Patents by Inventor Kazuo Niwa
Kazuo Niwa has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
-
Patent number: 6106977Abstract: A lithium secondary cell wherein a carbon material treated with a fluorinating agent and having substantially no C--F covalent bond, is used as an active material for negative electrode, provides a secondary cell having improved cell life. Further, a lithium secondary cell wherein a carbon material treated with a fluorinating agent and having an amount of fluorine extractable with an aqueous alkaline solution being at most 0.05 wt %, is used as an active material for negative electrode, or a lithium secondary cell wherein a carbon material treated with a fluorinating agent and containing lithium, is used as an active material for negative electrode, provides a secondary cell which is free from a problem of expansion of the casing during charging due to fluorine remaining in a small amount in the cell.Type: GrantFiled: July 28, 1998Date of Patent: August 22, 2000Assignee: Mitsubishi Chemical CorporationInventors: Yuukichi Kobayashi, Hidehiko Ohara, Kenji Watanabe, Kazuo Niwa
-
Patent number: 5871864Abstract: A lithium secondary cell wherein a carbon material treated with a fluorinating agent and having substantially no C-F covalent bond, is used as an active material for negative electrode, provides a secondary cell having improved cell life. Further, a lithium secondary cell wherein a carbon material treated with a fluorinating agent and having an amount of fluorine extractable with an aqueous alkaline solution being at most 0.05 wt %, is used as an active material for negative electrode, or a lithium secondary cell wherein a carbon material treated with a fluorinating agent and containing lithium, is used as an active material for negative electrode, provides a secondary cell which is free from a problem of expansion of the casing during charging due to fluorine remaining in a small amount in the cell.Type: GrantFiled: October 29, 1996Date of Patent: February 16, 1999Assignee: Mitsubishi Chemical CorporationInventors: Yuukichi Kobayashi, Hidehiko Ohara, Kenji Watanabe, Kazuo Niwa
-
Patent number: 5586152Abstract: A carbon fiber-reinforced carbon composite material, wherein carbon fibers are oriented substantially in the thickness direction, the ratio of the thermal conductivity in the thickness direction to the thermal conductivity in a direction perpendicular to the thickness direction is at least 2, and the thermal conductivity in the thickness direction is at least 3 W/cm..degree. C.Type: GrantFiled: May 25, 1995Date of Patent: December 17, 1996Assignees: Mitsubishi Jukogyo Kabushiki Kaisha, Mitsubishi Chemical CorporationInventors: Kimihiro Ioki, Kohei Okuyama, Kazuo Niwa, Hitoshi Seki
-
Patent number: 5578255Abstract: Disclosed herein is a method for preparing carbon fiber reinforced carbon composites comprising:subjecting short fibers composed of bundles of multiple single fibers to dry or wet fibrillation;preparing a sheet oriented in the two-dimensional random direction; andafter impregnating the obtained sheet with resins pitches and laminating the sheet followed by molding, subjecting the molded product to baking and densification treatments.Type: GrantFiled: March 20, 1995Date of Patent: November 26, 1996Assignee: Mitsubishi Chemical CorporationInventors: Kouhei Okuyama, Kazuo Niwa, Toshihiro Fukagawa
-
Patent number: 5566792Abstract: A sliding unit for a brake comprising a disk and pads made of carbon-fiber reinforced carbon composite materials, characterized in that in evaluation by X-ray diffraction, the sliding surface of the disk to the pads has interplanar spacing of graphite's reflection (002) of disk d002.sub.(disk) of 3.37 .ANG.-3.43 .ANG., and intensity ratio I.sub.(disk) /Ic of 60-90, which is obtained by dividing the integrated intensity of graphite's reflection (002) of disk I.sub.(disk) by the integrated intensity of (113) of .alpha.-Al.sub.2 O.sub.3 as a reference material Ic; the sliding surface of the pads to the disk has interplanar spacing of graphite's reflection (002) of pad d002.sub.(pad) of 3.42 .ANG.-3.44 .ANG., and intensity ratio I.sub.(pad) /Ic of 45-75, which is obtained by dividing the integrated intensity of graphite's reflection (002) of pad I.sub.(pad) by the integrated intensity of (113) of .alpha.-Al.sub.2 O.sub.3 as a reference materials Ic, and d002.sub.(disk) <d002(.sub.(pad).Type: GrantFiled: October 23, 1995Date of Patent: October 22, 1996Assignee: Mitsubishi Chemical CorporationInventors: Iwao Yamamoto, Kazuo Niwa, Hitoshi Seki, Toshirou Kusahara, Yoshiaki Inoue
