Patents by Inventor Ke Chang

Ke Chang has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20240111935
    Abstract: A method of generating an IC layout diagram includes receiving the IC layout diagram including an active region, a gate region extending across the active region from a first active region edge to a second active region edge, and a gate via positioned at a location along the gate region between the first and second edges, configuring a delta resistance network including the first and second edges, a midpoint between the first and second edges, and resistance values based on the location and first and second edges, and performing a simulation based on the delta resistance network.
    Type: Application
    Filed: November 27, 2023
    Publication date: April 4, 2024
    Inventors: Ke-Ying SU, Ke-Wei SU, Keng-Hua KUO, Lester CHANG
  • Patent number: 11923630
    Abstract: An electrical connector assembly includes: a bracket; and at least one transmission assembly mounted to the bracket and including an internal printed circuit board (PCB), a board-mount connector connected to a first row of conductive pads disposed at a bottom end portion of the PCB, and a plug-in connector connected to a second row of conductive pads disposed at a front end portion of the PCB, wherein the PCB has a third row of conductive pads disposed at a rear end portion thereof.
    Type: Grant
    Filed: November 2, 2021
    Date of Patent: March 5, 2024
    Assignees: FUDING PRECISION INDUSTRY (ZHENGZHOU) CO., LTD., FOXCONN INTERCONNECT TECHNOLOGY LIMITED
    Inventors: Shih-Wei Hsiao, Yu-San Hsiao, Yen-Chih Chang, Yu-Ke Chen, Na Yang, Wei-Hua Zhang
  • Patent number: 11275300
    Abstract: Extreme ultraviolet (EUV) mask blanks, methods for their manufacture, and production systems therefor are disclosed. The method for forming an EUV mask blank comprises placing a substrate in a multi-cathode physical vapor deposition chamber, the chamber comprising at least three targets, a first molybdenum target adjacent a first side of a silicon target and a second molybdenum target adjacent a second side of the silicon target.
    Type: Grant
    Filed: July 3, 2019
    Date of Patent: March 15, 2022
    Assignee: Applied Materials Inc.
    Inventors: Sai Abhinand, Shuwei Liu, Hui Ni Grace Fong, Ke Chang, Vibhu Jindal
  • Patent number: 10957590
    Abstract: Implementations of the present disclosure generally relate to the fabrication of integrated circuits, and more particularly, to methods for forming a layer. The layer may be a mask used in lithography process to pattern and form a trench. The mask is formed over a substrate having at least two distinct materials by a selective deposition process. The edges of the mask are disposed on an intermediate layer formed on at least one of the two distinct materials. The method includes removing the intermediate layer to form a gap between edges of the mask and the substrate and filling the gap with a different material than the mask or with the same material as the mask. By filling the gap with the same or different material as the mask, electrical paths are improved.
    Type: Grant
    Filed: October 30, 2019
    Date of Patent: March 23, 2021
    Assignee: Applied Materials, Inc.
    Inventors: Wenhui Wang, Huixiong Dai, Christopher S. Ngai, Liqi Wu, Wenyu Zhang, Yongmei Chen, Hao Chen, Keith Tatseun Wong, Ke Chang
  • Publication number: 20200161181
    Abstract: Implementations of the present disclosure generally relate to the fabrication of integrated circuits, and more particularly, to methods for forming a layer. The layer may be a mask used in lithography process to pattern and form a trench. The mask is formed over a substrate having at least two distinct materials by a selective deposition process. The edges of the mask are disposed on an intermediate layer formed on at least one of the two distinct materials. The method includes removing the intermediate layer to form a gap between edges of the mask and the substrate and filling the gap with a different material than the mask or with the same material as the mask. By filling the gap with the same or different material as the mask, electrical paths are improved.
    Type: Application
    Filed: October 30, 2019
    Publication date: May 21, 2020
    Inventors: Wenhui WANG, Huixiong DAI, Christopher S. NGAI, Liqi WU, Wenyu ZHANG, Yongmei CHEN, Hao CHEN, Keith Tatseun WONG, Ke CHANG
  • Patent number: 10629430
    Abstract: Methods and apparatus for processing a substrate are described herein. A vacuum multi-chamber deposition tool can include a degas chamber with both a heating mechanism and a variable frequency microwave source. The methods described herein use variable frequency microwave radiation to increased quality and speed of the degas process without damaging the various components.
    Type: Grant
    Filed: April 20, 2018
    Date of Patent: April 21, 2020
    Assignee: APPLIED MATERIALS, INC.
    Inventors: Loke Yuen Wong, Ke Chang, Yueh Sheng Ow, Ananthkrishna Jupudi, Glen T. Mori, Aksel Kitowski, Arkajit Roy Barman
  • Publication number: 20200012183
    Abstract: Extreme ultraviolet (EUV) mask blanks, methods for their manufacture, and production systems therefor are disclosed. The method for forming an EUV mask blank comprises placing a substrate in a multi-cathode physical vapor deposition chamber, the chamber comprising at least three targets, a first molybdenum target adjacent a first side of a silicon target and a second molybdenum target adjacent a second side of the silicon target.
