Patents by Inventor Keisuke IDEGUCHI
Keisuke IDEGUCHI has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 11976748Abstract: A diaphragm valve includes a body (3) having a flow path (2), a seat (4) formed in the flow path (2), a metal diaphragm (5) for opening and closing the flow path (2), a pair of clamping parts (6) and (7) for claiming peripheral edge portions of the metal diaphragm (5) to fix the metal diaphragm (5) to the body (3), and an actuator (8) for abutting the metal diaphragm (5) to the seat (4) or separating the metal diaphragm from the seat (4), wherein a fluorine resin coating is formed on a seat side surface (5a) of the metal diaphragm (5) at least in a contact region (B-A) with the seat (4) in a region (C) surrounded by a clamping region (D-C) between the seat side surface (5a) and one of the pair of clamping portions (6, 7), excluding the clamping region (D-C).Type: GrantFiled: June 12, 2020Date of Patent: May 7, 2024Assignee: FUJIKIN INCORPORATEDInventors: Kaoru Hirata, Masaaki Nagase, Atsushi Hidaka, Kazuyuki Morisaki, Keisuke Ideguchi, Kosuke Sugimoto, Masafumi Kitano, Kouji Nishino, Nobukazu Ikeda
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Patent number: 11914407Abstract: The flow rate control device 10 includes a control valve 11, a restriction part 12 provided downstream of the control valve 11, an upstream pressure sensor 13 for measuring a pressure P1 between the control valve 11 and the restriction part 12, a differential pressure sensor 20 for measuring a differential pressure ?P between the upstream and the downstream of the restriction part 12, and an arithmetic control circuit 16 connected to the control valve 11, the upstream pressure sensor 13, and the differential pressure sensor 20.Type: GrantFiled: April 16, 2020Date of Patent: February 27, 2024Assignee: FUJIKIN INCORPORATEDInventors: Kaoru Hirata, Keisuke Ideguchi, Shinya Ogawa, Katsuyuki Sugita, Masaaki Nagase, Kouji Nishino, Nobukazu Ikeda, Hiroyuki Ito
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Publication number: 20230359228Abstract: A flow rate control device 100 includes a control valve 6 provided in a flow path 1, a flow rate measurement unit 2, 3 for measuring fluid flow rate controlled by the control valve 6, and a controller 7. The controller 7 is configured so as to control the opening/closing operation of the control valve 6 to match the measurement integral flow rate based on the signal outputted from the flow rate measurement unit (Vn+Vd) to the target integral flow rate Vs.Type: ApplicationFiled: July 3, 2023Publication date: November 9, 2023Applicant: FUJIKIN INCORPORATEDInventors: Katsuyuki SUGITA, Kouji NISHINO, Naofumi YASUMOTO, Kaoru HIRATA, Shinya OGAWA, Keisuke IDEGUCHI
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Patent number: 11733721Abstract: A flow rate control device 100 includes a control valve 6 provided in a flow path 1, a flow rate measurement unit 2, 3 for measuring fluid flow rate controlled by the control valve 6, and a controller 7. The controller 7 is configured so as to control the opening/closing operation of the control valve 6 to match the measurement integral flow rate based on the signal outputted from the flow rate measurement unit (Vn+Vd) to the target integral flow rate Vs.Type: GrantFiled: February 15, 2019Date of Patent: August 22, 2023Assignee: FUJIKIN INCORPORATEDInventors: Katsuyuki Sugita, Kouji Nishino, Naofumi Yasumoto, Kaoru Hirata, Shinya Ogawa, Keisuke Ideguchi
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Publication number: 20230129479Abstract: A flow rate control device (8) includes a control valve (6) having a valve element and a piezoelectric element for moving the valve element, and an arithmetic processing circuit (7) for controlling an operation of the control valve, wherein the arithmetic processing circuit is configured to receive an external command signal SE corresponding to a target flow rate when opening the control valve from a closed state so that a gas flows at the target flow rate, and to generate an internal command signal E1 output to a driving circuit for determining a voltage applied to the piezoelectric element based on the external command signal, the internal command signal is a signal that rises with time from zero and converges to a value of the external command signal, and is generated such that a slope at the time of initial rise and a slope immediately before convergence are smaller than a slope therebetween.Type: ApplicationFiled: January 19, 2021Publication date: April 27, 2023Applicant: FUJIKIN INCORPORATEDInventors: Katsuyuki SUGITA, Kouji NISHINO, Kaoru HIRATA, Shinya OGAWA, Keisuke IDEGUCHI
