Patents by Inventor Kazuo Shirota
Kazuo Shirota has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 11851364Abstract: A synthetic quartz glass substrate having a controlled hydrogen molecule concentration is prepared by (a) hot shaping a synthetic quartz glass ingot into a glass block, (b) slicing the glass block into a glass plate, (c) annealing the glass plate at 500-1,250° C. for 15-60 hours, (d) hydrogen doping treatment of the glass plate in a hydrogen gas atmosphere at 300-450° C. for 20-40 hours, and (e) dehydrogenation treatment of the glass plate at 200-400° C. for 5-10 hours.Type: GrantFiled: January 22, 2019Date of Patent: December 26, 2023Assignee: SHIN-ETSU CHEMICAL CO., LTD.Inventors: Junichiro Nishida, Kazuo Shirota, Hisashi Yagi, Masaki Takeuchi
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Patent number: 10611676Abstract: A synthetic quartz glass substrate is prepared by furnishing a synthetic quartz glass block, coating an arbitrary surface and an opposite surface of the block with a liquid having a transmittance of at least 99.0%/mm at the wavelength of birefringence measurement, measuring the birefringence of the block by letting light enter one coated surface and exit the other coated surface, and sorting the block to an acceptable or unacceptable group, based on the measured birefringence value.Type: GrantFiled: June 11, 2015Date of Patent: April 7, 2020Assignee: SHIN-ETSU CHEMICAL CO., LTD.Inventors: Daijitsu Harada, Kazuo Shirota, Hisashi Yagi, Masaki Takeuchi
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Patent number: 10558116Abstract: A synthetic quartz glass substrate is prepared by furnishing a synthetic quartz glass block, coating two opposite surfaces of the block with a liquid having a transmittance of at least 99.0%/mm at the wavelength of birefringence measurement, measuring a birefringence distribution on the block by letting light enter one coated surface and exit the other coated surface, and sorting the block to an acceptable group or unacceptable group, based on the measured birefringence distribution.Type: GrantFiled: June 7, 2016Date of Patent: February 11, 2020Assignee: SHIN-ETSU CHEMICAL CO., LTD.Inventors: Hisashi Yagi, Daijitsu Harada, Masaki Takeuchi, Kazuo Shirota, Kazuhiko Aoki
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Publication number: 20190225539Abstract: A synthetic quartz glass substrate having a controlled hydrogen molecule concentration is prepared by (a) hot shaping a synthetic quartz glass ingot into a glass block, (b) slicing the glass block into a glass plate, (c) annealing the glass plate at 500-1,250° C. for 15-60 hours, (d) hydrogen doping treatment of the glass plate in a hydrogen gas atmosphere at 300-450° C. for 20-40 hours, and (e) dehydrogenation treatment of the glass plate at 200-400° C. for 5-10 hours.Type: ApplicationFiled: January 22, 2019Publication date: July 25, 2019Applicant: SHIN-ETSU CHEMICAL CO., LTD.Inventors: Junichiro Nishida, Kazuo Shirota, Hisashi Yagi, Masaki Takeuchi
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Publication number: 20160363856Abstract: A synthetic quartz glass substrate is prepared by furnishing a synthetic quartz glass block, coating two opposite surfaces of the block with a liquid having a transmittance of at least 99.0%/mm at the wavelength of birefringence measurement, measuring a birefringence distribution on the block by letting light enter one coated surface and exit the other coated surface, and sorting the block to an acceptable group or unacceptable group, based on the measured birefringence distribution.Type: ApplicationFiled: June 7, 2016Publication date: December 15, 2016Applicant: SHIN-ETSU CHEMICAL CO., LTD.Inventors: Hisashi Yagi, Daijitsu Harada, Masaki Takeuchi, Kazuo Shirota, Kazuhiko Aoki
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Publication number: 20150360997Abstract: A synthetic quartz glass substrate is prepared by furnishing a synthetic quartz glass block, coating an arbitrary surface and an opposite surface of the block with a liquid having a transmittance of at least 99.0%/mm at the wavelength of birefringence measurement, measuring the birefringence of the block by letting light enter one coated surface and exit the other coated surface, and sorting the block to an acceptable or unacceptable group, based on the measured birefringence value.Type: ApplicationFiled: June 11, 2015Publication date: December 17, 2015Applicant: SHIN-ETSU CHEMICAL CO., LTD.Inventors: Daijitsu Harada, Kazuo Shirota, Hisashi Yagi, Masaki Takeuchi
