Patents by Inventor Kazyuki Hayashi

Kazyuki Hayashi has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Reflective mask blank for EUV lithography
    Patent number: 8088538
    Abstract: Provision of a reflective mask blank for EUV lithography having an absorber layer which has a low reflectance in the wavelength regions of EUV light and pattern inspection light and whose film composition and film thickness are easily controllable to desired ones. A reflective mask blank for EUV lithography, which comprises a substrate, and a reflective layer to reflect EUV light and an absorber layer to absorb EUV light, formed in this order on the substrate, wherein the absorber layer contains tantalum (Ta), boron (B) and silicon (Si), and in the absorber layer, the content of B is at least 1 at. % and less than 5 at. % and the content of Si is from 1 to 25 at. %, and wherein the absorber layer contains no nitrogen (N) or at most 10 at. % of N.
    Type: Grant
    Filed: October 14, 2009
    Date of Patent: January 3, 2012
    Assignee: Asahi Glass Company, Limited
    Inventors: Kazyuki Hayashi, Kazuo Kadowaki, Masaki Mikami, Takashi Sugiyama