Patents by Inventor Kazuya Tokunaga

Kazuya Tokunaga has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 11841720
    Abstract: Provided is a flow rate controller. The flow rate controller calculates a resistor flow rate that is a flow rate of a fluid flowing through a fluid resistor, on the basis of a first measured pressure measured by a first pressure sensor and a second measured pressure measured by a second pressure sensor; controls a second valve on the basis of a deviation of the resistor flow rate from the set flow rate; outputs a first set pressure that is a target of a pressure upstream of the fluid resistor, on the basis of the set flow rate and a second set pressure which is a target of a pressure downstream of the fluid resistor and to which a constant value is set; and controls the first valve on the basis of a deviation of the first measured pressure from the first set pressure.
    Type: Grant
    Filed: November 1, 2022
    Date of Patent: December 12, 2023
    Assignee: HORIBA STEC, Co., Ltd.
    Inventor: Kazuya Tokunaga
  • Publication number: 20230250505
    Abstract: A rail includes a foot, a web, and a head. The web has a chemical composition containing C: 0.70 to 1.20 mass%, Si: 0.20 to 1.20 mass%, Mn: 0.20 to 1.50 mass%, P: 0.035 mass% or less, and Cr: 0.20 to 2.50 mass%, with the balance being Fe and incidental impurities. The area fraction of pearlite in the web is 95% or more, and the average size of pearlite blocks is 60 µm or less.
    Type: Application
    Filed: July 27, 2020
    Publication date: August 10, 2023
    Applicant: JFE Steel Corporation
    Inventors: Kazuya Tokunaga, Keisuke Ando
  • Publication number: 20230168697
    Abstract: Provided is a flow rate controller. The flow rate controller calculates a resistor flow rate that is a flow rate of a fluid flowing through a fluid resistor, on the basis of a first measured pressure measured by a first pressure sensor and a second measured pressure measured by a second pressure sensor; controls a second valve on the basis of a deviation of the resistor flow rate from the set flow rate; outputs a first set pressure that is a target of a pressure upstream of the fluid resistor, on the basis of the set flow rate and a second set pressure which is a target of a pressure downstream of the fluid resistor and to which a constant value is set; and controls the first valve on the basis of a deviation of the first measured pressure from the first set pressure.
    Type: Application
    Filed: November 1, 2022
    Publication date: June 1, 2023
    Inventor: Kazuya TOKUNAGA
  • Publication number: 20220307101
    Abstract: A rail comprises a predetermined chemical composition. In a hardness distribution in a region from a rail head surface to a depth of 16.0 mm, a part having higher hardness than V1 that is minimum hardness in a first internal region is present in a second internal region, and hardness of the rail head surface is HBW 400 to 520 and average hardness in the region from the rail head surface to the depth of 16.0 mm is HBW 350 or more.
    Type: Application
    Filed: June 9, 2020
    Publication date: September 29, 2022
    Applicant: JFE STEEL CORPORATION
    Inventors: Kenji OKUSHIRO, Kazuya TOKUNAGA, Moriyasu YAMAGUCHI
  • Patent number: 11454993
    Abstract: A flow rate control apparatus calculates a resistance flow rate, which is a flow rate of a fluid flowing through the fluid resistor, based on a first pressure measured by a first pressure sensor and a second pressure measured by a second pressure sensor, converts the resistance flow rate to a first valve flow rate, which is the flow rate of the fluid passing through a first valve, based on the first pressure, converts the resistance flow rate to a second valve flow rate, which is the flow rate of the fluid passing through a second valve, based on the second pressure, controls the first valve so that the deviation between a first set flow rate and the first valve flow rate becomes small, and controls the second valve so that the deviation between a second set flow rate and the second valve flow rate becomes small.
    Type: Grant
    Filed: August 3, 2021
    Date of Patent: September 27, 2022
    Assignee: HORIBA STEC, Co., Ltd.
    Inventor: Kazuya Tokunaga
  • Publication number: 20220228896
    Abstract: The present invention controls convergent pressure of a closed space provided with a fluid resistance at high speed while an upstream valve provided on the upstream of the fluid resistance prevents overshooting. A pressure control system is provided with a fluid resistance in a channel forming a closed space and is configured to control pressure of the closed space by controlling an upstream valve provided on the upstream of the fluid resistance. The pressure control system includes a convergent pressure arithmetic unit and a valve controller. The convergent pressure arithmetic unit calculates convergent pressure of the closed space when the upstream valve is fully closed using at least one of upstream pressure and downstream pressure on the fluid resistance in the channel. The valve controller compares the calculated convergent pressure with a predetermined target convergent pressure and fully close the upstream valve based on the result of the comparison.
