Patents by Inventor Keisuke Sugimoto

Keisuke Sugimoto has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 11976748
    Abstract: A diaphragm valve includes a body (3) having a flow path (2), a seat (4) formed in the flow path (2), a metal diaphragm (5) for opening and closing the flow path (2), a pair of clamping parts (6) and (7) for claiming peripheral edge portions of the metal diaphragm (5) to fix the metal diaphragm (5) to the body (3), and an actuator (8) for abutting the metal diaphragm (5) to the seat (4) or separating the metal diaphragm from the seat (4), wherein a fluorine resin coating is formed on a seat side surface (5a) of the metal diaphragm (5) at least in a contact region (B-A) with the seat (4) in a region (C) surrounded by a clamping region (D-C) between the seat side surface (5a) and one of the pair of clamping portions (6, 7), excluding the clamping region (D-C).
    Type: Grant
    Filed: June 12, 2020
    Date of Patent: May 7, 2024
    Assignee: FUJIKIN INCORPORATED
    Inventors: Kaoru Hirata, Masaaki Nagase, Atsushi Hidaka, Kazuyuki Morisaki, Keisuke Ideguchi, Kosuke Sugimoto, Masafumi Kitano, Kouji Nishino, Nobukazu Ikeda
  • Publication number: 20230101181
    Abstract: A curable photosensitive resin composition which can be cured at a relatively low temperature, has excellent developability and adhesion to a support, and a cured product that realizes low dielectric constant properties. A curable photosensitive resin composition containing a polyimide resin (A) which is a reaction product of monomer groups containing an aromatic tetracarboxylic anhydride (a1) and a diamine (a2) containing a dimer diamine, maleimides (B), and a polyfunctional polymerizable compound (C) having two or more ethylenic double bonds other than the component (A) and the component (B), a cured product, a photosensitive element, a resist pattern, a method of producing a resist pattern, a semiconductor device and an electronic device.
    Type: Application
    Filed: September 28, 2022
    Publication date: March 30, 2023
    Applicant: ARAKAWA CHEMICAL INDUSTRIES, LTD.
    Inventors: Takashi Yamaguchi, Taiyou Nakamura, Atsushi Shiotani, Keisuke Sugimoto, Madoka Yamashita, Takashi Tasaki
  • Patent number: 4839019
    Abstract: A limited current type oxygen sensor comprises an oxygen ion conductive solid electrolyte, a detection element including a positive electrode and a negative electrode, and a heater element including a heater. The negative electrode is installed on one of the walls constituting a space communicating with a small hole for restricting the amount of oxygen to diffuse therethrough. The porous positive electrode and the heater are embedded in the oxygen ion conductive solid electrolyte layers.
    Type: Grant
    Filed: November 17, 1987
    Date of Patent: June 13, 1989
    Assignee: Fuji Electric Co., Ltd.
    Inventors: Teizo Takahama, Masahiko Masuda, Keisuke Sugimoto, Yuji Sugiyama
  • Patent number: 4762605
    Abstract: A limited current type oxygen sensor comprises a solid electrolyte element formed from material having high oxygen-ion conductivity such as yittria-stabilized zirconia. Electrodes are provided on the top surface and the bottom surface of the element and are formed by calcining a mixture of small ceramic particles that are relatively sinter-retardant as compared with oxygen-ion conducting ceramics, of 200 .ANG. in average particle size fine precious metal particles, and a binder. A cover is provided over the second electrode and the cover includes at least one diffusion orifice that permits ambient gas to diffuse toward the second electrode.
    Type: Grant
    Filed: January 30, 1987
    Date of Patent: August 9, 1988
    Assignee: Fuji Electric Co., Ltd.
    Inventors: Takeo Tanaka, Keisuke Sugimoto, Yuji Sugiyama, Hideo Shiraishi, Teizo Takahama, Masahiko Masuda