Patents by Inventor Keisuke Funaki

Keisuke Funaki has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 7253223
    Abstract: A polycarbonate resin composition which has excellent flame retardancy, even when containing neither any phosphorus compound flame retardant nor any halogenated flame retardant, and which is highly reflective and has light-shutting properties and excellent thermal stability. The polycarbonate resin composition comprises 5 to 98 parts by weight of a polycarbonate/polyorganosiloxane copolymer, 0 to 93 parts by weight of a polycarbonate resin, 2 to 50 parts by weight of titanium oxide, 0 to 1.0 parts by weight of a fibril-forming polytetrafluoroethylene, and 0.05 to 2.0 parts by weight of an organosiloxane, the sum of the ingredients (A), (B), and (C) is 100 parts by weight.
    Type: Grant
    Filed: August 6, 2003
    Date of Patent: August 7, 2007
    Assignee: Idemitsu Kosan Co., Ltd.
    Inventors: Hiroshi Kawato, Keisuke Funaki, Masami Kogure, Hiroshi Akamine
  • Publication number: 20070054110
    Abstract: A light-reflecting polycarbonate resin sheet is characterized in that a light-resistant layer for cutting or absorbing ultraviolet light is provided on at least one side of a polycarbonate resin foam layer. A light-reflecting laminate is obtained by superposing such a light-reflecting polycarbonate resin sheet on a metal plate. The light-reflecting polycarbonate resin sheet has high light resistance while maintaining excellent reflective characteristics.
    Type: Application
    Filed: October 5, 2004
    Publication date: March 8, 2007
    Applicant: Idemiksu Kosan Co. Ltd
    Inventors: Hiroshi Kawato, Masami Kogure, Keisuke Funaki, Yosihiko Horio
  • Publication number: 20060159926
    Abstract: The light reflection sheet (I) of the present invention comprises a sheet having a thickness of 0.4 to 2 mm and comprising a polycarbonate resin composition containing (B) titanium oxide, and the sheet has a light reflectance of 98% or more and a light transmittance of less than 1%. It is excellent in a flame retardancy and a reflection characteristic. Also, the light reflection sheet (II) of the present invention is prepared by providing a light-fast layer which cuts or absorbs a UV ray in a thickness of 0.5 to 20 ?m on at least one face of a base sheet having a thickness of 0.4 to 2 mm and comprising a PC resin composition containing a combination of 85 to 60 mass % of (A) a PC base polymer and 15 to 40 mass % of (B) titanium oxide. It is less yellowed and less reduced in a reflection characteristic even after used for a long period of time.
    Type: Application
    Filed: March 2, 2004
    Publication date: July 20, 2006
    Applicant: Idemitsu Kosan Co., Ltd.
    Inventors: Keisuke Funaki, Masami Kogure, Hiroshi Akamine, Hiroshi Kawato
  • Publication number: 20060047037
    Abstract: A polycarbonate resin composition which has excellent flame retardancy, even when containing neither any phosphorus compound flame retardant nor any halogenated flame retardant, and which is highly reflective and has light-shutting properties and excellent thermal stability. The polycarbonate resin composition comprises 5 to 98 parts by weight of a polycarbonate/polyorganosiloxane copolymer, 0 to 93 parts by weight of a polycarbonate resin, 2 to 50 parts by weight of titanium oxide, 0 to 1.0 parts by weight of a fibril-forming polytetrafluoroethylene, and 0.05 to 2.0 parts by weight of an organosiloxane, the sum of the ingredients (A), (B), and (C) is 100 parts by weight.
    Type: Application
    Filed: August 6, 2003
    Publication date: March 2, 2006
    Inventors: Hiroshi Kawato, Keisuke Funaki, Masami Kogure, Hiroshi Akamine
  • Patent number: 6451917
    Abstract: The invention relates to a styrene resin material, especially a styrene-based resin composition having good high-speed castability and good spreadability and favorable to extrusion molding lines. Of the styrene-based resin material, the product of the melt index (MI, g/10 min) and the melt tension (MT, g) measured under a specific condition is at least 20. Concretely, for example, it is a styrene-based resin composition comprising (A) from 35 to 95% by weight of a styrenic polymer having a syndiotactic structure, (B) from 5 to 50% by weight of a specific polyethylenic resin, and (C) from 0 to 15% by weight (including 0) of a specific styrene-olefin copolymer.