    Type: Application
    Filed: January 10, 2022
    Publication date: July 21, 2022
    Inventor: Kazuya TOKUNAGA
  • Publication number: 20220163984
    Abstract: A flow rate control apparatus can obtain a flow rate of a fluid passing through a downstream-side valve in a form in which noise is significantly reduced with little time delay, and has improved responsiveness. The flow rate control apparatus includes: a downstream-side valve flow rate meter that measures a downstream-side valve flow rate that is a flow rate of a fluid passing through a downstream-side valve; and an observer including a downstream-side valve flow rate estimation model that estimates the downstream-side valve flow rate on the basis of an input parameter that changes an opening degree of the downstream-side valve. The observer is configured so as to be fed back a deviation between the measured value of the downstream-side valve flow rate and the estimated value of the downstream-side valve flow rate.
    Type: Application
    Filed: November 18, 2021
    Publication date: May 26, 2022
    Inventors: Kazuya TOKUNAGA, Kotaro TAKIJIRI
  • Publication number: 20220043466
    Abstract: A flow rate control apparatus calculates a resistance flow rate, which is a flow rate of a fluid flowing through the fluid resistor, based on a first pressure measured by a first pressure sensor and a second pressure measured by a second pressure sensor, converts the resistance flow rate to a first valve flow rate, which is the flow rate of the fluid passing through a first valve, based on the first pressure, converts the resistance flow rate to a second valve flow rate, which is the flow rate of the fluid passing through a second valve, based on the second pressure, controls the first valve so that the deviation between a first set flow rate and the first valve flow rate becomes small, and controls the second valve so that the deviation between a second set flow rate and the second valve flow rate becomes small.
    Type: Application
    Filed: August 3, 2021
    Publication date: February 10, 2022
    Inventor: Kazuya TOKUNAGA
  • Patent number: 11162602
    Abstract: A fluid control valve can suppress heat generation when discharging charges from a piezo actuator for contraction and reduce energy necessary to drive the piezo actuator. The fluid control valve includes a piezo actuator and a drive circuit connected to the piezo actuator is adapted so that the drive circuit includes: a flyback transformer including a primary side coil connected to a DC power supply DV and a secondary side coil connected to the piezo actuator; a charge switch that is connected to the primary side coil and switched from on to off when the piezo actuator charges; a discharge switch that is connected to the secondary side coil and switched from off to on when the piezo actuator discharges; and a regenerative capacitor that is connected to the primary side coil and into which electric energy due to the discharge of the piezo actuator is regenerated.
    Type: Grant
    Filed: May 18, 2020
    Date of Patent: November 2, 2021
    Assignee: HORIBA STEC, Co., Ltd.
    Inventors: Jeffrey Ransdell, Kazuya Tokunaga
  • Publication number: 20200386341
    Abstract: A fluid control valve can suppress heat generation when discharging charges from a piezo actuator for contraction and reduce energy necessary to drive the piezo actuator. The fluid control valve includes a piezo actuator and a drive circuit connected to the piezo actuator is adapted so that the drive circuit includes: a flyback transformer including a primary side coil connected to a DC power supply DV and a secondary side coil connected to the piezo actuator; a charge switch that is connected to the primary side coil and switched from on to off when the piezo actuator charges; a discharge switch that is connected to the secondary side coil and switched from off to on when the piezo actuator discharges; and a regenerative capacitor that is connected to the primary side coil and into which electric energy due to the discharge of the piezo actuator is regenerated.
    Type: Application
    Filed: May 18, 2020
    Publication date: December 10, 2020
    Inventors: Jeffrey Ransdell, Kazuya Tokunaga
  • Patent number: 10777570
    Abstract: An annular dielectric spacer can be formed at a level of a joint-level dielectric material layer between vertically neighboring pairs of alternating stacks of insulating layers and spacer material layers. After formation of a memory opening through multiple alternating stacks and formation of a memory film therein, an anisotropic etch can be performed to remove a horizontal bottom portion of the memory film. The annular dielectric spacer can protect underlying portions of the memory film during the anisotropic etch. In addition, a silicon nitride barrier may be employed to suppress hydrogen diffusion at an edge region of peripheral devices.
