Patents by Inventor Keiichiro Hitomi

Keiichiro Hitomi has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20230114172
    Abstract: An information processing system, a device, and an authentication method. The information processing system includes an information processing apparatus and a device communicably connected to the information processing apparatus, and the device requests the information processing apparatus for account information in response to receiving a predetermined operation, and the information processing apparatus transmits the account information to the device, and the device requests authentication from an authentication server, designating the account information received from the information processing apparatus, and acquires an authentication result.
    Type: Application
    Filed: September 7, 2022
    Publication date: April 13, 2023
    Applicant: Ricoh Company, Ltd.
    Inventor: Keiichiro Hitomi
  • Patent number: 11626266
    Abstract: Provided is a charged particle beam device capable of focusing with high accuracy even when a charged particle beam has a large off-axis amount. The charged particle beam device generates an observation image of a sample by irradiating the sample with a charged particle beam, and includes: a deflection unit that inclines the charged particle beam; a focusing lens that focuses the charged particle beam; an adjustment unit that adjusts a lens strength of the focusing lens based on an evaluation value calculated from the observation image; a storage unit that stores a relationship between a visual field movement amount and the lens strength; and a filter setting unit that calculates the visual field movement amount based on an inclination angle of the charged particle beam and the relationship, and sets an image filter to be superimposed on the observation image based on the calculated visual field movement amount.
    Type: Grant
    Filed: October 14, 2021
    Date of Patent: April 11, 2023
    Assignee: Hitachi High-Tech Corporation
    Inventors: Keiichiro Hitomi, Kenji Tanimoto, Yusuke Abe, Takuma Yamamoto, Kei Sakai, Satoru Yamaguchi, Yasunori Goto, Shuuichirou Takahashi
  • Publication number: 20230094023
    Abstract: To provide a charged particle beam image processing device in which a proper inspection region for an observation image that includes an edge of a line pattern can be set.
    Type: Application
    Filed: September 27, 2022
    Publication date: March 30, 2023
    Applicant: Hitachi High-Tech Corporation
    Inventors: Keiichiro HITOMI, Takahiro KAWASAKI
  • Publication number: 20220294929
    Abstract: An information processing system includes an information processing apparatus including a first processor and a first memory storing first program instructions and includes an information processing server including a second processor and a second memory storing second program instructions that cause the second processor to authenticate a user logging in to the information processing apparatus, wherein the first program instructions cause the first processor to log in the user as a guest user when the information processing server is not usable by the information processing apparatus.
    Type: Application
    Filed: February 23, 2022
    Publication date: September 15, 2022
    Applicant: Ricoh Company, Ltd.
    Inventor: Keiichiro HITOMI
  • Patent number: 11394844
    Abstract: An authentication system includes a shared terminal; and at least one information processing apparatus coupled to the shared terminal via a communication network. The shared terminal includes an authentication controller configured to, upon detecting that the shared terminal is activated, acquire authentication screen data, from the at least one information processing apparatus, for authentication performed for using an internal function of the shared terminal, display an authentication screen based on the acquired authentication screen data, and transmit, to the at least one information processing apparatus, input information that is input to the displayed authentication screen by a user; and an internal function operator configured to display a screen for using the internal function of the shared terminal, upon acquiring information indicating that an authentication process, which is performed based on the input information at the at least one information processing apparatus, is successful.
    Type: Grant
    Filed: September 28, 2020
    Date of Patent: July 19, 2022
    Assignee: Ricoh Company, Ltd.
    Inventors: Xiaofeng Han, Keiichiro Hitomi, Shikou Miyamoto
  • Publication number: 20220130638
    Abstract: Provided is a charged particle beam device capable of focusing with high accuracy even when a charged particle beam has a large off-axis amount. The charged particle beam device generates an observation image of a sample by irradiating the sample with a charged particle beam, and includes: a deflection unit that inclines the charged particle beam; a focusing lens that focuses the charged particle beam; an adjustment unit that adjusts a lens strength of the focusing lens based on an evaluation value calculated from the observation image; a storage unit that stores a relationship between a visual field movement amount and the lens strength; and a filter setting unit that calculates the visual field movement amount based on an inclination angle of the charged particle beam and the relationship, and sets an image filter to be superimposed on the observation image based on the calculated visual field movement amount.
