Patents by Inventor Keiji Taguchi
Keiji Taguchi has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Publication number: 20240117088Abstract: To provide a method for producing a fluorinated copolymer, whereby it is possible to efficiently produce a fluorinated copolymer in which coloration and foaming are suppressed during heating. A method for producing a fluorinated copolymer, comprising a step of producing a fluorinated copolymer by polymerizing tetrafluoroethylene and other monomer other than the tetrafluoroethylene in the presence of a hydroperoxide, at least one selected from the group consisting of a sulfite, a hydrogen sulfite, a dithionite, and a metabisulfite, at least one selected from the group consisting of an acidic substance and a substance that generates an acid by hydrolysis, and an aqueous medium.Type: ApplicationFiled: November 27, 2023Publication date: April 11, 2024Applicant: AGC Inc.Inventors: Kosuke SHIBASAKI, Yuki ORITO, Keiji HORI, Shintaro FUKUNAGA, Daisuke TAGUCHI
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Patent number: 6253775Abstract: A cleaning apparatus has a processing tank (21) for containing a processing liquid in which semiconductor wafers (W) are immersed, and a tubular vessel(22a) having a processing chamber (23) containing the processing tank (21). A side wall (26) of the vessel (22a), and a first partition wall (28) having an upright wall (27) standing on a bottom plate (23a) defining the bottom of the processing chamber (23) form a side ventilating duct (24). The bottom wall (30) of the vessel (22a), and a second partition wall (29) substantially horizontally extending from the lower end of the first partition wall (28) form a bottom ventilating duct (25). The side ventilating duct (24) and the bottom ventilating duct (25) can compactly arrange devices and pipes for supplying and discharging the cleaning liquid for cleaning semiconductor wafers (W), easily maintain the devices and pipes, easily arrange a ventilating system to the cleaning apparatus, and improve ventilation efficiency.Type: GrantFiled: June 2, 1999Date of Patent: July 3, 2001Assignee: Tokyo Electron LimitedInventors: Shigenori Kitahara, Keiji Taguchi, Hiroko Tsuboi
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Patent number: 5964398Abstract: A vane member comprises a first member and a second member, the first member and the second member are joined by that an insert member whose melting temperature is lower than melting temperatures of the first and second members contacts the first and second members, the insert member is heated to a welding temperature which is lower than the melting temperatures of the first and second members and is higher than the melting temperature of the insert member so that a mutual diffusion between at least an original base component of the insert member and at least an original base component of the first member different from the original base component of the insert member and a mutual diffusion between at least the original base component of the insert member and at least an original base component of the second member different from the original base component of the insert member are caused by the heating, and the mutual diffusions by the heating are continued at least until the original base component of the iType: GrantFiled: September 15, 1997Date of Patent: October 12, 1999Assignee: Hitachi, Ltd.Inventors: Akiomi Kohno, Kazuaki Yokoi, Keiji Taguchi, Hiroshi Misumi, Yoshiharu Ueyama, Kazuyuki Koide, Koji Hayashi
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Patent number: 5938403Abstract: A water machinery runner, which is highly reliable and is so excellent in wear and corrosion resistances that it can be used even under conditions where sediment is contained in a fluid includes crown 21, band 22 and blade 23 of a water machinery runner 2 to be rotated by a working fluid or a fluid flowing in a passage. The elements of the machinery runner are coated on at least portions of their individual surfaces with a first surface film containing a metal, as selected from the group consisting of Ni, Cr and Co, and a chromium carbide, and a second surface film containing a metal, as selected from the group consisting of Ni, Cr and Co, and a tungsten carbide.Type: GrantFiled: March 12, 1997Date of Patent: August 17, 1999Assignee: Hitachi, Ltd.Inventors: Ryoji Okada, Kazuo Niikura, Keiji Taguchi, Kiyohito Tani