    Type: Grant
    Filed: May 25, 2018
    Date of Patent: September 15, 2020
    Assignee: SANDISK TECHNOLOGIES LLC
    Inventors: Tadashi Nakamura, Jin Liu, Kazuya Tokunaga, Marika Gunji-Yoneoka, Matthias Baenninger, Hiroyuki Kinoshita, Murshed Chowdhury, Jiyin Xu
  • Publication number: 20190338402
    Abstract: A method for manufacturing a railway vehicle wheel is provided. The method comprises: in an electric heating furnace or converter, preparing steel containing, in mass %. 0.65% to 0.84% of C, 0.1% to 1.5% of Si, 0.05% to 1.5% of Mn, 0.025% or less of P, 0.015% or less of S, 0.001% to 0.08% of Al, and 0.05% to 1.5% of Cr, the balance being Fe and incidental impurities; casting the steel to obtain a material; hot rolling and/or hot forging the material to form a wheel; heating the wheel to Ac3 point +50° C. or higher; cooling the wheel from a start temperature of 700° C. or higher to a stop temperature of 500° C. to 650° C. at a rate of 1° C./s to 10° C./s; and then air cooling the wheel.
    Type: Application
    Filed: July 22, 2019
    Publication date: November 7, 2019
    Applicant: JFE STEEL CORPORATION
    Inventors: Tatsumi KIMURA, Takashi IWAMOTO, Shigeru ENDO, Minoru HONJO, Katsuyuki ICHIMIYA, Kazukuni HASE, Kazuya TOKUNAGA
  • Publication number: 20180277567
    Abstract: An annular dielectric spacer can be formed at a level of a joint-level dielectric material layer between vertically neighboring pairs of alternating stacks of insulating layers and spacer material layers. After formation of a memory opening through multiple alternating stacks and formation of a memory film therein, an anisotropic etch can be performed to remove a horizontal bottom portion of the memory film. The annular dielectric spacer can protect underlying portions of the memory film during the anisotropic etch. In addition, a silicon nitride barrier may be employed to suppress hydrogen diffusion at an edge region of peripheral devices.
    Type: Application
    Filed: May 25, 2018
    Publication date: September 27, 2018
    Inventors: Tadashi Nakamura, Jin Liu, Kazuya Tokunaga, Marika Gunji-Yoneoka, Matthias Baenninger, Hiroyuki Kinoshita, Murshed Chowdhury, Jiyin Xu
  • Patent number: 9991280
    Abstract: An annular dielectric spacer can be formed at a level of a joint-level dielectric material layer between vertically neighboring pairs of alternating stacks of insulating layers and spacer material layers. After formation of a memory opening through multiple alternating stacks and formation of a memory film therein, an anisotropic etch can be performed to remove a horizontal bottom portion of the memory film. The annular dielectric spacer can protect underlying portions of the memory film during the anisotropic etch. In addition, a silicon nitride barrier may be employed to suppress hydrogen diffusion at an edge region of peripheral devices.
    Type: Grant
    Filed: February 16, 2017
    Date of Patent: June 5, 2018
    Assignee: SANDISK TECHNOLOGIES LLC
    Inventors: Tadashi Nakamura, Jin Liu, Kazuya Tokunaga, Marika Gunji-Yoneoka, Matthias Baenninger, Hiroyuki Kinoshita, Murshed Chowdhury, Jiyin Xu, Dai Iwata, Hiroyuki Ogawa, Kazutaka Yoshizawa, Yasuaki Yonemochi
  • Publication number: 20170236835
    Abstract: An annular dielectric spacer can be formed at a level of a joint-level dielectric material layer between vertically neighboring pairs of alternating stacks of insulating layers and spacer material layers. After formation of a memory opening through multiple alternating stacks and formation of a memory film therein, an anisotropic etch can be performed to remove a horizontal bottom portion of the memory film. The annular dielectric spacer can protect underlying portions of the memory film during the anisotropic etch. In addition, a silicon nitride barrier may be employed to suppress hydrogen diffusion at an edge region of peripheral devices.
