Abstract: A semiconductor device includes: a first semiconductor chip on which a first alignment mark, a second alignment mark, first and second terminals for measuring conduction, a wiring that electrically connects the first alignment mark and the first terminal, and a wiring that electrically connects the second alignment mark and the second terminal are provided; and a second semiconductor chip on which a third alignment mark, a fourth alignment mark, and a wiring that electrically connects the third alignment mark and the fourth alignment mark are provided and which is bonded to the first semiconductor chip in such a way that the first alignment mark and the third alignment mark overlap each other, and the second alignment mark and the fourth alignment mark overlap each other.

Abstract: A disk device configured in such a manner that, in addition to tilt adjustment, the adjustment of the distance between a disk and an optical pickup can be easily performed.

Abstract: Provided are a substrate processing apparatus and a substrate processing method capable of processing of a substrate using a supercritical fluid without exposing the pattern formed on the substrate to an atmospheric environment. The substrate processing apparatus includes a cleaning bath configured to accommodate a substrate and clean the substrate by flowing a cleaning solution, and a processing vessel configured to accommodate the cleaning bath and process the substrate with a supercritical fluid.

Abstract: A disk device configured in such a manner that, in addition to tilt adjustment, the adjustment of the distance between a disk and an optical pickup can be easily performed.

Abstract: A disk device, wherein a disk clamp unit is further thinned. The disk device is provided with a spindle motor (300) for positioning and rotating a disk, an alignment ring (301) fixed to the rotating shaft of the spindle motor, and a clamp section (400) for mounting the disk on the spindle motor (300). The alignment ring (301) is provided with a projection section (301C) formed around the rotating shaft of the spindle motor (300), and a magnet (302) provided around the rotating shaft with a space provided between the magnet (302) and the projection section (301C). The clamp section (400) is provided with a center member (401) having formed therein a recessed space (401G) in which the projection section (301C) is fitted, and also with a member (402) to be attracted which is attracted by the magnet (302).

Abstract: Provided are a substrate processing apparatus and a substrate processing method capable of processing of a substrate using a supercritical fluid without exposing the pattern formed on the substrate to an atmospheric environment. The substrate processing apparatus includes a cleaning bath configured to accommodate a substrate and clean the substrate by flowing a cleaning solution, and a processing vessel configured to accommodate the cleaning bath and process the substrate with a supercritical fluid.

Abstract: A data recording device that can easily and reliably manage a plurality of recording media or information recording surfaces even when a data compression rate largely varies with the contents of the data and that can record, for example, mass image data by effectively preventing the picture quality of an image represented by the image data from being degraded. The data recording device records image data after securing a region according to the preliminarily estimated number of recording media or information recording surfaces at the time of recording image data by using a coding method, by which a data compression rate largely varies with the contents of data. Thereafter, the data recording device records management data used for managing the plurality of recording media or information recording surfaces, on which the coded data is recorded, on the management region according to a result of recording.

Abstract: An image data control apparatus includes a memory for storing image data and a reader for reading the image data from the memory. The reader can operate in a first mode for erasing the image data in association with the reading of the image data from the memory and can operate in a second mode for restoring the read image data in the storage means in association with the reading of the image data from the memory.

Abstract: A cleaning and drying apparatus includes a cleaning bath 22 for collecting cleaning liquid and also discharging the liquid, a drying chamber 23 arranged above the cleaning bath 22 and a wafer boat 24 for conveying semiconductor wafers W between the cleaning bath 22 and the drying chamber 23. Dry gas nozzles 37 for ejecting dry gas are provided in the drying chamber 23. A shutter 36 is arranged between the cleaning bath 22 and the drying chamber 23, for insulating the cleaning bath 22 from the drying chamber 23. A central processing unit 60 controls respective operations of the dry gas nozzles 37 and a driving unit 52 for the shutter 36. With the arrangement, after the wafers W have been cleaned in the cleaning bath 22, the cleaning liquid is discharged through a bottom of the bath 22, while the dry gas is supplied from the dry gas nozzles 37 to contact with surfaces of the wafers W and the cleaning liquid in a first drying process.

