Patents by Inventor Keiko Matsuda

Keiko Matsuda has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Mask structure for lithography, method of preparation thereof and lithographic method
    Patent number: 4837123
    Abstract: A mask structure for lithography has a mask material holding thin film and a holding substrate for holding the peripheral portion of said mask material holding thin film, said mask material holding thin film comprising a film comprising aluminum, nitrogen and oxygen.
    Type: Grant
    Filed: March 14, 1988
    Date of Patent: June 6, 1989
    Assignee: Canon Kabushiki Kaisha
    Inventors: Hideo Kato, Masaaki Matsushima, Keiko Matsuda, Hirofumi Shibata
  • Lithographic mask structure and process for preparing the same
    Patent number: 4804600
    Abstract: There is disclosed a lithographic mask structure including a mask support film, and a support substrate, wherein the peripheral portion of the mask support film is attached on the surface of the support substrate which has a groove.
    Type: Grant
    Filed: February 1, 1988
    Date of Patent: February 14, 1989
    Assignee: Canon Kabushiki Kaisha
    Inventors: Hideo Kato, Hirofumi Shibatya, Keiko Matsuda
  • Mask structure for lithography, method for preparation thereof and lithographic method
    Patent number: 4677042
    Abstract: A mask structure for lithography has a ring frame holding the peripheral portion of a thin film for holding a mask material, the mask material holding thin film comprising a layer of aluminum nitride.
    Type: Grant
    Filed: November 1, 1985
    Date of Patent: June 30, 1987
    Assignee: Canon Kabushiki Kaisha
    Inventors: Hideo Kato, Masaaki Matsushima, Keiko Matsuda, Hirofumi Shibata