Abstract: An etching method includes a first etching step, a processing step, and a second etching step. The first etching step is performed to etch a substrate on which a silicon oxide film and a silicon nitride film are formed with an etching liquid. The processing step is performed to process a pattern in the silicon oxide film on the substrate with a pattern shape processing liquid after the first etching step. The second etching step is performed to etch the substrate with the etching liquid after the processing step.

Abstract: A monitor target shooting information generation means (81) extracts, from each of a plurality of images, as information to be used for estimating the identify of a monitor target, monitor target identification information that is identification information of the monitor target, and the monitor target shooting information generation means (81) then generates multiple pieces of monitor target shooting information each including both the extracted monitor target identification information and a shooting time at which the monitor target was shot. An appearance history generation means (82) generates, from the generated multiple pieces of monitor target shooting information, an appearance history of the monitor target that has been estimated to be identical. A determination means (83) determines the monitor target the appearance history of which matches a specified rule.

Abstract: A guidance processing apparatus (100) includes an information acquisition unit (101) that acquires a plurality of different pieces of guidance information on the basis of states of a plurality of people within one or more images, and a control unit (102) that performs control of a plurality of target devices present in different spaces or time division control of a target device so as to set a plurality of different states corresponding to the plurality of pieces of guidance information.

Abstract: An etching method includes a first etching step, a processing step, and a second etching step. The first etching step is performed to etch a substrate on which a silicon oxide film and a silicon nitride film are formed with an etching liquid. The processing step is performed to process a pattern in the silicon oxide film on the substrate with a pattern shape processing liquid after the first etching step. The second etching step is performed to etch the substrate with the etching liquid after the processing step.

Abstract: There is provided a substrate processing method for performing an etching processing by immersing a substrate in a processing liquid containing a chemical liquid and silicon, the substrate processing method including: a preparation step of setting a supply flow rate of the chemical liquid based on a replenishment amount of the chemical liquid and a replenishment amount of the silicon; and a replenishment step of supplying the chemical liquid at the set supply flow rate of the chemical liquid and dissolving a set replenishment amount of the silicon in the processing liquid.

Abstract: Provided is an image processing apparatus (2000) including an index value calculation unit (2020) and a presentation unit (2040). The index value calculation unit (2020) acquires a plurality of images captured by a camera (3000) (captured images), and calculates an index value indicating the degree of change in the state of a monitoring target in the captured image, using the acquired captured image. The presentation unit (2040) presents an indication based on the index value calculated by the index value calculation unit (2020) on the captured image captured by the camera (3000).

Abstract: Provided is an image processing apparatus (2000) including an index value calculation unit (2020) and a presentation unit (2040). The index value calculation unit (2020) acquires a plurality of images captured by a camera (3000) (captured images), and calculates an index value indicating the degree of change in the state of a monitoring target in the captured image, using the acquired captured image. The presentation unit (2040) presents an indication based on the index value calculated by the index value calculation unit (2020) on the captured image captured by the camera (3000).

Abstract: A guidance processing apparatus (100) includes an information acquisition unit (101) that acquires a plurality of different pieces of guidance information on the basis of states of a plurality of people within one or more images, and a control unit (102) that performs control of a plurality of target devices present in different spaces or time division control of a target device so as to set a plurality of different states corresponding to the plurality of pieces of guidance information.

Abstract: A state acquisition unit (2020) acquires a state of a monitoring target in a captured image captured by a camera (3040). A monitoring point acquisition unit (2040) acquires, from a monitoring point information storage unit (3020), a monitoring point corresponding to the state of the monitoring target acquired by the state acquisition unit (2020). The monitoring point indicates a position to be monitored in the captured image. A presentation unit (2060) presents the monitoring point on the captured image.

Abstract: A substrate processing apparatus includes a liquid processing tank, a movement mechanism, an ejector, and a controller. The liquid processing tank stores a processing liquid. The movement mechanism moves a plurality of substrates immersed in the liquid processing tank to above the liquid surface of the processing liquid. The ejector ejects a vapor of an organic solvent toward portions of the plurality of substrates exposed from the liquid surfaces. The controller moves up the ejection position of the vapor of the organic solvent by the ejection unit as the plurality of substrates are moved up.

