Patents by Inventor Keiichiro Uda

Keiichiro Uda has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Field emission electron source and fabrication process thereof
    Patent number: 6570305
    Abstract: A silicon substrate is used as the substrate, on which a conical projection is formed as a cathode. A gate electrode is arranged via an insulating film formed on the substrate. The gate electrode is formed so as to enclose and encircle the cathode while the pointed portion of the cathode and the surface of the gate electrode are coated with two layered coating films.
    Type: Grant
    Filed: June 24, 1999
    Date of Patent: May 27, 2003
    Assignee: Sharp Kabushiki Kaisha
    Inventors: Masao Urayama, Keiichiro Uda, Seiki Yano, Yoshio Inoue
  • Method for manufacturing a semiconductor device comprising titanium
    Patent number: 5312774
    Abstract: A method for manufacturing a semiconductor device comprising forming a titanium or titanium compound film by a CVD method which uses a material gas containing an organic titanium compound of the formula (I) ##STR1## wherein R is a hydrogen atom, a lower alkyl group, a C.sub.8-13 condensed polycyclic hydrocarbonyl group or a silyl group which is substituted with a lower alkyl and/or an aryl, and a reducing gas.
    Type: Grant
    Filed: December 3, 1992
    Date of Patent: May 17, 1994
    Assignee: Sharp Kabushiki Kaisha
    Inventors: Kazuyo Nakamura, Keiichiro Uda, Osamu Yamazaki, Hiromi Hattori, Nobutaka Fukushima, Shigeo Onishi