    Type: Application
    Filed: July 3, 2019
    Publication date: January 9, 2020
    Inventors: Sai Abhinand, Shuwei Liu, Hui Ni Grace Fong, Ke Chang, Vibhu Jindal
  • Patent number: 10141641
    Abstract: A dual band antenna apparatus including a heat sink and a dual band antenna is provided. The heat sink is disposed on the dual band antenna. The dual band antenna includes a first radiator and a second radiator. The first radiator and the heat sink are oppositely disposed. The first radiator has a first open terminal, a first ground terminal and a feeding point. The first radiator receives a feeding signal through the feeding point to generate a first resonance mode, and thus the dual band antenna is capable of receiving or sending and both a first band signal. The second radiator is connected to the heat sink and has a second open terminal and a second ground terminal. The second open terminal of the second radiator is coupled with the first radiator and excited to generate a second resonance mode, thus the dual band antenna is capable of receiving or sending and both a second band signal.
    Type: Grant
    Filed: February 17, 2017
    Date of Patent: November 27, 2018
    Assignee: PEGATRON CORPORATION
    Inventors: Jung-Yi Huang, Ke-Chang Huang, Yi-Jung Huang
  • Publication number: 20180240666
    Abstract: Methods and apparatus for processing a substrate are described herein. A vacuum multi-chamber deposition tool can include a degas chamber with both a heating mechanism and a variable frequency microwave source. The methods described herein use variable frequency microwave radiation to increased quality and speed of the degas process without damaging the various components.
    Type: Application
    Filed: April 20, 2018
    Publication date: August 23, 2018
    Inventors: Loke Yuen WONG, Ke CHANG, Yueh Sheng OW, Ananthkrishna JUPUDI, Glen T. MORI, Aksel KITOWSKI, Arkajit Roy BARMAN
  • Patent number: 9960035
    Abstract: Methods and apparatus for processing a substrate are described herein. A vacuum multi-chamber deposition tool can include a degas chamber with both a heating mechanism and a variable frequency microwave source. The methods described herein use variable frequency microwave radiation to increased quality and speed of the degas process without damaging the various components.
    Type: Grant
    Filed: January 5, 2017
    Date of Patent: May 1, 2018
    Assignee: APPLIED MATERIALS, INC.
    Inventors: Loke Yuen Wong, Ke Chang, Yueh Sheng Ow, Ananthkrishna Jupudi, Glen T. Mori, Aksel Kitowski, Arkajit Roy Barman
  • Publication number: 20180056577
    Abstract: The present invention is a flexible mold with variable thickness which is a mold body with nano-imprinting micro-structure, and the mold body is gradually thickened from its periphery to the middle. When the flexible mold with variable thickness of the present invention is subjected to a force or displaced, a larger amount of compression may be produced to cause a larger contact pressure between the micro-structure at the bottom of the mold body and the imprinted object, and to control the amount of deformation of the mold body upon stripping by the thickness difference of the mold body for overcoming the previous defect caused by the excessive draft angle or sharp pressure release.
    Type: Application
    Filed: August 24, 2017
    Publication date: March 1, 2018
    Inventors: Yung-Chun LEE, Yi-Chun TSAI, Chun-Ying WU, Wei-Hsiang SU, Shao-Hsuan HUANG, Ke-Chang LU
  • Publication number: 20170264016
    Abstract: A dual band antenna apparatus including a heat sink and a dual band antenna is provided. The heat sink is disposed on the dual band antenna. The dual band antenna includes a first radiator and a second radiator. The first radiator and the heat sink are oppositely disposed. The first radiator has a first open terminal, a first ground terminal and a feeding point. The first radiator receives a feeding signal through the feeding point to generate a first resonance mode, and thus the dual band antenna is capable of receiving or sending and both a first band signal. The second radiator is connected to the heat sink and has a second open terminal and a second ground terminal. The second open terminal of the second radiator is coupled with the first radiator and excited to generate a second resonance mode, thus the dual band antenna is capable of receiving or sending and both a second band signal.
    Type: Application
    Filed: February 17, 2017
    Publication date: September 14, 2017
    Applicant: PEGATRON CORPORATION
    Inventors: Jung-Yi Huang, Ke-Chang Huang, Yi-Jung Huang
  • Publication number: 20170117146
    Abstract: Methods and apparatus for processing a substrate are described herein. A vacuum multi-chamber deposition tool can include a degas chamber with both a heating mechanism and a variable frequency microwave source. The methods described herein use variable frequency microwave radiation to increased quality and speed of the degas process without damaging the various components.
