Abstract: Provided is an imprint apparatus that applies a resin (drops) dispersed, at a plurality of locations on a substrate, brings the resin and a mold into contact, and transfers the contoured pattern that is formed in the mold to the resin comprising: a controller that sets a principal axis direction according to the contoured pattern and an array direction in which a plurality of resin drops are aligned, and determines application positions for the resin such that the array direction is angled with respect to the principal axis direction; and a dispenser that applies the resin based on the application positions that have been determined.

Abstract: Provided is an imprint apparatus that applies a resin to several locations on a substrate, brings the resin and a mold into contact, and transfers a contoured pattern formed in the mold to the resin, comprising: a controller that sets a principal axis direction according to the contoured pattern and determines the application positions of the resin based on the principal axis direction that has been set such that the distances between resin drops that have been applied so as to be separated in the principal axis direction is larger than the distances between resin drops that have been applied so as to be separated in a direction that is perpendicular to the principal axis direction; and a dispenser that applies the resin based on the application position that has been determined.

Abstract: An object is to provide an imprint method or an imprint apparatus that not only reduces the time for filling with resin or reduces pattern defects, but also reduces the surface roughness of resin. An imprint method brings a resin on a substrate and a mold having a pattern into contact with each other to transfer the pattern onto the substrate. The imprint method includes a step of bringing the resin on the substrate and the mold into contact with each other while a space between the substrate and the mold is filled with a predetermined gas, a step of curing the resin while the resin and the mold are in contact with each other, and a step of separating the resin and the mold. The predetermined gas contains a first gas having a solubility of 0.36 mol/liter or more in the resin and a second gas having a solubility of less than 0.36 mol/liter in the resin, at 20° C. and a pressure of 1 atmosphere.

Abstract: An indium adsorbent is provided that is obtained by the following process. A hydrophilic polymer having a carboxyl group in which indium is incorporated in advance is caused to absorb an aqueous solution of a water-soluble monomer, a cross-linking agent, and a polymerization initiator, and an acid treatment is performed on a polymer obtained by polymerizing the water-soluble monomer, to obtain the indium adsorbent. The indium adsorbent has a template architecture with respect to indium. Accordingly, the indium adsorbent is capable of adsorbing indium with a high selectivity. An indium selection rate is 2.0 or more with respect to zinc.

Abstract: An exposure apparatus which projects a pattern of an original onto a substrate via a liquid to expose the substrate, includes a substrate stage which holds the substrate and moves, the substrate stage including a peripheral member arranged to surround a region in which the substrate is arranged, the peripheral member having a holding surface which holds the liquid, wherein a trench which traps the liquid is formed in the peripheral member, and the trench is arranged to surround the region in which the substrate is arranged, and includes a bottom portion, an inner-side surface extending from the holding surface toward the bottom portion, and an outer-side surface, the inner-side surface having a slant which increases stepwise or continuously in a direction away from the holding surface, and the outer-side surface is provided with a spattering preventing portion which prevents spattering of the liquid trapped by the trench.

Abstract: An exposure apparatus which projects a pattern of an original onto a substrate via a liquid to expose the substrate, includes a substrate stage which holds the substrate and moves, the substrate stage including a peripheral member arranged to surround a region in which the substrate is arranged, the peripheral member having a holding surface which holds the liquid, wherein a trench which traps the liquid is formed in the peripheral member, and the trench is arranged to surround the region in which the substrate is arranged, and includes a bottom portion, an inner-side surface extending from the holding surface toward the bottom portion, and an outer-side surface, the inner-side surface having a slant which increases stepwise or continuously in a direction away from the holding surface, and the outer-side surface is provided with a spattering preventing portion which prevents spattering of the liquid trapped by the trench.

Abstract: An exposure apparatus includes an illumination optical system for illuminating a reticle using a light from a light source, and a projection optical system for projecting a pattern of the reticle onto a substrate, the exposure apparatus exposing the substrate through a liquid that is supplied to a space between the substrate and a lens of the projection optical system closest to the substrate, a surface of the lens on which the light does not pass having a polished surface.

Abstract: An indium adsorbent includes a polymer material having a template architecture with respect to indium, the indium adsorbent having an adsorption selection rate of indium with respect to zinc of 2.0 or more.

Abstract: An exposure apparatus, exposing a substrate via liquid so as to transfer a pattern of a mask onto the substrate, includes a stage configured to move while holding the substrate. The stage includes a substrate supporting portion on which the substrate is disposed, a supporting surface disposed outside the substrate supporting portion configured to support the liquid together with the substrate, and a frame portion formed so as to surround the supporting surface. The frame portion includes a depression and a member whose top surface is located in a plane including the supporting surface.

Abstract: An immersion exposure apparatus includes a projection optical system, a first supply unit, and a second supply unit. The projection optical system projects exposure light from an original onto a substrate. The first supply unit forms a first liquid film in a space formed between the projection optical system and the substrate by supplying first liquid. The space includes a light path of the exposure light. The second supply unit forms a second liquid film around the first liquid film by supplying second liquid that is different from the first liquid.