Abstract: A substrate processing apparatus includes a liquid processing tank, a movement mechanism, an ejector, and a controller. The liquid processing tank stores a processing liquid. The movement mechanism moves a plurality of substrates immersed in the liquid processing tank to a position above the liquid surface of the processing liquid. The ejector ejects a vapor of an organic solvent toward portions of the plurality of substrates that are exposed from the liquid surface. The controller changes an ejection flow rate of the vapor ejected by the ejector as the plurality of substrates are moved up.

Abstract: An etching method includes a first etching step, a processing step, and a second etching step. The first etching step is performed to etch a substrate on which a silicon oxide film and a silicon nitride film are formed with an etching liquid. The processing step is performed to process a pattern in the silicon oxide film on the substrate with a pattern shape processing liquid after the first etching step. The second etching step is performed to etch the substrate with the etching liquid after the processing step.

Abstract: A substrate processing apparatus includes: a processing tank that stores a processing liquid for performing a liquid processing on a plurality of substrates; a substrate support that supports the plurality of substrates such that main surfaces of each of the plurality of substrates follow a vertical direction in the processing tank; a processing liquid ejection unit provided below the plurality of substrates supported by the substrate support, and generates an ascending flow of the processing liquid in the processing tank; and a rectifying section that adjusts flow of the processing liquid in a side space formed between a first side wall of the processing tank and a first substrate having a main surface facing the first side wall of the processing tank among the plurality of substrates.

Abstract: A state acquisition unit (2020) acquires a state of a monitoring target in a captured image captured by a camera (3040). A monitoring point acquisition unit (2040) acquires, from a monitoring point information storage unit (3020), a monitoring point corresponding to the state of the monitoring target acquired by the state acquisition unit (2020). The monitoring point indicates a position to be monitored in the captured image. A presentation unit (2060) presents the monitoring point on the captured image.

Abstract: A state acquisition unit (2020) acquires a state of a monitoring target in a captured image captured by a camera (3040). A monitoring point acquisition unit (2040) acquires, from a monitoring point information storage unit (3020), a monitoring point corresponding to the state of the monitoring target acquired by the state acquisition unit (2020). The monitoring point indicates a position to be monitored in the captured image. A presentation unit (2060) presents the monitoring point on the captured image.

Abstract: A state acquisition unit (2020) acquires a state of a monitoring target in a captured image captured by a camera (3040). A monitoring point acquisition unit (2040) acquires, from a monitoring point information storage unit (3020), a monitoring point corresponding to the state of the monitoring target acquired by the state acquisition unit (2020). The monitoring point indicates a position to be monitored in the captured image. A presentation unit (2060) presents the monitoring point on the captured image.

Abstract: A state acquisition unit (2020) acquires a state of a monitoring target in a captured image captured by a camera (3040). A monitoring point acquisition unit (2040) acquires, from a monitoring point information storage unit (3020), a monitoring point corresponding to the state of the monitoring target acquired by the state acquisition unit (2020). The monitoring point indicates a position to be monitored in the captured image. A presentation unit (2060) presents the monitoring point on the captured image.

Abstract: A monitor target shooting information generation unit extracts, from each of a plurality of images, as information to be used for estimating the identify of a monitor target, monitor target identification information that is identification information of the monitor target, and the monitor target shooting information generation unit then generates multiple pieces of monitor target shooting information each including both the extracted monitor target identification information and a shooting time at which the monitor target was shot. An appearance history generation unit generates, from the generated multiple pieces of monitor target shooting information, an appearance history of the monitor target that has been estimated to be identical. A determination unit determines the monitor target the appearance history of which matches a specified rule.

Abstract: Provided is an image recognition system that can easily perform image recognition on a side face of an item. An image recognition system according to one example embodiment of the present invention includes: a placement stage used for placing an item below an image capture device provided so as to perform capturing of a downward direction; a support structure configured to support the item at a predetermined angle relative to a top face of the placement stage; and an image recognition apparatus that identifies the item by performing image recognition on an image of the item acquired by the image capture device.

Abstract: A monitor target shooting information generation means (81) extracts, from each of a plurality of images, as information to be used for estimating the identify of a monitor target, monitor target identification information that is identification information of the monitor target, and the monitor target shooting information generation means (81) then generates multiple pieces of monitor target shooting information each including both the extracted monitor target identification information and a shooting time at which the monitor target was shot. An appearance history generation means (82) generates, from the generated multiple pieces of monitor target shooting information, an appearance history of the monitor target that has been estimated to be identical. A determination means (83) determines the monitor target the appearance history of which matches a specified rule.