Patents by Inventor Keiji Morita
Keiji Morita has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Publication number: 20240066865Abstract: A liquid discharge head includes a nozzle layer having a nozzle through which a liquid is discharged from a second side toward a first side, a liquid chamber substrate, and a drive circuit. The nozzle layer includes a vibration layer, a piezoelectric actuator adjacent to the nozzle and over the first side, a circuit connection over the first side, a first protective layer around the circuit connection, a second protective layer over the piezoelectric actuator, a first water-resistant film over the first protective layer, and a second water-resistant film over the second protective layer. The second protective layer is separated from the first protective layer. The first protective layer defines an opening above the circuit connection. The liquid chamber substrate has a liquid chamber communicating with the nozzle. The drive circuit is disposed over the second side and connected to the circuit connection to drive the piezoelectric actuator.Type: ApplicationFiled: January 19, 2022Publication date: February 29, 2024Inventors: Keiji UEDA, Takahiko KURODA, Toshiaki MASUDA, Kaname MORITA
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Patent number: 10583774Abstract: A vehicle lamp emits red light from a second light emitting area by lighting a tail/accessory lamp while emitting red light from a first light emitting area during a lighting of a tail lamp. Meanwhile, the vehicle lamp lights out the tail/accessory lamp while emitting orange light from the second light emitting area during a lighting (flickering) of a turn lamp.Type: GrantFiled: October 19, 2018Date of Patent: March 10, 2020Assignee: STANLEY ELECTRIC CO., LTD.Inventors: Satoshi Shikata, Hiroshi Miura, Keiji Morita
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Publication number: 20190118702Abstract: A vehicle lamp emits red light from a second light emitting area by lighting a tail/accessory lamp while emitting red light from a first light emitting area during a lighting of a tail lamp. Meanwhile, the vehicle lamp lights out the tail/accessory lamp while emitting orange light from the second light emitting area during a lighting (flickering) of a turn lamp.Type: ApplicationFiled: October 19, 2018Publication date: April 25, 2019Inventors: Satoshi SHIKATA, Hiroshi MIURA, Keiji MORITA
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Patent number: 9495819Abstract: A lock device is arranged in a vehicle including an inlet used for charging. The vehicle is configured to perform a predetermined control operation in accordance with a control request signal transmitted through wireless communication from an electronic key when a normal operation is performed on a control switch of the electronic key. The lock device includes a lock mechanism configured to switch a locking subject related with the inlet between a lock state and an unlock state. A controller controls the lock mechanism to switch the locking subject between a lock state and an unlock state when detecting a special operation performed on the control switch.Type: GrantFiled: November 21, 2013Date of Patent: November 15, 2016Assignee: KABUSHIKI KAISHA TOKAI RIKA DENKI SEISAKUSHOInventor: Keiji Morita
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Publication number: 20140165675Abstract: A lock device is arranged in a vehicle including an inlet and an operation switch. The vehicle is configured to perform a predetermined control operation corresponding to the operation switch when the condition that verification of an authentic electronic key through wireless communication has been accomplished and the condition that a normal operation of the operation switch has been performed are both satisfied. The lock device includes a lock mechanism that locks a locking subject related with the inlet. A controller controls the lock mechanism to switch the locking subject between a lock state and an unlock state when the condition that the verification of the authentic electronic key has been accomplished and the condition that a special operation of the operation switch has been performed are both satisfied.Type: ApplicationFiled: December 4, 2013Publication date: June 19, 2014Applicant: KABUSHIKI KAISHA TOKAI RIKA DENKI SEISAKUSHOInventor: Keiji MORITA
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Publication number: 20140167913Abstract: A lock device is arranged in a vehicle including an inlet used for charging. The vehicle is configured to perform a predetermined control operation in accordance with a control request signal transmitted through wireless communication from an electronic key when a normal operation is performed on a control switch of the electronic key. The lock device includes a lock mechanism configured to switch a locking subject related with the inlet between a lock state and an unlock state. A controller controls the lock mechanism to switch the locking subject between a lock state and an unlock state when detecting a special operation performed on the control switch.Type: ApplicationFiled: November 21, 2013Publication date: June 19, 2014Applicant: KABUSHIKI KAISHA TOKAI RIKA DENKI SEISAKUSHOInventor: Keiji MORITA
