Patents by Inventor Kazuo Torige

Kazuo Torige has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 4367124
    Abstract: There is disclosed a process for preparing lithographic printing plate bases, which comprises electrolytically etching a sheet made of aluminum or an aluminum alloy in an electrolytic solution containing hydrochloric acid and a .beta.-dicarbonyl compound.
    Type: Grant
    Filed: July 2, 1981
    Date of Patent: January 4, 1983
    Assignee: Mitsubishi Chemical Industries, Limited
    Inventors: Nobuji Kikuchi, Yoshiyuki Kisaka, Kazuo Torige, Masayuki Onose
  • Patent number: 4339315
    Abstract: There is disclosed a process for preparing lithographic printing plate bases, which comprises electrolytically etching a sheet made of aluminum or an aluminum alloy in an aqueous electrolytic solution containing hydrochloric acid and citric or malic acid at a bath temperature of 10.degree. to 40.degree. C.
    Type: Grant
    Filed: March 6, 1981
    Date of Patent: July 13, 1982
    Assignee: Mitsubishi Chemical Industries Limited
    Inventors: Nobuji Kikuchi, Yoshiyuki Kisaka, Kazuo Torige, Masayuki Onose
  • Patent number: 4267260
    Abstract: A developer for use with a lithographic photo-sensitive medium of a polyether resin, comprising a compound of the formula:RO--CH.sub.2 --CH.sub.2 --O--.sub.k R.sup.1orROCH.sub.2 CH.sub.2 OR.sup.2(wherein R represents an alkyl group with carbon number of 1 to 4, R.sup.1 represents hydrogen or an acyl group, R.sup.2 represents an acyl group with a carbon number of 2 to 5, and k represents an integer of 2 to 3).
    Type: Grant
    Filed: July 19, 1976
    Date of Patent: May 12, 1981
    Assignee: Mitsubishi Chemical Industries, Ltd.
    Inventors: Konoe Miura, Chihiro Eguchi, Yoshihiro Takahashi, Akinobu Oshima, Kazuo Torige, Shinichi Bunya
  • Patent number: 4083725
    Abstract: A photosensitive composition is prepared from a mixture of a cinnamic acid photosensitive resin and a halogen-substituted benzanthrone sensitizer.
    Type: Grant
    Filed: April 19, 1976
    Date of Patent: April 11, 1978
    Assignee: Mitsubishi Chemical Industries Ltd.
    Inventors: Hideo Fukutani, Konoe Miura, Chihiro Eguchi, Yoshihiro Takahashi, Kazuo Torige
  • Patent number: 4063953
    Abstract: A photosensitive composition is prepared from a mixture of a photosensitive resin containing radicals having the formula ##STR1## wherein X and Y represent hydrogen, halogen, cyano or nitro, Ar represents an aryl radical or a substituted aryl radical, and n represents 1 or 2, and a solvent having the formula ##STR2## wherein R and R" represent a lower alkyl radical and R' represents a lower alkylene radical.
    Type: Grant
    Filed: December 3, 1975
    Date of Patent: December 20, 1977
    Assignee: Mitsubishi Chemical Industries, Ltd.
    Inventors: Hideo Fukutani, Konoe Miura, Yoshihiro Takahashi, Kazuo Torige