    Type: Application
    Filed: October 14, 2021
    Publication date: April 28, 2022
    Applicant: Hitachi High-Tech Corporation
    Inventors: Keiichiro HITOMI, Kenji TANIMOTO, Yusuke ABE, Takuma YAMAMOTO, Kei SAKAI, Satoru YAMAGUCHI, Yasunori GOTO, Shuuichirou TAKAHASHI
  • Patent number: 11276548
    Abstract: Provided are a charged particle beam device and a charged particle beam adjustment method capable of observing or inspecting a change in observation conditions in a more appropriate beam state while preventing an increase in a time required for each measurement point. The charged particle beam device includes a condenser lens 3 and an objective lens 14 configured to focus an electron beam 4 emitted from an electron source 2, a primary beam scanning deflector 5 or a secondary electron deflector 15, an adjusting element 13 configured to adjust an axis of the electron beam 4, and a control device 9 configured to supply a signal representing a control amount to the adjusting element 13 for control.
    Type: Grant
    Filed: November 23, 2020
    Date of Patent: March 15, 2022
    Assignee: Hitachi High-Tech Corporation
    Inventors: Hitomi Sakai, Daisuke Sato, Keiichiro Hitomi, Hiroyuki Saito, Kazuma Tanii
  • Publication number: 20210377250
    Abstract: An authentication system includes a device and at least one information processing apparatus connected to the device via a network. The information processing apparatus includes one or more memories and first circuitry. The one or more memories store user information and setting information indicating whether omission of a password is permitted in authentication. The first circuitry receives, from the device, an authentication request signal that includes an identifier for identifying a user but does not include a password. The first circuitry, in response to the setting information indicating that omission of the password is permitted and in response to the user information including information on the user identified by the identifier, transmits information indicating successful authentication to the device.
    Type: Application
    Filed: May 10, 2021
    Publication date: December 2, 2021
    Applicant: Ricoh Company, Ltd.
    Inventor: Keiichiro Hitomi
  • Publication number: 20210233735
    Abstract: Provided are a charged particle beam device and a charged particle beam adjustment method capable of observing or inspecting a change in observation conditions in a more appropriate beam state while preventing an increase in a time required for each measurement point. The charged particle beam device includes a condenser lens 3 and an objective lens 14 configured to focus an electron beam 4 emitted from an electron source 2, a primary beam scanning deflector 5 or a secondary electron deflector 15, an adjusting element 13 configured to adjust an axis of the electron beam 4, and a control device 9 configured to supply a signal representing a control amount to the adjusting element 13 for control.
    Type: Application
    Filed: November 23, 2020
    Publication date: July 29, 2021
    Inventors: Hitomi SAKAI, Daisuke SATO, Keiichiro HITOMI, Hiroyuki SAITO, Kazuma TANII
  • Publication number: 20210099599
    Abstract: An authentication system includes a shared terminal; and at least one information processing apparatus coupled to the shared terminal via a communication network. The shared terminal includes an authentication controller configured to, upon detecting that the shared terminal is activated, acquire authentication screen data, from the at least one information processing apparatus, for authentication performed for using an internal function of the shared terminal, display an authentication screen based on the acquired authentication screen data, and transmit, to the at least one information processing apparatus, input information that is input to the displayed authentication screen by a user; and an internal function operator configured to display a screen for using the internal function of the shared terminal, upon acquiring information indicating that an authentication process, which is performed based on the input information at the at least one information processing apparatus, is successful.
    Type: Application
    Filed: September 28, 2020
    Publication date: April 1, 2021
    Applicant: Ricoh Company, Ltd.
    Inventors: Xiaofeng HAN, Keiichiro HITOMI, Shikou MIYAMOTO
  • Patent number: 10546017
    Abstract: An information processing apparatus is capable of displaying terms each having a character string embedded in an application and terms each having a character string to be added by at least one term module for the application, on a screen of the application. The information processing apparatus includes circuitry. The circuitry determines, during startup of the information processing apparatus, whether at least one of the application and the at least one term module has been updated. The circuitry generates association information to be stored in a memory, based on determination that at least one of the application and the at least one term module has been updated. The circuitry acquires one of term identification information of the application and term identification information of the at least one term module from the memory. The circuitry selects a character string to be displayed, using the term identification information acquired.
