Abstract: Small crystal size is the issue of a conventional method for formation of a film of graphene by a thermal CVD technique using a copper foil as a substrate. A carbon film laminate is described in which graphene having a larger crystal size is formed. The carbon film laminate is configured to include a sapphire single crystal having a surface composed of terrace surfaces which are flat at the atomic level, and atomic-layer steps, a copper single crystal thin film formed by epitaxial growth on the substrate, and graphene deposited on the copper single crystal thin film, and thus enabling formation of graphene having a large crystal size.

Abstract: The invention provides a laminate capable of polishing and grinding the surface of a material having a high hardness such as diamond, sapphire or hard carbon film, rapidly and in a simplified manner with high planarity and high accuracy, utilizing the high adhesiveness to substrates, the hardness and the surface planarity that a carbon film has, but using neither diamond abrasive grains nor alkali slurry. The laminate comprises a substrate and a carbon layer provided on the substrate, wherein the carbon layer comprises a diamond fine grain provided on the substrate and crushed by impact given thereto, a formation/growth inhibiting material that inhibits the formation of an impurity inhibiting the growth of a carbon grain and/or inhibits the growth of a carbon grain, and a carbon grain, and an amount (amount per unit volume) of the formation/growth inhibiting material decreases from a lower layer toward an upper layer on the substrate side.

Abstract: An object of the invention is to provide a carbon film laminate having a sliding surface with low friction, low abrasion, and low counterpart aggressiveness using high adhesiveness to a base material, hardness, surface flatness, low counterpart aggressiveness, transparency, and high thermal conductivity which are provided to the carbon film without using liquid and semiliquid lubricants such as lubricating oil. Provided is a carbon film laminate including a base material, a carbon film adhesion reinforcing layer which is provided on the base material and which is formed from silicon oxide (SiOx, x=1 to 2) containing fluorine atoms (F) in a concentration of 1×1019 atoms/cm3 or more, and a carbon film that is formed on the carbon film adhesion reinforcing layer. The carbon film contains fluorine atoms in the film in a concentration of 1×1019 to 1×1021 atoms/cm3, and has an approximate spectrum curve obtained by superimposing, on a peak fitting curve A at a Bragg angle (2?±0.5°) of 43.

Abstract: Disclosed is a carbon film which has optical characteristics of retaining a high transparency and being high in refractive index and low in double refractivity, is excellent in electric insulating performance, can be applied to various base materials with good adhesiveness, and can be formed at low temperature. Also disclosed is a laminate including a carbon film and a method for producing the laminate.

Abstract: An object of the present invention is to solve a problem such as a small crystal size, which is the issue of a conventional method for formation of a film of graphene by a thermal CVD technique using a copper foil as a substrate, and thus providing a carbon film laminate in which graphene having a larger crystal size is formed. The carbon film laminate is configured to include a sapphire (0001) single crystal having a surface composed of terrace surfaces which are flat at the atomic level, and atomic-layer steps, a copper (111) single crystal thin film formed by epitaxial growth on the substrate and graphene deposited on the copper (111) single crystal thin film, and thus enabling formation of graphene having a large crystal size.

Abstract: An object of the present invention is to solve problems such as high temperature processing and long processing time, which are issues of formation of a graphene film by thermal CVD, thereby providing a technique of forming a transparent conductive carbon film using a crystalline carbon film formed at lower temperature within a short time using a graphene film, and the method of the present invention is characterized by setting the temperature of a base material to 500° C. or lower and the pressure to 50 Pa or less, and also depositing a transparent conductive carbon film on a surface of a base material by a microwave surface-wave plasma CVD method in a gas atmosphere in which an oxidation inhibitor as an additive gas for suppressing oxidation of the surface of the base material is added to a carbon-containing gas or a mixed a carbon-containing gas and an inert gas.

Abstract: Problem To provide a carbon film and a laminate having optical characteristics of retaining high transparency, having high refraction index and less double refractivity, being excellent in electric insulating property, being capable of being coated at good adhesion to various substrates, and being capable of being formed at a low temperature, and applications thereof. Means for Solving the Problem The invention relates to a carbon film which has an approximate spectrum curve obtainable by superimposing, on a peak fitting curve A at a Bragg's angle (2?±0.3°) of 43.9°, a peak fitting curve B at 41.7° and a base line in an X-ray diffraction spectrum by a CuKa1 ray, and has a film thickness of from 2 mm to 100 ?m. The intensity of the fitting curve B relative to the intensity of the fitting curve A is preferably from 5 to 90% in the approximated spectrum described above.

Abstract: Disclosed is a carbon film which has optical characteristics of retaining a high transparency and being high in refractive index and low in double refractivity, is excellent in electric insulating performance, can be applied to various base materials with good adhesiveness, and can be formed at low temperature. Also disclosed is a laminate including a carbon film and a method for producing the laminate.

Abstract: To provide a microwave plasma-treating apparatus which is capable of generating plasma having a high degree of uniformity of density and a high density for executing large-quantity and high-speed processing, capable of generating plasma of a large area, and capable of preventing dielectric windows from being thermally broken despite the apparatus being operated with large electric power for extended periods of time. The microwave plasma-treating apparatus includes a waveguide arranged to feed microwave electric power, a plurality of microwave coupling holes formed in the waveguide in the axial direction thereof, a dielectric member of a piece of plate capable of transmitting microwaves arranged in the waveguide in the axial direction thereof under the microwave coupling holes, a gap formed between the plurality of microwave coupling holes and the dielectric member, and a cooling member for cooling the dielectric member. Desirably, the microwave coupling holes have an annular shape.

