Abstract: For providing a liquid crystal device comprising a structure capable of uniformly supporting a terrace area in the liquid crystal device, a pair of insulation films 112 are formed on the terrace area 11a so as to cover a part of wiring lines 131a and 131b simultaneously with forming the insulation films 112 on electrodes 111 using the same material as the insulation film on the electrodes, and an orientation film 113 is additionally formed on the insulation films 112. The orientation film 113 is also formed on the insulation films 112 formed on the terrace area 11a, and the orientation film 113 is formed so as to expand out of the outer edge of the insulation films 112.

Abstract: A cleaning apparatus includes cleaning vessels 2a and 2b for storing cleaning water “W1” used for cleaning an article to be cleaned 14; concentrating vessels 3a and 3b for storing sewage “W2” discharged from the cleaning vessels; an ultrafiltration membrane 11 for receiving the sewage “W2” discharged from the concentrating vessels to separate the received sewage into filtered water “W3” and concentrated sewage “W5”; and waterway lines “L4” and “L12” for returning the concentrated sewage “W5” discharged from the ultrafiltration membrane 11 to the concentrating vessels 3a and 3b. The filth is removed from the article to be cleaned 14 by dipping the article to be cleaned 14 into the cleaning water “W1”. The ultrafiltration membrane 11 is provided with a backwash filtration system “L9”, “B4”, and “P3” for removing filthy refuse.