Patents by Inventor Keiji Kabeta

Keiji Kabeta has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 5802233
    Abstract: A polysilane optical device comprising a hydrocarbyloxy group-containing polysilane encapsulated with a material having a light transmitting property and air impermeability, such as a glass, a polystyrene, an acryl resin, or a polycarbonate. The optical device has a high durability, and optical characteristics and functions thereof do not greatly change.
    Type: Grant
    Filed: September 11, 1996
    Date of Patent: September 1, 1998
    Assignee: Toshiba Silicone Co., Ltd.
    Inventors: Shinichiro Sugi, Keiji Kabeta, Shigeru Wakamatsu, Takafumi Imai
  • Patent number: 5759638
    Abstract: The present invention relates to a process for forming an electronic circuit, which comprises coating a polyorganosilane on at least one surface of a substrate for forming an electronic circuit, followed by drying to form a solid state polysilane thin film, masking a portion for forming a circuit of said thin film and oxidizing a remaining portion to form an insulating portion, and then doping an oxidizing substance to the portion subjected to masking to form a conductive portion, and in order to oxidize a partial portion of the thin film, said thin film is irradiated with UV light in the presence of oxygen, preferably, in the oxidizing step, by carrying out partial oxidation while controlling an oxidation degree, the remaining portion is converted into three or more kinds of portions having different volume resistivities.
    Type: Grant
    Filed: March 4, 1997
    Date of Patent: June 2, 1998
    Assignee: Toshiba Silicone Co., Ltd.
    Inventors: Takafumi Imai, Keiji Kabeta, Kiyoaki Syuto, Shigeru Wakamatsu
  • Patent number: 5633312
    Abstract: Disclosed is a process for preparing a polyorganosilane which comprises subjecting a disilane compound having at least two substituted or unsubstituted hydrocarbyloxy groups in one molecule to disproportionation reaction in the presence of a catalyst comprising a reaction product of an organic alkali metal compound represented by the formula (I):RM (I)wherein R represents a substituted or unsubstituted monovalent hydrocarbon group; and M represents an alkali metal,represented by the formula (III):MR.sup.3.sub.p M (III)wherein R.sup.3 represents a saturated or unsaturated chain or cyclic divalent hydrocarbon group or a divalent heterocyclic group, two or more R.sup.3 s may be the same or different and an ether oxygen atom may exist between two or more R.sup.3 s; p represents an integer of 1 or more; and M represents an alkali metal atom,and at least one of a disilane compound and a silane compound both of which have a substituted or unsubstituted hydrocarbyloxy group(s).
    Type: Grant
    Filed: April 1, 1996
    Date of Patent: May 27, 1997
    Assignee: Toshiba Silicone Co., Ltd.
    Inventors: Keiji Kabeta, Sigeru Wakamatsu, Takafumi Imai
  • Patent number: 5489662
    Abstract: A process for the preparation of an organosilicon polymer, which comprises reacting one equivalent of a bis(alkoxysilyl) compound represented by the following general formula:R.sup.1 R.sup.2 R.sup.3 Si--(A).sub.p --SiR.sup.1 R.sup.2 R.sup.3wherein R.sup.1, R.sup.2 and R.sup.3 each represents the same or different substituted or unsubstituted monovalent hydrocarbon group or an alkoxy group, with the proviso that at least one of R.sup.1, R.sup.2 and R.sup.3 is an alkoxy group; A represents a divalent aromatic group, a divalent conjugated or nonconjugated unsaturated aliphatic group, or a divalent saturated aliphatic group; and p represents an integer of 1 or more, with one or more equivalents of an alkoxydisilane represented by the following general formula:(OR.sup.4).sub.6-n Si.sub.2 (R.sup.5).sub.nwherein R.sup.4 and R.sup.
    Type: Grant
    Filed: August 31, 1994
    Date of Patent: February 6, 1996
    Assignee: Toshiba Silicone Co., Ltd.
    Inventors: Shigeru Wakamatsu, Keiji Kabeta, Takafumi Imai
  • Patent number: 5075459
    Abstract: A treatment agent for inorganic siliconaceous fillers has as its main ingredient an organosilicon compound of general fomrula (I): ##STR1## in which X represents a functional group selected from among H.sub.2 NCH.sub.2 CH.sub.2 --, H.sub.2 NCH.sub.2 CH.sub.2 CH.sub.2 --, ##STR2## Y.sup.1 is CH.sub.2 .dbd.CHCH.sub.2 -- or --CH.sub.2 CH.sub.2 CH.sub.2 SiR.sub.n.sup.1 Z.sub.3-n.sup.1, R.sup.1 is a substituted or nonsubstituted monovalent hydrocarbon group, Z.sup.1 is an alkoxy group having 1-6 carbon atoms and n is an integer from 0-2, or of general formula (II): ##STR3## in which Y.sup.2 is ##STR4## --CH.sub.2 CH.sub.2 CH.sub.2 SiR.sub.m.sup.2 Z.sub.3-m.sup.2 or a substitutent or nonsubstituted monovalent hydrocarbon group, Z.sup.2 is an alkoxy group having 1-6 carbon atoms and m is an integer from 0-2.