Abstract: The invention provides a laminate capable of polishing and grinding the surface of a material having a high hardness such as diamond, sapphire or hard carbon film, rapidly and in a simplified manner with high planarity and high accuracy, utilizing the high adhesiveness to substrates, the hardness and the surface planarity that a carbon film has, but using neither diamond abrasive grains nor alkali slurry. The laminate comprises a substrate and a carbon layer provided on the substrate, wherein the carbon layer comprises a diamond fine grain provided on the substrate and crushed by impact given thereto, a formation/growth inhibiting material that inhibits the formation of an impurity inhibiting the growth of a carbon grain and/or inhibits the growth of a carbon grain, and a carbon grain, and an amount (amount per unit volume) of the formation/growth inhibiting material decreases from a lower layer toward an upper layer on the substrate side.

Abstract: An object of the invention is to provide a resin material having further improved thermal conductivity, slidability, heat resistance, strength and rigidity of a resin material and having imparted thereto characteristics such as high thermal conductivity, rigidity, scratch prevention, high slidability and the like, and a method for producing the same. A laminate is obtained by laminating the resin material and a carbon film having a thermal conductivity of from 70 to 700 W/mK, a resistance value of 1×107 ?cm or more (100° C.) and a film thickness of from 50 nm to 10 ?m, the carbon film having a spectrum peak at a Brag's angle (2?±0.3°) of from 41 to 42° in an X-ray diffraction spectrum by CuK?1 ray, or the laminate has a plasma-resistant film integrally molded on the resin material according to need.

Abstract: A carbon film including: carbon grains having substantially the same grain size in the range of 1 nm to 1,000 nm, and preferably in the range of 2 nm to 200 nm, in the thickness-wise direction of the carbon film; and an amorphous substance for suppressing generation of impurities accompanied by formation of the carbon grains and/or for suppressing growth of said carbon grains, the amorphous substance existing at least on the surfaces of the carbon grains in a grain boundary between the carbon grains and/or gaps between the carbon grains. Such a carbon film has excellent optical properties such as high transparency, a high refractive index and small birefringence, and exhibits excellent electrical insulation. Further, the carbon film can be coated on various substrates with high adhesion and can be formed at a low temperature. Therefore, the carbon film is extremely useful for application to an optical device, a wrist watch, an electronic circuit substrate, a grinding tool or a protection film.

Abstract: Problem To provide a carbon film and a laminate having optical characteristics of retaining high transparency, having high refraction index and less double refractivity, being excellent in electric insulating property, being capable of being coated at good adhesion to various substrates, and being capable of being formed at a low temperature, and applications thereof. Means for Solving the Problem The invention relates to a carbon film which has an approximate spectrum curve obtainable by superimposing, on a peak fitting curve A at a Bragg's angle (2?±0.3°) of 43.9°, a peak fitting curve B at 41.7° and a base line in an X-ray diffraction spectrum by a CuKa1 ray, and has a film thickness of from 2 mm to 100 ?m. The intensity of the fitting curve B relative to the intensity of the fitting curve A is preferably from 5 to 90% in the approximated spectrum described above.

Abstract: A non-asbestos friction material is made of a molded and cured composition comprising a fibrous base other than asbestos, a binder and a filler. The filler includes spheres or beads of glass having a Vickers hardness (DPH, 300 gf) of at most 800 kg/mm2. Friction materials thus constituted have a suitable friction coefficient, facilitate rust removal from the mating surface, and minimize noise generation and mating surface attack.

Abstract: A non-asbestos friction material is made of a molded and cured composition comprising a fibrous base other than asbestos, a binder and a filler. The filler includes barium sulfate having an average particle size of 20 to 500 &mgr;m. Friction materials thus constituted can be endowed with a porosity of 5 to 25%. In addition, they have a good resistance to fade, a good coefficient of friction at high speed, and outstanding strength and wear resistance.

Abstract: A non-asbestos friction material is made by molding and curing a composition comprising a fibrous base, a filler, a binder, and tin and/or tin sulfide and exhibits excellent wear resistance and less metal pickup at high temperatures.

Abstract: A friction apparatus such as a brake or clutch includes a rotor formed from an aluminum alloy and hardened with a ceramic reinforcing material and a component such as a brake pad having a friction surface which incorporates a hard inorganic material which is an oxide, carbide, or nitride in an amount of 0.5 to 15% by volume. The reinforcing agent in the aluminum alloy and the hardening material in the friction material are selected to be compatible in accordance with the teachings of the specification.

Abstract: A method of preventing the rust-forming and adherence between friction material and opposite friction member by incorporating into the friction material a mixture or reaction product of boric acid and zinc oxide as an additive in an amount of 0.5 to 20 wt. %.

Abstract: A magnetizing system including a FLIP-FLOP and an integrating circuit operative to control a conduction phase of a unidirectional thyristor through a gating circuit so as to supply to an iron-core coil an increasing magnetizing current from an AC source through the thyristor so as to magnetize a horseshoe steel member. When a comparator determines that the magnetization amount of the steel member, sensed by a Hall effect element, equals 1.2 to 1.3 times a reference amount, the magnetizing current is stopped. Similar components for effecting demagnetization are then operated in the same manner so as to demagnetize the steel member with an increasing unidirectional current opposite in sense to the magnetizing current or an increasing bidirectional current until the sensed magnetization amount equals the reference amount. At that time, the demagnetizing current is stopped.