Abstract: This disclosure relates to etching compositions containing 1) at least one oxidizing agent; 2) at least one chelating agent; 3) at least one organic solvent; 4) at least one amine compound; and 5) water.

Abstract: A coloring photosensitive composition includes an oxime ester-based photopolymerization initiator containing a fluorine atom, a polymerizable compound having an ethylenically unsaturated double bond, an alkali-soluble resin, and a colorant, in which in a case where a film having a film thickness after drying of 2.0 ?m is formed using the coloring photosensitive composition, the optical density of the film at a wavelength of 365 nm is 1.5 or more.

Abstract: This disclosure relates to methods and compositions for treating a semiconductor substrate having a pattern disposed on a surface of the substrate.

Abstract: A coloring photosensitive composition includes an oxime ester-based photopolymerization initiator containing a fluorine atom, a polymerizable compound having an ethylenically unsaturated double bond, an alkali-soluble resin, and a colorant, in which in a case where a film having a film thickness after drying of 2.0 ?m is formed using the coloring photosensitive composition, the optical density of the film at a wavelength of 365 nm is 1.5 or more.

Abstract: This disclosure relates to a cleaning composition that contains 1) at least one redox agent; 2) at least one alkylsulfonic acid or a salt thereof, the alkylsulfonic acid containing an alkyl group substituted by OH or NH2; and 3) at least one aminoalcohol.

Abstract: This disclosure relates to a cleaning composition that contains 1) at least one redox agent; 2) at least one alkylsulfonic acid or a salt thereof, the alkylsulfonic acid containing an alkyl group substituted by OH or NH2; 3) at least one aminoalcohol; 4) at least one corrosion inhibitor; 5) at least one water soluble organic solvent; 6) water; and 7) optionally, at least one pH adjusting agent.

Abstract: Provided is a composition with which a film capable of detecting infrared light with high sensitivity for use in an infrared sensor or the like can be formed. In addition, provided are a film, an optical filter, a solid image pickup element, and an infrared sensor. This composition includes: a color material that transmits infrared light and blocks visible light; a near infrared absorbing colorant; and a curable compound. In the composition, a ratio A/B of a minimum value A of an absorbance of the composition in a wavelength range of 400 to 700 nm to a maximum value B of an absorbance of the composition in a wavelength range of 1,400 to 1,500 nm is 4.5 or higher, and in a case where a film having a thickness of 1 ?m is formed using the composition, the film has a maximum value of a refractive index in a wavelength range of 800 nm or longer.

Abstract: Provided is a composition with which a film that allows transmission of infrared light in a state where noise generated from visible light is small can be formed. In addition, provided are a film, a laminate, an infrared transmitting filter, a solid image pickup element, and an infrared sensor. This composition includes: a coloring material that allows transmission of infrared light and shields visible light; an infrared absorber; and a curable compound, in which the infrared absorber includes a material that shields light in a wavelength range of longer than 1000 nm and 1200 nm or shorter. In the composition, a ratio A/B of a minimum value A of an absorbance of the composition in a wavelength range of 400 to 1100 nm to a maximum value B of an absorbance of the composition in a wavelength range of 1400 to 1500 nm is 4.5 or higher.

Abstract: A composition includes: an infrared absorbing pigment; an acid or a base that undergoes neutralization or a salt interchange reaction with the infrared absorbing pigment; an acidic or basic resin; and a solvent, in which in a case where the acid is included, the acidic resin is included, in a case where the base is included, the basic resin is included, and in a case where a pKa of the acid is represented by pKa1A, a conjugate acid pKa of the base is represented by pKa1B, a pKa of the acidic resin is represented by pKa2A, and a conjugate acid pKa of the basic resin is represented by pKa2B, any one of the following Expression A or Expression B is satisfied.

Abstract: A coloring photosensitive composition includes an oxime ester-based photopolymerization initiator containing a fluorine atom, a polymerizable compound having an ethylenically unsaturated double bond, an alkali-soluble resin, and a colorant, in which in a case where a film having a film thickness after drying of 2.0 ?m is formed using the coloring photosensitive composition, the optical density of the film at a wavelength of 365 nm is 1.5 or more.