    Type: Grant
    Filed: November 26, 1990
    Date of Patent: December 24, 1991
    Assignee: Toshiba Silicone Co., Ltd.
    Inventors: Keiji Kabeta, Kiyoaki Syuto
  • Patent number: 4997860
    Abstract: A sand casting caking agent contains an acid-curable resin and an organosilicon compound of the general formula (I): ##STR1## in which R.sup.1 is hydrogen or an alkyl having from 1 to 6 carbon atoms, R is a substituted or nonsubstituted monovalent hydrocarbon group, Y is an alkoxy group having from 1 to 6 carbon atoms, n is an integer of from 1 to 6 and m is either 0 or 1. Casting molds containing the agent of the present invention exhibit superior moisture resistance.
    Type: Grant
    Filed: October 11, 1989
    Date of Patent: March 5, 1991
    Assignee: Toshiba Silicone Co., Ltd.
    Inventor: Keiji Kabeta
  • Patent number: 4990641
    Abstract: A new organosilicon compound is defined by the formula (1): ##STR1## in which R.sup.1 is a hydrogen atom or a methyl gorup, X.sup.1 and X.sup.2 each independently are --CH.sub.2 CH.dbd.CH.sub.2 or --(CH.sub.2).sub.2 SiR.sup.2.sub.n Y.sub.3-n, provided at least one of them --(CH.sub.2).sub.3 SiR.sup.2.sub.n Y.sub.3-n, R.sup.2 is a substituted or non-substituted monovalent hydrocarbon group, Y is an alkoxy group or a halogen atom, and n is zero, 1 or 2.
    Type: Grant
    Filed: July 7, 1989
    Date of Patent: February 5, 1991
    Assignee: Toshiba Silicone Co., Ltd.
    Inventor: Keiji Kabeta
  • Patent number: 4927949
    Abstract: An improved method of preparing an aminoalkylalkoxy silane of the formula: ##STR1## in which R.sup.1 and R.sup.2 independently are alkyl groups having 1-8 carbon atoms, R.sup.3 is a hydrogen atom or an alkyl group having 1-6 carbon atoms, R.sup.4 and R.sup.5 independently are a member selected from the group consisting of a hydrogen atom, an alkyl group having 1-10 carbon atoms, --CH.sub.2 CH.sub.2 NH.sub.2, --CH.sub.2 CH.sub.2 NHCH.sub.2 CH.sub.2 NH.sub.2, an allyl group, a substituted phenyl group and a nonsubstituted phenyl group and a is an integer from 0-2, comprises the step of reacting a silane compound with an allylamine in the presence of a catalyst composition selected from the group consisting of (1) a rhodium complex catalyst and a heterocyclic compound containing nitrogen and/or sulfur atoms and (2) a rhodium complex catalyst having a heterocyclic compound containing nitrogen and/or sulfur atoms as a ligand.
    Type: Grant
    Filed: September 13, 1989
    Date of Patent: May 22, 1990
    Assignee: Toshiba Shilicone Co., Ltd.
    Inventors: Keiji Kabeta, Michio Zenbayashi
  • Patent number: 4927951
    Abstract: An organosilicon compound which contains a highly reactive (meth)acrylamide and a siloxane group with a molecule has the following formula: ##STR1## where R.sup.1 is a methyl group or hydrogen atom, R.sup.2 is a substituted or unsubstituted monovalent hydrocarbon group, Q is a divalent hydrocarbon group having 1-8 carbon atoms, A is a hydrogen atom, substituted or unsubstituted hydrocarbon carbon group or --QSiR.sup.n.sup.2 [OSi(CH.sub.3).sub.3 ].sub.3-n, and n is an integer from 0-2.
    Type: Grant
    Filed: October 20, 1989
    Date of Patent: May 22, 1990
    Assignee: Toshiba Silicone Co., Ltd.
    Inventors: Keiji Kabeta, Kiyoaki Syuto
  • Patent number: 4921976
    Abstract: A silicon compound represented by formula (I): ##STR1## wherein either one of R.sup.1 and R.sup.2 represents a vinyl group with the other representing a hydrogen atom; either one of R.sup.3 and R.sup.4 represents a vinyl group with the other representing a hydrogen atom; and R.sup.5, R.sup.6, and R.sup.7, which may be the same or different, each represents a substituted or unsubstituted monovalent hydrocarbon group, an alkoxy group or a halogen atom. The compound exhibits improved compatibility with polymerizable monomers or organic polymers and is useful as a crosslinking agent or modifier.
    Type: Grant
    Filed: November 16, 1988
    Date of Patent: May 1, 1990
    Assignee: Toshiba Silicone Co., Ltd.
    Inventor: Keiji Kabeta
  • Patent number: 4814473
    Abstract: In a process for producing 5-vinylbicyclo[2.2.1]heptyltrichlorosilane by addition-reacting 5-vinylbicyclo[2.2.1]hepta-2-ene with trichlorosilane, a process for producing 5-vinylbicyclo[2.2.1]heptyltrichlorosilane characterized in that a palladium metal or palladium complex is used as a catalyst.
    Type: Grant
    Filed: September 19, 1988
    Date of Patent: March 21, 1989
    Assignee: Toshiba Silicone Co., Ltd.
    Inventor: Keiji Kabeta