-
Patent number: 5558820Abstract: A process for the preparation of microcapsules having a wall membrane made of a polyurethane urea resin, which includes steps of mixing an oily solution and an aqueous solution, passing the resulting mixed solution through a clearance between an inner cylinder and an outer cylinder which are rotated relative to each other to form an oil-in-water type emulsion, and then forming a wall membrane on droplets of the resulting emulsion. In a preferred embodiment, the clearance between the inner cylinder and the outer cylinder is preferably in the range of 0.05 to 5 mm, more preferably 0.1 to 2 mm. The retention time of the emulsion in the clearance portion is in the range of 0.02 seconds or more, preferably 0.2 seconds or more. The inner and outer cylinders are in the form of column, optionally conical in part thereof.Type: GrantFiled: May 30, 1995Date of Patent: September 24, 1996Assignee: Fuji Photo Film Co., Ltd.Inventors: Hideo Nagano, Kazuo Niwa, Takayuki Hayashi
-
Patent number: 5525558Abstract: A process for producing a carbon fiber reinforced carbon composite material, comprising dispersing a short fibrous bundle of carbon fibers which comprises a plurality of single fibers, preparing a sheet in which fibers are in the two-dimensional random orientation, impregnating with a resin or pitch, laminating and molding, and then applying a baking and densifying treatment, a dispersion degree of the bundle of carbon fibers being controlled based on the formula (1) expressing correlation between the dispersion degree of the bundle of carbon fibers and the mechanical strength of the carbon fiber reinforced composite material:Dispersion degree=A-B.times.coefficient of friction (1)wherein A and B are constants determined experimentally, to produce a carbon fiber reinforced carbon composite material having desired mechanical characteristic.Type: GrantFiled: March 17, 1994Date of Patent: June 11, 1996Assignee: Mitsubishi Chemical CorporationInventors: Kazuo Niwa, Toshihiro Fukagawa, Nobuyuki Oonishi, Takeo Matsui, Yutaka Kawamata, Hitoshi Seki
-
Patent number: 5439080Abstract: A disc brake for a vehicle comprising a disc and pads, the disc being rotatable integrally with wheels and the pads capable of being brought into friction engagement with the disc. The disc comprises a baked carbon fiber reinforced carbon composite comprising dispersed bundles of short carbon fibers impregnated with a reinforcing material of primarily a pitch. The pads comprise a baked carbon fiber reinforced carbon composite comprising dispersed bundles of short carbon fibers impregnated with a reinforcing material of primarily a pyrolytic carbon and a thermosetting resin.Type: GrantFiled: July 28, 1994Date of Patent: August 8, 1995Assignees: Nissin Kogyo Co., Ltd., Mitsubishi Kasei Corp.Inventors: Ichiro Haneda, Tatsuyoshi Sakurai, Mashiro Yanagisawa, Kohei Okuyama, Kazuo Niwa, Toshihiro Fukagawa
-
Patent number: 5398784Abstract: The present invention discloses a disc brake for a vehicle having a disc which is rotatable integrally with the wheels and pads which are brought into friction engagement with the disc. The disc is prepared by impregnating a reinforcing material into a carbon fiber reinforced carbon composite obtained by dispersing bundles of multiple single short carbon fibers with primarily a pitch, a combination of a pyrolytic carbon and a pitch or a combination of a pyrolytic carbon and a thermosetting resin, followed by baking; whereas the pads are prepared by impregnating a reinforcing material into a carbon fiber reinforced carbon composite obtained by dispersing bundles of multiple single short carbon fibers with primarily a combination of a pyrolytic carbon and a thermosetting resin or a combination of a pitch and a thermosetting resin, followed by baking.Type: GrantFiled: October 27, 1992Date of Patent: March 21, 1995Assignees: Nissin Kogyo Co., Ltd., Mitsubishi Kasei CorporationInventors: Ichiro Haneda, Tatsuyoshi Sakurai, Mashiro Yanagisawa, Kohei Okuyama, Kazuo Niwa, Toshihiro Fukagawa
-
