Abstract: One embodiment of this invention is an anti-reflection (AR) film including a transparent substrate film; a hard coat layer; and an AR layer produced by a dry coating technique, wherein the hard coat layer and the AR layer are formed on at least one side of the transparent substrate film, and a strain, at which the AR film cracks when stretched at a constant rate of 1 mm/min. or less, is in the range 0.65-1.10%.

Abstract: An anti-reflection (AR) film has a transparent substrate film; a hard coat layer which is formed on one surface of the transparent substrate film; and an AR layer which is formed on the hard coat layer. And the AR layer has a four-layer stacked structure of alternate high and low refractive index material layers; the total thickness of the low refractive index material layer is in the range 90-130 nm; and the arithmetic mean roughness Ra of the AR layer surface is in the range 1.5-3.0 nm.

Abstract: An anti-reflection film, including: a transparent base film; and an anti-reflection stacked member provided on the hard coating, having, in alternation, a high-refractivity oxide thin film layer and a low-refractivity oxide thin film layer, wherein: an outermost layer of the anti-reflection stacked member is the low-refractivity oxide thin film layer; the low-refractivity oxide thin film layer is a silicon oxide thin film; a thickness of the silicon oxide thin film is in a range of 75 nm or greater, and 100 nm or smaller; the silicon oxide thin film has a first layer on a side of the transparent base film, and a second layer on an outside of the first layer; and a composition ratio Si/O (A) of silicon to oxygen in the first layer and a composition ratio Si/O (B) of silicon to oxygen in the second layer satisfies a relationship, Si/O (A)>Si/O (B).