    Type: Application
    Filed: January 5, 2017
    Publication date: April 27, 2017
    Inventors: Loke Yuen WONG, Ke CHANG, Yueh Sheng OW, Ananthkrishna JUPUDI, Glen T. MORI, Aksel KITOWSKI, Arkajit Roy BARMAN
  • Patent number: 9548200
    Abstract: Methods and apparatus for processing a substrate are described herein. A vacuum multi-chamber deposition tool can include a degas chamber with both a heating mechanism and a variable frequency microwave source. The methods described herein use variable frequency microwave radiation to increased quality and speed of the degas process without damaging the various components.
    Type: Grant
    Filed: July 2, 2014
    Date of Patent: January 17, 2017
    Assignee: APPLIED MATERIALS, INC.
    Inventors: Loke Yuen Wong, Ke Chang, Yueh Sheng Ow, Ananthkrishna Jupudi, Glen T. Mori, Aksel Kitowski, Arkajit Roy Barman
  • Publication number: 20160219999
    Abstract: The present invention is to provide a protective case embedded with elastic cushion plates and applicable to a portable electronic device (e.g., a smartphone, tablet PC, or e-book reader), which includes a case body made of a first elastic material (e.g., thermoplastic polyurethane) and having four sidewalls and four curved walls each connecting two adjacent sidewalls to jointly form a receiving space, and four elastic cushion plates made of a second elastic material (e.g., silicone) whose hardness is less than that of the first elastic material. Each curved wall is embedded with the elastic cushion plate. Thus, when the portable electronic device is fitted into the receiving space through an opening of the protective case, four corners of the portable electronic device lie against the elastic cushion plates respectively, so as to ensure that the elastic cushion plate can greatly reduces impact of an external force applied to the corner.
    Type: Application
    Filed: March 9, 2015
    Publication date: August 4, 2016
    Inventor: Ke-Chang CHANG
  • Publication number: 20150056819
    Abstract: Methods and apparatus for processing a substrate are described herein. A vacuum multi-chamber deposition tool can include a degas chamber with both a heating mechanism and a variable frequency microwave source. The methods described herein use variable frequency microwave radiation to increased quality and speed of the degas process without damaging the various components.
    Type: Application
    Filed: July 2, 2014
    Publication date: February 26, 2015
    Inventors: Loke Yuen WONG, Ke CHANG, Yueh Sheng OW, Ananthkrishna JUPUDI, Glen T. MORI, Aksel KITOWSKI, Arkajit Roy BARMAN
  • Patent number: 8950582
    Abstract: The present invention is to provide a. protective case having elastically deformable air chambers for impact reduction, which is made of an elastically deformable material and includes at least four lateral walls and at least four outer curved walls each connecting adjacent lateral wails, such that the outer curved wails and the lateral walls jointly form and enclose a receiving space. When a portable electronic device is received in the receiving space, the inner sides of the lateral walls lie against the four lateral sides of the periphery of the portable electronic device respectively. Meanwhile, the outer curved walls correspond in position to the four corners of the portable electronic device respectively, but the inner sides of the outer curved walls are not in contact with the portable electronic device, so as to form the air chambers between the outer curved walls and the portable electronic device respectively.
    Type: Grant
    Filed: March 15, 2013
    Date of Patent: February 10, 2015
    Inventor: Ke-Chang Chang
  • Publication number: 20140216973
    Abstract: The present invention is to provide a. protective case having elastically deformable air chambers for impact reduction, which is made of an elastically deformable material and includes at least four lateral walls and at least four outer curved walls each connecting adjacent lateral wails, such that the outer curved wails and the lateral walls jointly form and enclose a receiving space. When a portable electronic device is received in the receiving space, the inner sides of the lateral walls lie against the four lateral sides of the periphery of the portable electronic device respectively. Meanwhile, the outer curved walls correspond in position to the four corners of the portable electronic device respectively, but the inner sides of the outer curved walls are not in contact with the portable electronic device, so as to form the air chambers between the outer curved walls and the portable electronic device respectively.
    Type: Application
    Filed: March 15, 2013
    Publication date: August 7, 2014
    Inventor: Ke-Chang CHANG
  • Patent number: 8157599
    Abstract: An electrical connector includes an insulating housing with a tongue plate protruding forwards from a front portion thereof and a plurality of conductive terminals comprising an upper row of conductive terminals and a lower row of conductive terminals which are mounted on upper and lower sides of the tongue plate respectively. The terminals include a butting portion, a soldering portion, and a bending portion connected between the butting portion and the soldering portion. At least one positioning modules is mounted into the accommodating chamber of the insulating housing so that it envelopes a periphery of the bending portions of the plurality of conductive terminals.
    Type: Grant
    Filed: September 23, 2011
    Date of Patent: April 17, 2012
    Assignee: Molex Incorporated
    Inventor: Ke Chang Wei
  • Patent number: D783588
    Type: Grant
    Filed: June 2, 2015
    Date of Patent: April 11, 2017
    Inventor: Ke-Chang Chang