Patent number: 5390217Abstract: A carbon fiber-reinforced carbon composite material, wherein carbon fibers are oriented substantially in the thickness direction, the ratio of the thermal conductivity in the thickness direction to the thermal conductivity in a direction perpendicular to the thickness direction is at least 2, and the thermal conductivity in the thickness direction is at least 3 W/cm.multidot..degree.C.Type: GrantFiled: April 24, 1992Date of Patent: February 14, 1995Assignees: Mitsubishi Jukogyo Kabushiki Kaisha, Mitsubishi Genshiryoku Kogyo Kabushiki Kaisha, Mitsubishi Kasei CorporationInventors: Kimihiro Ioki, Kohei Okuyama, Kazuo Niwa, Hitoshi Seki, Takanori Takahashi
-
Patent number: 4216491Abstract: A semiconductor integrated circuit which includes a plurality of island regions surrounded by a bottom dish-like dielectric layer formed on one side of a support body. A transistor element is formed in the island region, and the collector region of the transistor element is formed more adjacent to one surface of the island region than the other regions. The emitter and base electrodes of the transistor element are respectively led out from the bottom side of the island region to the surface of the support body using interior leads. The method for manufacturing the above-described device is also disclosed.Type: GrantFiled: August 31, 1978Date of Patent: August 5, 1980Assignee: Tokyo Shibaura Electric Co., Ltd.Inventors: Takashi Matsuda, Kazuo Niwa, Yasusuke Sumitomo
-
Patent number: 4175235Abstract: Apparatus for the plasma treatment of semiconductors comprises a plasma generating section, means for introducing a gas suitable for plasma treatment into the plasma generating section, high-frequency discharging means for activating the gas contained in said plasma generating section, a treatment section for treating semiconductor substrates with the activated gas, evacuation means for exhausting the gas, and discharge starting means positiioned in a region including the plasma generating section and its neighborhood, whereby a discharge can be started quickly and assuredly.Type: GrantFiled: August 29, 1977Date of Patent: November 20, 1979Assignee: Tokyo Shibaura Electric Co., Ltd.Inventors: Kazuo Niwa, Masahiro Shibagaki, Yasuhiro Horiike
-
Patent number: 4138781Abstract: In a method for the manufacture of a semiconductor device, comprising selectively forming at least one function region of a semiconductor element by a photoengraving technique using a masking layer and forming an electrode metal layer on an electrode contact surface portion of said substrate adjacent to the function region, the position of the electrode contact portion is determined by subjecting the masking layer on the surface of the substrate to an initial patterning step. This method can be advantageously used to attain high integration of an IC device.Type: GrantFiled: January 7, 1977Date of Patent: February 13, 1979Assignee: Tokyo Shibaura Electric Co., Ltd.Inventor: Kazuo Niwa
-
Patent number: 4138306Abstract: Apparatus for the treatment of semiconductors comprises a reaction chamber for effecting the vapor phase reaction of semiconductor substrates, means for introducing a vapor phase reaction gas into the reaction chamber, a plasma generating section, means for introducing into the plasma generating section a gas suitable for the plasma treatment of the inside of the reaction chamber, microwave power applying means for activating the gas contained in the plasma generating section, conduit means for introducing the activated gas into the reaction chamber, and evacuation means, whereby the undesired deposits formed on the parts other than the semiconductor substrates can be removed easily.Type: GrantFiled: August 29, 1977Date of Patent: February 6, 1979Assignee: Tokyo Shibaura Electric Co., Ltd.Inventor: Kazuo Niwa
-
Patent number: 4131909Abstract: A semiconductor integrated circuit includes first and second island regions, surrounded by a bottomed dishlike dielectric layer formed on one side of a support body. A MOS transistor element is formed in the first island region, whose gate region is located at the bottom side of the island region. The gate electrode is connected to a bottom portion of the second island region, which is used as a gate electrode contact region, in the support body using a interconnection lead. There is a method for manufacturing the above device.Type: GrantFiled: October 26, 1976Date of Patent: December 26, 1978Assignee: Tokyo Shibaura Electric Co., Ltd.Inventors: Takashi Matsuda, Kazuo Niwa, Yasusuke Sumitomo