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Patent number: 8650912Abstract: A method for manufacturing quartz glass using a main burner having a multi-tube assembly having a center tube, a first enclosure tube surrounding the center tube, a second enclosure tube surrounding the first enclosure tube, a tubular shell surrounding the multi-tube assembly, and a plurality of nozzles disposed within the tubular shell, a double-tube assembly surrounding at least a forward opening of the main burner includes feeding silica-forming compound to the center tube, a combustion-supporting gas to the first enclosure tube and the nozzles, a combustible gas to the second enclosure tube and the tubular shell, and a combustion-supporting gas to the double-tube assembly, forming oxyhydrogen flame for hydrolyzing or decomposing the silica-forming compound to form silica, depositing the silica on the target, and melting and vitrifying the deposited silica into quartz glass.Type: GrantFiled: April 29, 2011Date of Patent: February 18, 2014Assignee: Shin-Etsu Chemical Co., Ltd.Inventors: Hisatoshi Otsuka, Kazuo Shirota
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Patent number: 8596095Abstract: A synthetic quartz glass ingot is prepared by vapor phase hydrolyzing or oxidatively decomposing a silica feedstock in a flame to form fine particles of silica, depositing the silica particles on a target and melting and vitrifying the particles to form a synthetic quartz glass ingot on the target while the target is moved back and forth. The method further comprises: (i) continuously feeding the silica feedstock at a predetermined rate, (ii) keeping the flame in constant contact with an overall growing face, (iii) cyclically repeating the back and forth movement of the target at a predetermined speed, and (iv) maintaining the shape of the growing ingot unchanged.Type: GrantFiled: September 6, 2007Date of Patent: December 3, 2013Assignee: Shin-Etsu Chemical Co., Ltd.Inventors: Hisatoshi Otsuka, Kazuo Shirota, Osamu Sekizawa
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Publication number: 20110203318Abstract: A method for manufacturing quartz glass using a main burner having a multi-tube assembly having a center tube, a first enclosure tube surrounding the center tube, a second enclosure tube surrounding the first enclosure tube, a tubular shell surrounding the multi-tube assembly, and a plurality of nozzles disposed within the tubular shell, a double-tube assembly surrounding at least a forward opening of the main burner includes feeding silica-forming compound to the center tube, a combustion-supporting gas to the first enclosure tube and the nozzles, a combustible gas to the second enclosure tube and the tubular shell, and a combustion-supporting gas to the double-tube assembly, forming oxyhydrogen flame for hydrolyzing or decomposing the silica-forming compound to form silica, depositing the silica on the target, and melting and vitrifying the deposited silica into quartz glass.Type: ApplicationFiled: April 29, 2011Publication date: August 25, 2011Applicant: SHIN-ETSU CHEMICAL CO., LTD.Inventors: Hisatoshi Otsuka, Kazuo Shirota
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Patent number: 7954340Abstract: When a synthetic quartz glass substrate is prepared from a synthetic quartz glass block, (I) the block has a hydrogen molecule concentration of 5×1017-1×1019 molecules/cm3, (II) the substrate has a hydrogen molecule concentration of 5×1015-5×1017 molecules/cm3, (III) the substrate has an in-plane variation of its internal transmittance at 193.4 nm which is up to 0.2%, and (IV) the substrate has an internal transmittance of at least 99.6% at 193.4 nm. The synthetic quartz glass substrate has a high transmittance and a uniform transmittance distribution, and is adapted for use with excimer lasers, particularly ArF excimer lasers.Type: GrantFiled: April 2, 2009Date of Patent: June 7, 2011Assignee: Shin-Etsu Chemical Co., Ltd.Inventors: Hisatoshi Otsuka, Kazuo Shirota, Osamu Sekizawa