    Type: Grant
    Filed: June 26, 2000
    Date of Patent: September 17, 2002
    Assignee: Idemitsu Petrochemical Co., Ltd.
    Inventors: Masami Kogure, Keisuke Funaki, Takaaki Uchida
  • Publication number: 20010031706
    Abstract: Provided is a lubricant film having the advantages of high-temperature lubricity, environmental adaptation and workability. At least the surface layer of the film is of a styrenic polymer essentially having a syndiotactic structure or of a resin composition that comprises such a styrenic polymer essentially having a syndiotactic structure, and the layer has a degree of crystallinity of at least 30%, a film impact of at least 2000 J/m and a wettability index of at most 36. The film is favorable to process films.
    Type: Application
    Filed: July 20, 1999
    Publication date: October 18, 2001
    Inventors: TAKAAKI UCHIDA, TAIZOU SUGIOKA, KEISUKE FUNAKI
  • Patent number: 6093768
    Abstract: A composition useful in molding comprises (A) from 10-95% by weight of a syndiotactic styrene resin, (B) from 5-90% by weight of a thermoplastic resin such as a polyolefin, polyester, polyether, polyamide or polycarbonate, and ( ) from 1-15 parts by weight of a rubber polymer such as maleic anhydride-modified or unmodified styrene-(butadiene or isoprene) block copolymer.
    Type: Grant
    Filed: June 5, 1995
    Date of Patent: July 25, 2000
    Assignee: Idemitsu Kosan Co., Ltd.
    Inventors: Akikazu Nakano, Takashi Sumitomo, Keisuke Funaki, Toshikazu Ijitsu, Michihiro Sawada, Masahiko Kuramoto, Masakazu Suzuki
  • Patent number: 6087435
    Abstract: A polystyrene-based resin composition, comprising (A) a styrene-based resin with a mainly syndiotactic configuration, (B) a polyolefin, and (C) rubber polymer particles as main components, exhibits excellent heat resistance and impact resistance.
    Type: Grant
    Filed: June 5, 1995
    Date of Patent: July 11, 2000
    Assignee: Idemitsu Kosan Co., Ltd.
    Inventors: Akikazu Nakano, Takashi Sumitomo, Keisuke Funaki, Toshikazu Ijitsu, Michihiro Sawada, Masahiko Kuramoto, Masakazu Suzuki
  • Patent number: 6051655
    Abstract: A composition amenable to injection molding and extrusion comprises a syndiotactic styrene resin, a thermoplastic resin such as a polyolefin and an inorganic filler optionally contains a rubber.
    Type: Grant
    Filed: June 5, 1995
    Date of Patent: April 18, 2000
    Assignee: Idemitsu Kosan Co., Ltd.
    Inventors: Akikazu Nakano, Takashi Sumitomo, Keisuke Funaki, Toshikazu Ijitsu, Michihiro Sawada, Masahiko Kuramoto, Masakazu Suzuki
  • Patent number: 6046275
    Abstract: A composition comprises (A) a syndiotactic styrene-based resin and (C) rubber polymer particles such as graft copolymers, butadiene or isoprene block copolymers optionally hydrogenated and/or modified with maleic anhydride, and other rubbers, and, optionally, (B) a thermoplastic resin such as a polycarbonate, and/or (D) a filler such as glass fibers.
    Type: Grant
    Filed: June 5, 1995
    Date of Patent: April 4, 2000
    Assignee: Idemitsu Kosan Co., Ltd.