    Type: Grant
    Filed: July 3, 2018
    Date of Patent: January 28, 2020
    Assignee: Ricoh Company, Ltd.
    Inventors: Keiichiro Hitomi, Kazuki Sasayama, Tatsuma Hirokawa, Zentaroh Ono
  • Patent number: 10416940
    Abstract: Example embodiments of the present disclosure include image processing apparatus installed with a web browser that includes circuitry and an image processing device. The circuitry interprets content obtained from a web server connected to the image processing apparatus via a network, displays a screen based on the interpreted content, requests the web server to process according to a user input on the displayed screen, and requests the image processing device to perform predetermined image processing.
    Type: Grant
    Filed: March 15, 2018
    Date of Patent: September 17, 2019
    Assignee: Ricoh Company, Ltd.
    Inventors: Hiroki Asakimori, Tomohiro Kuroyanagi, Yuuta Saitoh, Nobuya Monden, Yohsuke Utoh, Keiichiro Hitomi
  • Publication number: 20190012402
    Abstract: An information processing apparatus is capable of displaying terms each having a character string embedded in an application and terms each having a character string to be added by at least one term module for the application, on a screen of the application. The information processing apparatus includes circuitry. The circuitry determines, during startup of the information processing apparatus, whether at least one of the application and the at least one term module has been updated. The circuitry generates association information to be stored in a memory, based on determination that at least one of the application and the at least one term module has been updated. The circuitry acquires one of term identification information of the application and term identification information of the at least one term module from the memory. The circuitry selects a character string to be displayed, using the term identification information acquired.
    Type: Application
    Filed: July 3, 2018
    Publication date: January 10, 2019
    Inventors: Keiichiro HITOMI, Kazuki Sasayama, Tatsuma Hirokawa, Zentaroh Ono
  • Publication number: 20180267753
    Abstract: Example embodiments of the present disclosure include image processing apparatus installed with a web browser that includes circuitry and an image processing device. The circuitry interprets content obtained from a web server connected to the image processing apparatus via a network, displays a screen based on the interpreted content, requests the web server to process according to a user input on the displayed screen, and requests the image processing device to perform predetermined image processing.
    Type: Application
    Filed: March 15, 2018
    Publication date: September 20, 2018
    Inventors: Hiroki ASAKIMORI, Tomohiro KUROYANAGI, Yuuta SAITOH, Nobuya MONDEN, Yohsuke UTOH, Keiichiro HITOMI
  • Publication number: 20180068345
    Abstract: An information processing apparatus includes processors to control a display of a setting information reception screen used to receive setting information, and an execution instruction of information processing, a primary memory to store a primary application used for requesting the processors to execute the information processing based on the setting information and the execution instruction, and a secondary memory to store a secondary application, and a function providing application. When the secondary application receives an instruction, the secondary application transfers the instruction to the function providing application.
    Type: Application
    Filed: September 6, 2017
    Publication date: March 8, 2018
    Inventors: Tatsuma HIROKAWA, Mari TATEZONO, Keiichiro HITOMI
  • Patent number: 9200896
    Abstract: In order to provide a pattern dimension measurement method with a small measured error and excellent reproducibility even though defocus occurs and a charged particle beam microscope used in the same, in a method for applying a charged particle beam to a specimen formed with a pattern to measure a pattern dimension from a signal intensity distribution of signal charged particles from the specimen, edge index positions (X1) and (X2) on the right and left of the maximum point of signal intensity corresponding to a pattern edge are calculated by a threshold method, and a pattern edge position (Xe) is found from a mean value between the positions. Thus, it is possible to reduce the influence of defocus on the pattern edge position (Xe).
