Abstract: An abrasive cloth dresser which can efficiently remove reaction products soaked into abrasive cloths for polishing semiconductor wafers etc. without scattering the reaction products. The abrasive cloth dresser includes a rotating hollow arm shaft 7, a high-pressure pure water jetting head 8 provided at a distal end of the hollow arm shaft, and a brush hood 11 provided at a distal end of the high-pressure pure water jetting head 8 and having a brush 16 planted thereto. The high-pressure pure water jetting head 8 includes a jet nozzle 83 through which high-pressure pure water is jetted for impacting reaction products soaked into a piece of abrasive cloth 3 to come out for removal. The brush 16 is elliptical in shape, and has a planted bristle density which is lower in a brush left-hand portion 161 near the high-pressure pure water injection center IC, but higher in a brush central portion 162 and a brush right-hand portion 163.

Abstract: There is disclosed a method for crimping an open end of a can body. A male die is inserted into the can body through the open end in such a manner as to be coaxial therewith. Then, the female die is caused to fit on the opening end, and the female die is kept moving along the outer peripheral surface of the male die while moving the male die, inserted into the can body, in a releasing direction from the can body. Thus, the opening end is crimped by the relative movement of the male and female dies. There is also disclosed a crimping apparatus which includes at least one crimping mechanism, a holder for holding the can body at a prescribed position, a complex cam and a drive mechanism. The crimping mechanism includes male and female dies, follower members connected to the male and female dies, respectively. The cam includes first and second cam faces with which the first and second follower members are respectively held in engagement.