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Patent number: 7827824Abstract: A synthetic quartz glass substrate having (i) an OH concentration of 1-100 ppm and a hydrogen molecule concentration of 1×1016-1×1019 molecules/cm3, (ii) an in-plane variation of its internal transmission at wavelength 193.4 nm which is up to 0.2%, and (iii) an internal transmission of at least 99.6% at wavelength 193.4 nm is suited for use with excimer lasers.Type: GrantFiled: September 6, 2007Date of Patent: November 9, 2010Assignee: Shin-Etsu Chemical Co., Ltd.Inventors: Hisatoshi Otsuka, Kazuo Shirota, Osamu Sekizawa
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Publication number: 20090188281Abstract: When a synthetic quartz glass substrate is prepared from a synthetic quartz glass block, (I) the block has a hydrogen molecule concentration of 5×1017-1×1019 molecules/cm3, (II) the substrate has a hydrogen molecule concentration of 5×1015-5×1017 molecules/cm3, (III) the substrate has an in-plane variation of its internal transmittance at 193.4 nm which is up to 0.2%, and (IV) the substrate has an internal transmittance of at least 99.6% at 193.4 nm. The synthetic quartz glass substrate has a high transmittance and a uniform transmittance distribution, and is adapted for use with excimer lasers, particularly ArF excimer lasers.Type: ApplicationFiled: April 2, 2009Publication date: July 30, 2009Applicant: Shin-Etsu Chemical Co., Ltd.Inventors: Hisatoshi Otsuka, Kazuo Shirota, Osamu Sekizawa
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Publication number: 20080141717Abstract: A burner for use in the manufacture of quartz glass is provided, which comprises a triple-tube assembly of a center tube for feeding a silane or siloxane compound, an intermediate tube for feeding oxygen, and an outer tube for feeding hydrogen, a first tubular shell surrounding the triple-tube assembly for feeding hydrogen, a plurality of first nozzles disposed within the first tubular shell for feeding oxygen, a second tubular shell surrounding the first tubular shell for feeding hydrogen, and a plurality of second nozzles disposed within the second tubular shell for feeding oxygen. Synthetic quartz glass ingots having high optical homogeneity are produced.Type: ApplicationFiled: February 4, 2008Publication date: June 19, 2008Inventors: Kazuo SHIROTA, Hisatoshi Otsuka, Toshiki Imai
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Publication number: 20080115533Abstract: A synthetic quartz glass ingot is prepared by vapor phase hydrolyzing or oxidatively decomposing a silica feedstock in a flame to form fine particles of silica, depositing the silica particles on a target and melting and vitrifying the particles to form a synthetic quartz glass ingot on the target while the target is moved back and forth. The method further comprises: (i) continuously feeding the silica feedstock at a predetermined rate, (ii) keeping the flame in constant contact with an overall growing face, (iii) cyclically repeating the back and forth movement of the target at a predetermined speed, and (iv) maintaining the shape of the growing ingot unchanged.Type: ApplicationFiled: September 6, 2007Publication date: May 22, 2008Applicant: Shin-Etsu Chemical Co., Ltd.Inventors: Hisatoshi Otsuka, Kazuo Shirota, Osamu Sekizawa
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Publication number: 20080119346Abstract: A synthetic quartz glass substrate having (i) an OH concentration of 1-100 ppm and a hydrogen molecule concentration of 1×1016-1×1019 molecules/cm3, (ii) an in-plane variation of its internal transmission at wavelength 193.4 nm which is up to 0.2%, and (iii) an internal transmission of at least 99.6% at wavelength 193.4 nm is suited for use with excimer lasers.Type: ApplicationFiled: September 6, 2007Publication date: May 22, 2008Applicant: Shin-Etsu Chemical Co., Ltd.Inventors: Hisatoshi Otsuka, Kazuo Shirota, Osamu Sekizawa
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Patent number: 7232778Abstract: In a synthetic quartz glass ingot which is produced by vapor phase hydrolyzing or oxidatively decomposing a silica-forming starting compound in an oxyhydrogen flame such that silica growth in a direction occurs at a silica particle deposition and melting face, striae visible when viewed from a direction perpendicular to the silica growth direction are distributed periodically over the silica growth direction. The ingot can be used in the production of optical-grade high-homogeneity synthetic quartz glass elements for excimer laser applications, particularly ArF excimer laser applications, in the production of laser damage-resistant optical elements used with light sources such as excimer lasers, and in the production of UV optical fiber.Type: GrantFiled: December 11, 2002Date of Patent: June 19, 2007Assignee: Shin-Etsu Chemical Co., Ltd.Inventors: Hisatoshi Otsuka, Kazuo Shirota