    Inventors: Akikazu Nakano, Takashi Sumitomo, Keisuke Funaki, Toshikazu Ijitsu, Michihiro Sawada, Masahiko Kuramoto, Masakazu Suzuki
  • Patent number: 6043307
    Abstract: Novel styrene-based resin compositions comprising a styrene-based resin having a mainly syndiotactic configuration in compbination with one or more of: (A) thermoplastic resins other than the styrene-based resin, (B) a rubber polyers, and (C) inorganic fillers. The compositions have improved heat resistance and impact resistance over non-syndiotactic styrene-based resin compositions.
    Type: Grant
    Filed: June 7, 1995
    Date of Patent: March 28, 2000
    Assignee: Idemitsu Kosan Co., Ltd.
    Inventors: Akikazu Nakano, Takashi Sumitomo, Keisuke Funaki, Toshikazu Ijitsu, Michihiro Sawada, Masahiko Kuramoto, Masakazu Suzuki
  • Patent number: 6013726
    Abstract: A polystyrene-based resin composition containing a styrene-based resin with mainly syndiotactic configuration, a polyamide, and a rubber polymer as main components.
    Type: Grant
    Filed: June 5, 1995
    Date of Patent: January 11, 2000
    Assignee: Idemitsu Kosan Co., Ltd.
    Inventors: Akikazu Nakano, Takashi Sumitomo, Keisuke Funaki, Toshikazu Ijitsu, Michihiro Sawada, Masahiko Kuramoto, Masakazu Suzuki
  • Patent number: 6008293
    Abstract: A composition comprising 20-80 weight percent of a styrene polymer with mainly syndiotactic configuration, and 20-80 weight percent of a polycarbonate, and optionally an inorganic filler.
    Type: Grant
    Filed: June 5, 1995
    Date of Patent: December 28, 1999
    Assignee: Idemitsu Kosan Co., Ltd.
    Inventors: Akikazu Nakano, Takashi Sumitomo, Keisuke Funaki, Toshikazu Ijitsu, Michihiro Sawada, Masahiko Kuramoto, Masakazu Suzuki
  • Patent number: 5990217
    Abstract: A polystyrene-based resin composition containing a styrene-based resin with mainly syndiotactic configuration and filler as main components. Styrene-based resins of mainly syndiotactic configuration include polystyrene, poly(alkylstyrene), poly(halogenated styrene), poly(alkoxystyrene), styrene copolymers comprised of polymerized units of at least of styrene, alkylstyrene, halogenated styrene and alkoxystyrene, and mixtures thereof.
    Type: Grant
    Filed: May 12, 1998
    Date of Patent: November 23, 1999
    Assignee: Idemitsu Kosan Co., Ltd.
    Inventors: Akikazu Nakano, Takashi Sumitomo, Keisuke Funaki, Toshikazu Ijitsu, Michihiro Sawada, Masahiko Kuramoto, Masakazu Suzuki
  • Patent number: 5907129
    Abstract: There is disclosed a styrenic resin composition which comprises 70 to 99.9% by weight of an (A) styrenic polymer having a high degree of syndiotactic configuration and 0.1 to 30% by weight of a (B) organic compound having a --NH-- group and a molecular weight of less than 10,000.According to the present invention, there is obtained a styrenic resin composition having a syndiotactic configuration which is improved in electrical insulating properties, especially in withstand voltage against direct current.
    Type: Grant
    Filed: October 30, 1996
    Date of Patent: May 25, 1999
    Assignee: Idemitsu Kosan Co., Ltd.
    Inventors: Keisuke Funaki, Takaaki Uchida, Akitoshi Masuyama
  • Patent number: 5891951
    Abstract: A polystyrene-based resin composition containing a styrene-based resin with mainly syndiotactic configuration and filler as main components. Styrene-based resins of mainly syndiotactic configuration include polystyrene, poly(alkylstyrene), poly(halogenated styrene), poly(alkoxystyrene), styrene copolymers comprised of polymerized units of at least of styrene, alkylstyrene, halogenated styrene and alkoxystyrene, and mixtures thereof.
    Type: Grant
    Filed: June 5, 1995
    Date of Patent: April 6, 1999
    Assignee: Idemitsu Kosan Co., Ltd.