Abstract: A substrate transporting apparatus includes a wafer transfer arm 10 for carrying a plurality of semiconductor wafers W being processed horizontally, a pitch changer 20 for carrying the wafers W at predetermined intervals vertically and a posture changing device 30 positioned between the wafer transfer arm 10 and the pitch changer 20, for changing the posture of the wafers W to the horizontal and vertical arrangements. The pitch changer 20 includes a first holding part 21A and a second holding part 21B which are adapted so as to elevate relatively to each other. The wafers W are held by either one of the holding parts 21A, 21B at the predetermined intervals. The posture changing device 30 has a pair of holders 31 between which the semiconductor wafers W is interposed. The holders 31 are respectively provided, on their sides opposing each other, with a plurality of holding grooves 32A, 32B for retaining the wafers W independently.

Abstract: A substrate transporting apparatus includes a wafer transfer arm 10 for carrying a plurality of semiconductor wafers W being processed horizontally, a pitch changer 20 for carrying the wafers W at predetermined intervals vertically and a posture changing device 30 positioned between the wafer transfer arm 10 and the pitch changer 20, for changing the posture of the wafers W to the horizontal and vertical arrangements. The pitch changer 20 includes a first holding part 21A and a second holding part 21B which are adapted so as to elevate relatively to each other. The wafers W are held by either one of the holding parts 21A, 21B at the predetermined intervals. The posture changing device 30 has a pair of holders 31 between which the semiconductor wafers W is interposed. The holders 31 are respectively provided, on their sides opposing each other, with a plurality of holding grooves 32A, 32B for retaining the wafers W independently.

Abstract: A cleaning and drying apparatus includes a cleaning bath 22 for collecting cleaning liquid and also discharging the liquid, a drying chamber 23 arranged above the cleaning bath 22 and a wafer boat 24 for conveying semiconductor wafers W between the cleaning bath 22 and the drying chamber 23. Dry gas nozzles 37 for ejecting dry gas are provided in the drying chamber 23. A shutter 36 is arranged between the cleaning bath 22 and the drying chamber 23, for insulating the cleaning bath 22 from the drying chamber 23. A central processing unit 60 controls respective operations of the dry gas nozzles 37 and a driving unit 52 for the shutter 36. With the arrangement, after the wafers W have been cleaned in the cleaning bath 22, the cleaning liquid is discharged through a bottom of the bath 22, while the dry gas is supplied from the dry gas nozzles 37 to contact with surfaces of the wafers W and the cleaning liquid in a first drying process.

Abstract: A data recording device that can easily and reliably manage a plurality of recording media or information recording surfaces even when a data compression rate largely varies with the contents of the data and that can record, for example, mass image data by effectively preventing the picture quality of an image represented by the image data from being degraded. The data recording device records image data after securing a region according to the preliminarily estimated number of recording media or information recording surfaces at the time of recording image data by using a coding method, by which a data compression rate largely varies with the contents of data. Thereafter, the data recording device records management date used for managing the plurality of recording media or information recording surfaces, on which the coded data is recorded, on the management region according to a result of recording.

Abstract: An output apparatus to generate a decoration rule pattern comprises: a memory to store data indicative of a kind of pattern to be generated and data indicative of an output position of the pattern; and a making circuit to make a pattern on the basis of the data indicative of the kind of the pattern to be generated and the data indicative of the output position which are stored in the memory, wherein the making circuit continuously makes a plurality of units of the pattern to be generated, makes a rotation pattern (rotated version) of the unit, and makes a pattern of an edge portion of the pattern to be generated from the unit. With the apparatus, a decoration rule pattern can be drawn at the high speed and with high quality by rotating a pattern and repetitively generating a pattern.

Abstract: An image forming apparatus includes a print data input device for inputting print data, a processor for performing data-processing of the print data, and an output device for outputting the processed print data as image data to an image forming unit. The processor includes a first setting device for setting line direction data representing a line direction, a second setting device for setting character direction data representing character direction, and a third setting device for setting line feed direction data representing line feed direction. The processor determines a processing mode of the inputted print data on the basis of the line direction data, the character direction data, and the line feed direction data.

Abstract: An image recording apparatus has image forming means for forming an image on a record medium. The image forming means determines a record mode in accordance with designated page direction and print direction.

Abstract: An apparatus for recording an image on a record medium includes an image forming device which operates in a plurality of record modes, and a control device for determining the record mode to be used on the basis of inputted page direction information and inputted print direction information.