Abstract: An exposure apparatus for exposing a substrate through liquid includes a stage for holding and moving the substrate. The stage includes a holding section for holding the substrate and a supporting section disposed around the holding section. The supporting section includes a recovery port including a gap between the substrate held by the holding section and the supporting section, the recovery port for recovering the liquid, a space for storing the liquid recovered through the recovery port, a liquid recovery mechanism for draining the liquid that has collected in a lower part of the space, and a sloshing reduction member disposed in the space, the sloshing reduction member for reducing sloshing of the liquid.

Abstract: An immersion exposure apparatus includes a projection optical system, a first supply unit, and a second supply unit. The projection optical system projects exposure light from an original onto a substrate. The first supply unit forms a first liquid film in a space formed between the projection optical system and the substrate by supplying first liquid. The space includes a light path of the exposure light. The second supply unit forms a second liquid film around the first liquid film by supplying second liquid that is different from the first liquid.

Abstract: An exposure apparatus for exposing a substrate via liquid includes a supply nozzle configured to supply the liquid, and a recovery nozzle configured to recover the liquid, wherein at least one of the supply nozzle and the recovery nozzle includes porous ceramic with an oxide film.

Abstract: An easy-to manufacture contact lens exhibiting an excellent axial stability and having a novel ballast mechanism. On the front surface (36) of the contact lens (30), (i) a circular front surface (38) forming an optical portion (44) and (ii) annular front surfaces (40, 42) forming peripheral portions (46, 48) are formed with a substantially constant radial dimension around the geometrical center axis (32) of the lens in the front view thereof. Cross-sectional shapes of the front surfaces (40, 42) at the peripheral parts are varied in the circumferential direction and the thickness at the peripheral portions (46, 48) is varied in the circumferential direction, thus shifting the center of gravity G of the contact lens (30) from the geometrical center axis (32) of the lens.

Abstract: An exposure apparatus includes an illumination optical system for illuminating a reticle using a light from a light source, and a projection optical system for projecting a pattern of the reticle onto a substrate, the exposure apparatus exposing the substrate through a liquid that is supplied to a space between the substrate and a lens of the projection optical system closest to the substrate, a surface of the lens on which the light does not pass having a polished surface.

Abstract: A method of molding an ophthalmic lens product by using a mold assembly which has a mold cavity, the lens product having a configuration corresponding to that of an ophthalmic lens or a precursor of the ophthalmic lens and being obtained by polymerizing a liquid monomer composition in the mold cavity to provide a polymer product which gives the lens product, the method comprising the steps of: preparing the mold assembly having a monomer storage space for storing the liquid monomer composition, which storage space is held in fluid communication with the mold cavity; filling the mold cavity of the mold assembly with the liquid monomer composition while the liquid monomer composition is accommodated in the monomer storage space; and polymerizing the liquid monomer composition at a temperature of 10-80° C. while a pressure higher than the atmospheric pressure is applied directly to a liquid surface of a mass of the liquid monomer composition accommodated in the monomer storage space.

Abstract: A device comprises a lower die 6 composed of a lower die base portion and a lower die columnar portion of which tip surface is formed with a lower die molding surface corresponding to one surface of an ocular lens material; an upper die 8 composed of an upper die base portion that is fitted into an upper portion of a hollow hole of the cylindrical main body for parting the hollow hole into two, forming an intermediate chamber 18 between itself and the lower die base portion into which the monomer composition is filled, and forming an exterior accumulating chamber 20 on a side of an upper aperture of the hollow hole into which the monomer composition is accumulated, and an upper die columnar portion of which tip surface is formed with an upper die molding surface corresponding to another surface of the ocular lens material, wherein a molding cavity 22 having a communicating portion 24 is formed between the upper die molding surface and the lower die molding surface; and not less than three piercing holes 16 pr

Abstract: A jig adapted to hold a contact lens material having a concave surface, for holding the contact lens material, including a protruding portion which has a top end having as an outer surface thereof a convex surface. This convex surface of the jig is bonded to the concave surface of the contact lens material. The protruding portion has a recess which extends from an inner surface of the top end toward a bottom end of the protruding portion. The recess is defined by an inner surface which includes a first portion that corresponds to the convex surface of the top end of the protruding portion. At least the first portion of the inner surface is roughened with a light-scattering texture. A method of holding the contact lens material while the contact lens material is processed into a contact lens is disclosed.

Abstract: A jig adapted to hold a contact lens material having a concave surface, for holding the contact lens material, including a protruding portion which has a top end having as an outer surface thereof a convex surface. This convex surface of the jig is bonded to the concave surface of the contact lens material. The protruding portion has a recess which extends from an inner surface of the top end toward a bottom end of the protruding portion. The recess is defined by an inner surface which includes a first portion that corresponds to the convex surface of the top end of the protruding portion. At least the first portion of the inner surface is toughened with a light-scattering texture. A method of holding the contact lens material while the contact lens material is processed into a contact lens is disclosed.

Abstract: The inner and outer surfaces of a toric contact lens have respectively a curved surface having a different radius of curvature wherein the central axis of the outer surface is deviated downwardly from the central axis of the inner surface. Accordingly, the position of the gravity center of the lens is lowered because the lower portion of the lens is thicker than the upper portion. Further, slab-off portions are formed in the upper and lower portions of the outer surface of the lens. The contact lens of the present invention can prevent the rotation of the lens on the cornea, provides a good feeling to a wearer, and is safe in use.