Abstract: Provided are a curable composition, a cured film, an optical filter, a solid image pickup element, an image display device, an infrared sensor, a dispersing auxiliary agent, a dispersion, and a method of manufacturing a dispersion. With the curable composition, a cured film having excellent moisture resistance in which the formation of an aggregate derived from a compound having a colorant skeleton is suppressed can be formed. This curable composition includes: a compound A having a structure in which at least one functional group selected from an acid group having a pKa of 3 or lower and a Clog P value of ?1.1 or higher, an anionic group obtained by dissociating one or more hydrogen atoms from the acid group, or a salt of the acid group is bonded to a ?-conjugated structure of a colorant skeleton and having a maximum absorption wavelength in a wavelength range of 650 to 1200 nm; a curable compound; and a solvent.

Abstract: A coloring photosensitive composition includes an oxime ester-based photopolymerization initiator containing a fluorine atom, a polymerizable compound having an ethylenically unsaturated double bond, an alkali-soluble resin, and a colorant, in which in a case where a film having a film thickness after drying of 2.0 ?m is formed using the coloring photosensitive composition, the optical density of the film at a wavelength of 365 nm is 1.5 or more.

Abstract: This disclosure relates to methods and compositions for treating a wafer having a pattern disposed on a surface of the wafer.

Abstract: A composition includes: a compound represented by Formula (1); and at least one selected from the group consisting of a curable compound and a resin. Provided are a film that is formed using the composition, an infrared cut filter, a solid image pickup element, an infrared sensor, and a camera module. Further, provided is a compound represented by Formula (1). R1 and R2 each independently represent a group represented by the following Formula (2) and having a SP value of 12.2 (cal/cm3)1/2 or higher as a whole.

Abstract: Provided is a resin composition including: an infrared absorbing pigment; and a resin having an infrared absorbing group. In addition, provided are a film that is formed using the resin composition, an infrared cut filter, a method of manufacturing an infrared cut filter, a solid image pickup element, an infrared sensor, and a camera module.

Abstract: Provided are a filter capable of detecting light with less noise, an optical sensor, a solid-state imaging element, and an image display device. This filter is provided with a plurality of different pixels that are two-dimensionally arranged, and at least one of the plurality of pixels is a pixel 11 of a near-infrared cut filter that shields at least a part of light having a wavelength in the near-infrared region and transmits light having a wavelength in the visible region.

Abstract: A resin composition includes an organic pigment, a resin, and a solvent, in which a content of a Na atom is 0.01 to 50 mass ppm with respect to a total solid content of a resin composition.

Abstract: This disclosure relates to a cleaning composition that contains 1) at least one redox agent; 2) at least one alkylsulfonic acid or a salt thereof, the alkylsulfonic acid containing an alkyl group substituted by OH or NH2; 3) at least one aminoalcohol; 4) at least one corrosion inhibitor; 5) at least one water soluble organic solvent; 6) water; and 7) optionally, at least one pH adjusting agent.

Abstract: Provided is a pigment dispersion liquid used in a curable composition capable of manufacturing a film having fewer foreign matters. Provided are a curable composition capable of manufacturing a film having fewer foreign matters, a film, a near infrared cut filter, a solid-state imaging element, an image display device, and an infrared sensor. The pigment dispersion liquid includes a near infrared absorbing organic pigment having an maximum absorption wavelength in a wavelength range of 600 to 1,200 nm; two or more kinds of pigment derivatives having different structures; and a solvent.

Abstract: A photosensitive composition with which a cured film that includes a pattern having excellent rectangularity and suppressed thermal shrinkage can be formed is provided. A cured film formed of the photosensitive composition, an optical filter, a laminate, a pattern forming method, a solid image pickup element, an image display device, and an infrared sensor are provided. The photosensitive composition includes a near infrared absorber, a curable compound, a photoinitiator, and an ultraviolet absorber, in which in thermogravimetry, the ultraviolet absorber has a mass loss percentage of 5% or lower at 150° C. and has a mass loss percentage of 40% or higher at 220° C.