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Publication number: 20110247736Abstract: An extruded member of Al—M13 Si aluminum alloy specially composed of Mg, Si, Fe, Cu, Zn, Ti, etc. which has the equiaxed re-crystallized grain structure in which intergranular precipitates 1 ?m or larger are separate from one another at large average intervals and there are many cube orientations over the entire thickness region thereof so that it excels in both flexural crushing performance and corrosion resistance. The extruded member is suitable for use as automotive body reinforcement members which need outstanding lateral crushing performance under severe collision conditions as well as good corrosion resistance.Type: ApplicationFiled: June 3, 2011Publication date: October 13, 2011Applicant: KABUSHIKI KAISHA KOBE SEIKO SHOInventors: Keiji MORITA, Shinji Yoshihara, Manabu Nakai, Shigenobu Yasunaga
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Publication number: 20090242087Abstract: An extruded member of Al—Mg—Si aluminum alloy specially composed of Mg, Si, Fe, Cu, Zn, Ti, etc. which has the equiaxed re-crystallized grain structure in which intergranular precipitates 1 ?m or lager are separate from one another at large average intervals and there are many cube orientations over the entire thickness region thereof so that it excels in both flexural crushing performance and corrosion resistance. The extruded member is suitable for use as automotive body reinforcement members which need outstanding lateral crushing performance under severe collision conditions as well as good corrosion resistance.Type: ApplicationFiled: March 3, 2009Publication date: October 1, 2009Applicant: Kabushiki Kaisha Kobe Seiko Sho (Kobe Steel Ltd.)Inventors: Keiji Morita, Shinji Yoshihara, Manabu Nakai, Shigenobu Yasunaga
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Patent number: 7476634Abstract: To provide a yttria sintered body having an excellent corrosion resistance to halogen-based corrosive gases and plasma and an excellent thermal shock resistance, and adapted for use as a component member in manufacturing apparatuses for semiconductor and liquid crystal devices, particularly in a plasma process apparatus. A yttria sintered body including tungsten of an average particle size of 3 ?m or less dispersed in the yttria so that a ratio of the tungsten relative to the yttria is ranging from 1 to 50% in terms of weight, and having an open pore rate of 0.2% or less and a thermal shock resistance by water submersion method of 200° C. or larger.Type: GrantFiled: August 15, 2006Date of Patent: January 13, 2009Assignee: Covalent Materials CorporationInventors: Sachiyuki Nagasaka, Keiji Morita, Keisuke Watanabe
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Publication number: 20080189351Abstract: To reduce a load inflicted on a network by peer-to-peer communication between terminals, the present invention provides a network system having a communication destination machine and a communication source machine, in which: the communication destination machine includes a unit which registers its own location information in a peer-to-peer network; and the communication source machine includes: a unit which searches the peer-to-peer network for the location information of the communication destination machine and obtains the location information; and a unit which uses the obtained information to establish peer-to-peer communication. The location information contains communication path information which enables the communication source machine to communicate with a desired machine beyond a path controller, and a parameter necessary for communication. The communication source machine may include a unit which accumulates location information or similar data of multiple communication destination machines.Type: ApplicationFiled: September 4, 2007Publication date: August 7, 2008Inventors: Shigeyuki Nemoto, Takahiro Fujishiro, Ayumi Kawano, Keiji Morita
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Publication number: 20070079934Abstract: To provide an inexpensive gas dispersion plate having a high corrosion resistance to halogen-based corrosive gasses and a plasma thereof, and capable of preventing particle generation from the gas hole, thereby contributing to an improvement in the production yield of the semiconductor devices. The gas dispersion plate includes one or plural gas holes in a base material formed by a Y2O3 ceramic material having a relative density of 96% or more, in which an edge part of the gas hole is formed by a sand blasting process into a rounded shape with a radius of curvature of 0.2 mm or more.Type: ApplicationFiled: August 30, 2006Publication date: April 12, 2007Inventors: Yukitaka Murata, Sachiyuki Nagasaka, Keiji Morita, Keisuke Watanabe, Shigenori Wakabayashi
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Publication number: 20070066478Abstract: To provide a yttria sintered body having an excellent corrosion resistance to halogen-based corrosive gases and plasma and an excellent thermal shock resistance, and adapted for use as a component member in manufacturing apparatuses for semiconductor and liquid crystal devices, particularly in a plasma process apparatus. A yttria sintered body including tungsten of an average particle size of 3 ?m or less dispersed in the yttria so that a ratio of the tungsten relative to the yttria is ranging from 1 to 50% in terms of weight, and having an open pore rate of 0.2% or less and a thermal shock resistance by water submersion method of 200° C. or larger.Type: ApplicationFiled: August 15, 2006Publication date: March 22, 2007Inventors: Sachiyuki Nagasaka, Keiji Morita, Keisuke Watanabe