    Type: Grant
    Filed: September 30, 2010
    Date of Patent: December 1, 2015
    Assignee: Hitachi High-Technologies Corporation
    Inventors: Keiichiro Hitomi, Yoshinori Nakayama, Junichi Tanaka
  • Patent number: 9110384
    Abstract: Disclosed is a scanning electron microscope provided with a calculation device (403) for measuring the dimension of a pattern on a sample (413), characterized in that the amount of change of a pattern shape, caused by electron beam irradiation, is calculated and stored, and a pattern shape contour (614; 815; 1512) before the sample is irradiated with an electron beam is restored from a pattern shape contour (613; 814; 1511) in a scanning electron microscope image (612; 813; 1510) after the sample is irradiated with an electron beam using the calculated amount and, then, the pattern shape contour (614; 815; 1512) is displayed. Thus, the shrinking of a resist and/or the effect of electrostatic charge caused when a sample is irradiated with an electron beam are eliminated, so that the shape contour of a two-dimensional pattern before irradiating an electron beam can be restored with a high degree of accuracy, and the dimension of a pattern can be measured with a high degree of accuracy, using the restored image.
    Type: Grant
    Filed: January 21, 2011
    Date of Patent: August 18, 2015
    Assignee: HITACHI HIGH-TECHNOLOGIES CORPORATION
    Inventors: Seiko Omori, Junichi Tanaka, Yoshinori Nakayama, Keiichiro Hitomi
  • Patent number: 8637820
    Abstract: Provided is a high-resolution scanning electron microscope with minimal aberration, and equipped with an electro-optical configuration that can form a tilted beam having wide-angle polarization and a desired angle, without interfering with an electromagnetic lens. In the scanning electron microscope, an electromagnetic deflector (201) is disposed above a magnetic lens (207), and a control electrode (202) that accelerates or decelerates electrons is provided so at to overlap (in such a manner that the height positions overlap with respect to the vertical direction) with the electromagnetic deflector (201). In wide field polarization, electrodes are accelerated, and in tilted beam formation, electrons are decelerated.
    Type: Grant
    Filed: February 18, 2011
    Date of Patent: January 28, 2014
    Assignee: Hitachi High-Technologies Corporation
    Inventors: Yasunari Sohda, Takeyoshi Ohashi, Kaori Shirahata, Keiichiro Hitomi
  • Patent number: 8478021
    Abstract: In order to provide a charged beam device capable of obtaining a precise image of a sample surface pattern while improving the accuracy of automatic focus/astigmatism correction, there are provided an electron gun (1), a deflection control portion (8) which allows an electron beam to scan, a focus control portion (10) and an astigmatism correction portion (3) for the electron beam, an image processing portion (11), and a switching portion (9) which switches scan conditions when obtaining pattern information of the sample (1001) surface and scan conditions when performing the automatic focus/astigmatism correction, and a scan speed and scan procedures are switched between when obtaining the pattern information and when performing the automatic focus/astigmatism correction.
    Type: Grant
    Filed: January 13, 2010
    Date of Patent: July 2, 2013
    Assignee: Hitachi High-Technologies Corporation
    Inventors: Kaori Shirahata, Yoshinori Nakayama, Keiichiro Hitomi, Muneyuki Fukuda, Yasunari Sohda
  • Publication number: 20120298865
    Abstract: Disclosed is a scanning electron microscope provided with a calculation device (403) for measuring the dimension of a pattern on a sample (413), characterized in that the amount of change of a pattern shape, caused by electron beam irradiation, is calculated and stored, and a pattern shape contour (614; 815; 1512) before the sample is irradiated with an electron beam is restored from a pattern shape contour (613; 814; 1511) in a scanning electron microscope image (612; 813; 1510) after the sample is irradiated with an electron beam using the calculated amount and, then, the pattern shape contour (614; 815; 1512) is displayed. Thus, the shrinking of a resist and/or the effect of electrostatic charge caused when a sample is irradiated with an electron beam are eliminated, so that the shape contour of a two-dimensional pattern before irradiating an electron beam can be restored with a high degree of accuracy, and the dimension of a pattern can be measured with a high degree of accuracy, using the restored image.
    Type: Application
    Filed: January 21, 2011
    Publication date: November 29, 2012
    Inventors: Seiko Omori, Junichi Tanaka, Yoshinori Nakayama, Keiichiro Hitomi