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Publication number: 20230011244Abstract: A pressure control device 20 includes a pressure control valve 25, a flow resistance 23 provided downstream of the pressure control valve, for restricting a gas flow, a first pressure sensor 21 for measuring a gas pressure between the pressure control valve and the flow resistance, a second pressure sensor 22 for measuring a gas pressure downstream of the flow resistance, and an arithmetic control circuit 26 connected to the first pressure sensor and the second pressure sensor. The pressure control device is configured to control the gas pressure downstream of the flow resistance by adjusting an opening degree of the pressure control valve based on an output of the second pressure sensor regardless of an output of the first pressure sensor control, and calculate the flow rate of the gas downstream of the flow resistance based on the output of the first pressure sensor and the output of the second pressure sensor.Type: ApplicationFiled: December 3, 2020Publication date: January 12, 2023Applicant: FUJIKIN INCORPORATEDInventors: Kaoru HIRATA, Kouji NISHINO, Katsuyuki SUGITA, Shinya OGAWA, Keisuke IDEGUCHI
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Publication number: 20220268365Abstract: A diaphragm valve includes a body 3 having a flow path 2 formed therein, a sheet 4 formed in the flow path 2, a metal diaphragm 5 for opening and closing the flow path 2 by abutting on or separating from the sheet 4, a pair of clamping parts 6 and 7 for claiming peripheral edge portions of both side surfaces of the metal diaphragm 5 respectively to fix the metal diaphragm 5 to the body 3, and an actuator 8 for abutting the metal diaphragm 5 on the sheet 4 or separating the metal diaphragm from the sheet 4, wherein a fluorine resin coating is formed on a sheet side surface 5a of the metal diaphragm 5 in a region excluding a clamping region D-C between the sheet side surface 5a and the clamping part 7, and at least in a contact region B-A with the sheet 4 in a region C surrounded by the clamping region D-C.Type: ApplicationFiled: June 12, 2020Publication date: August 25, 2022Applicant: FUJIKIN INCORPORATEDInventors: Kaoru HIRATA, Masaaki NAGASE, Atsushi HIDAKA, Kazuyuki MORISAKI, Keisuke IDEGUCHI, Kosuke SUGIMOTO, Masafumi KITANO, Kouji NISHINO, Nobukazu IKEDA
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Publication number: 20220197316Abstract: The flow rate control device 10 includes a control valve 11, a restriction part 12 provided downstream of the control valve 11, an upstream pressure sensor 13 for measuring a pressure P1 between the control valve 11 and the restriction part 12, a differential pressure sensor 20 for measuring a differential pressure ?P between the upstream and the downstream of the restriction part 12, and an arithmetic control circuit 16 connected to the control valve 11, the upstream pressure sensor 13, and the differential pressure sensor 20.Type: ApplicationFiled: April 16, 2020Publication date: June 23, 2022Applicant: FUJIKIN INCORPORATEDInventors: Kaoru HIRATA, Keisuke IDEGUCHI, Shinya OGAWA, Katsuyuki SUGITA, Masaaki NAGASE, Kouji NISHINO, Nobukazu IKEDA, Hiroyuki ITO
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Publication number: 20210141399Abstract: A flow rate control device 100 includes a control valve 6 provided in a flow path 1, a flow rate measurement unit 2, 3 for measuring fluid flow rate controlled by the control valve 6, and a controller 7. The controller 7 is configured so as to control the opening/closing operation of the control valve 6 to match the measurement integral flow rate based on the signal outputted from the flow rate measurement unit (Vn+Vd) to the target integral flow rate Vs.Type: ApplicationFiled: February 15, 2019Publication date: May 13, 2021Applicant: FUJIKIN INCORPORATEDInventors: Katsuyuki SUGITA, Kouji NISHINO, Naofumi YASUMOTO, Kaoru HIRATA, Shinya OGAWA, Keisuke IDEGUCHI