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Publication number: 20070049482Abstract: When a synthetic quartz glass substrate is prepared from a synthetic quartz glass block, (I) the block has a hydrogen molecule concentration of 5×1017-1×1019 molecules/cm3, (II) the substrate has a hydrogen molecule concentration of 5×1015-5×1017 molecules/cm3, (III) the substrate has an in-plane variation of its internal transmittance at 193.4 nm which is up to 0.2%, and (IV) the substrate has an internal transmittance of at least 99.6% at 193.4 nm. The synthetic quartz glass substrate has a high transmittance and a uniform transmittance distribution, and is adapted for use with excimer lasers, particularly ArF excimer lasers.Type: ApplicationFiled: August 10, 2006Publication date: March 1, 2007Inventors: Hisatoshi Otsuka, Kazuo Shirota, Osamu Sekizawa
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Patent number: 7159418Abstract: Fluorine-containing synthetic quartz glass is produced by feeding silica-forming material, hydrogen, and oxygen gases from a burner to a reaction zone, flame hydrolyzing the silica-forming material in the reaction zone to form particles of silica, depositing the silica particles on a rotatable substrate in the reaction zone to form a porous silica matrix, and heating and vitrifying the porous silica matrix in a fluorine compound gas-containing atmosphere. During formation of the porous silica matrix, the angle between the center axes of the silica matrix and the silica-forming reactant flame from the burner is adjusted to 90–120° so that the porous silica matrix has a density of 0.1–1.0 g/cm3 with a narrow distribution within 0.1 g/cm3. The resulting quartz glass has a high transmittance to light in the vacuum ultraviolet region below 200 nm.Type: GrantFiled: August 17, 2001Date of Patent: January 9, 2007Assignee: Shin-Etsu Chemical Co, Ltd.Inventors: Koji Matsuo, Hisatoshi Otsuka, Kazuo Shirota, Shigeru Maida
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Patent number: 6990836Abstract: Synthetic quartz glass is produced by feeding a silica-forming raw material gas, hydrogen gas, oxygen gas and a fluorine compound gas from a burner to a reaction zone, flame hydrolyzing the silica-forming raw material gas in the reaction zone to form fine particles of fluorine-containing silica, depositing the silica fine particles on a rotatable substrate in the reaction zone so as to create a fluorine-containing porous silica matrix, and heat vitrifying the porous silica matrix in a fluorine compound gas-containing atmosphere. This process enables the low-cost manufacture of a synthetic quartz glass having a higher and more uniform transmittance to light in the vacuum ultraviolet region than has hitherto been achieved.Type: GrantFiled: February 22, 2001Date of Patent: January 31, 2006Assignee: Shin-Etsu Chemical Co., Ltd.Inventors: Shigeru Maida, Motoyuki Yamada, Hisatoshi Otsuka, Kazuo Shirota, Koji Matsuo
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Publication number: 20050132749Abstract: A burner for use in the manufacture of synthetic quartz glass is provided, which comprises a main burner (7) comprising a multi-tube assembly (1) including a center tube (2) for feeding a silica-forming compound, a first enclosure tube (3) surrounding the center tube for feeding a combustion-supporting gas, and a second enclosure tube (4) surrounding the first enclosure tube for feeding a combustible gas; a tubular shell (5) surrounding the multi-tube assembly for feeding a combustible gas; and a plurality of nozzles (6) disposed within the tubular shell for feeding a combustion-supporting gas. A double-tube assembly (8) is disposed so as to surround the forward opening of the main burner (7) for feeding a combustion-supporting gas. Synthetic quartz glass ingots having high optical homogeneity are produced.Type: ApplicationFiled: December 2, 2004Publication date: June 23, 2005Applicant: Shin-Etsu Chmeical Co., Ltd.Inventors: Hisatoshi Otsuka, Kazuo Shirota