Patents by Inventor Keishi Shionaga

Keishi Shionaga has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20220388785
    Abstract: An information processing apparatus for controlling a conveying apparatus to convey a substrate to be processed by a substrate processing apparatus includes a processor that performs operations including controlling the conveying apparatus, according to teaching data, to perform a first movement operation including putting the substrate into a container configured to carry the substrate and a second movement operation including getting the substrate from the container, acquiring image data including an image of a placement position for the substrate in the container during the first movement operation and the second movement operation, performing image processing on the image data to quantify a relationship between a position of the container and a position of the substrate, determining the quantified relationship to yield a determination result, and outputting correction data for correcting the conveying apparatus with respect to the first movement operation and the second movement operation, based on the de
    Type: Application
    Filed: May 23, 2022
    Publication date: December 8, 2022
    Inventors: Tadashi ENOMOTO, Nao AKASHI, Youngtai KANG, Keishi SHIONAGA
  • Patent number: 9857124
    Abstract: The clamp apparatus of the present disclosure includes a clamp member configured to contact a substrate accommodating container from an upper side and fix the substrate accommodating container to a predetermined position when a cover provided on a front surface of the substrate accommodating container is opened/closed, a driving mechanism configured to drive the clamp member; a casing configured to cover the driving mechanism, a suction port configured to communicate with the casing, an exhaust chamber provided near the casing, and a fan provided inside the exhaust chamber.
    Type: Grant
    Filed: March 15, 2016
    Date of Patent: January 2, 2018
    Assignee: Tokyo Electron Limited
    Inventors: Mitsuru Obara, Hisashi Inoue, Keishi Shionaga, Masahiro Kobayashi, Norio Baba, Hiroshi Kikuchi
  • Publication number: 20160273836
    Abstract: The clamp apparatus of the present disclosure includes a clamp member configured to contact a substrate accommodating container from an upper side and fix the substrate accommodating container to a predetermined position when a cover provided on a front surface of the substrate accommodating container is opened/closed, a driving mechanism configured to drive the clamp member; a casing configured to cover the driving mechanism, a suction port configured to communicate with the casing, an exhaust chamber provided near the casing, and a fan provided inside the exhaust chamber.
    Type: Application
    Filed: March 15, 2016
    Publication date: September 22, 2016
    Inventors: Mitsuru Obara, Hisashi Inoue, Keishi Shionaga, Masahiro Kobayashi, Norio Baba, Hiroshi Kikuchi
  • Patent number: 8216378
    Abstract: A reaction tube for a semiconductor process for performing a heat process on a plurality of target objects stacked at intervals under a vacuum state is integrally made of an electrically insulating and heat-resistant material. The reaction tube includes a cylindrical sidewall that has a load port at a lower end for loading and unloading the target objects to and from the reaction tube, and a circular ceiling wall that closes an upper end of the sidewall and has a flat inner surface extending in a direction perpendicular to an axial direction of the sidewall. The ceiling wall has an annular groove formed in a peripheral region of an outer surface along the sidewall.
    Type: Grant
    Filed: March 23, 2009
    Date of Patent: July 10, 2012
    Assignee: Tokyo Electron Limited
    Inventors: Hirofumi Kaneko, Hisashi Inoue, Keishi Shionaga, Shingo Hishiya, Atsushi Endoh
  • Publication number: 20090250005
    Abstract: A reaction tube for a semiconductor process for performing a heat process on a plurality of target objects stacked at intervals under a vacuum state is integrally made of an electrically insulating and heat-resistant material. The reaction tube includes a cylindrical sidewall that has a load port at a lower end for loading and unloading the target objects to and from the reaction tube, and a circular ceiling wall that closes an upper end of the sidewall and has a flat inner surface extending in a direction perpendicular to an axial direction of the sidewall. The ceiling wall has an annular groove formed in a peripheral region of an outer surface along the sidewall.
    Type: Application
    Filed: March 23, 2009
    Publication date: October 8, 2009
    Applicant: TOKYO ELECTRON LIMITED
    Inventors: Hirofumi Kaneko, Hisashi Inoue, Keishi Shionaga, Shingo Hishiya, Atsushi Endoh