welding method welds on a substrate the electrode and the core of a coaxial cable to each other by irradiation of the laser beam. The core is sandwiched between a pressing member and the electrode, while the electrode and the core are brought into contact with each other at a connection section. The pressing member is a member that is transparent to the processing laser beam. A part of the core is molten by radiating the laser beam from the pressing member side. As a result, the electrode and the core are connected with each other.Type: GrantFiled: April 16, 2010Date of Patent: October 9, 2012Assignee: Sumitomo Electric Industries, Ltd.Inventor: Kazuo Nakamae
-
Patent number: 8183509Abstract: The present invention relates to a laser processing apparatus and the like having a structure for implementing at the same time both an efficient laser processing in the place where a laser beam is difficult to reach and a laser processing without damages in the place where the laser beam is easy to reach. This laser processing apparatus comprises a laser light source, an irradiation optical system applying a laser beam to an object while scanning the laser beam, a photo-detector detecting the laser beam applied from the irradiation optical system, and a control section of making switching between a continuous oscillation and a pulse oscillation of the laser beam at the laser light source.Type: GrantFiled: July 28, 2011Date of Patent: May 22, 2012Assignee: Sumitomo Electric Industries, Ltd.Inventors: Motoki Kakui, Kazuo Nakamae, Shinobu Tamaoki