    Type: Application
    Filed: February 16, 2017
    Publication date: August 17, 2017
    Inventors: Tadashi NAKAMURA, Jin LIU, Kazuya TOKUNAGA, Marika GUNJI-YONEOKA, Matthias BAENNINGER, Hiroyuki KINOSHITA, Murshed CHOWDHURY, Jiyin XU, Dai IWATA, Hiroyuki OGAWA, Kazutaka YOSHIZAWA, Yasuaki YONEMOCHI
  • Publication number: 20170191149
    Abstract: Provided is a railway vehicle wheel that enables further reducing wear and fatigue damage of the wheel and rail in total. A railway vehicle wheel containing, in mass %: 0.65% to 0.84% of C; 0.1% to 1.5% of Si; 0.05% to 1.5% of Mn; 0.025% or less of P; 0.015% or less of S; 0.001% to 0.08% of Al; and 0.05% to 1.5% of Cr, the balance being Fe and incidental impurities, wherein a microstructure at least in a region extending from a tread to a depth of 15 mm is a pearlite structure, and a pearlite lamellar spacing at least in the region is 150 nm or less.
    Type: Application
    Filed: June 9, 2015
    Publication date: July 6, 2017
    Applicant: JFE STEEL CORPORATION
    Inventors: Tatsumi KIMURA, Takashi IWAMOTO, Shigeru ENDO, Minoru HONJO, Katsuyuki ICHIMIYA, Kazukuni HASE, Kazuya TOKUNAGA
  • Patent number: 9409606
    Abstract: When a front pillar on a driver's seat side is deformed to a vehicle rear side due to short overlap collision on the driver's seat side of an automobile, an instrument panel reinforcement bridged between left and right front pillars is bent at a long hole serving as a starting point and provided on an outer side of a column bracket in a vehicle width direction. Due to this, a steering column, which is mounted on the instrument panel reinforcement through the column bracket, is restrained from being displaced due to a load from the front pillar.
    Type: Grant
    Filed: April 10, 2014
    Date of Patent: August 9, 2016
    Assignee: TOYOTA JIDOSHA KABUSHIKI KAISHA
    Inventors: Mitsuaki Eshima, Kazuya Tokunaga
  • Patent number: 9337085
    Abstract: Air gaps are formed between bit lines by etching to remove sacrificial material from between bit lines. Bit lines are protected from etch damage. Sacrificial material may be selectively oxidized prior to deposition of bit line metal so that protective oxide lies along sides of bit lines during etch. Portions of protective material may be selectively formed on tops of bit lines prior to etching sacrificial material.
    Type: Grant
    Filed: July 25, 2014
    Date of Patent: May 10, 2016
    Assignee: SanDisk Technologies Inc.
    Inventors: Jong Sun Sel, Marika Gunji-Yoneoka, Naoki Takeguchi, Chan Park, Tuan D. Pham, Kazuya Tokunaga
  • Patent number: 9330969
    Abstract: Air gaps are formed between bit lines by etching to remove sacrificial material from between bit lines. Bit lines are protected from etch damage. Sacrificial material may be selectively oxidized prior to deposition of bit line metal so that protective oxide lies along sides of bit lines during etch. Portions of protective material may be selectively formed on tops of bit lines prior to etching sacrificial material.
    Type: Grant
    Filed: July 25, 2014
    Date of Patent: May 3, 2016
    Assignee: SanDisk Technologies Inc.
    Inventors: Jong Sun Sel, Marika Gunji-Yoneoka, Naoki Takeguchi, Chan Park, Tuan D. Pham, Kazuya Tokunaga
  • Publication number: 20160059900
    Abstract: When a front pillar on a driver's seat side is deformed to a vehicle rear side due to short overlap collision on the driver's seat side of an automobile, an instrument panel reinforcement bridged between left and right front pillars is bent at a long hole serving as a starting point and provided on an outer side of a column bracket in a vehicle width direction. Due to this, a steering column, which is mounted on the instrument panel reinforcement through the column bracket, is restrained from being displaced due to a load from the front pillar.
    Type: Application
    Filed: April 10, 2014
    Publication date: March 3, 2016
    Applicant: TOYOTA JIDOSHA KABUSHIKI KAISHA
    Inventors: Mitsuaki ESHIMA, Kazuya TOKUNAGA