Abstract: A polyphenylene ether includes a repeating unit derived from a phenol of the formula (1), a repeating unit derived from a phenol of the formula (2), and a structural unit derived from a phenol of the formula (3).

Abstract: A membrane distillation device, provided with a membrane distillation module including a plurality of hydrophobic porous hollow fiber membranes, and a condenser for condensing water vapor extracted from the module. The average pore diameter of the porous hollow fiber is 0.01-1 ?m. The filling ratio of the porous hollow fiber of the membrane distillation module is 10-80%, and the pressure condition for the membrane distillation is equal to or greater than 1 kPa and equal to or less than the saturated vapor pressure of water at the temperature of the water being treated.

Abstract: The present invention provides a membrane distillation apparatus that comprises an evaporation part comprising a liquid phase part 1 in which water to be treated flows, a gas phase part 1, and a hydrophobic porous membrane that separates the liquid phase part 1 and the gas phase part 1, a condensation part comprising a liquid phase part 2 in which cooling water flows, a gas phase part 2, and a cooling member that separates the liquid phase part 2 and the gas phase part 2, and a gas phase part 3 connecting the gas phase part 1 with the gas phase part 2, wherein the pressure of the gas phase parts 1 to 3 is 1 kPa or higher and the saturated steam pressure of water at the temperature of water to be treated or lower.

Abstract: A membrane distillation device, provided with a membrane distillation module including a plurality of hydrophobic porous hollow fiber membranes, and a condenser for condensing water vapor extracted from the module. The average pore diameter of the porous hollow fiber is 0.01-1 ?m. The filling ratio of the porous hollow fiber of the membrane distillation module is 10-80%, and the pressure condition for the membrane distillation is equal to or greater than 1 kPa and equal to or less than the saturated vapor pressure of water at the temperature of the water being treated.

Abstract: The present invention provides a membrane distillation apparatus that comprises an evaporation part comprising a liquid phase part 1 in which water to be treated flows, a gas phase part 1, and a hydrophobic porous membrane that separates the liquid phase part 1 and the gas phase part 1, a condensation part comprising a liquid phase part 2 in which cooling water flows, a gas phase part 2, and a cooling member that separates the liquid phase part 2 and the gas phase part 2, and a gas phase part 3 connecting the gas phase part 1 with the gas phase part 2, wherein the pressure of the gas phase parts 1 to 3 is 1 kPa or higher and the saturated steam pressure of water at the temperature of water to be treated or lower.

Abstract: The present invention provides an organic semiconductor material which exhibits a high mobility, and excellent solubility in solvents and oxidation resistance. The present invention also provides an organic semiconductor thin film exhibiting a high mobility, and an organic semiconductor device exhibiting excellent electronic characteristics. A transistor structure is formed by coating the silicon substrate with a thin film of pentacene compound substituted halogens at 6 and 13 positions and aliphatic hydrocarbons at 2, 3, 9 and 10 positions, wherein the substrate is patterned beforehand with gold to have a source and drain electrodes.

Abstract: The present invention provides an organic semiconductor material which exhibits a high mobility, and excellent solubility in solvents and oxidation resistance. The present invention also provides an organic semiconductor thin film exhibiting a high mobility, and an organic semiconductor device exhibiting excellent electronic characteristics. A transistor structure is formed by coating the silicon substrate with a thin film of pentacene compound substituted halogens at 6 and 13 positions and aliphatic hydrocarbons at 2, 3, 9 and 10 positions, wherein the substrate is patterned beforehand with gold to have a source and drain electrodes.

Abstract: The present invention provides an organic semiconductor material which exhibits a high mobility, and excellent solubility in solvents and oxidation resistance. The present invention also provides an organic semiconductor thin film exhibiting a high mobility, and an organic semiconductor device exhibiting excellent electronic characteristics. A transistor structure is formed by coating the silicon substrate with a thin film of pentacene compound substituted halogens at 6 and 13 positions and aliphatic hydrocarbons at 2, 3, 9 and 10 positions, wherein the substrate is patterned beforehand with gold to have a source and drain electrodes.

Abstract: The present invention provides an organic semiconductor material which exhibits a high mobility, and excellent solubility in solvents and oxidation resistance. The present invention also provides an organic semiconductor thin film exhibiting a high mobility, and an organic semiconductor device exhibiting excellent electronic characteristics. A transistor structure is formed by coating the silicon substrate with a thin film of pentacene compound substituted halogens at 6 and 13 positions and aliphatic hydrocarbons at 2, 3, 9 and 10 positions, wherein the substrate is patterned beforehand with gold to have a source and drain electrodes.

Abstract: A method of centering a hollow cylindrical piece of work comprises measuring the outside and inside diameters and contours of the work by means of outside- and inside-diameter-measuring instruments relative to the common centerline of the instruments taken as the virtual center of the work, inputting the measured values with corrections made for any deflection of the work and for any error arising from the instruments, to an electronic computer, and allowing the computer to memorize the information and operate to find the real center of the hollow cylindrical work on the basis of the stored information, whereby the location of the real center and machining allowances necessary for obtaining a product finished to the desired contours can be be computed.