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Patent number: 5911232Abstract: Disclosed is an ultrasonic cleaning device including a cleaning tank containing a semiconductor wafer W and pure water, and a plurality of vibrating plates provided with the cleaning tank. The vibrating plates are electric distortion transducers. By controlling the output phases of oscillators that vibrate the plates with a single oscillating source, the output phases of the oscillation sources can be matched. This enables uniform sound pressure distribution. Consequently, ultrasonic interference between vibrating plates can be eliminated. Uniform sound pressure distribution makes it possible to obtain a uniform particle removal rate, thereby improving cleaning efficiency.Type: GrantFiled: August 29, 1997Date of Patent: June 15, 1999Assignee: Tokyo Electron, Ltd.Inventors: Shori Mokuo, Keiji Taguchi, Shigenori Kitahara
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Patent number: 5304045Abstract: A closed type motor-driven compressor includes a motor accommodated in a closed container and a compression mechanism connected through a crank shaft to the motor. A shielding member having a cylindrical portion substantially concentric with the axis of the compression mechanism is disposed between the motor and the compression mechanism. This shielding member defines a shielding air space between the motor and the compression mechanism for preventing a permeation of a lubricating oil. An inlet of a discharge pipe of the closed type motor-driven compressor is positioned inwardly of this shielding air space.Type: GrantFiled: September 8, 1992Date of Patent: April 19, 1994Assignee: Hitachi, Ltd.Inventors: Nobutoshi Hoshino, Kazuo Ikeda, Kooichi Inaba, Shigeya Kawaminami, Atushi Shimada, Tatuya Wakana, Nobuo Abe, Kunio Fukami, Hidenari Takada, Masanori Wakaizumi, Mitsuaki Haneda, Keiji Taguchi, Toshio Yamanaka, Tatuo Horie, Masami Masuda
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Patent number: 4872606Abstract: In a sealed structure consisting of ceramic members opposing each other and a frame coupled to the ceramic members and defining an He-tight chamber with the ceramic members, the melting point of a joint member for bonding one of the ceramic members to the frame is lower than the melting point of another joint member for bonding the other of the ceramic members to the frame so that rebonding can be made.Type: GrantFiled: December 10, 1986Date of Patent: October 10, 1989Assignee: Hitachi, Ltd.Inventors: Motohiro Satoh, Toshihiro Yamada, Akiomi Kohono, Akihiko Yamamoto, Keiji Taguchi, Takahiro Daikoku, Fumiuki Kobayashi
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Patent number: 4854495Abstract: This invention discloses a method of soldering together at least two members selected form metals and ceramics, which comprises successively jointing a high-melting jointing material, a medium-melting jointing material, and a low-melting jointing material, and a sealing structure prepared by this method.The method according to present invention enables the preparation of a sealing structure having a soldered area which is excellent in tightness.Type: GrantFiled: June 18, 1987Date of Patent: August 8, 1989Assignee: Hitachi, Ltd.Inventors: Akihiko Yamamoto, Akiomi Kohno, Toshihiri Yamada, Motohiro Satou, Keiji Taguchi, Kazuaki Yokoi
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Patent number: 4509995Abstract: A quenching method wherein an object to be quenched is sprayed with a mixed spray jet of a liquid and a gas. The diameter of droplets in the mixed spray jet is from 50 to 200 .mu.m, and the mixing ratio between the liquid and the gas is varied during the period from the start to the end of cooling. Also disclosed is a quenching apparatus having nozzles for spraying an object to be quenched with a mixed spray jet of a liquid and a gas, a liquid supply source for supplying a pressurized liquid, and a gas supply source for supplying a pressurized gas. Each of the nozzles has a liquid-jetting port formed in the surface opened to the atmosphere and a gas-jetting port annularly formed around the liquid-jetting port on the same plane. The liquid-jetting port is communicated with the liquid supply source, while the gas-jetting port is communicated with the gas supply source.Type: GrantFiled: January 19, 1983Date of Patent: April 9, 1985Assignees: Hitachi, Ltd., Hitachi Const. Machinery Co.Inventors: Takeshi Hachisu, Keiji Taguchi, Toshimi Sasaki, Tetsuo Matsumoto, Nobuyoshi Hidao