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Publication number: 20060073354Abstract: A gas diffusion plate has an alumina or an aluminum base material provided with one or more through holes and an yttria body shrink-fitted to one of the through holes and provided with one or more gas discharge holes.Type: ApplicationFiled: September 30, 2005Publication date: April 6, 2006Inventors: Keisuke Watanabe, Keiji Morita, Sachiyuki Nagasaka
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Publication number: 20050227118Abstract: The present invention provides a plasma resistant member having a reinforced mechanical strength and being sufficiently durable to exposure to a low pressure high density plasma. At least the surface of the alumina based material is formed of an oxide or composite oxide layer of a group IIIA element via an intermediate layer. It is preferable in the construction of the plasma resistant member that the intermediate layer comprises 10 to 80% by weight of the oxide or composite oxide of the group IIIA element in the periodic table and 90 to 20% by weight of alumina. The intermediate layer may also comprise a course ceramic with a porosity of 0.2 to 5%. It is also desirable that at least one of the conditions such as a difference in the thermal shrinkage ratio at 1600 to 1900° C. of 3% or less is provided.Type: ApplicationFiled: June 10, 2005Publication date: October 13, 2005Applicant: Toshiba Ceramics Co., Ltd.Inventors: Tomonori Uchimaru, Haruo Murayama, Takashi Tanaka, Keiji Morita, Akira Miyazaki
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Patent number: 6838405Abstract: A plasma-resistant member for a semiconductor manufacturing apparatus, which can reduce the contamination level on a semiconductor wafer. The contents of Fe, Ni, Cr and Cu are made lower than 1.0 ppm respectively within a depth of at least 10 ?m from surface in a plasma-resistant member.Type: GrantFiled: August 1, 2002Date of Patent: January 4, 2005Assignee: Toshiba Ceramics Co., Ltd.Inventors: Mitsuhiro Fujita, Keiji Morita
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Patent number: 6834613Abstract: A plasma-resistant member used in a reaction chamber of a plasma treating apparatus is formed of a dense alumina sintered product having an average grain size of 18-45 &mgr;m, a surface roughness Ra of 0.8-3.0 &mgr;m and a bulk density of 3.90 g/cm3 or over.Type: GrantFiled: December 7, 2000Date of Patent: December 28, 2004Assignees: Toshiba Ceramics Co., Ltd., Tokyo Electron LimitedInventors: Akira Miyazaki, Keiji Morita, Sachiyuki Nagasaka, Shuji Moriya
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Publication number: 20030051811Abstract: The present invention provides a plasma resistant member having a reinforced mechanical strength and being sufficiently durable to exposure to a low pressure high density plasma. At least the surface of the alumina based material is formed of an oxide or composite oxide layer of a group IIIA element via an intermediate layer. It is preferable in the construction of the plasma resistant member that the intermediate layer comprises 10 to 80% by weight of the oxide or composite oxide of the group IIIA element in the periodic table and 90 to 20% by weight of alumina. The intermediate layer may also comprise a course ceramic with a porosity of 0.2 to 5%. It is also desirable that at least one of the conditions such as a difference in the thermal shrinkage ratio at 1600 to 1900° C. of 3% or less is provided.Type: ApplicationFiled: March 29, 2002Publication date: March 20, 2003Applicant: Toshiba Ceramics Co., Ltd.Inventors: Tomonori Uchimaru, Haruo Murayama, Takashi Tanaka, Keiji Morita, Akira Miyazaki
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Publication number: 20030034130Abstract: A plasma-resistant member for a semiconductor manufacturing apparatus, which can reduce the contamination level on a semiconductor wafer. The contents of Fe, Ni, Cr and Cu are made lower than 1.0 ppm respectively within a depth of at least 10 &mgr;m from surface in a plasma-resistant member.Type: ApplicationFiled: August 1, 2002Publication date: February 20, 2003Applicant: TOSHIBA CERAMICS CO., LTD.Inventors: Mitsuhiro Fujita, Keiji Morita
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Patent number: 6492042Abstract: The invention is a method of producing a ceramics material comprising the steps of: preparing a raw powder in which alumina particles having an average particle diameter of 0.1-1.0 &mgr;are doped with at least magnesia of 0.01-1 weight % and a solution containing yttrium of 0.1-15 weight % in yttria; molding said raw powder and calcining a molding thus created; and heating the calcined molding in an atmosphere containing a hydrogen gas to create YAG which is leached to the surface to deposit YAG on the surface and sintering the molding.Type: GrantFiled: July 10, 2001Date of Patent: December 10, 2002Assignee: Toshiba Ceramics Co., Ltd.Inventors: Keiji Morita, Mitsuhiro Fujita, Haruo Murayama
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Patent number: 6348428Abstract: A crystalline inorganic fiber or molded body thereof is thermally treated in gas atmosphere containing chlorine. The crystalline inorganic fiber or molded body thereof contains small impurities such as Fe, Cu and Ni. For example, Fe is 15 ppm or less, Cu is 1 ppm or less, and Ni is 0.5 ppm or less.Type: GrantFiled: February 9, 2000Date of Patent: February 19, 2002Assignee: Toshiba Monofrax Co., Ltd.Inventors: Yasuo Misu, Mikiya Fujii, Kazuhide Kawai, Fumio Tokuoka, Makoto Takahashi, Keiji Morita