    Inventors: Akikazu Nakano, Takashi Sumitomo, Keisuke Funaki, Toshikazu Ijitsu, Michihiro Sawada, Masahiko Kuramoto, Masakazu Suzuki
  • Patent number: 5837384
    Abstract: There are disclosed a polystyrenic stretched film which comprises a styrenic resin composition containing 70 to 100% by weight of a styrenic polymer having a high degree of the syndiotactic configuration, has a crystallinity of 35% or more, and contains 200 ppm or less of residual monomer components and 1000 or less of particles of foreign substances having a size of 9 .mu.m or larger in 1 cm.sup.3, and a process for producing the polystyrenic stretched film which comprises extruding the styrenic resin composition in a specific amount in combination with melt filtration of the composition, cooling the extruded composition, biaxially stretching the cooled composition, and heat treating the stretched composition under the condition that the degree of heat treatment is 10.sup.-1 or more and less than 5.times.10.sup.2.
    Type: Grant
    Filed: July 16, 1996
    Date of Patent: November 17, 1998
    Assignee: Idemitsu Petrochemical Co., Ltd.
    Inventors: Keisuke Funaki, Takaaki Uchida
  • Patent number: 5798172
    Abstract: The present invention relates to a styrenic resin composition which comprises 90 to 99.99% by weight of a styrenic polymer having a high degree of syndiotctic configuration (SPS) and 0.01 to 10% by weight of a spherical aluminosilicate having pH in the range of 5 to 11; a polystyrene oriented film which comprises the above styrenic resin composition molded into an oriented film; a styrenic resin composition which comprises 99.2 to 99.95% by weight of a styrenic polymer having a high degree of syndiotactic configuration and 0.05 to 0.8% by weight of a spherical regular elastomer having an average grain size in the range of 0.1 to 3 .mu.m, and which has a melt index at 300.degree. C. under 2.16 kg load being in the range of 1 to 50; and a polystyrene oriented film which comprises the above styrenic resin composition molded into an oriented film.
    Type: Grant
    Filed: July 29, 1996
    Date of Patent: August 25, 1998
    Assignee: Idemitsu Petrochemical Co., Ltd.
    Inventors: Keisuke Funaki, Akihiko Okada, Takaaki Uchida
  • Patent number: 5753354
    Abstract: There are disclosed a polystyrenic stretched film which comprises a styrenic resin composition containing 70 to 100% by weight of a styrenic polymer having a high degree of the syndiotactic configuration, and has a crystallinity of 35% or more, a dispersion of thickness of 8% or less, and a dispersion of birefringence in 1000 cm.sup.2 of 20% or less, and a process for producing the polystyrenic stretched film. There are also disclosed a photographic film, a process film for printing, and a film for over-head projectors comprising the polystyrenic stretched film.According to the present invention, a stretched film having excellent uniformity of thickness and showing little deformation such as warp, striation, and waviness after heating can be provided.
    Type: Grant
    Filed: July 29, 1996
    Date of Patent: May 19, 1998
    Assignee: Idemitsu Petrochemical Co., Ltd.
    Inventors: Keisuke Funaki, Takaaki Uchida, Masami Kogure
  • Patent number: 5518817
    Abstract: A resin laminate comprising layer of styrene-based polymer having mainly syndiotactic configuration and a thermoplastic resin layer, a metallized laminate comprising a layer of the styrene-based polymer described above and a metal layer, and process for producing these laminates are disclosed. In the laminate, the styrene-based polymer layer and the thermoplastic resin layer may be biaxially stretched.The laminates are expected to be utilized for electrostatic capacitors, hot stamping foils, flexible printed circuit board substrates, food wrapping films, and other functional films including magnetic tapes, and ornament films.
    Type: Grant
    Filed: July 11, 1994
    Date of Patent: May 21, 1996
    Assignee: Idemitsu Kosan Co, Ltd.
    Inventors: Komei Yamasaki, Keisuke Funaki