Patents by Inventor Kazutaka Tamura

Kazutaka Tamura has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 6919157
    Abstract: The present invention relates to a positive-working radiation-sensitive composition which is characterized in that it contains a compound meeting any of conditions a1) to a3), and b) an acid generator which generates acid by irradiation with radiation; and also to a method for the production of a resist pattern employing same. a1) A compound wherein a carboxyl group is protected by an acid labile group represented by general formula (1) (R1 and R2 are aromatic rings, and R3 represents an alkyl group, a substituted alkyl group, a cycloalkyl group or an aromatic ring. R1 to R3 may be the same or different.) a2) A compound in which an alkali-soluble group is protected by an acid labile group represented by general formula (2) (R4 to R6 are each an alkyl group, a substituted alkyl group, a cycloalkyl group or an aromatic ring, and at least one of R4 to R6 is an aromatic ring with an electron-donating group. R4 to R6 may be the same or different.
    Type: Grant
    Filed: January 19, 2001
    Date of Patent: July 19, 2005
    Assignee: Toray Industries, Inc.
    Inventors: Hiroyuki Niwa, Kazutaka Tamura, Masahide Senoo
  • Patent number: 6576400
    Abstract: The present invention relates to a positive-working radiation-sensitive composition which is characterized in that it is a positive-working radiation-sensitive composition containing polymer the solubility of which is increased in aqueous alkali by the action of acid, and a compound which generates acid by irradiation with radiation, and the ease of occurrence of main chain scission of said polymer by means of radiation is greater than that of polymethyl methacrylate, and it also relates to a positive-working radiation-sensitive composition which is characterized in that it contains an alkali-soluble polymer, a compound having the effect of suppressing the alkali-solubility of said alkali-soluble polymer and the suppression effect of which is lowered or eliminated by the action of acid, and a compound which generates acid by irradiation with radiation, and the ease of occurrence of main chain scission of said alkali-soluble polymer by radiation is greater than that of polymethyl methacrylate.
    Type: Grant
    Filed: May 10, 2000
    Date of Patent: June 10, 2003
    Assignee: Toray Industries, Inc.
    Inventor: Kazutaka Tamura
  • Publication number: 20030003392
    Abstract: The present invention relates to a positive-working radiation-sensitive composition which is characterized in that it contains a compound meeting any of conditions a1) to a3), and b) an acid generator which generates acid by irradiation with radiation; and also to a method for the production of a resist pattern employing same.
    Type: Application
    Filed: February 22, 2002
    Publication date: January 2, 2003
    Inventors: Hiroyuki Niwa, Kazutaka Tamura, Masahide Senoo
  • Patent number: 5851739
    Abstract: A developer for quinonediazide/novlak positive electron beam resists including alkali metal ions, weak acid ions and a water soluble organic compound subject to the following conditions: 0.05.ltoreq.a.ltoreq.0.5, 0.07.ltoreq.bn.ltoreq.1.5 and a<bn or a>bn, wherein a is the concentration of the alkali metal in mol/kg, b is the concentration of the weak acid in mol/kg and n is the valence of the weak acid ions, and the concentration of the water soluble organic compound is 0.5 to 10 wt %, based on the total weight of the developer.
    Type: Grant
    Filed: November 26, 1997
    Date of Patent: December 22, 1998
    Assignee: Toray Industries, Inc.
    Inventors: Hiroki Oosedo, Mutsuo Kataoka, deceased, Shigeyoshi Kanetsuki, Kazutaka Tamura, Masaya Asano
  • Patent number: 5629127
    Abstract: The present invention relates to a positive electron beam resist composition containing a cresolnovolak resin, a lower molecular additive with a specific structure and a quinonediazide compound with a specific structure, and a developer for the positive electron beam resist, containing specific amounts of alkali metal ions, weak acid radical ions and a water soluble organic compound. The present invention can provide a positive electron beam resist composition with a novolak and a quinonediazide as main ingredients, excellent in dry etching resistance and resolution, and it if is used, a fine pattern can be obtained at high sensitivity especially when the developer of the present invention is used.
    Type: Grant
    Filed: May 25, 1995
    Date of Patent: May 13, 1997
    Assignee: Toray Industries, Inc.
    Inventors: Hiroki Oosedo, Mutsuo Kataoka, deceased, Mayumi Kataoka, legal representative, Shigeyoshi Kanetsuki, Kazutaka Tamura, Masaya Asano
  • Patent number: 5582338
    Abstract: In accordance with the present invention, a tool holder 10 is provided for carrying a cutting implement, such as a pair of lopping shears 15, having a plurality of blades 16a and 16b attached by a pivot 18 to a pair of elongated handles 20a and 20b. The tool holder includes a support backing 12, containing a plurality of vertically extending slots 34a and 34b. A waist belt 32 may be passed through the vertically extending slots so that the tool holder may be suspended from the waist belt. A support frame 42 is also attached to the support backing. A rigid cap 14 for housing the blades 16a and 16b of the lopping shears 15 is fastened to the support frame 42 and the support backing 12. The rigid cap comprises a convex surface having a longitudinal edge 14a and a latitudinal edge 14b, wherein the longitudinal edge is attached to the support backing 12.
    Type: Grant
    Filed: May 8, 1995
    Date of Patent: December 10, 1996
    Inventor: Kazutaka Tamura
  • Patent number: 5506776
    Abstract: The amount of wiring required in a steering control system is reduced, and a power loss which occurs in the wiring of the power system is also reduced. The influences of electric noises upon the wiring between sensors and a control unit is reduced, thus improving the reliability. The control unit 9 connected with sensors and a servo unit SVU each include an independent computer 1, 8, and are connected to each other through a communication line. The control unit 9 is disposed adjacent to the sensors, while the servo unit SVU is disposed adjacent to an actuator. Information relating to a target steer angle and which is transmitted is chosen to be a variance T.DELTA. thereof, and on the receiving end, T.DELTA. is accumulated to obtain a target steer angle T.theta.. A steer angle deviation 0e is transmitted from SVU to the control unit 9. The presence or absence of any abnormality occurring is examined by checking the period of signal reception and signal values.
    Type: Grant
    Filed: March 1, 1995
    Date of Patent: April 9, 1996
    Assignee: Aisin Seiki Kabushiki Kaisha
    Inventors: Takehiko Fushimi, Hisayasu Mase, Takeshi Hatano, Tadaichi Matsumoto, Kazutaka Tamura
  • Patent number: 4326743
    Abstract: A weeding tool is provided in the form of a fork having a plurality of tines, each tine having teeth which project outwardly and rearwardly from lateral edges thereof. The tines are employed for breaking up and loosening soil around relatively large weed roots. The teeth along the tine edges collect and withdraw small, hair-like rootlets dispersed throughout the soil in association with the larger roots. In a preferred embodiment the rearwardly directed teeth are offset in a crosscut configuration and are staggered along edges of adjacent tines to increase their effectiveness. The removal of rootlets during the course of ordinary weeding with the tool reduces regeneration of weeds by propagation of the rootlets.
    Type: Grant
    Filed: June 30, 1980
    Date of Patent: April 27, 1982
    Inventor: Kazutaka Tamura